Effects of Color Depth on Wool and Silk Fabrics Treated Sputter Etching

Sputter etching에 의한 양모, 견직물의 농색효과

Wool and silk fabrics dyed with C.l. Acid Black 155 were subjected to sputter etching and exposed to a low temperature argon plasma. Color depth of shade of the fabrics increased considerably, but sputter etching was more effectively than argon low temperature plasma treatment. And measured for any significant chemical modification by ESCA (XPS). Sputter etching and argon low temperature plasma treatments incorporated oxygen atoms into the surface.