• Proceedings of the Materials Research Society of Korea Conference
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• 2000.11a
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• pp.53-53
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• 2000

• Proceedings of the Materials Research Society of Korea Conference
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• 2006.11a
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• pp.19.2-19.2
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• 2006

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.12
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• pp.979-986
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• 2001

This paper was researched the effect of slurry stability on the mechanical and electrical property of the porcelain insulator with various raw materials such as feldspar, quartz, clay and l7wt% alumina. The slurry was fabricated after ball milling the mixed raw materials. Green compacts were made by the extrusion and were sintered at 1300$\^{C}$ for 60min in the tunnel kiln. All of the specimens were densified 96% of the theoretical density. The 3-point flexural strength($\sigma$$\_$B/) of the specimen stabilized slurry pH 7.8 was 1650 k9/㎠ and the vickers hardness(Hv) and the fracture toughness(K$\_$IC/) were 27.5 GPa and 2.2 MPa$.$m$\^$$\sfrac{1}{2}$/, respectively. The mechanical properties of the specimen stabilized slurry PH 9.3 were 1716 kg/㎠($\sigma$$\_$B/), 27.6 GPa(Hv) and 3.0 MPa$.$m$\^$$\sfrac{1}{2}$/(K$\_$IC/), respectively. The dielectric strength was increased from 8.3kV/mm to 13.2kV/mm as the increase of the slurry pH from 7.8 to 9.3. Therefore the physical properties of the specimen stabilized slurry pH 9.3 were improved.

• KCI Concrete Journal
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• v.14 no.4
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• pp.151-159
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• 2002

This study investigates experimentally the optimum mix proportion and design factors of the stabilizing liquid used for excavation of the massive and deep slurry wall in LNG in-ground tank before pouring concrete. Considering those site conditions, the stabilizing liquid used for excavation of slurry wall has to be satisfied with some requirements including specific gravity, fluid loss, cake thickness, funnel viscosity and sand content in order to construct the safe and qualified slurry wall. For this purpose, we select materials including bentonite, polymer and dispersion agent. After performing many tests for materials and mix design process, we propose the optimum mix proportion that the upper limit ratio of bentonite is $2.0\%$, polymer is $0.1\%$ considering the funnel viscosity and dispersion agent is $0.05\%$considering the fluid loss of the stabilizing liquid. Also, we select all materials which are consisted of GTC4 as bentonite, KSTP as polymer and Bentocryl 86 as dispersion agent. Based on the results of this study, the optimum mix proportion of the stabilizing liquid is applicable to excavate the deep and massive slurry wall in LNG in-ground tank successfully.

• Journal of Powder Materials
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• v.21 no.4
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• pp.266-270
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• 2014

Metal foams have a cellular structure consisting of a solid metal containing a large volume fraction of pores. In particular, open, penetrating pores are necessary for industrial applications such as in high temperature filters and as a support for catalysts. In this study, Fe foam with above 90% porosity and 2 millimeter pore size was successfully fabricated by a slurry coating process and the pore properties were characterized. The Fe and $Fe_2O_3$ powder mixing ratios were controlled to produce Fe foams with different pore size and porosity. First, the slurry was prepared by uniform mixing with powders, distilled water and polyvinyl alcohol(PVA). After slurry coating on the polyurethane(PU) foam, the sample was dried at $80^{\circ}C$. The PVA and PU foams were then removed by heating at $700^{\circ}C$ for 3 hours. The debinded samples were subsequently sintered at $1250^{\circ}C$ with a holding time of 3 hours under hydrogen atmosphere. The three dimensional geometries of the obtained Fe foams with an open cell structure were investigated using X-ray micro CT(computed tomography) as well as the pore morphology, size and phase. The coated amount of slurry on the PU foam were increased with $Fe_2O_3$ mixing powder ratio but the shrinkage and porosity of Fe foams were decreased with $Fe_2O_3$ mixing powder ratio.

• Proceedings of the Materials Research Society of Korea Conference
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• 2012.05a
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• pp.107.2-107.2
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• 2012

We used the electrophoretic deposition (EPD) process to fabricate a glass composite and investigated the EPD parameters to find the optimum deposition time by understanding the relationship among the process parameters of zeta potential (ZP), pH, deposition yield and saturation point. A binder and a dispersing agent were mixed properly with glass frit ($0.2{\sim}25{\mu}m$, d50=$8.77{\mu}m$) in an ethyl alcohol medium for the preparation of the slurry. The pH and ZP were in an inverse relationship to each other due to the generation of $H_3O^+$ ions with the addition of the dispersing agent in the slurry. The acidic nature of the dispersing agent was resulted in a decrease of the pH and an increase of the ZP. Otherwise, the pH increased with the addition of the glass frit in the slurry because $H_3O^+$ ions were absorbed on the glass frit. Therefore, the $OH^-$ ions correspondingly increased. The saturation point of EPD was strongly correlated with the variation of the pH in the slurry; this is caused by a chemical reaction between the ethyl alcohol and the ions that make up the glass frit. An adjustment of the pH variation and the saturation point in the slurry can be established with respect to the optimum deposition time in the slurry.

