• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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• pp.896-899
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• 2003

Using hi plasma and Fe-Phthalocyanine, carbon nanofibers have been synthesized a low temperature. The carbon nanofibers had about In nm diameter and up to $10{\mu}m$ length. These were grown in random orientation. There are two shapes in the CNFs, screw and straight line shapes. Furthermore, we found the selective growth of nanofibers on the scratched substrates.

• 한국전기전자재료학회논문지
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• 제26권6호
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• pp.425-428
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• 2013

In this paper, we present a novel hydrophilic coating material (Wellture Finetech, Korea) which can be utilized as a coating layer for anti-contamination for electrical and electronic system. The coating material was deposited on 4 inch silicon wafer with several different film thickness. The film thickness was controlled by spin coating speed. After curing of the film, we have scratched by permanent marker to check self-cleaning property of the film. Also we have executed several mechanical tests of the films. As the spin coating speed is increased, the film thickness was thinned from 230 nm to 125 nm. Contact angle of the film was lowered from $30^{\circ}$ to $12^{\circ}$ as the spin coating speed is increased from 700 to 2,500 rpm. On permanent marker scratched film surface coated at 1,000 rpm, we have poured regular city water to investigate self cleaning property of the film. The scratches were gradually separated from the film surface due to super-hydrophilicity of the film. Hardness of spin coated film was 9H measured by ASTM D3363 method. and adhesion of all film was 5B tested by ASTM D3359 method. Also, to get exact hardness value of the film, we have utilized a nano-indenter. As spin speed is increased, the hardness of film was increased from 3 GPa to 5 GPa.

• 대한치과교정학회지
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• 제22권1호
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• pp.123-131
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• 1992

This study was done to evaluate the changes of enamel surface by interproximal stripping and recovery of it by polishing. The number of 34 1st premolars which had extracted for orthodontic treatment were selected as samples. Interproximal stripping was performed by hand with metal strip and strip placer (Dentaurum Co., Germany) and low speed handpiece with diamond disk (Superdiaflex, Germany). Polishing was performed by hand with plastic strip (3M Col) and low speed handpiece with whip-mix, DCPA (Dicalcium Phosphate, Anhydrous, $CaHPO_4$) powder and Sof-lex (3M Co. U.S.A.) polishing kit. Each groups were examined under the scanning electron microscope (JEOL Co., JSM-840A, Japan) and the following results were obtained: 1. The stripped group performed by metal strip and diamond disk altogether showed deep furrow on the enamel surface as wide as about $10{{\mu}m}$. 2. There could be seen more irregular scratched line in the group stripped by metal strip than that by diamond disk. 3. The polished group performed by plastic strip and DCPA powder showed slight smoothening of the edge of stripped furrow on the enamel surface without relation to the stripping method. 4. The polished group performed by Sof-lex progressive polishing kit could not avoid the formation of the furrows on the enamel surface according to the particle size without relation to the stripping method. 5. The polished group performed by the superfine polishing wheel, the final stage of Sof-lex polishing method showed shallow scratched line as wide as within about $2{{\mu}m}$ on the enamel surface without relation to the stripping method. 6. The interproximal stripped enamel surface could not recover its original surface texture by any kind of polishing methods.

• 한국표면공학회지
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• 제50권5호
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• pp.352-359
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• 2017

The growth of nanocrystalline diamond films on a p-type poly silicon substrate was studied using microwave plasma chemical vapor deposition method. A 6 mm thick poly silicon plate was mirror polished and scratched in an ultrasonic bath containing slurries made of 30 cc ethanol and 1 gram of diamond powders having different sizes between 5 and 200 nm. Upon diamond deposition, the specimen scratched in a slurry with the smallest size of diamond powder exhibited the highest diamond particle density and, in turn, fastest diamond film growth rate. Diamond deposition was carried out applying different DC bias voltages (0, -50, -100, -150, -200 V) to the substrate. In the early stage of diamond deposition up to 2 h, the effect of voltage bias was not prominent probably because the diamond nucleation was retarded by ion bombardment onto the substrate. After 4 h of deposition, the film growth rate increased with the modest bias of -100 V and -150 V. With a bigger bias condition(-200 V), the growth rate decreased possibly due to the excessive ion bombardment on the substrate. The film grown under -150V bias exhibited the lowest contact angle and the highest surface roughness, which implied the most hydrophilic surface among the prepared samples. The film growth rate increased with the apparent activation energy of 21.04 kJ/mol as the deposition temperature increased in the range of $300{\sim}600^{\circ}C$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.425.2-425.2
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• 2016

