• Title/Summary/Keyword: poly(A)

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A Study on the Compatibility of PMMA-Poly(butadiene-g-MMA) Blends (PMMA와 Poly(butadiene-g-MMA) 블렌드의 상용성에 관한 연구)

  • Park, Sung-Ick;Han, Seung;Suh, Kyung-Do;Mun, Tak-Jin
    • Applied Chemistry for Engineering
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    • v.5 no.1
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    • pp.182-188
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    • 1994
  • Poly(butadiene-g-MMA) was synthesized by grafting methyl metharcylate on polybutadiene which is intrinsically incompatible with poly(mothy methacrylate)(PMMA) and this graft copolymer was blended with PMMA. Mechanical properties of PMMA-poly(butadiene-g-MMA) blends and PMMA-polybutadiene blends, such as impact strength, tensile strength and haze were determined. Morphological changes of the blends as a function of graft percentage were observed by scanning electron microscopy. Mechanical properties of PMMA-poly(butadiene-g-MMA) blends were better than PMMA-polybutndiene blends. Especially, mechanical properties of PMMA-poly(butadiene-g-MMA) blends were improved nth increasing graft percentage of MMA.

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THE EFFECTS OF MONO-POLY ON THE SOFT DENTURE LINERS (의치상용 연성 이장재에 대한 mono-poly의 효과)

  • Heo, Ji-Hyun;Jin, Tai-Ho;Cho, Hye-Won
    • The Journal of Korean Academy of Prosthodontics
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    • v.38 no.4
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    • pp.484-491
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    • 2000
  • Soft denture liners or conditioners may be valuable therapeutic materials. The life of these liners is short and varies, but it can be extended by the use of a mono-poly(polymethyl methacrylate coating material). This study determined whether coating three temporary soft denture liners with mono-poly affected the resiliency of soft liners, and evaluated the ability of mono-poly to prevent water absorption and alcohol loss from the underlying soft liners. $20{\times}12mm$ cylindrical specimens of Coe-Soft, Soft-Liner, Coe-Comfort soft lining materials were made and divided into two groups of mono-poly uncoated(control) and mono-poly coated specimens. Specimens were immersed in water and compressed on an instron universal testing machine and weighed at initial, 24 hours, 1 week, 2 weeks, and 4 weeks. Resiliency was determined by measuring the energy absorbed by the soft liners when stressed to a specific yield point. Mono-poly coating significantly increased the resiliency of the Soft-Liner, but had no effect on the other soft liners. Among the 3 soft liners, Soft-Liner showed the hightest resiliency and modulus of elasticity. The weight loss in Soft-Liner was the least among the 3 liners, and the weight loss in Coe-Soft was decreased by monopoly coating.

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Effect of Poly(butyl acrylate)-Poly(methyl methacrylate) Rubber Particle Texture on the Toughening Behavior of Poly(methyl methacrylate)

  • Chung, Jae-Sik;Park, Kyung-Ran;Wu, Jong-Pyo;Han, Chang-Sun;Lee, Chan-Hong
    • Macromolecular Research
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    • v.9 no.2
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    • pp.122-128
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    • 2001
  • Monodisperse composite latex particles with size of ca. 300 nm, which consist ofn-butyl acrylate as a soft phase and methyl methacrylate as a hard phase with different morphology, were synthesized by seeded multi-stage emulsion polymerization. Three types of composite latex particles including random-, core/shell-, and gradient-type particles were obtained by using different monomer feeding methods during semi-batch emulsion polymerization. Effect of poly(butyl acrylate)-poly(methyl methacrylate) rubber particle morphology on the mechanical and rheological properties of rubber toughened poly(methyl methacrylate) was investigated. Among three different rubber particles, the gradient-type rubber particle showed better toughening effect than others. No significant variation of rheological property of poly(methyl methacrylate)/rubber blends was observed for the different rubber particle morphology.

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A NOTE ON q-ANALOGUE OF POLY-EULER POLYNOMIALS AND ARAKAWA-KANEKO TYPE ZETA FUNCTION

  • KIM, YOUNG ROK;LEE, HUI YOUNG;KIM, AHYUN
    • Journal of applied mathematics & informatics
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    • v.38 no.5_6
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    • pp.611-623
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    • 2020
  • In this paper, we define a q-analogue of the poly-Euler numbers and polynomials which is generalization of the poly Euler numbers and polynomials including q-analogue of polylogarithm function. We also give the relations between generalized poly-Euler polynomials. Furthermore, we introduce zeta fuctions of Arakawa-Kaneko type and talk their properties and the relation with q-analogue of poly-Euler polynomials.

Optical Properties of Conducting Polymer Poly(3-Alkylthiophene) Solution (도전성 고분자 Poly( 3- Alkylthiophene ) 용액의 광학적 성질)

  • Park, J.H.;SaGong, G.;Lim, J.S.;Kim, T.S.;Gu, H.B.
    • Proceedings of the KIEE Conference
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    • 1990.07a
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    • pp.221-223
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    • 1990
  • In this study, we have studied the optioal properties and $I_2$ doping effect of Poly(3-Akkylthiophene) solution. The end of speotrum absorbance on the solutions of Poly(3 - Octylthiophene), Poly (3-Dodecylthiophene) and Poly(3-Dooooylthiophene) was dependent on temperature. It is bellved that conrod-coil transition dependent on temperature was rod-coil transition. And absortance peak of Poly (3-Dodecylthiophene) in dichloromethane solution increased with increasing the $I_2$ dopant.

