• 상하수도학회지
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• 제33권4호
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• pp.243-250
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• 2019

This objective of this study was to investigate the degradation characteristics of phenol, a refractory substance, by using a submerged dielectric barrier discharge (DBD) plasma reactor. To indirectly determine the concentration of active species produced in the DBD plasma, the dissolved ozone was measured. To investigate the phenol degradation characteristics, the phenol and chemical oxygen demand (COD) concentrations were evaluated based on pH and the discharge power. The dissolved ozone was measured based on the air flow rate and power discharged. The highest dissolved ozone concentration was recorded when the injected air flow rate was 5 L/min. At a discharge power of 40W as compared to 70W, the dissolved ozone was approximately 2.7 - 6.5 times higher. In regards to phenol degradation, the final degradation rate was highest at about 74.06%, when the initial pH was 10. At a discharged power of 40W, the rate of phenol decomposition was observed to be approximately 1.25 times higher compared to when the discharged power was 70W. It was established that the phenol degradation reaction was a primary reaction, and when the discharge power was 40W as opposed to 70W, the reaction rate constant(k) was approximately 1.72 times higher.

• 한국자기학회지
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• 제14권3호
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• pp.99-104
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• 2004

자기 터널 접합(Magnetic Tunnel Junction, MTJ)의 플라즈마 산화시간과 열처리 온도에 따른 자기저항(Tunneling Magnetoresistance, TMR) 온도의존특성을 연구하였다. 플라즈마 산화시간을 30$_{s}$ 70$_{s}$ 까지 10$_{s}$ 간격으로 변화시켜 측정한 결과, 산화시간 50초에서 상온에서 25.3%의 가장 높은 TMR 비를 얻었다. 스핀 분극도 $P_{0}$ 스핀파 지수(spin wave parameter) $\alpha$를 구한 결과, 산화시간 50$_{s}$ 에서 40.3%의 가장 높은 스핀 분극도와 가장 낮은 온도 의존 특성인 (10$\pm$4.742)${\times}$$10^{-6}$ $K^{－1.5}$스핀파 지수(spin wave parameter) $\alpha$값을 얻었다. 그리고 온도별 열처리 결과 175$^{\circ}C$에서 TMR비가 25.3%에서 27.5%까지 증가하였으며 스핀파 지수는 (10$\pm$0.719)${\times}$$10^{-6}$ K $^{－1.5}$ 까지 감소하여 온도의존도가 감소하였다.

• 한국재료학회지
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• 제8권6호
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• pp.538-544
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• 1998

열차폐코팅층의 박리는 세라믹/금속접합층 계면에서 취성이 큰 스피텔의 생성, 금속과 세라믹의 열팽창계수의 차이, 세라믹층의 상변태, 코팅층의 잔류응력에 기인한다. 본 연구에서는 인코넬 713C에 전자빔 코팅 및 플라즈마 용사법으로 코팅된 안정화지르코니아/CoNiCrAIY 계면의 산화거동을 조사하기 위하여 $900^{\circ}C$에서 등온산화시험동안 생성되는 산화막층과 스피넬 생성 거동을 관찰, 분석하였다. 코팅 직후 코팅층에 고르게 분포하고 있는 Co,Ni,Cr,AI,Zr의 원소들이 산화시간에 따라 확산하여 산화반응을 하였다. 초기 20시간의 산화기시간에 안정화지르코니아/CoNiCrAIY 계면에 주요 성분이 $\alpha$-$AI_2O_3$인 산화막층이 생성되었고, CoNiCrAIY층에는 AI의 외부확산으로 인한 AI 결핍지역이 생성되었다. 산화시험동안 $\alpha$-AI2O층이 임계두께까지 성장한 후에 산화막층의 성장속도는 감소하였고, 안정화지르코니아/산화막층 계면에 스피넬, $Cr_2O_3$, $CO_2CrO_4$의 형성으로 인한 크랙이 관찰되었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.399-399
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• 2013

