• 제목/요약/키워드: optical annealing

검색결과 647건 처리시간 0.028초

Investigation of the Annealing Time Effects on the Properties of Sputtered ZnO:Al Thin Films

  • Kim, Deok Kyu;Kim, Hong Bae
    • Applied Science and Convergence Technology
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    • 제23권6호
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    • pp.366-370
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    • 2014
  • ZnO:Al transparent conductive films were deposited on glass substrates by RF magnetron sputtering technique and annealed by rapid thermal annealing system. The influence of annealing time on the structural, electrical, and optical properties of ZnO:Al thin films was investigated by atomic force microscopy, X-ray diffraction, Hall method and optical transmission spectroscopy. As the annealing time increases from 0 to 5 min, the crystallinity is improved, the root main square surface roughness is decreased and the sheet resistance is decreased. The lowest sheet resistance of ZnO:Al thin film is 90 ohm/sq. The reduction of sheet resistance is caused by increasing carrier concentration due to substituent Al ion. All films are transparent up to 80% in the visible wavelength range and the adsorption edge is a blue-shift due to Burstein-Moss effect with increasing annealing time.

Influence of Rapid Thermal Annealing on the Opto-Electrical Performance of Ti-doped Indium Oxide Thin Films

  • Choe, Su-Hyeon;Kim, Daeil
    • 한국표면공학회지
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    • 제52권6호
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    • pp.306-309
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    • 2019
  • Titanium (Ti) doped indium oxide (In2O3) films were deposited on glass substrates by RF magnetron sputtering and the films were rapid thermal annealed at 100, 200, and 300℃, respectively to investigate the influence of the rapid annealing on the opto-electrical performance of the films. The grain size of In2O3 (222) plane increased with annealing temperatures and their electrical resistivity decreased to as low as 8.86×10-4 Ωcm at 300℃. The visible transmittance also improved from 77.1 to 79.5% when the annealing temperature increased. The optical band gap of the TIO films shifted from 4.010 to 4.087 eV with increases in annealing temperature from room temperature to 300℃. The figure of merit shows that the TIO films annealed at 300℃ had better optical and electrical performance than the other films prepared using lower-temperature or no annealing.

Simulated Annealing 알고리즘에 의한 위상격자를 이용한 실시간 광 영상 생성 (Real time optical image generation using phase grating with simulated annealing algorithm)

  • 김철수;김정우;배장근;김수중
    • 전자공학회논문지B
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    • 제33B권6호
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    • pp.149-155
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    • 1996
  • In this paper, we designed binary phase grating with SA (simulated annealing) algorithm for image generation, and used LCTV(liquid crystal television) as phase modulator. We generated optical image using LCTV which controlled by personal computer in real time. Many parameters in SA algorithm are determined by average deviation of the cost function, not experimental method. It was confirmed that the LCTV could be used as a phase modulator through mach-zehnder interferometering experiment. The various optical images are generated in real itme by fourier transforming of the phase gratings on LCTV which is controlled by personal computer and they can be used for optical interconnection in a neural network and addressing information in a volume hologram etc.

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SA 기법을 이용한 광디스크 드라이브 공기베어링 슬라이더의 최적설계 (The Optimal Design of Air Bearing Sliders of Optical Disk Drives by Using Simulated Annealing Technique)

  • 장혁;김현기;김광선;임경화
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2001년도 춘계학술대회논문집C
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    • pp.316-321
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    • 2001
  • The optical storage device has recently experienced significant improvement, especially for the aspects of high capacity and fast transfer rate. However, it is necessary to study a new shape of air bearing surface for the rotary type actuator because the optical storage device has the lower access time than that of HDD (Hard Disk Drives). In this study, we proposed the air bearing shape by using SA (Simulated Annealing) algorithm which is very effective to achieve the global optimum instead of many local optimums. The objective of optimization is to minimize the deviation in flying height from a target value 100nm. In addition, the pitch and roll angle should be maintained within the operation limits.

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인가주파수에 따른 결합형 광변조기 특성변화 (Characterization of coupling optical modulator to the applied frequency)

  • 강기성
    • E2M - 전기 전자와 첨단 소재
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    • 제9권6호
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    • pp.584-592
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    • 1996
  • Coupling optical modulator which on the $LiTaO_3$ substrate is fabricated by using proton exchange method and self-aligned method. Proton exchange of proton diffusion method was applied to pattern a waveguide on $LiTaO_3$ substrate. The annealing at >$400^{\circ}C$ was carded out to control waveguide width and depth. The depths of the two annealed optical waveguides, which were measured by using .alpha.-step, were 1.435 K.angs. and 1.380 K.angs. Using .alpha.-step facility, we examined that the width of waveguides is increased from 5.mu.m to 6.45 .mu.m and 6.3.mu.m due to the annealing effects. The process of proton exchange was done at 150.deg. C for 120 min, >$200^{\circ}C$ for 60 min and annealing process was done at >$400^{\circ}C$ for 90 min, >$400^{\circ}C$ for 60 min. The high speed coupling optical modulator has very good figures of merits; the measured high frequency power were achieved.