토카막(TOKAMAK) 장치의 진공용기 및 용기내벽은 플라즈마(Plasma)에 의한 고열과 높은 에너지의 이온 입자들에 항상 노출되어 있는 환경이다. 토카막의 일종인 KSTAR장치의 진공용기는 스테인레스강(STS316)계열의 재질로 이루어져 있고, 플라즈마와 면하는 용기 벽면은 플라즈마에 대해 견딜 수 있도록 그라파이트 타일(graphite tile)로 구성되어 있다. 고에너지의 이온 입자들과 열플럭스(Heatflux)는 용기벽면과 용기를 침식시키고, 또한 이렇게 생겨난 분진(dust)들은 진공용기 내 여기저기를 떠다니게 되고, 플라즈마에 대해서 불순물로서 작용하게 된다. 본 연구에서는 감마분석법으로 플라즈마에 의해 진공용기 내에 집적된 분진들의 구성 성분을 분석하여 주요 출처를 규명할 수 있는 방법을 제시하고, KSTAR 플라즈마의 불순물 제어에 유용하게 활용 할 수 있는 데이터를 제공하여 향후 KSTAR의 고성능 플라즈마 기술개발에 일조할 수 있도록 하고자 한다.

• E2M - 전기 전자와 첨단 소재
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• 제9권5호
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• pp.470-475
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• 1996

Fiber-textured diamond films have been deposited on scratched silicon(100) substrate by micro wave .plasma enhanced chemical vapor deposition at the condition of micro wave power : 950 W, pressure : 60 torr, H$_{2}$ gas flow rate : 50 sccm, CH$_{4}$ gas flow rate : 1.5 sccm, substrate temperature : about 900.deg. C and deposition time : 20 hours. The films were characterized by mean of scanning electron microscopy, Raman spectroscopy and X-ray analysis.

• 한국전기전자재료학회논문지
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• 제19권1호
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• pp.46-51
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• 2006

This paper reports on the effects of silicone oils, used as processing agents, on the recovery of hydrophobicity of silicone rubber. The recovery of hydrophobicity was evaluated by the measuring the contact angle, the surface electrical resistance and SEM. Here, we formed artificial contamination on the surface of samples, which scratched by sand papers and alumina powders. There was small recovery of hydrophobicity on the surface of SIR-A that silicone oil was not added. In both oil-added samples, SIR-B and SIR-C, recovery of hydrophobicity was achieved greatly. The surface of SIR-C showed that a lot of silicone oil was observed due to migration of oil, relatively in comparison with SIR-B. The tendency of recovery of hydrophobicity expressed by contact angle was in a good agreement with electrical property as determined by surface resistivity.

• 한국전기전자재료학회논문지
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• 제14권7호
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• pp.584-589
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• 2001

Diamond thin films were synthesized on WC-Co substrate by RF PACVD(radio frequency plasma-assisted chemical vapor deposition) technique with H$_2$-CH$_4$-O$_2$ gas mixture. WC-Co substrate was pre-treated in HNO$_3$solution, scratched with 3$\mu\textrm{m}$ diamond paste and exposed in the O$_2$ plasma before deposition. The diamond thin film prepared at 11% oxygen concentration showed the best quality of good adhesion and wear resistance at various oxygen concentration with the fixed 5% CH$_4$ concentration.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.161-161
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• 2008

The oxide film of silicon wafer has been mainly polished by fumed silica, colloidal silica or ceria slurry. Because colloidal silica slurry is uniform and highly dispersed composed of spherical shape particles, by which the oxide film polished remains to be less scratched in finishing polishing process. Even though the uniformity and spherical shape is advantage for reducing the scratch, it may also be the factor to decrease the removal rate. We have studied the correlation of silica abrasive particles and CMP characteristics by varying pH, down force, and table rotation rate in polishing. It was found that the CMP polishing is dependent on the morphology, aggregation, and the surface property of the silica particles.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2000년도 춘계학술대회논문집
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• pp.1577-1582
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• 2000

In this study, the experimental modal analysis is performed to investigate the dynamic characteristics of slider-air bearings in hard disk drives. Bump response of the slider is acquired by measuring the relative velocity for two points using the laser interferometer, in which the disk is scratched lightly by a sharp knife to make a bump. From the measurements, the modal parameters of the head slider, modal frequencies and damping ratios of roll and pitch, are estimated by data processing and parameter estimation.