• 제목/요약/키워드: metal forming

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용액공정용 불소 도핑된 인듐 갈륨 징크 산화물 반도체의 박막 트랜지스터 적용 연구 (Solution-Processed Fluorine-Doped Indium Gallium Zinc Oxide Channel Layers for Thin-Film Transistors)

  • 정선호
    • 마이크로전자및패키징학회지
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    • 제26권3호
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    • pp.59-62
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    • 2019
  • 본 논문은 용액공정용 불소 도핑된 인듈 갈륨 징크 산화물 반도체를 연구하였으며, 박막 트랜지스터 적용 가능성을 확인하였다. 용액형 산화물 반도체를 형성하기 위해, 금속염 전구체 기반 용액을 제조하였으며, 추가적인 불소 도핑을 유도하기 위해 화학적 첨가제로서 암모늄 플로라이드를 이용하였다. 열처리 온도 및 불소 도핑양에 따른 전기적 물성을 고찰함으로서, 300도 저온 열처리를 통해 제조된 산화물 반도체층의 전기적 특성을 향상시켰다. 20 mol% 불소를 도핑하는 경우, $1.2cm^2/V{\cdot}sec$의 이동도 및 $7{\times}10^6$의 점멸비 특성이 발현 가능함을 확인하였다.

판형 열교환기 전열판의 부식 파손 분석 (Corrosion Failure Analysis of Flow Plate in Plate Heat Exchanger)

  • 송민지;최가현;채호병;김우철;김희산;김정구;이수열
    • Corrosion Science and Technology
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    • 제20권4호
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    • pp.204-209
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    • 2021
  • Corrosion failure analysis of the flow plate, which is one of the accessories of the plate heat exchanger in a district heating system, was performed. The flow plate is made of 316 stainless steel, and water at different temperatures in the flow plate exchanges heat in a non-contact manner. The flow plate samples in which water mixing issues occurred were collected. Corrosion-induced pits, oxides, and contaminants were observed at locations where two plates are regularly in contact. The EDS analysis of the surface oxides and contaminants revealed that they were composed of carbon, silicon, and magnesium, which came from chemical adhesives. The IC/ICP analyses showed that the concentration of chloride ions was 30 ~ 40 ppm, which was not sufficient to cause corrosion of stainless steel. In the crevice, a local decrease in dissolved oxygen occurs along with an increase in chloride ions, thus forming an acidic environment. These environments destroyed the passive film of stainless steel, resulting in pits. Moreover, contaminants formed a narrower gap between the two metal plates and inhibited the diffusion of ions, thereby accelerating crevice corrosion.

페로브스카이트 반도체 물질에 원형 패턴을 형성하기 위한 상압플라즈마 식각 기술 (Atmospheric Pressure Plasma Etching Technology for Forming Circular Holes in Perovskite Semiconductor Materials)

  • 김무진
    • 융합정보논문지
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    • 제11권2호
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    • pp.10-15
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    • 2021
  • 본 논문에서는 먼저 습식 코팅 방법으로 페로브스카이트 (CH3NH3PbI3) 박막을 글라스 상에 형성하고, 다양한 분석 기법을 이용하여 막의 두께, 표면거칠기, 결정성, 구성성분 및 가시광 영역에서의 이 물질의 반응에 대해 논한다. 완성된 반도체 물질은 막내부에 결함(defect)이 없고 균일하며, 표면거칠기는 매우 작으며, 가시광영역에서 높은 흡수율이 관찰되었다. 다음으로 이와 같이 형성된 유무기 층에 hole 형상을 구현하기 위하여, 구멍이 일정한 간격으로 있는 메탈마스크, 페로브스카이트 물질이 코팅되어 있는 유리, 자석 순서로 되어있는 구조의 샘플을 상압플라즈마 공법을 이용하여 시간에 따른 물질에 형성되는 hole 형태의 변화를 분석하였다. 시간이 길어짐에 따라 더 많이 식각되는 것을 알 수 있으며, 이 중에서 공정 시간을 가장 오래한 샘플에 대해서는 보다 자세하게 살펴보았고, 플라즈마의 위치에 따른 차이에 의해 7영역으로 분류할 수 있었다.