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RF 마그네트론 스퍼터링에 의해 증착된 ITO/TiO2 적층 박막의 어닐링 효과 (Effect of Annealing Temperature on the Properties of ITO/TiO2 Films Deposited with RF Magnetron Sputtering)

  • 이영진;허성보;이학민;김유성;김대일
    • 열처리공학회지
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    • 제25권5호
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    • pp.244-248
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    • 2012
  • ITO/$TiO_2$ films were deposited by RF magnetron sputtering on glass substrates and then the effect of vacuum annealing on the structural, optical and electrical properties of the films was investigated. The structural, optical and electrical properties are strongly related to annealing temperature. The films annealed at $300^{\circ}C$ showed a grain size of 40.9 nm, which was larger than as-deposited amorphous films. The optical transmittance in the visible wavelength region also increased, while the electrical resistivity decreased. The ITO/$TiO_2$ films annealed at $300^{\circ}C$ showed the highest optical transmittance of 81% and also showed the lowest electrical resistivity of $3.05{\times}10^{-4}{\Omega}cm$, in this study.

Annealing Effect on the Structural and Optical Properties of In2S3 Thin Films

  • 황동현;안정훈;손영국
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.589-589
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    • 2012
  • Indium sulfide thin films have been grown onto glass substrates using radio frequency magnetron sputtering at room temperature. The as-deposited film were annealed in nitrogen atmosphere at different temperatures of 100, 200, 300, 400 and $500^{\circ}C$ with an 1 h annealing time. The effect of annealing temperature on composition, structure, morphology and optical properties of the as-grown In2S3 films has been studied. The XRD results indicate that the as-deposited films are composed by a mixture of both cubic ${\alpha}$ and ${\beta}$ crystalline phases, with some fraction of tetragonal phase. The thermal annealing on the films produces the conversion of the cubic crystalline phases to the tetragonal ${\beta}$ one and a crystalline reorientation of the latter phase. The surface morphological analysis reveals that the films grown at $300^{\circ}C$ have an average grain size of ~ 58 nm. These films show a S/In ratio of 0.99. The optical band gap is found to be direct and the films grown at $300^{\circ}C$ shows a higher optical transmittance of 80% and an energy band gap of 2.52 eV.

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RF 스퍼터를 이용하여 제작된 a-Si:H 박막의 어닐링 효과에 관한 연구 (Effect of Annealing on a-Si:H Thin Films Fabricated by RF Magnetron Sputtering)

  • 김도윤;김인수;최세영
    • 한국재료학회지
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    • 제19권2호
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    • pp.102-107
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    • 2009
  • The effect of annealing under argon atmosphere on hydrogenated amorphous silicon (a-Si:H) thin films deposited at room temperature and $300^{\circ}C$ using Radio Frequency (RF) magnetron sputtering has been investigated. For the films deposited at room temperature, there was not any increase in hydrogen content and optical band gap of the films, and as a result, quality of the films was not improved under any annealing conditions. For the films deposited at $300^{\circ}C$, on the other hand, significant increases in hydrogen content and optical band gap were observed, whereas values of microstructure parameter and dark conductivity were decreased upon annealing below $300^{\circ}C$. In this study, it was proposed that the Si-HX bonding strength is closely related to deposition temperature. Also, the improvement in optical, electrical and structural properties of the films deposited at $300^{\circ}C$ was originated from thermally activated hydrogen bubbles, which were initially trapped at microvoids in the films.

Annealing Temperature Dependence of Magnetic and Optic Properties of Bi:YIG Films Deposited with Aerosol Deposition Method

  • Shin, Kwang-Ho;Mizoguchi, Masahiko;Inoue, Mitsuteru
    • Journal of Magnetics
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    • 제12권3호
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    • pp.129-132
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    • 2007
  • Bismuth-substituted yttrium iron garnet (Bi:YIG, $Bi_{0.5}Y_{2.5}Fe_5O_{12}$) films were deposited with aerosol deposition method and their magnetic and optical properties were investigated as a function of annealing temperature. Since the ceramic films deposited with aerosol deposition method have not a perfect crystal structure due to non-uniform internal stress occurred by mechanical collision during their deposition, the post annealing could be a key process to release its internal stress and to improve its micro structure for optimizing the magnetic and magneto-optic properties of films. The crystallinity of Bi: YIG film was improved with increase of annealing temperature, and the saturation magnetization increased up to 87 emu/cc at $800^{\circ}C$. The Faraday rotation increased up to $1.4deg/{\mu}m$ by annealing at $700^{\circ}C$ around the wavelength of $0.5{\mu}m$. The optical transmittance of the Bi:YIG film was also improved in visible region.

UV 조사에 의한 doped ZnS 나노입자의 annealing 효과 (Optical annealing of doped ZnS nanoparticles through UV irradiation)

  • 이준우;조경아;김현석;김진형;박병준;김상식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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    • pp.24-27
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    • 2004
  • ZnS nanoparticles were synthesized and doped with $Pr^{3+}\;and\;Mn^{2+}$. Photoluminescence(PL) peaks were observed at 430 nm for pure ZnS, 585 nm for $Mn^{2+}-doped$ ZnS, and at around 430, 460, 480, 495 nm for ZnS nanoparticles doped with $Pr^{3+}$, respectively. For co-doped sample, both characteristics of doping with each element were exhibited. Optical annealing through UV irradiation was carried out in the two atmospheres; air and vacuum. The increases of the luminescence intensity was more considerable in the air, which is attributed to the photo-induced oxidation. In the case of co-doped sample the change of the emission color was observed by UV annealing.

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