Metal silicides는 Si 기반의microelectronic devices의 interconnect와 contact 물질 등에 사용하기 위하여 그 형성 mechanism과 전기적 특성에 대한 연구가 많이 이루어지고 있다. 이 중 Rare-earth(RE) silicides는 저온에서 silicides를 형성하고, n-type Si과 낮은 Schottky Barrier contact (~0.3 eV)을 이룬다. 또한 낮은 resistivity와 Si과의 작은 lattice mismatch, 그리고 epitaxial growth의 가능성, 높은 thermal stability 등의 장점을 갖고 있다. RE silicides 중 ytterbium silicide는 가장 낮은 electric work function을 갖고 있어 n-channel schottky barrier MOSFETs의 source/drain으로 주목받고 있다. 또한 Silicon 기반의 CMOSFETs의 성능 향상 한계로 인하여 germanium 기반의 소자에 대한 연구가 이루어져 왔다. Ge 기반 FETs 제작을 위해서는 낮은 source/drain series/contact resistances의 contact을 형성해야 한다. 본 연구에서는 저접촉 저항 contact material로서 ytterbium germanide의 가능성에 대해 고찰하고자 하였다. HRTEM과 EDS를 이용하여 ytterbium germanide의 미세구조 분석과 면저항 및 Schottky Barrier Heights 등의 전기적 특성 분석을 진행하였다. Low doped n-type Ge (100) wafer를 1%의 hydrofluoric (HF) acid solution에 세정하여 native oxide layer를 제거하고, 고진공에서 RF sputtering 법을 이용하여 ytterbium 30 nm를 먼저 증착하고, 그 위에 ytterbium의 oxidation을 방지하기 위한 capping layer로 100 nm 두께의 TiN을 증착하였다. 증착 후, rapid thermal anneal (RTA)을 이용하여 N2 분위기에서 $300{\sim}700^{\circ}C$에서 각각 1분간 열처리하여 ytterbium germanides를 형성하였다. Ytterbium germanide의 미세구조 분석은 transmission electron microscopy (JEM-2100F)을 이용하였다. 면 저항 측정을 위해 sulfuric acid와 hydrogen peroxide solution (H2SO4:H2O2=6:1)에서 strip을 진행하여 TiN과 unreacted Yb을 제거하였고, 4-point probe를 통하여 측정하였다. Yb germanides의 면저항은 열처리 온도 증가에 따라 감소하다 증가하는 경향을 보이고, $400{\sim}500^{\circ}C$에서 가장 작은 면저항을 나타내었다. HRTEM 분석 결과, deposition 과정에서 Yb과 Si의 intermixing이 일어나 amorphous layer가 존재하였고, 열처리 온도가 증가하면서 diffusion이 더 활발히 일어나 amorphous layer의 두께가 증가하였다. $350^{\circ}C$ 열처리 샘플에서 germanide/Ge interface에서 epitaxial 구조의 crystalline Yb germanide가 형성되었고, EDS 측정 및 diffraction pattern을 통하여 안정상인 YbGe2-X phase임을 확인하였다. 이러한 epitaxial growth는 면저항의 감소를 가져왔으며, 열처리 온도가 증가하면서 epitaxial layer가 증가하다가 고온에서 polycrystalline 구조의 Yb germanide가 형성되어 면저항의 증가를 가져왔다. Schottky Barrier Heights 측정 결과 또한 면저항 경향과 동일하게 열처리 증가에 따라 감소하다가 고온에서 다시 증가하였다.

• 한국표면공학회지
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• 제50권5호
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• pp.366-372
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• 2017

Plasma electrolytic oxidation(PEO) has attracted attention as a surface treatment which has high wear resistance and corrosion resistance. PEO is generally considered as cost-effective, environmentally friendly and superior in terms of coating performance. Most of studies about the PEO processes have been applied to light metals such as Al and Mg. Because the strength of Al and Mg is weaker than that of steel, there is a limit to the application. In this study, PEO process was used to form oxide coatings on Hot dipped aluminized(HDA) steel and the characteristics of the coating film according to the PEO current density were studied. The morphology was observed by SEM and component was analyzed by using EDS. The corrosion behaviors of PEO coating films were estimated by exposing salt spray test at 5 wt.% NaCl solution and measuring polarization curves in deaerated 3 wt.% NaCl solution. With the increase of PEO process current density, the pore size of the coating surface and the thickness of coating increased. It was confirmed that no Fe component was present on the coating surface. PEO coating films obviously showed good corrosion resistance compared with HDA. It is considered that the PEO coating acts as a barrier to protect the base material from external factors causing corrosion.

