• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2003년도 추계학술대회 논문집 전기물성,응용부문
• /
• pp.49-52
• /
• 2003

Single crystalline silicon (SCS) was adopted for a reliable micromirror array of biochip fabrication applications. SCS has excellent mechanical properties and smooth surface, which is the best material for micromirror devices. The mirror array has $16{\times}16$ micromirrors and each mirror has a $120{\mu}m{\times}100{\mu}m$ reflective surface. The micromirror has simple torsional beam springs and electrostatic force was used for driving. The designed tilting angle was $9.6^{\circ}$, and the tilting angles were measured according to applied voltages. The surface roughness was measured by a laser profiler. The response time was measured using He-Ne laser and position sensitive diode (PSD), and the lifetime was checked for reliability proof.

• 전기학회논문지P
• /
• 제63권3호
• /
• pp.125-130
• /
• 2014

This paper is research result for a development of solar cell silicon ingot glowing(SCSIG) PWM converter system for 120[kW] 3[kA]. The system include 3-phase AC-DC rectifier diode converter of input voltage AC 460[V] and 60[Hz], DC-AC single phase full bridge PWM inverter of high frequency, AC-DC single-phase full wave rectifier using center-tapped of transformer for low voltage 50[V] and large current 3,000[A], carbon resistor load 0.2 [$m{\Omega}$]. PWM switching frequency for IGBT inverter control set 15KHz. The suggested researching contents are designed data sheets of power converter system, PSIM simulation, operating characteristics and analysis results of developed SCSIG system.

• 한국정보통신설비학회:학술대회논문집
• /
• 한국정보통신설비학회 2003년도 하계학술대회
• /
• pp.93-95
• /
• 2003

We have designed and fabricated a micromirror array using single crystalline silicon (SCS) for data communication applications. The mirror array has $16{\times}16$ micromirrors and each mirror has $120{\mu}m{\times}100{\mu}m$ reflective surface. Electrostatic force was adopted as a driving mechanism. The spring dimensions were determined using relationship between spring dimensions and driving voltage. The designed tilting angle was $9.6^{\circ}$, and measured tilting angle according to applied voltages were experimented. The response time was measured using He-Ne laser and position sensitive diode (PSD), and lifetime was checked for reliability proof.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2004년도 제27회 학술발표회 초록집
• /
• pp.165-165
• /
• 2004

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2006년도 제31회 학술논문발표회 초록집
• /
• pp.137-137
• /
• 2006

• Transactions on Electrical and Electronic Materials
• /
• 제13권2호
• /
• pp.73-77
• /
• 2012

Operation of liquid crystal displays (LCDs) can be improved by monolithic integration of the pixel transistors with light emitting diodes (LEDs) on a single substrate. Conventional LCDs make use of filters to control the backlighting which reduces the overall efficiency. These LCDs also utilize LEDs in series which impose failure and they require high voltage for operation with a power factor correction. The screen of small hand-held devices can operate from moderate brightness. Therefore, III-V nanowires that are grown along with transistors over Silicon substrates can be utilized. Control of nanowire LEDs with nanowire transistors will significantly lower the cost, increase the efficiency, improve the manufacturing yield and simplify the structure of the small displays that are used in portable devices. The steps to grow nanowires on Silicon substrates are described. The vertical n-type and p-type nanowire transistors with surrounding gate structures are characterized. While biased at 0.5 V, nanowire transistors with minimum radius or channel width have an OFF current which is less than 1pA, an ON current more than 1 ${\mu}A$, a total delay less than 10 ps and a transconductance gain of more than 10 ${\mu}A/V$. The low power and fast switching characteristics of the nanowire transistor make them an ideal choice for the realization of future displays of portable devices with long battery lifetime.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
• /
• pp.198.1-198.1
• /
• 2016

Organic light-emitting diode (OLED) displays have promising potential to replace liquid crystal displays (LCDs) due to their advantages of low power consumption, fast response time, broad viewing angle and flexibility. Organic light emitting materials are vulnerable to moisture and oxygen, so inorganic thin films are required for barrier substrates and encapsulations.[1-2]. In this work, the silicon-based inorganic thin films are deposited on plastic substrates by plasma-enhanced chemical vapor deposition (PECVD) at low temperature. It is necessary to deposit thin film at low temperature. Because the heat gives damage to flexible plastic substrates. As one of the transparent diffusion barrier materials, silicon oxides have been investigated. $SiO_x$ have less toxic, so it is one of the more widely examined materials as a diffusion barrier in addition to the dielectric materials in solid-state electronics [3-4]. The $SiO_x$ thin films are deposited by a PECVD process in low temperature below $100^{\circ}C$. Water vapor transmission rate (WVTR) was determined by a calcium resistance test, and the rate less than $10.^{-2}g/m^2{\cdot}day$ was achieved. And then, flexibility of the film was also evaluated.

