• Title/Summary/Keyword: plasma coating

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Role of Ca in Modifying Corrosion Resistance and Bioactivity of Plasma Anodized AM60 Magnesium Alloys

  • Anawati, Anawati;Asoh, Hidetaka;Ono, Sachiko
    • Corrosion Science and Technology
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    • v.15 no.3
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    • pp.120-124
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    • 2016
  • The effect of alloying element Ca (0, 1, and 2 wt%) on corrosion resistance and bioactivity of the as-received and anodized surface of rolled plate AM60 alloys was investigated. A plasma electrolytic oxidation (PEO) was carried out to form anodic oxide film in $0.5mol\;dm^{-3}\;Na_3PO_4$ solution. The corrosion behavior was studied by polarization measurements while the in vitro bioactivity was tested by soaking the specimens in Simulated Body Fluid (1.5xSBF). Optical micrograph and elemental analysis of the substrate surfaces indicated that the number of intermetallic particles increased with Ca content in the alloys owing to the formation of a new phase $Al_2Ca$. The corrosion resistance of AM60 specimens improved only slightly by alloying with 2 wt% Ca which was attributed to the reticular distribution of $Al_2Ca$ phase existed in the alloy that might became barrier for corrosion propagation across grain boundaries. Corrosion resistance of the three alloys was significantly improved by coating the substrates with anodic oxide film formed by PEO. The film mainly composed of magnesium phosphate with thickness in the range $30-40{\mu}m$. The heat resistant phase of $Al_2Ca$ was believed to retard the plasma discharge during anodization and, hence, decreased the film thickness of Ca-containing alloys. The highest apatite forming ability in 1.5xSBF was observed for AM60-1Ca specimens (both substrate and anodized) that exhibited more degradation than the other two alloys as indicated by surface observation. The increase of surface roughness and the degree of supersaturation of 1.5xSBF due to dissolution of Mg ions from the substrate surface or the release of film compounds from the anodized surface are important factors to enhance deposition of Ca-P compound on the specimen surfaces.

The Fabrication of Implant Core Coated with Ti Balls (Ti ball이 coating된 임플란트 core의 제조)

  • Choi, D.J.;Park, D.G.;Park, S.B.;Park, S.S.;Turaev, F.R.;Roh, J.S.;Kim, S.J.;Woo, H.S.;Kim, S.E.;Lee, J.H.
    • Journal of the Korean Society for Heat Treatment
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    • v.21 no.2
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    • pp.94-100
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    • 2008
  • The implant prototypes with various porosities were fabricated by Spark Plasma Sintering of atomized spherical titanium balls. The interface was observed by optical microscope. Sintering temperature and holding time were selected at the point of big change of Z-axis ratio during sintering. These experiments show that Spark Plasma Sintering of spherical titanium balls can be efficiently used to produce implants surfaced with titanium balls with various porosities in a short time less than 120 seconds by manipulating the current condition such as z-axis, temperature and balls size.

Study on the design of LEO Satellite System in Space Plasma Environment (우주 플라즈마 환경에서 저궤도 위성 시스템 설계에 관한 고찰)

  • Lim, S.B.;Hong, S.P.;Kim, T.Y.;Jang, J.W.;Choi, S.W.
    • Aerospace Engineering and Technology
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    • v.7 no.2
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    • pp.67-75
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    • 2008
  • The electrostatic charging/discharging mechanism and its effects, and the system design considerations in the space plasma environment are studied in this paper. The electrostatic discharge (ESD) effects are carefully taken into account for a design of the satellite system at the early stage of the development. Generally, the electrical design requirements are specified to protect the satellite system from the ESD effects in the electromagnetic compatibility specifications. Those requirements are included the grounding, the bonding, the shielding, the conductive coating, the electric interfacing and so on. The space charging is caused by the increasing of the voltage difference between the each locations on the satellite surface. If the space charging is continued up to threshold, it may be occurred the system failure. This phenomenon is depended on the mission of system, electrical and mechanical configuration, system operation, and orbit condition. Therefore the related requirements are properly tailored and concentrated into the safety design.