• Journal of Powder Materials
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• v.20 no.6
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• pp.439-444
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• 2013

Fe foam with above 90% porosity and 2 millimeter pore size was successfully fabricated by a slurry coating process. In this study, the binder contents were controlled to produce the Fe foam with different pore size, strut thickness and porosity. Firstly, the slurry was prepared by uniform mixing with Fe powders, distilled water and polyvinyl alcohol(PVA) as initial materials. After slurry coating on the polyurethane(PU) foam the sample was dried at $80^{\circ}C$. The PVA and PU foams were then removed by heating at $700^{\circ}C$ for 3 hours. The debinded samples were subsequently sintered at $1250^{\circ}C$ with holding time of 3 hours under hydrogen atmosphere. The three dimensional geometries of the obtained Fe foams with open cell structure were investigated using X-ray micro CT(computed tomography) as well as the pore morphology, size and phase.

• Transactions on Electrical and Electronic Materials
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• v.7 no.4
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• pp.163-166
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• 2006

The dishing and the erosion were evaluated on the tungsten CMP process with conventional and new developed slurry. The tungsten thin film was polished by orbital polishing equipment. Commercial pattern wafer was used for the evaluation. Both slurries were pre tested on the oxide region on the wafer surface and the removal rate was not different very much. At the pattern density examination, the erosion performance was increased at all processing condition due to the reduction of thickness loss in new slurry. However, the dishing thickness was not remarkably changed at high pattern density despite of the improvement at low pattern density. At the large pad area, the reduction of dishing thickness was clearly found at new tungsten slurry.

• Journal of Applied Reliability
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• v.16 no.4
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• pp.263-271
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• 2016

Purpose: A slurry pump for flue gas desulfurization system performs a role that discharges the slurry of a plaster shape in a thermal power plant. Since a slurry pump transfers the slurry by the centrifugal force, it has the friction wear in the impeller and liner because of the slurry. Methods: In this study, failure analysis and test evaluation on the slurry pump have been proposed and the process that reliability of the product improves through design improvement has been presented. And failure cause of typical failure case has been investigated and improvement design has been presented. Results: Reliability improvement is established by analysis of the test results of before and after acceleration test. Conclusion: This study can be provided to improve the product reliability through failure analysis of a slurry pump.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.37.2-37.2
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• 2011

반도체공정에서 Photo-lithography는 특정 광원을 사용하여 구현하고자 하는 패턴을 기판상에 형성하는 기술이다. 이러한 Photo-lithography 공정에서는 패턴이 형성되어 있는 마스크가 핵심적인 역할을 하며 반도체소자의 전체적인 성능을 결정한다. 이에 따라 Photo-lithography용 마스크에 사용되는 Blank 마스크는 Defect의 최소화 및 우수한 평탄도 등의 조건들이 요구되고 있다. 이러한 Blank 마스크 재료로 광원을 효율적으로 투과시키는 성질이 우수하고 다른 재료에 비해 열팽창계수가 작은 석영기판이 사용되고 있다. 석영 기반의 마스크는 UV Lithography에서 주로 사용되고 있으며 그 밖에 UV-NIL (Nano Imrpint Lithography), EUVL (Extreme Ultra Violet Lithography) 등에도 이용되고 있다. 석영기판을 가공하여 Blank 마스크로 제작하기 위해 석영기판의 Lapping/Polishing 등이 핵심기술이며 현재 일본에서 전량 수입에 의존하고 있어, 이에 대한 연구의 필요성이 절실한 상황이다. 본 연구에서는 Blank 마스크제작을 위한 석영기판의 Polishing 공정에 사용되는 Ceria Slurry의 특성 연구 및 이에 따른 연마평가를 실시하였으며 첨가제의 조건에 따른 pH/Viscosity/Stability 등의 물리적인 특성을 관찰하여 석영기판 Polishing에 효율적인 Ceria slurry의 최적조건을 도출했다. 또한, 조건에 따른 Slurry의 정확한 분석을 위해 Zeta Potential Analyzer를 이용하여 연마입자의 크기 및 Zeta Potential에 대한 평가를 실시한 후 연마제와 석영기판의 Interaction force를 측정하였다. 상기 실험에 의해 얻어진 최적화된 연마 공정 조건하에서 Ceria slurry를 사용하여 연마평가를 실시함으로써 Removal Rate/Roughness 등의 결과를 관찰하였다. 본 연구를 통해 반도체 photo mask 제작을 위한 Ceria slurry의 주요특성을 파악하고 석영기판의 Polishing에 효율적인 조건을 도출함으로써 Lithography 마스크를 효율적으로 제작할 수 있을 것으로 예상된다.