• 한국생산제조학회지
• /
• 제25권5호
• /
• pp.362-367
• /
• 2016

Recently, wireless charging systems have expanded their applications from household electrical appliances to outdoor activity devices. In wireless charging systems, solar cells have versatile advantages, such as abundant raw materials within the earth, reasonable prices of products, and highest power conversion efficiency. In this study, the photovoltaic effect between a silicon solar cell and a photon of infrared wavelength was simulated using a Shockley diode equation. A solar cell power charging system was then set up to: 1) clarify mechanisms of the charging interaction based on the photovoltaic effect with a laser source, and 2) verify interdependency of the parameters: laser settings and geometrical position between a solar cell and the laser. As was observed, the solar cell generates more power when the photon was irradiated uniformly, intensively, and vertically on the surface of the solar cell.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2009년도 제38회 동계학술대회 초록집
• /
• pp.322-322
• /
• 2010

For boron doping on n-type silicon wafer, around $1,000^{\circ}C$ doping temperature is required, because of the relatively low solubility of boron in a crystalline silicon comparing to the phosphorus case. Boron doping by fiber laser annealing and lamp furnace heat treatment were carried out for the uniformly deposited p-a-Si:H layer. Since the uniformly deposited p-a-Si:H layer by cluster is highly needed to be doped with high temperature heat treatment. Amorphous silicon layer absorption range for fiber laser did not match well to be directly annealed. To improve the annealing effect, we introduce additional lamp furnace heat treatment. For p-a-Si:H layer with the ratio of $SiH_4:B_2H_6:H_2$=30:30:120, at $200^{\circ}C$, 50 W power, 0.2 Torr for 30 min. $20\;mm\;{\times}\;20\;mm$ size fiber laser cut wafers were activated by Q-switched fiber laser (1,064 nm) with different sets of power levels and periods, and for the lamp furnace annealing, $980^{\circ}C$ for 30 min heat treatment were implemented. To make the sheet resistance expectable and uniform as important processes for the $p^+$ layer on a polished n-type silicon wafer of (100) plane, the Q-switched fiber laser used. In consequence of comparing the results of lifetime measurement and sheet resistance relation, the fiber laser treatment showed the trade-offs between the lifetime and the sheet resistance as $100\;{\omega}/sq.$ and $11.8\;{\mu}s$ vs. $17\;{\omega}/sq.$ and $8.2\;{\mu}s$. Diode level device was made to confirm the electrical properties of these experimental results by measuring C-V(-F), I-V(-T) characteristics. Uniform and expectable boron heavy doped layers by fiber laser and lamp furnace are not only basic and essential conditions for the n-type crystalline silicon solar cell fabrication processes, but also the controllable doping concentration and depth can be established according to the deposition conditions of layers.

• 한국진공학회지
• /
• 제13권1호
• /
• pp.14-21
• /
• 2004

오늘날 전력소자의 작동에 고주파를 사용하기 때문에 에너지 손실을 줄이기 위해 전력소자의 스위칭 속도를 증가시키는 것은 필수적이다. 본 연구에서는 $p^+- n^-$ 접합 다이오드의 스위칭 속도를 증가시킬 목적으로 minority carrier의 수명을 감소시킬 수 있는 전자조사를 실시하였다. 다이오드의 전기적 성질에 대한 전자조사의 효과를 나타냈다. 스위칭 속도는 효과적으로 증가하였다. 또한 증가될 것으로 예상되는 접합 누설 전류와 전자조사 후 정전압강하는 최적 조건의 에너지와 dose량으로 조사된 $p^+- n^-$접합 다이오드에서는 무시할 수 있는 정도로 나타났다. DLTS와 C-V 분석은 실리콘 기판에서 전자조사로 감소된 결함은 0.284eV와 0.483eV의 에너지 준위를 갖는 donor-like 결함인 것을 보여준다. 본 연구에서의 실험 결과를 고려해 보면, 전자조사는 $p^+- n^-$ 접합 다이오드 전력 소자의 스위칭 속도를 증가시켜 에너지 손실을 감소시킬 수 있는 가장 유용한 기술이라고 결론지을 수 있다.