• 한국재료학회지
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• 제31권8호
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• pp.439-444
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• 2021

The oxidation resistance of the diffusion aluminide bond coat (BC) is compromised largely by interdiffusion (ID) effects on coated turbine blades of aeroengines. The present study is designed to understand the influence of ID on βNiAl coatings or BC. In this regard, nickel substrate and CMSX-4 superalloy are deposited. In total, four sets of BCs are developed, i.e. pure βNiAl (on Ni substrate), simple βNiAl (on CMSX-4 substrate), Zr-βNiAl (on CMSX-4 substrate) and Pt-βNiAl (on CMSX-4 substrate). The main aim of this study is to understand the interdiffusion of Al, Zr and Pt during preparation and oxidation. In addition, the beneficial effects of both Zr and platinum are assessed. Pure βNiAl and simple βNiAl show Ni-out-diffusion, whereas for platinum inward diffusion to the substrate is noticed under vacuum treatment. Interestingly, Zr-βNiAl shows the least ID in all BCs and exhibit stability under both vacuum and oxidation treatments. However, its spallation resistance is slightly lower than that of Pt-βNiAl BC. All BCs show similar oxide growth trends, except for Zr-βNiAl, which exhibits two-stage oxidations, i.e. transient and steady-state. Moreover, it is suggested that the localized spallation in all BCs is caused by βNiAl - γ'-Ni₃Al transformation.

• 전기학회논문지P
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• 제52권1호
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• pp.14-19
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• 2003

The effect of the Pt electrode and the $Pt-IrO_2$ hybrid electrode on the performance of ferroelectric device was investigated. The modified Pt thin films with non-columnar structure significantly reduced the oxidation of TiN diffusion barrier layer, which rendered it possible to incorporate the simple stacked structure of Pt/TiN/poly-Si plug. When a $Pt-IrO_2$ hybrid electrode is applied, PZT thin film properties are influenced by the thickness and the partial coverage of the electrode layers. The optimized $Pt-IrO_2$ hybrid electrode significantly enhanced the fatigue properties of the PZT thin film with minimal leakage current.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1988년도 추계학술대회 논문집 학회본부
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• pp.193-195
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• 1988

The native oxide films were thermally and anodically formed on the n-GaP substrates grown by SSD method and measured this oxide thickness and the chemical composition and the electrical properties with formation condition. The chemical composition of themally oxidized GaP film was composed of mostly $GaPO_4$ at temperature below $800^{\circ}C$ and mostly $\beta-Ga_{2}O_{3}$ above $800^{\circ}C$. But The chemical composition of anodically oxidized GaPfilm was composed of the mixture of $Ga_{2}O_{3}$ and $P_{2}O_{5}$. The barrier height of Al/oxide/n-Gap which was formed at $700^{\circ}C$ by thermal oxidation method were 1.10eV, 1.03eV in Current-Voltage measurement. Interface charge density were $4{\times}10^{12}q(C/cm^2)$ and $3{\times}10^{12}q(C/cm^2)$ in Capacitance-Voltage measurement respectively.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2001년도 하계학술대회 논문집 C
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• pp.1402-1404
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• 2001

Josephson junction arrays of the type $Nb/Al-Al_2O_3/Nb$ were prepared by DC magnetron sputtering. The tunnel barrier was formed by in-situ thermal oxidation. Individual junctions were defined using selective niobium etching process(SNEP). The characteristic curves of Josephson junction arrays fabricated with and without cooling the substrate were represented. The junctions deposited without cooling showed poor characteristics(high leakage current, low gap voltage), and a high quality Josephson junction array of 2,000 junctions with high hysteresis was obtained with cooling and when operated at 74.6 GHz, it generated stable quantized voltage steps up to 2.2 V.

• Journal of Electrochemical Science and Technology
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• 제3권1호
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• pp.35-43
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• 2012

Highly ordered and perforated anodic aluminum oxide membranes were prepared by anodic oxidation and subsequent removal of the barrier layer. By using these homemade anodic aluminum oxide membranes as templates, metal selenide nanowires and nanotubes were synthesized. The structure and composition of these one-dimensional nanomaterials were studied by field emission scanning electron microscopy as well as transmission electron microscopy and energy dispersive X-ray spectroscopy. The growth process of metal selenide inside anodic aluminum oxide channel was traced by investigating the series of samples using scanning electron microscopy after reacting for different times. Straight and dense copper selenide and silver selenide nanowires with a uniform diameter were successfully prepared. In case of nickel selenide, nanotubes were preferentially formed. Phase and crystallinity of the nanostructured materials were also investigated.