• Title/Summary/Keyword: plasma frequency

Search Result 860, Processing Time 0.027 seconds

A Novel Current-fed Energy Recovery Sustaining Driver for Plasma Display Panel (PDP) (PDP를 위한 새로운 전류원 타입의 에너지 회수 및 방전유지 회로)

  • Han S.K.;Moon G.W.;Youn M.J.
    • Proceedings of the KIPE Conference
    • /
    • 2003.07b
    • /
    • pp.755-760
    • /
    • 2003
  • A novel current-fed energy-recovery sustaining driver (CFERSD) for a PDP is proposed in this paper. Its main idea is to recover the energy stored in the PDP or to inject the input source energy to the PDP by using the current source built-up in the energy recovery inductor. This method provides zero-voltage-switching (ZVS) of all main power switches, the reduction of EMI, and more improved operational voltage margins with the aid of the discharge current compensation. In addition, since the current flowing through the energy recovery inductor can compensate the plasma discharge current flowing through the conducting power switches, the current stress through all main power switches can be considerably reduced. Furthermore, it features a low conduction loss and fast transient time. Operations, features and design considerations are presented and verified experimentally on a 1020X106mm sized PDP, 50kHz-switching frequency, and sustaining voltage 140V based prototype.

  • PDF

A Highly Efficient AC-PDP Driver Featuring an Energy Recovery Function in Sustaining Mode Operation

  • Kang, Feel-Soon;Park, Sung-Jun;Kim, Cheul-U
    • KIEE International Transaction on Electrical Machinery and Energy Conversion Systems
    • /
    • v.2B no.3
    • /
    • pp.100-108
    • /
    • 2002
  • A simple sustain driver employing an energy recovery function is proposed as a highly efficient driver of a plasma display panel. The proposed driver uses dual resonance in the sustaining mode operation: a main resonance between an inductor and an external capacitor to produce alternative pulses and a sub-resonance between an inductor and a panel to recover the energy consumption by the capacitive displacement current of the PDP. The operational principle and design procedure of the proposed circuit are presented with theoretical analysis. The operation of the proposed sustain driver is verified through simulation and experiments based on a 7.5-inch-diagonal panel with a 200 KHz operating frequency.

LOW TEMPERATURE DEPOSITION OFSIOx FILMS BY PLASMA-ENHANCED CVD USING 100 kHz GENERATOR

  • Kakinoki, Nobuyuki;Suzuki, Takenobu;Takai, Osamu
    • Journal of Surface Science and Engineering
    • /
    • v.29 no.6
    • /
    • pp.760-765
    • /
    • 1996
  • Silicon oxide thin films are prepared by plasma-enhanced CVD (PECVD) using 100kHz and 13.56MHz generators. Source gases are two sorts of mixture, tetramethoxysilane (TMOS) and oxygen, and tetramethylsilane (TMS) and oxygen. We investigate the effect of frequency on film properties of deposited films including mechanical properties. 100kHz PECVD process can deposit silicon oxide films at $23^{\circ}C$ at the power of 20W. X-ray photoelectron spectroscopy (XPS), infrared spectroscopy (IR) and ellipsometric measurements reveal that the structural quality of the films prepared both by 100kHz process and by 13.56MHz process are very like silicon dioxide. The 100kHz process is adequate for low temperature deposition of SiOx films.

  • PDF

A Comparative Study of HfN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Magnetron Sputtering (DC 스퍼터법과 비대칭 바이폴라 펄스 DC 스퍼터법으로 증착된 HfN 코팅막의 물성 비교연구)

  • Jeon, Seong-Yong;Jeong, Pyeong-Geun
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2017.05a
    • /
    • pp.103.2-103.2
    • /
    • 2017
  • Nanocrystalline HfN coatings were prepared by reactively sputtering Hf metal target with N2 gas using a magnetron sputtering system operated in DC and ABPP (asymmetric bipolar pulsed plasma) condition with various duties and frequencies. The effects of duty and frequency, ranging from 75 to 100 % and 5 to 50 kHz, on the coating microstructure, crystallographic and mechanical properties were systematically investigated with FE-SEM, AFM, XRD and nanoindentation. The results show that pulsed plasma has a significant influence on coating microstructure and mechanical properties of HfN coatings. Coating microstructure evolves from the columnar structure to a highly dense one as duty decreases. Average grain size and nano hardness of HfN coatings were also investigated with various pulsed conditions.

  • PDF

Protective Thin Films on PAN Fiber for Water Resistant Modification by Plasma Polymerization (PAN직물의 내수성개질을 위한 보호성 플라즈마중합박막제조)

  • Seo, Eun Deock;Kang, Young Reep;Kim, Jung Dal
    • Textile Coloration and Finishing
    • /
    • v.7 no.2
    • /
    • pp.55-62
    • /
    • 1995
  • Plasma polymerization of Perfiuoropropene(PFP) and n-Hexane was carried out in a tubular type reactor by means of 13.56MHz radio frequency generator at the fixed RF discharge power of 25W and at the pressures of 100mTorr, 140mTorr and 200mTorr. The thin films were deposited on PAN fabrics in order to improve the dimemsional stability of woven states in hot water laundry. IR spectroscopy was used for the analysis of the structures of the thin films deposited and SEM for examination of surfaces of the fabrics. the PAN fabrics, which were coated by thin films at several experimental conditions, were immersed in boiling water for 2 hours and then the dimension stability of woven states were evaluated. In spite of very thin films, the results of surface modification were satisfactory. In general the performace of thin films by PFP was superior to that of n-Hexane.