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Investigation of the TiCrN Coating Deposited by Inductively Coupled Plasma Assisted DC Magnetron Sputtering. (Inductively Coupled Plasma Assisted D.C. Magnetron Sputtering법으로 제작된 TiCrN 코팅층의 특성 분석)

  • Cha, B.C.;Kim, J.H.;Lee, B.S.;Kim, S.K.;Kim, D.W.;Kim, D.;You, Y.Z.
    • Journal of the Korean Society for Heat Treatment
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    • v.22 no.5
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    • pp.267-274
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    • 2009
  • Titanium Chromium Nitrided (TiCrN) coatings were deposited on stainless steel 316 L and Si (100) wafer by inductively coupled plasma assisted D.C. magnetron sputtering at the various sputtering power on Cr target and $N_2/Ar$ gas ratio. Increasing the sputtering power of Cr target, XRD patterns were changed from TiCrN to nitride $Cr_2Ti$. The maximum hardness was $Hk_{3g}$ 3900 at $0.3\;N_2/Ar$ gas ratio. The thickness of the TiCrN films increased as the Cr target power increased, and it showed over $Hk_{5g}3100$ hardness at 100 W, 150 W. TiCrN films were deposited by the ICP assisted DC magnetron sputtering shown good wear resistance as the $N_2/Ar$ gas ratio was 0.1, 0.3.

Characteristics of the AlON-Al2O3 Ceramic Coatings on the Al2021 Alloy by Electrolytic Plasma Processing

  • Wang, Kai;Byeon, Sang-Sik;Kim, Geun-Woo;Park, Keun-Young;Ahmed, Faheem;Koo, Bon-Heun
    • Korean Journal of Materials Research
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    • v.22 no.3
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    • pp.155-158
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    • 2012
  • In this work, AlON-$Al_2O_3$ coatings were prepared on Al2021 alloy by the electrolytic plasma processing (EPP) method. The experimental electrolytes include: 2 g/l NaOH as the electrolytic conductive agent, 10 g/l $Na_2AlO_2$ as the alumina formative agent, and 0.5 g/l $NaNO_2$, $NaNO_3$, and $NH_4NO_3$ as the nitride inducing agents. The effects of different nitrogen inducing agents were studied by a combined compositional and structural analyses of the ceramic coatings carried out by Xray diffractometry (XRD) and scanning electron microscopy (SEM) for the specimens EPP-treated at room temperature for 15 min under a hybrid voltage of 260 DC along with an AC 50 Hz power supply (200 V). Microhardness tests and wear tests were carried out to correlate the evolution of the microstructure and the resulting mechanical properties. Potentiodynamic polarizations and immersion corrosion tests were carried out in 3.5wt% NaCl water solutions under static conditions in order to evaluate the corrosion behavior of the coated samples. The results demonstrate that $NaNO_2$ is proven to be a good nitrogen inducing agent to produce high quality AlON-$Al_2O_3$ ceramic coatings.