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Thermal Analysis of Poly(Sodium 4-Styrenesulfonate) Intercalated Graphite Oxide Composites

  • Jeong, Hye-Gyeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.555-555
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    • 2012
  • The thermal stability of poly(sodium 4-styrenesulfonate) intercalated graphite oxide has been investigated using a differential scanning calorimeter. The poly(sodium 4-styrenesulfonate) intercalated graphite oxide composite shows a prominent exothermic reaction near $207^{\circ}C$ and an endothermic reaction near $453^{\circ}C$. Graphite oxide is responsible for the exothermic reaction while the endothermic reaction is caused by the poly(sodium 4-styrenesulfonate) used in the synthesis of poly(sodium 4-styrenesulfonate) intercalated graphite oxide. The onset temperature of the exothermic reaction of poly(sodium 4-styrenesulfonate) intercalated graphite oxide decreased by $92^{\circ}C$ in comparison with that of graphite oxide, indicating the addition of poly(sodium 4-styrenesulfonate) in the composite has diminished the thermal stability of graphite oxide.

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Schottky barrier Thin-Film-Transistors crystallized by Excimer laser annealing and solid phase crystallization method (ELA 결정화와 SPC 결정화를 이용한 쇼트키 장벽 다결정 실리콘 박막 트랜지스터)

  • Shin, Jin-Wook;Choi, Chel-Jong;Cho, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.129-130
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    • 2008
  • Polycrystalline silicon (poly-Si) Schottky barrier thin film transistors (SB-TFT) are fabricated by erbium silicided source/drain for n-type SB-TFT. High quality poly-Si film were obtained by crystallizing the amorphous Si film with excimer laser annealing (ELA) or solid phase crystallization (SPC) method. The fabricated poly-Si SB-TFTs have a large on/off current ratio with a low leakage current. Moreover, the electrical characteristics of poly-Si SB TFTs are significantly improved by the additional forming gas annealing in 2 % $H_2/N_2$, because the interface trap states at the poly-Si grain boundaries and at the gate oxide/poly-Si channel decreased.

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A Study on the Hot-Carrier Effects of p-Channel Poly-Si TFT s (p-채널 Poly-Si TFT s 소자의 Hot-Carrier 효과에 관한 연구)

  • 진교원;박태성;백희원;이진민;조봉희;김영호
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.9
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    • pp.683-686
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    • 1998
  • Hot carrier effects as a function of bias stress time and bias stress consitions were syste-matically investigated in p-channel poly-Si TFT s fabricated on the quartz substrate. The device degradation was observed for the negative bias stress, while improvement of electrical characteristic except for subthreshold slope was observed for the positive bias stress. It was found that these results were related to the hot-carrier injection into the gate oxide and interface states at the poly-Si/$SiO_2$interface rather than defects states generation within the poly-Si active layer under bias stress.

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Silicon oxide and poly-Si film simultaneously formed by excimer laser (엑시머 레이저를 이용하여 동시에 형성된 실리콘 산화막과 다결정 실리콘 박막)

  • 박철민;민병혁;전재홍;유준석;최홍석;한민구
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.34D no.1
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    • pp.35-40
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    • 1997
  • A new method to form the gate oxide and recrystllize the polycrystalline silicon (poly-Si) active layer simultaneously is proposed and fabricated successfully. During te irradiation of excimer laser, the poly-Si film is recrystallized, while the oxygen ion impurities injected into the amorphous silicon(a-Si) film are activated by laser energy and react with silicon atoms to form SiO2. We investigated the characteristics of the sample fabricated by proposed method using AES, TEM, AFM. The electrical performance of oxide was verified by ramp up voltage method. Our experimental results show that a high quality oxide, a pol-Si film with fine grain, and a smooth and clean interface between oxide and poly-Si film have been successfully obtained by the proposed fabrication method. The interface roughness of oxide/poly-Si fabricated by new method is superior to film by conventional fabrication os that the proposed method may improve the performance of poly-Si TFTs.

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Synthesis of an Amphiphilic $\pi$-Conjugated Triblock Copolymer of Poly(9,9-didodecylfluorene-2,7-diyl) and Poly(hydroxyl ethyl methacrylate)

  • Kim, Hyun-Jung;Kim, Hyun-Seok;Kwon, Yong-Ku
    • Macromolecular Research
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    • v.13 no.6
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    • pp.529-532
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    • 2005
  • A novel amphiphilic, symmetric rod-coil, triblock copolymer (denoted as PHEMA-b-PF-b-PHEMA) of poly(9,9-didodecylfluorene-2,7-diyl) (PF) and poly(hydroxyl ethyl methacrylate) (PHEMA) was synthesized. A $\pi$-conjugated poly(9,9-didodecylfluorene-2,7-diyl) (PF) was used as a rodlike midblock segment and connected with hydrophilic end blocks of poly(hydroxyl ethyl methacrylate) (PHEMA) by using an ATRP technique. The chemical structure of PHEMA-b-PF-b-PHEMA was confirmed by $^{1}H$-NMR and GPC, and its PL properties were investigated in selected solvents. Due to the dissimilarities in molecular conformation and solubility between PHEMA and PF blocks, both block segments were segregated to display a phase-separated morphology on a Si wafer.