• Title/Summary/Keyword: pHEMT

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Study on the Breakdown Simulation for InAlAs/InGaAs/GaAs MHEMTs with an InP-etchstop Layer (InP 식각정지층을 갖는 InAlAs/InGaAs/GaAs MHEMT 소자의 항복 특성 시뮬레이션에 관한 연구)

  • Son, Myung Sik
    • Journal of the Semiconductor & Display Technology
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    • v.11 no.2
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    • pp.53-57
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    • 2012
  • This paper is for accurately simulating the breakdown of MHEMTs with an InP-etchstop layer. 2D-Hydrodynamic simulation parameters are investigated and calibrated for the InP-epitaxy layer. With these calibrated parameters, simulations are performed and analyzed for the breakdown of devices with an InP-etchstop layer. In the paper, the impact-ionization coefficients, the mobility degradation due to doping concentration, and the saturation velocity for InP-epitaxy layer are newly calibrated for more accurate breakdown simulation.

Broadband Microwave SPDT Switch Using CPW Impedance Transform Network (CPW 임피던스 변환회로를 이용한 광대역 마이크로파 SPDT 스위치)

  • Lee Kang Ho;Park Hyung Moo;Rhee Jin Koo;Koo Kyung Heon
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.42 no.7 s.337
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    • pp.57-62
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    • 2005
  • This paper describes the design of a high performance microwave single pole double throw (SPDT) monolithic microwave integrated circuit switch using GaAs pHEMT process. The switch design proposes a novel coplanar waveguide (CPW) impedance transform network which results in the low insertion loss and high isolation by compensating for the FET parasitics to get the low on-resistance and low off-capacitance. The proposed switch has the measured isolation of better than 24 dB and insertion loss of less than 2.6 dB from 53 to 61 GHz. The chip is fabricated with the size of 2.2mm $\times$ 1.6 mm.

Analysis of Asymmetrical $IMD_3$ And ACPR Characteristics for pHEMT Power Amplifier (pHEMT 전력 증폭기의 $IMD_3$ 비대칭성과 ACPR 특성 해석)

  • Lee, Kang-Jun;Park, Chan-Hyuck;Koo, Kyung-Heon
    • Proceedings of the IEEK Conference
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    • 2005.11a
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    • pp.221-224
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    • 2005
  • This paper discribes the nonlinear distortion of a pHEMT power amplifier. In the paper, we have used some commercially available power amplifiers for analyzing the relationship between the $IMD_3$ and ACPR for wireless LAN. And the $IMD_3$ results using two-tone test have been compared with ACPR to satisfy the requited 802.11g standard ACPR value. Measurement result shows that $IMD_3$ of 20MHz tone-spacing need to be more than 18.45dBc for power amplifiers. The WCDMA signal is fed into the power amplifier, for analyzing relationship between the asymmetrical $IMD_3$ and ACLR. With measurement result, the asymmetrical $IMD_3$ characteristic has increased with the increase of two-tone spacing. $IMD_3$ measurement result with maximum 20MHz of the two-tone spacing, shows that the difference between $IMD_3(lower)$ and $IMD_3(upper)$ is about 7dB. And the measured ACLR shows 5dB difference at -4MHz and +4MHz offset from center frequency.

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A Study on the Growth of $In_{0.53}Ga_{0.47}As/In_{0.52}AI_{0.48}$As/InP Epitaxial Layers for HEMT by MBE (MBE에 의한 HEMT 소자용 $In_{0.53}Ga_{0.47}As/In_{0.52}AI_{0.48}$As/InP 에피택셜층 성장 연구)

  • 노동완;이해권;이재진;이재진;편광의;남기수
    • Journal of the Korean Vacuum Society
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    • v.4 no.2
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    • pp.177-182
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    • 1995
  • 저잡음 HEMT소자 제작을 위한 에피택셜 기판을 MBE방법을 이용하여 $In_{0.53}Ga_{0.47}As/In_{0.52}AI_{0.48}$As/InP 물질계로 성장하였다. 기판온도의 변화, 채널층과 격리층 사이의 성장 일시 멈춤 등의 성장 조건 변화에 따른 Hall 이동도의 변화를 연구하였다. 전자 공급층을 Si으로 델타도핑한 결과 같은 조건에서 성장기판의 온도를 $520^{\circ}C$에서$ 540^{\circ}C$로 증가시키면 실온의 전자이동도는 7,850$\textrm{cm}^2$/Vsec으로 증가하였으며, 격리층과 채널층 사이에서 약 50초간 성장중 채널층의 표면 adatom의 surface migration 시간을 충분히 제공하여 결정결함의 감소로 계면의 급격성이 향상된 결과로 사료된다. 본 실험을 통하여 얻은 최고 이동도 값은 격리층의 두께가 $100\AA$인 경유에 상온 측정결과 $11,400\textrm{cm}^2$/vsec 및 77K 측정결과 $50,300\textrm{cm}^2$/Vsec이었다.

