• Title/Summary/Keyword: plasma stability

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광 센서를 이용한 레이저 가공공정의 모니터링 (Monitoring of Laser Material Processing Using Photodiodes)

  • 박영환
    • 한국산학기술학회논문지
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    • 제10권3호
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    • pp.515-520
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    • 2009
  • 본 논문에서는 알루미늄 레이저 용접에서 발생하는 플라즈마의 빛을 계측하여 용접공정을 모니터링할 수 있는 시스템을 개발하였다. 분광분석을 통해 용접 시 플라즈마의 파장대를 계측하고 이를 근거로 하여 모니터링 시스템에 적합한 포토다이오드를 선정하였다. 이를 다양한 용접 조건에 대하여 적용하였고, 센서 신호의 특성은 플라즈마의 강도와 안정성에 밀접하게 연관되어 있음을 신호의 평균값과 FFT분석을 통하여 알 수 있었다. 이러한 신호 변동의 원인은 플라즈마와 키홀의 거동과 용접 비드의 형상과도 밀접한 관계가 있음을 분석하였다.

Dynamic analysis of multi-functional maintenance platform based on Newton-Euler method and improved virtual work principle

  • Li, Dongyi;Lu, Kun;Cheng, Yong;Zhao, Wenlong;Yang, Songzhu;Zhang, Yu;Li, Junwei;Shi, Shanshuang
    • Nuclear Engineering and Technology
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    • 제52권11호
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    • pp.2630-2637
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    • 2020
  • The structure design of divertor Multi-Functional Maintenance Platform (MFMP) actuated by hydraulic system for China Fusion Engineering Test Reactor (CFETR) was introduced in this paper. The model of MFMP was established according to maintenance requirements. In this paper, Newton-Euler method and the improved virtual work principle were used, the equivalent driving force of each actuator was obtained through the equivalent Jacobian inverse matrix derived from velocity relationship among the components. The accuracy of the model was verified by ADAMS simulation. The stability control of the heavy-duty components driven by hydraulic cylinders based on Newton-Euler method and improved virtual work principle was established.

Investigation on nanoadhesive bonding of plasma modified titanium for aerospace application

  • Ahmed, Sabbir;Chakrabarty, Debabrata;Mukherjee, Subroto;Joseph, Alphonsa;Jhala, Ghanshyam;Bhowmik, Shantanu
    • Advances in aircraft and spacecraft science
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    • 제1권1호
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    • pp.1-14
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    • 2014
  • Physico-chemical changes of the plasma modified titanium alloy [Ti-6Al-4V] surface were studied with respect to their crystallographic changes by X-Ray Diffraction (XRD) and Scanning Electron Microscope (SEM).The plasma-treatment of surface was carried out to enhance adhesion of high performance nano reinforced epoxy adhesive, a phenomenon that was manifested in subsequent experimental results. The enhancement of adhesion as a consequence of improved spreading and wetting on metal surface was studied by contact angle (sessile drop method) and surface energy determination, which shows a distinct increase in polar component of surface energy. The synergism in bond strength was established by analyzing the lap-shear strength of titanium laminate. The extent of enhancement in thermal stability of the dispersed nanosilica particles reinforced epoxy adhesive was studied by Thermo Gravimetric Analysis (TGA), which shows an increase in onset of degradation and high amount of residuals at the high temperature range under study. The fractured surfaces of the joint were examined by Scanning electron microscope (SEM).

상용 주파수 (60Hz) Plasma Jet Torch의 동작특성에 관한 연구 (A Study on the Operating Characteristics of Commercial Frequency Plasma Jet Torch)

