A Study of the Dielectric Characteristics of the Low-k SiOCH Thin Films by Ellipsometry (Ellipsometry를 이용한 Low-k SiOCH 박막의 유전특성에 관한 연구)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.21 no.12
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- pp.1083-1089
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- 2008