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InP기반 InAs 2DEG HEMT성장 및 전기적특성

  • Song, Jin-Dong;Sin, Sang-Hun;Kim, Su-Yeon;Lee, Eun-Hye
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.168-168
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    • 2010
  • InAs는 0.35eV의 낮은 밴드갭을 가지며 상온에서 약 $30,000cm^2/Vs$의 높은 전자이동도를 보여, GaAs/AlGaAs 및 InGaAs/InP 2DEG HEMT에 이은 차세대 초고속 전자소자의 2DEG용 물질로 각광을 받고 있다. 그러나 InAs의 격자상수는 약 0.61nm로 이에 적절한 반절연기판을 구할수 없어, GaAs상에 Al(Ga)Sb를 이용하여 성장하는 방법으로 2DEG을 실현하고 있다. 상기 방법으로 상온에서 ${\sim}30,000cm^2/Vs$ 전자이동도를 보이는 InAs/AlSb 2DEG HEMT 소자를 여러 연구팀에서 시현하였으나, 실제적으로 응용하기 위해서 etch-stop층 또는 contact층의 제작이 용이치 않아 실제의 회로구현에는 어려움을 격고 있다. 이에 InGaAs/InP 2DEG내에 InAs를 넣어 InAs 2DEG을 제작하는 방법이 NTT[1]에 의해 제안되어, SPINTRONICS등의 InAs 2DEG이 필요한 곳에 응용되고 있다. [2] 본 발표에서는 고품질의 InAs 2DEG을 실현하기 위해, 다양한 성장 변수 (온도, As 분압, 성장 시퀀스, InAs층의 두께등)와 2DEG의 전기적특성간의 관계를 발표한다. 최종적으로 상온전자이동도 ${\sim}12,000cm^2/Vs$의 InAs 2DEG을 제작할수 있었으며, 이를 다양한 전자소자에 차후 응용할 예정이다.

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RTA Effect on Transport Characteristics in Al0.25Ga0.75As/In0.2Ga0.8As pHEMT Epitaxial Structures Grown by Molecular Beam Epitaxy (MBE로 성장된 Al0.25Ga0.75As/In0.2Ga0.8As pHEMT 에피구조의 RTA에 따른 전도 특성)

  • Kim, Kyung-Hyun;Hong, Sung-Ui;Paek, Moon-Cheol;Cho, Kyung-Ik;Choi, Sang-Sik;Yang, Jeon-Wook;Shim, Kyu-Hwan
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.7
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    • pp.605-610
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    • 2006
  • We have investigated $Al_{0.25}Ga_{0.75}As/In_{0.2}Ga_{0.8}As$ structures for pseudomorphic high electron mobility transistor(pHEMT), which were grown by molecular beam epitaxy(MBE) and consequently annealed by rapid thermal anneal(RTA), using Hall measurement, photoluminescence, and transmission electron microscopy (TEM). According to intensity and full-width at half maximum maintained stable at the same energy level, the quantized energy level in $Al_{0.25}Ga_{0.75}As/In_{0.2}Ga_{0.8}As$ quantum wells was independent of the RTA conditions. However, the Hall mobility was decreased from $6,326cm^2/V.s\;to\;2,790cm^2/V.s\;and\;2,078cm^2/V.s$ after heat treatment respectively at $500^{\circ}C\;and\;600^{\circ}C$. The heat treatment which is indispensable during the fabrication procedure would cause catastrophic degradation in electrical transport properties. TEM observation revealed atomically non-uniform interfaces, but no dislocations were generated or propagated. From theoretical consideration about the mobility changes owing to inter-diffusion, the degraded mobility could be directly correlated to the interface scattering as long as samples were annealed below $600^{\circ}C$ lot 1 min.