  • 전춘생;정재웅
    • 전기의세계
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    • 제24권1호
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    • pp.75-85
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    • 1975
  • In order to develop the commercial frequency (60Hz) plasma torch of small capacity for material cutting, welding and other industrial heating, the A.C plasma jet generator of non-transfered type is made domestically and the electrode configurations of plasma torch are composed of two kinds of electrodes W-C and W-Cu, combined by thermal emission and field emission electrode materials. In this paper, the characteristics of input power, thermal efficiency, electrode consumption, the flame and forms of arc voltage and arc current for A.C plasma torch are investigated in relation to such variables as arc current, argon flow and magnetic field intensity to obtain the basic design data necessary to A.C plasma jet generator. The result are as follows; (1)The input power, thermal efficiency and electrode consumption are influenced greatly by argon flow, magnetic field intensity and nozzle materials. (2)A.C arc voltage and current are non-symmetrial, involving D.C Component. Due to this current of D.C Component, transformer core is saturated and a large abnormal current flows into the primary winding coil. In order to prevent this abnormal current flow, a condenser must be connected in series to the main discharge circuit. (3)The stability and sharpness of jet flame are improved more in the torch of W-C electrode configuration than in the torch of W-Cu electrode configuration.

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High quality fast growth nano-crystalline Si film synthesized by UHF assisted HF-PECVD

  • Kim, Youn-J.;Choi, Yoon-S.;Choi, In-S.;Han, Jeon-G.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.306-306
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    • 2010
  • A high density (> $10^{11}\;cm^{-3}$) and low electron temperature (< 2 eV) plasma is produced by using a conventional HF (13.56 MHz) plasma enhanced chemical vapor deposition (PECVD) with an additional ultra high frequency (UHF, 314 MHz) plasma source utilizing two parallel antenna assembly. It is applied for the high rate synthesis of high quality nanocrystalline silicon (nc-Si) films. A high deposition rate of 1.8 nm/s is achieved with a high crystallinity (< 70%), a low spin density (< $3{\times}10^{16}\;cm^{-3}$) and a high light soaking stability (< 1.5). Optical emission spectroscopy measurements reveal emission intensity of $Si^*$ and $SiH^*$, intensity ratio of $H{\alpha}/Si^*$ and $H{\alpha}/SiH^*$ which are closely related to film deposition rate and film crystallinity, respectively. A high flux of precursor and atomic hydrogen which are produced by an additional high excitation frequency is effective for the fast deposition of highly crystallized nc-Si films without additional defects.

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NH3 Plasma Treatment를 사용한 고성능 TFT 제작 및 분석 (A Production and Analysis on High Quality of Thin Film Transistors Using NH3 Plasma Treatment)

  • 박희준;;이준신
    • 한국전기전자재료학회논문지
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    • 제30권8호
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    • pp.479-483
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    • 2017
  • The effect of $NH_3$ plasma treatment on device characteristics was confirmed for an optimized thin film transistor of poly-Si formed by ELA. When C-V curve was checked for MIS (metal-insulator-silicon), Dit of $NH_3$ plasma treated and MIS was $2.7{\times}10^{10}cm^{-2}eV^{-1}$. Also in the TFT device case, it was decreased to the sub-threshold slope of 0.5 V/decade, 1.9 V of threshold voltage and improved in $26cm^2V^{-1}S^{-1}$ of mobility. Si-N and Si-H bonding reduced dangling bonding to each interface. When gate bias stress was applied, the threshold voltage's shift value of $NH_3$ plasma treated device was 0.58 V for 1,000s, 1.14 V for 3,600s, 1.12 V for 7,200s. As we observe from this quality, electrical stability was also improved and $NH_3$ plasma treatment was considered effective for passivation.

습식공정으로 형성된 구리산화물 나노와이어의 전계방출특성 향상 (Enhancement of Field Emission Characteristics of CuO Nanowires Formed by Wet Chemical Process)

  • 성우용;김왈준;이승민;이호영;박경호;이순일;김용협
    • 한국표면공학회지
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    • 제37권6호
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    • pp.313-318
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    • 2004
  • Vertically-aligned and uniformly-distributed CuO nanowires were formed on copper-coated Si substrates by wet chemical process, immersing them in a hot alkaline solution. The effects of hydrogen plasma treatment on the field emission characteristics of CuO nanowires were investigated. It was found that hydrogen plasma treatment enhanced the field emission properties of CuO nanowires by showing a decrease in turn-on voltage, and an increase in emission current density, and stability of current-voltage curves. However, the excessive hydrogen plasma treatment made the I-V curves unstable. It was confirmed by XPS (X-ray Photoelectron Spectroscopy) analysis that hydrogen plasma treatment deoxidized CuO nanowires, thereby the work function of the nanowires decreased from 4.35 eV (CuO) to 4.1 eV (Cu). It is thought that the decrease in the work function enhanced the field emission characteristics. It is well-known that the lower the work function, the better the field emission characteristics. The results suggest that the hydrogen plasma treatment is very effective in achieving enhanced field emission properties of the CuO nanowires, and there may exist an optimal hydrogen plasma treatment condition.