  • PDF

Effect of nitrogen doping on properties of plasma polymerized poly (ethylene glycol) film

  • Javid, Amjed;Long, Wen;Lee, Joon S.;Kim, Jay B.;Sahu, B.B.;Jin, Su B.;Han, Jeon G.
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2014.11a
    • /
    • pp.286-288
    • /
    • 2014
  • This study deals with the catalyst free radio frequency plasma assisted polymerization of ethylene glycol using nitrogen as reactive gas to modify the surface chemistry and morphology. The deposited film was characterized through various analysis techniques i.e. surface profilometry, Forier transform infrared spectroscopy, water contact angle and UV-visible spectroscopy to analyze film thickness, chemical structure, surface energy and optical properties respectively. The surface topography was analyzed by Atomic force microscopy. It was observed that the ethylene oxide behaviour and optical transmittance of the film were reduced with the introduction of nitrogen gas due to higher fragmentation of monomer. However the hydrophilic behavior of the film improved due to formation of new water loving functional groups suitable for biomedical applications.

  • PDF

A Study on Tribological Properties of Diamond-like Carbon Thin Film for the Application to Solid Lubricant of MEMS Devices (MEMS 소자의 고체윤활박막으로 활용하기 위한 다이아몬드상 카본 박막의 트라이볼로지 특성 분석)

  • Choi, Won-Seok;Hong, Byung-You
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.19 no.11
    • /
    • pp.1010-1013
    • /
    • 2006
  • Hydrogenated Diamond-like carbon (DLC) films were Prepared by the radio frequency plasma enhanced chemical vapor deposition (RF PECVD) method on silicon substrates using methane $(CH_4)$ and hydrogen $(H_2)$ gas for the application to solid lubricant of MEMS devices. We have checked the influence of varying RF power on tribological properties of DLC film. We have checked their performance as two kinds of method such as FFM (Friction Force Microscope) and BOD (Ball-on Disk) measurement. The friction coefficients and the contact number of cycles to steady state decreased as the increase of RF power with FFM and BOD measurement, respectively.

A study of decomposition of harmful gases using Composite catalyst by Photocatalytic plasma reactions (복합촉매를 이용한 플라즈마 반응에 의한 유해가스의 제거에 관한 연구)

  • Kim, Gwan-Jung;U, In-Seong;Park, Hwa-Yong;Lee, Hong-Ju
    • Proceedings of the Safety Management and Science Conference
    • /
    • 2012.04a
    • /
    • pp.421-433
    • /
    • 2012
  • The objective of this study is to obtain the optimal process condition and the maximum decomposition efficiency by measuring the decomposition efficiency, electricity consumption, and voltage in accordance with the change of the process variables such as the frequency, maintaining time period, concentration, electrode material, thickness of the electrode, the number of windings of the electrode, and added materials etc. of the harmful atmospheric contamination gases such as NO, $NO_2$, and $SO_2$etc. with the plasma which is generated by the discharging of the specially designed and manufactured $TiO_2$ catalysis reactor and SPCP reactor.

  • PDF

A study of decomposition of sulfur oxides using Calcium hydroxide catalyst by plasma reactions (Ca(OH)2촉매를 이용한 플라즈마 반응에 의한 황산화물의 제거에 관한 연구)

  • Kim, Da Young;Woo, In Sung;Lee, Sun Hee;Kim, Do Hyeon;Kim, Byeong Cheol
    • Proceedings of the Safety Management and Science Conference
    • /
    • 2013.11a
    • /
    • pp.547-560
    • /
    • 2013
  • In this study, the air pollutant removal such as sulfur oxides was studied. A combination of the plasma discharge in the reactor by the reaction surface discharge reactor Calcium hydroxides catalytic reactor and air pollutants, hazardous gas SOx, changes in gas concentration, change in frequency, the thickness of the electrode, kinds of electrodes and the addition of simulated composite catalyst composed of a variety of gases, including decomposition experiments were performed by varying the process parameters. The experimental results showed the removal efficiency of 98% in the decomposition of sulfur oxides removal experiment when Calcium hydroxides catalysts and the tungsten(W) electrodes were used. It was increased 3% more than if you do not have the catalytic. If added to methane gas was added the removal efficiency increased decomposition.

  • PDF

The Impedance Matching Network for a ferromagnetic Inductively Coupled Plasma driven at 400 kHz. (400 kHz 페라이트 유도 결합 플라즈마를 위한 임피던스 매칭 네트워크)

  • Cho, Sung-Won;Bang, Jin-Young;Lee, Young-Kwang;Chung, Chin-Wook
    • Journal of the Semiconductor & Display Technology
    • /
    • v.6 no.2 s.19
    • /
    • pp.29-33
    • /
    • 2007
  • Low frequency (400 kHz) Ferrite ICP has been proposed for large area processing. Because the coupling coefficient is close to 1, the transformer matching can be adapted to Ferrite ICP. The transformer matching system is simple. In this paper the new matching system by controlling the turns of transformer using relays is proposed for impedance matching. We developed a simple matching system and characterized it when the turns were changed. It was observed that the 2-channel relay is available for transformer matching.

  • PDF