A 30GHz Band MMIC Low Noise Amplifier for Satellite Communications (위성통신용 30GHz대 MMIC 저잡음증폭기의 설계 및 제작)

  • Lim, Jong-Sik;Yom, In-Bok;Yoo, Young-Geun;Kang, Sung-Choon;Nam, Sang-Wook
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.9
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    • pp.13-20
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    • 1999
  • A 2-stage MMIC(monolithic Microwave Integrated Circuits) LNA(Low Noise Amplifiers) at 30GHz hand has been designed and fabricated for the Ka-band Satellite Communications. The $0.15 {\mu}m$ with the width of $80 {\mu}m$ pHEMT technology was used for the fabrication of this MMIC LNA. Using the series feedback technique, ultra low noise and excellent S11 could be obtained at the same time without the cost of gain at 30GHz-band. The stability factors(Ks) for each stage and overall stage are greater than 1 at full frequency bands by the bias circuits and stabilization circuit. The measured performances, which agree well with the predicted performances, show this 2-stage MMIC LNA has the gain of more than 15.7dB and noise figure of less than 2.09dB over 29GHz to 33GHz.

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Space Qualification of MMICs for COMS Communications Transponder (통신해양기상위성 통신 중계기용 MMIC의 우주인증)

  • Jang, Dong-Pil;Yeom, In-Bok;O, Seung-Yeop
    • Journal of Satellite, Information and Communications
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    • v.1 no.2
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    • pp.56-62
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    • 2006
  • This paper describes the MMIC product qualification of the Ka band satellite transponder for the COMS(Communication, Ocean and Meteorological Satellite). Ka-band active equipment for the COMS communications transponder are being developed by using 12 kinds of MMICs which include low noise amplifiers, medium power amplifiers, frequency mixers, frequency multipliers, RF switch, and HEMT attenuator MMIC, Those MMICs had been fabricated at the MMIC production foundry of northrop Grumman Space Technology (Velocium) which is qualified for space application, and experienced in various space programs during past decades. For the MMIC product qualification, Visual inspection and SEM inspection had been performed, and burn-in test for 240 hours and accelerated life-test for 1000 hours had been done on test fixtures of individual MMIC products at $125^{\circ}C$. Additionally, infrared temperature scanning and finite element simulation were performed to analyze and confirm the channel temperature of semiconductor devices on several representatives of those MMIC products that os one of the most important factors in performance degradation and life reduction.

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A 20 GHz Band 1 Watt MMIC Power Amplifier (20 GHz대 1 Watt 고출력증폭 MMIC의 설계 및 제작)

  • 임종식;김종욱;강성춘;남상욱
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.10 no.7
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    • pp.1044-1052
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    • 1999
  • A 2-stage 1 watt MMIC(Monolithic Microwave Integrated Circuits) HPA(High Power Amplifiers) at 20 GHz band has been designed and fabricated. The $0.15\mu\textrm{m}$ with the width of $400\mu\textrm{m}$for single device pHEMT technology was used for the fabrication of this MMIC HPA. Due to the series feedback technique from source to ground, bias circuits and stabilization circuits on the main microstrip line, the stability factors(Ks) are more than one at full frequency. The independent operation for each stage and excellent S11, S22 less than -20 dB have been obtained by using lange couplers. For beginning the easy design, linear S-parameters have been extracted from the nonlinear equivalent circuit in foundry library, and equivalent circuits of devices at in/output ports were calculated from this S-parameters. The measured performances, which are in well agreement with the predicted ones, showed the MMIC HPA in this paper has the minimum 15 dB of linear gain, -20 dB of reflection coefficients and 31 dBm of output power over 17~25 GHz.

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HEMT Mixer for Phase Conjugator Applications in the LS Band (공액 위상변위기용 LS 밴드 HEMT 혼합기)

  • 전중창
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.8 no.2
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    • pp.239-244
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    • 2004
  • In this paper, we have developed a frequency mixer which can be used as a microwave phase conjugator in the LS band retrodirective antenna system. The mixer as a phase conjugator must have an If signal of which frequency is nearly as high as that of an RF signal, so this fact brings difficulty in the combination of input signals and the design of impedance matching circuit. The circuit configuration is chosen to be of the gate mixer using a pseudomorphic HEMT device. The operating frequencies are 4.00 ㎓, 2.01 ㎓, and 1.99 ㎓ for LO, RF, and IF, respectively. Conversion gain is measured to be 12.5 ㏈ and 1 ㏈ compression point -34 ㏈m at the LO power of -7 ㏈m. The mixer fabricated in this research is the single-ended type, where RF leakage signal appears inevitably at the If port because RF and If frequencies are almost the same. The circuit topology suggested here can be applied directly to the design of balanced-type mixers and phase conjugators.