열변성 단백질이 결합된 음이온성 리포솜의 혈장 내 안정성 및 세포 내 이입 평가 (Stability in Plasma and Intracellular Uptake of Thermally Denatured Protein-coated anionic Liposomes)

  • 이미정;황인영;김성규;정석현;정서영;성하수;조선행;신병철
    • Journal of Pharmaceutical Investigation
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    • 제39권6호
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    • pp.423-429
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    • 2009
  • Liposomes have been used as one of the efficient carriers for drug delivery. In this study, anionic liposomes of which surface was modified by using both electrostaic interaction between anionic liposomes and cationically charged BSA molecules at lower pH than isoelectric point (pI) of BSA and denaturation of the BSA-coated liposomes by thermal treatment. The thermally denatured BSA-coated liposomes (DBAL) had mean particle diameter of 125.2${\pm}$1.7 nm and zeta potential value of -22.4${\pm}$4.5 mV. Loading efficiency of model drug, doxorubicin (DOX), into liposomes was 83.0${\pm}$2.6%. Results of in vitro stability study of DBAL in blood plasma showed that the mean particle diameter of DBAL 400 did not increase in blood plasma and adsorption of plasma protein was much less than plain or anionic liposomes. Intracellular uptake of DBAL 400 evaluated by confocal microscopy observation was higher than that of PEG liposomes.

$CH_4$/Ar 유도 결합 플라즈마를 이용한 Sapphire 기판의 식각 특성 (Etching properties of sapphire substrate using $CH_4$/Ar inductively coupled plasma)

  • 엄두승;김관하;김동표;양설;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.102-102
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    • 2008
  • Sapphire (${\alpha}-Al_2O_3$) has been used as the substrate of opto-electronic device because of characteristics of thermal stability, comparatively low cost, large diameter, optical transparency and chemical compatibility. However, there is difficulty in the etching and patterning due to the physical stability of sapphire and the selectivity with sapphire and mask materials [1,2]. Therefore, sapphire has been studied on the various fields and need to be studied, continuously. In this study, the etching properties of sapphire substrate were investigated with various $CH_4$/Ar gas combination, radio frequency (RF) power, DC-bias voltage and process pressure. The characteristics of the plasma were estimated for mechanism using optical emission spectroscopy (OES). The chemical compounds on the surface of sapphire substrate were investigated using energy dispersive X-ray (EDX). The chemical reaction on the surface of the etched sapphire substrate was observed by X-ray photoelectron spectroscopy (XPS). Scanning electron microscopy (SEM) was used to investigate the vertical and slope profiles.

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Synthesis of Novel Hemicyanine Dyes for Color Compensating Film in Plasma Display Panels

  • Kim, Bo Hyung;Park, Se Woong;Lee, Donghyun;Kwon, Il Keun;Kim, Jae Pil
    • Bulletin of the Korean Chemical Society
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    • 제35권8호
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    • pp.2453-2459
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    • 2014
  • Five novel cyanine dyes containing julolidine and indole moieties were synthesized. Several color compensating films for plasma display panels (PDP) were prepared using these dyes. The spectroscopic and physicochemical properties of the synthesized dyes in both solution and film state were evaluated. For each color compensating film, the optimum ratio of dye to binder was determined on the basis of transmittance, half band width, and photo-stability of the color compensating film. The five synthesized dyes showed sharp absorption peaks near 590 nm (orange light) and had molar extinction coefficients above $1{\times}10^5M^{-1}cm^{-1}$. The melting point of the dyes was above $200^{\circ}C$ and photo-stability of the color compensating films was improved by introducing substituents at the 5th position on the indole derivatives.