Journal of the Korean Society for Heat Treatment (열처리공학회지)

The Korean Society for Heat Treatment (한국열처리공학회)
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Investigation of the TiCrN Coating Deposited by Inductively Coupled Plasma Assisted DC Magnetron Sputtering.

Inductively Coupled Plasma Assisted D.C. Magnetron Sputtering법으로 제작된 TiCrN 코팅층의 특성 분석

  • Cha, B.C. (School of Materials Science and Engineering, University of UIsan) ;
  • Kim, J.H. (School of Materials Science and Engineering, University of UIsan) ;
  • Lee, B.S. (School of Materials Science and Engineering, University of UIsan) ;
  • Kim, S.K. (School of Materials Science and Engineering, University of UIsan) ;
  • Kim, D.W. (School of Materials Science and Engineering, University of UIsan) ;
  • Kim, D. (School of Materials Science and Engineering, University of UIsan) ;
  • You, Y.Z. (School of Materials Science and Engineering, University of UIsan)
  • 차병철 (울산대학교 첨단소재공학부) ;
  • 김준호 (울산대학교 첨단소재공학부) ;
  • 이병석 (울산대학교 첨단소재공학부) ;
  • 김선광 (울산대학교 첨단소재공학부) ;
  • 김대욱 (울산대학교 첨단소재공학부) ;
  • 김대일 (울산대학교 첨단소재공학부) ;
  • 유용주 (울산대학교 첨단소재공학부)
  • Published : 2009.09.30
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Abstract

Titanium Chromium Nitrided (TiCrN) coatings were deposited on stainless steel 316 L and Si (100) wafer by inductively coupled plasma assisted D.C. magnetron sputtering at the various sputtering power on Cr target and $N_2/Ar$ gas ratio. Increasing the sputtering power of Cr target, XRD patterns were changed from TiCrN to nitride $Cr_2Ti$. The maximum hardness was $Hk_{3g}$ 3900 at $0.3\;N_2/Ar$ gas ratio. The thickness of the TiCrN films increased as the Cr target power increased, and it showed over $Hk_{5g}3100$ hardness at 100 W, 150 W. TiCrN films were deposited by the ICP assisted DC magnetron sputtering shown good wear resistance as the $N_2/Ar$ gas ratio was 0.1, 0.3.

Keywords

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