Spark Plasma Sintering and Ultra-Precision Machining Characteristics of SiC

  • Son, Hyeon-Taek;Kim, Dae-Guen;Park, Soon-Sub;Lee, Jong-Hyeon
    • Korean Journal of Materials Research
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    • v.20 no.11
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    • pp.559-569
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    • 2010
  • The liquid-phase sintering method was used to prepare a glass lens forming core composed of SiC-$Al_2O_3-Y_2O_3$. Spark plasma sintering was used to obtain dense sintered bodies. The sintering characteristics of different SiC sources and compositions of additives were studied. Results revealed that, owing to its initial larger surface area, $\alpha$-SiC offers sinterability that is superior to that of $\beta$-SiC. A maximum density of $3.32\;g/cm^3$ (theoretical density [TD] of 99.7%) was obtained in $\alpha$-SiC-10 wt% ($6Al_2O_3-4Y_2O_3$) sintered at $1850^{\circ}C$ without high-energy ball milling. The maximum hardness and compression stress of the sintered body reached 2870 Hv and 1110 MPa, respectively. The optimum ultra-precision machining parameters were a grinding speed of 1243 m/min, work spindle rotation rate of 100 rpm, feed rate of 0.5 mm/min, and depth of cut of $0.2\;{\mu}m$. The surface roughnesses of the thus prepared final products were Ra = 4.3 nm and Rt = 55.3 nm for the aspheric lens forming core and Ra = 4.4 nm and Rt = 41.9 for the spherical lens forming core. These values were found to be sufficiently low, and the cores showed good compatibility between SiC and the diamond-like carbon (DLC) coating material. Thus, these glass lens forming cores have great potential for application in the lens industry.

Effect of Plasma Density on the Tribological Properties of Amorphous Carbon Thin Films (비정질 탄소박막의 트라이볼로지 특성에 미치는 플라즈마 밀도의 영향)

  • Park, Y.S.;Lee, J.D.;Hong, B.
    • Journal of the Korean Vacuum Society
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    • v.20 no.5
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    • pp.333-338
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    • 2011
  • In this work, we have fabricated the amorphous carbon (a-C:H) thin film by using unbalanced magnetron sputtering method with the magnetron source of inside/outside electromagnetic coils as the protective coating materials. We have investigated the tribological properties of amorphous carbon films prepared with various electromagnetic coil currents for the change of the plasma density, such as hardness, friction coefficient, adhesion, and surface roughness. Raman and HRTEM were used to study the microstructure of carbon films. In the result, the hardness and adhesion properties of a-C:H films were improved with increasing electromagnetic coil current due to the increase of the plasma density to the substrate. Thus, these results can be explained by the increase of $sp^2$ bonding and cluster number in the amorphous carbon film, related to the improved bombardment around substrate and the increased substrate temperature.

Photoelectrical Conductivity and Photodegradation Properties of $TiO_2$ and Ag Sputtered $TiO_2$ Plasma Spraying Coatings ($TiO_2$ 및 Ag 스퍼터링-$TiO_2$ 플라즈마 용사피막의 광전류 및 광분해 특성)

  • Kang, Tae-Gu;Jang, Yong-Ho;Park, Kyeung-Chae
    • Journal of Welding and Joining
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    • v.27 no.2
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    • pp.38-43
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    • 2009
  • In this study, we investigated photocatalytic ability of plasma sprayed $TiO_2$ and Ag sputtering $TiO_2$(Ag-$TiO_2$) coatings. A sputtering processes were adopted to coat the surface of $TiO_2$ with Ag(99.99%). Ag was sputtered at 10mA, 450V for $1{\sim}11$ seconds. $TiO_2$ and Ag-$TiO_2$ coatings were heat-treated at 250, 300, 350, $400^{\circ}C$ for $0{\sim}240$seconds. Photoelectrical conductivity was measured by four-point probe, and photodegradation was calculated by UV-V is spectrometer. Microstructure observation of $TiO_2$ and Ag-$TiO_2$ coatings were investigated by SEM. Crystal structure of $TiO_2$ and Ag-$TiO_2$ coatings were investigated by XRD. Qualitative analyses of $TiO_2$ and Ag-$TiO_2$ coatings were conducted by EDX. When $TiO_2$ coatings were heat-treated at $350^{\circ}C$ for 30 sec, photoelectrical conductivity and photodegradation were best. And in XRD analysis result, (101)/(110) relative intensity ratio of $TiO_2$(rutile) was comparably changed with photoelectrical conductivity. When Ag-$TiO_2$ coatings were heat-treated at $350^{\circ}C$ for 30 [sec] after sputtering Ag for 7 sec, Photoelectrical conductivity and photodegradation are best. Surface of coatings in such condition has very small and uniform Ag particles.