복합조직강의 고속인장 결과를 이용한 컴퓨터 전산모사와 실제 충돌시험 결과와의 비교 연구 (A Comparative Study of Computer Simulation using High-Speed Tensile Test Results with Actual Crash Test Results of DP Steels)

  • 방형진;최일동;강성규;문만빈
    • 대한금속재료학회지
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    • 제50권12호
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    • pp.873-882
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    • 2012
  • Dual Phase (DP) steel which has a soft ferrite phase and a hard martensite phase reveals both high strength and high ductility and has received increased attention for use in automotive applications. To conduct structural analysis to verify vehicle safety, highly credible experimental results are required. In this study, tensile tests were performed in a strain rate range from $10^{-4}/s$ to 300/s for Sink Roll-Less (SRL) hot-dip metal coated sheets. Collision properties were estimated through simulation by LS-DYNA using the stress-strain curve obtained from the tensile test. The simulation results were compared with the actual crash test results to confirm the credibility of the simulation. In addition, a tensile test and a crash test with 2% prestrain and a baking (PB) specimen were evaluated identically because automotive steel is used after forming and painting. The mechanical behaviors were improved with an increasing strain rate regardless of the PB treatment. Thus, plastic deformation with an appropriate strain rate is expected to result in better formability and crash characteristics than plastic deformation with a static strain rate. The ultimate tensile strength (UTS) and absorbed energy up to 10% strain were improved even though the total elongation decreased after PB treatment, The results of the experimental crash test and computer simulation were slightly different but generally, a similar propensity was seen.

사출성형공정에서 CAE 기반 품질 데이터와 실험 데이터의 통합 학습을 통한 인공지능 품질 예측 모델 구축에 대한 연구 (A study on the construction of the quality prediction model by artificial neural intelligence through integrated learning of CAE-based data and experimental data in the injection molding process)

  • 이준한;김종선
    • Design & Manufacturing
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    • 제15권4호
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    • pp.24-31
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    • 2021
  • In this study, an artificial neural network model was constructed to convert CAE analysis data into similar experimental data. In the analysis and experiment, the injection molding data for 50 conditions were acquired through the design of experiment and random selection method. The injection molding conditions and the weight, height, and diameter of the product derived from CAE results were used as the input parameters for learning of the convert model. Also the product qualities of experimental results were used as the output parameters for learning of the convert model. The accuracy of the convert model showed RMSE values of 0.06g, 0.03mm, and 0.03mm in weight, height, and diameter, respectively. As the next step, additional randomly selected conditions were created and CAE analysis was performed. Then, the additional CAE analysis data were converted to similar experimental data through the conversion model. An artificial neural network model was constructed to predict the quality of injection molded product by using converted similar experimental data and injection molding experiment data. The injection molding conditions were used as input parameters for learning of the predicted model and weight, height, and diameter of the product were used as output parameters for learning. As a result of evaluating the performance of the prediction model, the predicted weight, height, and diameter showed RMSE values of 0.11g, 0.03mm, and 0.05mm and in terms of quality criteria of the target product, all of them showed accurate results satisfying the criteria range.

