• 제목/요약/키워드: plasma temperature

검색결과 2,540건 처리시간 0.026초

Ion Flux Assisted PECVD of SiON Films Using Plasma Parameters and Their Characterization of High Rate Deposition and Barrier Properties

  • Lee, Joon-S.;Jin, Su-B.;Choi, Yoon-S.;Choi, In-S.;Han, Jeon-G.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.236-236
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    • 2011
  • Silicon oxynitride (SiON) was deposited for gas barrier film on polyethylene terephthalate (PET) using octamethylycyclodisiloxane (Si4O4C8H24, OMCTS) precursor by plasma enhanced chemical vapor deposition (PECVD) at low temperature. The ion flux and substrate temperature were measured by oscilloscope and thermometer. The chemical bonding structure and barrier property of films were characterized by Fourier transform infrared (FT-IR) spectroscopy and the water vapor transmission rate (WVTR), respectively. The deposition rate of films increases with RF bias and nitrogen dilution due to increase of dissociated precursor and nitrogen ion incident to the substrate. In addition, we confirmed that the increase of nitrogen dilution and RF bias reduced WVTR of films. Because, on the basis of FT-IR analysis, the increase of the nitrogen gas flow rate and RF bias caused the increase of the C=N stretching vibration resulting in the decrease of macro and nano defects.

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마이크로웨이브 플라즈마를 이용한 탄화공정 및 PAN fiber의 강도 향상에 관한 연구 (A Study on the Carbonization and Strengthening of PAN Fiber by Microwave Plasma)

  • 최지성;주정훈;이헌수
    • 한국표면공학회지
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    • 제45권2호
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    • pp.89-94
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    • 2012
  • A study to replace a high temperature thermal carbonization process with microwave plasma process is carried for PAN fiber as a starting material. Near atmospheric pressure microwave plasma (1 Torr~45 Torr) was used to control to get the fiber temperature up to $1,000^{\circ}C$. Even argon is an inert gas, its plasma state include high internal energy particles; ion (15.76 eV) and metastable (11.52 eV). They are very effective to lower the necessary thermal temperature for carbonization of PAN fiber and the resultant thermal budget. The carbonization process was confirmed by both EDS (energy dispersive spectroscopy) of plasma treated fibers and OES (optical emission spectroscopy) during processing step as a real time monitoring tool. The same trend of decreasing oxygen content was observed in both diagnostic methods.

MoS$_2$$Fe_2O_3$ 첨가제가 지르코니아계 용사코팅층의 마모마찰 특성에 미치는 영향 (Effect of MoS$_2$ and $Fe_2O_3$ Additives on the Tribological Behavior of the Plasma Sprayed Zirconia Based Coatings)

  • 신종한;임대순;안효석
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 1997년도 제26회 추계학술대회
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    • pp.93-99
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    • 1997
  • High Temperature wear behavior of plasma sprayed ZrO$_2$ and MoS$_2$, $Fe_2O_3$ coatings were investigated for high temperature wear resistance applications. The MoS$_2$, $Fe_2O_3$ added powders containing 2.5, 5.0, 7.5, 10.0 mol% of $MoS_2$, $Fe_2O_3$ for plasma spray were made by spray drying method. Wear test were performed at temperature ranges from room temperature to 600$\circ$C. The microstructural change of coatings and the worn. surface were examined by SEM and XRD. In ZrO$_2$ coating, the coefficient of friction and wear amount of room temperature to 400$\circ$C was increased with temperature and decreased with temperature over 400$\circ$C. The coefficient of friction and wear amount of MoS$_2$ added coatings were increased with temperature, but those of $Fe_2O_3$ added coatings had lower coefficient of friction and higher wear resistance than ZrO$_2$ coating.

