Journal of the Korean Society for Heat Treatment (열처리공학회지)

The Korean Society for Heat Treatment (한국열처리공학회)
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Effect of Annealing Temperature on the Properties of ITO/TiO2 Films Deposited with RF Magnetron Sputtering

RF 마그네트론 스퍼터링에 의해 증착된 ITO/TiO2 적층 박막의 어닐링 효과

  • Lee, Young-Jin (School of Materials Science and Engineering, University of Ulsan) ;
  • Heo, Sung-Bo (School of Materials Science and Engineering, University of Ulsan) ;
  • Lee, Hak-Min (School of Materials Science and Engineering, University of Ulsan) ;
  • Kim, Yu-Sung (R&D Division, New optics LTD.) ;
  • Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
  • 이영진 (울산대학교 첨단소재공학부) ;
  • 허성보 (울산대학교 첨단소재공학부) ;
  • 이학민 (울산대학교 첨단소재공학부) ;
  • 김유성 (뉴옵틱스 기술연구소) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Received : 2012.07.16
  • Accepted : 2012.09.21
  • Published : 2012.09.30
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Abstract

ITO/$TiO_2$ films were deposited by RF magnetron sputtering on glass substrates and then the effect of vacuum annealing on the structural, optical and electrical properties of the films was investigated. The structural, optical and electrical properties are strongly related to annealing temperature. The films annealed at $300^{\circ}C$ showed a grain size of 40.9 nm, which was larger than as-deposited amorphous films. The optical transmittance in the visible wavelength region also increased, while the electrical resistivity decreased. The ITO/$TiO_2$ films annealed at $300^{\circ}C$ showed the highest optical transmittance of 81% and also showed the lowest electrical resistivity of $3.05{\times}10^{-4}{\Omega}cm$, in this study.

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References

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