Morphology of Bone-like Apatite Formation on Sr and Si-doped Hydroxyapatite Surface of Ti-6Al-4V Alloy after Plasma Electrolytic Oxidation

  • Yu, Ji-Min;Choe, Han-Cheol
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2017.05a
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    • pp.79-79
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    • 2017
  • Metallic biomaterials have been mainly used for the fabrication of medical devices for the replacement of hard tissue such as artificial hip joints, bone plates, and dental implants. Because they are very reliable on the viewpoint of mechanical performance. This trend is expected to continue. Especially, Ti and Ti alloys are bioinert. So, they do not chemically bond to the bone, whereas they physically bond with bone tissue. For their poor surface biocompatibility, the surface of Ti alloys has to be modified to improve the surface osteoinductivity. Recently, ceramic-like coatings on titanium, produced by plasma electrolytic oxidation (PEO), have been developed with calciumand phosphorus-enriched surfaces. A lso included the influences of coatings, which can accelerate healing and cell integration, as well as improve tribological properties. However, the adhesions of these coatings to the Ti surface need to be improved for clinical use. Particularly Silicon (Si) has been found to be essential for normal bone, cartilage growth and development. This hydroxyapatite, modified with the inclusion of small concentrations of silicon has been demonstrating to improve the osteoblast proliferation and the bone extracellular matrix production. Strontium-containing hydroxyapatite (Sr-HA) was designed as a filling material to improve the biocompatibility of bone cement. In vitro, the presence of strontium in the coating enhances osteoblast activity and differentiation, whereas it inhibits osteoclast production and proliferation. The objective of this work was to study Morphology of bone-like apatite formation on Sr and Si-doped hydroxyapatite surface of Ti-6Al-4V alloy after plasma electrolytic oxidation. Anodized alloys was prepared at 270V~300V voltages with various concentrations of Si and Sr ions. Bone-like apatite formation was carried out in SBF solution. The morphology of PEO, phase and composition of oxide surface of Ti-6Al-4V alloys were examined by FE-SEM, EDS, and XRD.

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Indium Tin Oxide (ITO) Nano Thin Films Deposited by a Modulated Pulse Sputtering at Room Temperature (모듈레이티드 펄스 스퍼터링으로 상온 증착한 Indium-Tin-Oxide (ITO) 나노 박막)

  • You, Younggoon;Jeong, Jinyong;Joo, Junghoon
    • Journal of Surface Science and Engineering
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    • v.47 no.3
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    • pp.109-115
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    • 2014
  • High power impulse magnetron sputtering (HIPIMS), also known as the technology is called peak power density in a short period, you can get high, so high ionization sputtering rate can make. Higher ionization of sputtered species to a variety of coating materials conventional in the field of improving the characteristics and self-assisted ion thin film deposition process, which contributes to a superior being. HIPIMS at the same power, but the deposition speed is slow in comparison with DC disadvantages. Since recently as a replacement for HIPIMS modulated pulse power (MPP) has been developed. This ionization rate of the sputtered species can increase the deposition rate is lowered and at the same time to overcome the problems to be reported. The differences between the MPP and the HIPIMS is a simple single pulse with a HIPIMS whereas, MPP is 3 ms in pulse length is adjustable, with the full set of multi-pulses within the pulse period and the pulse is applied can be micro advantages. In this experiment, $In_2O_3$ : $SnO_2$ composition ratio of 9 : 1 wt% target was used, Ar : $O_2$ flow rate ratio is 4.8 to 13.0% of the rate of deposition was carried out at room temperature. Ar 40 sccm and the flow rate of $O_2$ and then fixed 2 ~ 6 sccm was compared against that. The thickness of the thin film deposition is fixed at 60 nm, when the partial pressure of oxygen at 9.1%, the specific resistance value of $4.565{\times}10^{-4}{\Omega}cm$, transmittance 86.6%, mobility $32.29cm^2/Vs$ to obtain the value.