Influence of ultrasonic impact treatment on microstructure and mechanical properties of nickel-based alloy overlayer on austenitic stainless steel pipe butt girth joint

  • Xilong Zhao;Kangming Ren;Xinhong Lu;Feng He;Yuekai Jiang
    • Nuclear Engineering and Technology
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    • 제54권11호
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    • pp.4072-4083
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    • 2022
  • Ultrasonic impact treatment (UIT) is carried out on the Ni-based alloy stainless steel pipe gas tungsten arc welding (GTAW) girth weld, the differences of microstructure, microhardness and shear strength distribution of the joint before and after ultrasonic shock are studied by microhardness test and shear punch test. The results show that after UIT, the plastic deformation layer is formed on the outside surface of the Ni-based alloy overlayer, single-phase austenite and γ type precipitates are formed in the overlayer, and a large number of columnar crystals are formed on the bottom side of the overlayer. The average microhardness of the overlayer increased from 221 H V to 254 H V by 14.9%, the shear strength increased from 696 MPa to 882 MPa with an increase of 26.7% and the transverse average residual stress decreased from 102.71 MPa (tensile stress) to -18.33 MPa (compressive stress), the longitudinal average residual stress decreased from 114.87 MPa (tensile stress) to -84.64 MPa (compressive stress). The fracture surface has been appeared obvious shear lip marks and a few dimples. The element migrates at the fusion boundary between the Ni-based alloy overlayer and the austenitic stainless steel joint, which is leaded to form a local martensite zone and appear hot cracks. The welded joint is cooled by FA solidification mode, which is forming a large number of late and skeleton ferrite phase with an average microhardness of 190 H V and no obvious change in shear strength. The base metal is all austenitic phase with an average microhardness of 206 H V and shear strength of 696 MPa.

파인블랭킹 공정에서의 곡률부 다이롤 감소를 위한 전단 공정 설계 (Design of shearing process to reduce die roll in the curved shape part of fine blanking process)

  • 전용준
    • Design & Manufacturing
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    • 제17권3호
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    • pp.15-20
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    • 2023
  • In the fine blanking process, which is a press operation known for producing parts with narrow clearances and high precision through the application of high pressure, die roll often occurs during the shearing process when the punch penetrates the material. This die roll phenomenon can significantly reduce the functional surface of the parts, leading to decreased product performance, strength, and fatigue life. In this research, we conducted an in-depth analysis of the factors influencing die roll in the curvature area of the fine blanking process and identified its root causes. Subsequently, we designed and experimentally verified a die roll reduction process specifically tailored for the door latch manufacturing process. Our findings indicate that die roll tends to increase as the curvature radius decreases, primarily due to the heightened bending moment resulting from reduced shape width-length. Additionally, die roll is triggered by the absorption of initial punch energy by scrap material during the early shearing phase, resulting in lower speed compared to the product area. To mitigate the occurrence of die roll, we strategically selected the Shaving process and carefully determined the shaving direction and clearance area length. Our experiments demonstrated a promising trend of up to 75% reduction in die roll when applying the Shaving process in the opposite direction of pre-cutting, with the minimum die roll observed at a clearance area length of 0.2 mm. Furthermore, we successfully implemented this approach in the production of door latch products, confirming a significant reduction in die roll. This research contributes valuable insights and practical solutions for addressing die roll issues in fine blanking processes.

티타늄 파우더가 금속의 열처리 시 결합강도에 미치는 영향 (Effect of titanium powder on the bond strength of metal heat treatment)