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A Two-dimensional Steady State Simulation Study on the Radio Frequency Inductively Coupled Argon Plasma

  • Lee, Ho-Jun;Kim, Dong-Hyun;Park, Chung-Hoo
    • KIEE International Transactions on Electrophysics and Applications
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    • 제2C권5호
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    • pp.246-252
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    • 2002
  • Two-dimensional steady state simulations of planar type radio frequency inductively coupled plasma (RFICP) have been performed. The characteristics of RFICP were investigated in terms of power transfer efficiency, equivalent circuit analysis, spatial distribution of plasma density and electron temperature. Plasma density and electron temperature were determined from the equations of ambipolar diffusion and energy conservation. Joule heating, ionization, excitation and elastic collision loss were included as the source terms of the electron energy equation. The electromagnetic field was calculated from the vector potential formulation of ampere's law. The peak electron temperature decreases from about 4eV to 2eV as pressure increases from 5 mTorr to 100 mTorr. The peak density increases with increasing pressure. Electron temperatures at the center of the chamber are almost independent of input power and electron densities linearly increase with power level. The results agree well with theoretical analysis and experimental results. A single turn, edge feeding antenna configuration shows better density uniformity than a four-turn antenna system at relatively low pressure conditions. The thickness of the dielectric window should be minimized to reduce power loss. The equivalent resistance of the system increases with both power and pressure, which reflects the improvement of power transfer efficiency.

Effect of Acvated Oxygen Plasma on the Crystallinity and Superconductivity of $Yba_2Cu_3-O_{7-x}$ Thin Films Prepated by Reactive Co-evaporation method

  • Chang, Ho-Jung;Kim, Byoung-Chul;Akihama, Ryozo;Song, Jin-Tae
    • 한국재료학회지
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    • 제4권3호
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    • pp.280-286
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    • 1994
  • As-grown $YBa_2Cu_3O_{7-x}$ films on MgO(100)substrates were prepated by a reactive co-evaporation method, and effects of activated oxygen plasma on the crystallinity and superconductivity at substrate temperature ranging from $450^{\circ}C$ to $590^{\circ}C$ were investigated. The film deposited under the activated oxygen plasma at the substrate temperature of $590^{\circ}C$ had a single crystal phase. Whereas, when films were deposited under only oxygen gas, they were not in perfect single crystal phase but with slight polycrystalline nature. When the substrate temperature was $590^{\circ}C$, $Tc_{zero}$'s were 83K and 80K for films with and without activated oxygen plasma, respectively. The critical temperature, the crystal structure and the surface morphology of as-grown films were found to be insensitive to the activated oxygen plasma which is introduced during deposition instead of oxygen gas, but the crystalline quality was improved somewhat by the introduction by the introduction of actvated oxygen plasma.

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Curing of meat batter by indirect treatment of atmospheric pressure cold plasma

  • Jo, Kyung;Lee, Juri;Lim, Yubong;Hwang, Jaejun;Jung, Samooel
    • 농업과학연구
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    • 제45권1호
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    • pp.94-104
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    • 2018
  • Nitrite is an essential additive for cured meat product. Plasma is ionized gas and reactive nitrogen species in plasma can be infused into meat batter and subsequently generate nitrites by reaction with water molecules after plasma treatment. However, the increase of nitrite in meat batter is limited with direct treatment of atmospheric pressure cold plasma because of the increase of meat batter temperature. Therefore, this study investigated the influence of indirect treatment of atmospheric pressure cold plasma on the physicochemical properties of meat batter. Meat batter was indirectly treated with plasma at 1.5 kW for 60 min. The pH of meat batter decreased while the temperature increased with plasma treatment time. The total aerobic bacterial count of meat batter was not affected by plasma treatment. The nitrite content of meat batter was increased to 377.68 mg/kg after 60 min of plasma treatment. The residual nitrite content of cooked meat batter also increased with plasma treatment time. The CIE $a^*$-value of cooked meat batter increased. As plasma treatment time increased, lipid oxidation tended to increase and protein oxidation significantly increased. According to these results, the indirect treatment of atmospheric pressure cold plasma can be used as a new curing method for replacing synthetic nitrite salts.

알루미늄 분말 점화용 고밀도 스팀 플라즈마 제트 온도장 및 방출 스펙트럼 측정 (Temperature Field and Emission Spectrum Measurement of High Energy Density Steam Plasma Jet for Aluminum Powder Ignition)

  • 이상협;임지환;이도형;윤웅섭
    • 한국추진공학회지
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    • 제18권1호
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    • pp.26-32
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    • 2014
  • 본 연구에서 고에너지 금속 알루미늄의 효과적인 점화를 위해 개발한 직류 방식의 스팀 플라즈마 점화기 가스온도를 OH radical의 방출 스펙트럼을 사용하여 측정하였다. 플라즈마 제트온도는 초고온이므로 비접촉식 광학 계측 방법인 볼츠만 기울기법과 스펙트럼 비교 분석법을 이용하여 측정하였으며 각각의 방법은 정밀하게 검증 후 실험에 적용되었다. 플라즈마 점화기의 노즐 팁으로부터 30 mm 범위에서의 제트온도 측정결과 두 방법 모두 알루미늄의 점화온도(${\approx}2400K$) 이상의 2900 K ~ 5800 K를 확인할 수 있었다.

라인형 플라즈마 소스를 이용한 ALD 공정 연구 (Study of ALD Process using the Line Type Plasma Source)

  • 권기청;조태훈;최진우;송세영;설제윤;이준신
    • 반도체디스플레이기술학회지
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    • 제15권4호
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    • pp.33-35
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    • 2016
  • In this study, a new plasma source was used in the ALD process. Line type plasma sources were analyzed by electric and magnetic field simulation. And the results were compared with plasma density and electron temperature measurement results. As a result, the results of the computer simulation and the diagnosis results of plasma density and electron temperature showed similar tendency. At this time, the plasma uniformity is 95.6 %. $Al_2O_3$ thin film was coated on 6 inch Si-wafer, using this plasma source. The uniformity of the thin film was more than 98% and the thin film growth rate was 0.13 nm/cycle.

Sputter etching에 의한 양모, 견직물의 농색효과 (Effects of Color Depth on Wool and Silk Fabrics Treated Sputter Etching)

  • 조환;구강
    • 한국염색가공학회지
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    • 제6권3호
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    • pp.44-51
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    • 1994
  • Wool and silk fabrics dyed with C.l. Acid Black 155 were subjected to sputter etching and exposed to a low temperature argon plasma. Color depth of shade of the fabrics increased considerably, but sputter etching was more effectively than argon low temperature plasma treatment. And measured for any significant chemical modification by ESCA (XPS). Sputter etching and argon low temperature plasma treatments incorporated oxygen atoms into the surface.

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EFFECT OF ENVIRONMENTAL TEMPERATURE AND FEED INTAKE ON PLASMA CONCENTRATION OF THYROID HORMONES IN DAIRY HEIFERS

  • Purwanto, B.P.;Fujita, M.;Nishibori, M.;Yamamoto, S.
    • Asian-Australasian Journal of Animal Sciences
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    • 제4권3호
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    • pp.293-298
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    • 1991
  • A study was conducted to determine the effect of environmental temperature and level of food intake on plasma concentration of thyroid hormones. Three dairy heifers were used in an experiment which consisted of three levels of chamber temperature (10, 20 and $30^{\circ}C$) and three levels of food intake (100, 75 and 50% of recommended requirements). The analysis showed significant effects of environmental temperature on plasma triiodothyronine concentration, rectal temperature, respiration rate and heart rate but not on heat production. The range of plasma triiodothyronine was 2.51~1.79 ng/ml when the environmental temperature varied from 10 to $30^{\circ}C$. Effects of feed intake level were significant for heart rate and heal production. Heat production decreased from 25.9 to $20.0kJ/kg^{0.75}{\cdot}h$ when the TDN intake decreased from 66.3 to $35.1g/kg^{0.75}{\cdot}d$. There was no interactive effect of environmental temperature and feed intake level. Plasma triiodothyronine concentration decreased under high environmental temperature without any changes in heat production. The effects of environmental temperature and feed intake level on the physiological function of thyroid gland, as indicated by the relative circulating rate of thyroid hormones, were found to be clear.