  • 김사학;김욱태
    • 구강회복응용과학지
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    • 제33권2호
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    • pp.71-79
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    • 2017
  • 목적: 본 연구는 베릴륨이 함유되지 않은 금속-도재용(Ni-Cr)합금 산화처리 시 도재로 안에 티타늄 파우더를 화학적 촉매로 이용하여 산화막을 억제하고, 금속 표면에 형성될 불순물을 제어하여 도재의 결합력을 증진시켜 줄 수 있는 가능성을 분석 하고자 하였다. 연구 재료 및 방법: 베릴륨이 함유되지 않은 금속-도재용(Ni-Cr)합금 산화처리 시 도재로 안에 티타늄을 화학적 촉매로 이용하였다. 티타늄 파우더를 화학적 촉매로 사용하지 않은 T1군을 대조군으로 하고, 10 g, 20 g 티타늄 파우더를 사용한 시편을 T2, T3군으로 분류하여 전단결합강도와 계면특성 관찰을 위하여 제작 하였다. 일원배치 분산분석(one-way ANOVA)은 그룹의 차이를 검사하기 위해서 시행하였고 사후 검정(Tukey Honestly Significant Difference test)은 그룹 간의 통계적 분석을 위하여 수행되었다. 결과: 티타늄 파우더를 화학적 촉매로 사용 한 T3군의 3점 굽힘 결합강도와 산화막 두께를 측정한 결과, $39.22{\pm}3.4MPa$$6.66{\mu}m$로 가장 높고, 얇게 나타났으며, T2군은 $34.65{\pm}1.39MPa$$13.22{\mu}m$, 티타늄 화학적 촉매로 사용하지 않은 대조군 T1군은 $32.37{\pm}1.91MPa$$22.22{\mu}m$ 순으로 나타났다. 결론: 시편들의 결합강도를 통계 분석한 결과, 티타늄 파우더를 화학적 촉매로 사용한 실험 T3, T2군의 결합력이 높게 나타났고, 산화막 두께 역시 대조군 T1군 보다 얇게 나타나 것으로 결합력 증진에 영향을 줄 수 있음이 관찰 되었다.

Electrical and Chemical Properties of ultra thin RT-MOCVD Deposited Ti-doped $Ta_2O_5$

  • Lee, S. J.;H. F. Luan;A. Mao;T. S. Jeon;Lee, C. h.;Y. Senzaki;D. Roberts;D. L. Kwong
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제1권4호
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    • pp.202-208
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    • 2001
  • In Recent results suggested that doping $Ta_2O_5$ with a small amount of $TiO_2$ using standard ceramic processing techniques can increase the dielectric constant of $Ta_2O_5$ significantly. In this paper, this concept is studied using RTCVD (Rapid Thermal Chemical Vapor Deposition). Ti-doped $Ta_2O_5$ films are deposited using $TaC_{12}H_{30}O_5N$, $C_8H_{24}N_4Ti$, and $O_2$ on both Si and $NH_3$-nitrided Si substrates. An $NH_3$-based interface layer at the Si surface is used to prevent interfacial oxidation during the CVD process and post deposition annealing is performed in $H_2/O_2$ ambient to improve film quality and reduce leakage current. A sputtered TiN layer is used as a diffusion barrier between the Al gate electrode and the $TaTi_xO_y$ dielectric. XPS analyses confirm the formation of a ($Ta_2O_5)_{1-x}(TiO_2)_x$ composite oxide. A high quality $TaTi_xO_y$ gate stack with EOT (Equivalent Oxide Thickness) of $7{\AA}$ and leakage current $Jg=O.5A/textrm{cm}^2$ @ Vg=-1.0V has been achieved. We have also succeeded in forming a $TaTi_x/O_y$ composite oxide by rapid thermal oxidation of the as-deposited CVD TaTi films. The electrical properties and Jg-EOT characteristics of these composite oxides are remarkably similar to that of RTCVD $Ta_2O_5, suggesting that the dielectric constant of $Ta_2O_5$ is not affected by the addition of $TiO_2$.

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Analysis of wet chemical tunnel oxide layer characteristics capped with phosphorous doped amorphous silicon for high efficiency crystalline Si solar cell application

  • Kang, Ji-yoon;Jeon, Minhan;Oh, Donghyun;Shim, Gyeongbae;Park, Cheolmin;Ahn, Shihyun;Balaji, Nagarajan;Yi, Junsin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.406-406
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    • 2016
  • To get high efficiency n-type crystalline silicon solar cells, passivation is one of the key factor. Tunnel oxide (SiO2) reduce surface recombination as a passivation layer and it does not constrict the majority carrier flow. In this work, the passivation quality enhanced by different chemical solution such as HNO3, H2SO4:H2O2 and DI-water to make thin tunnel oxide layer on n-type crystalline silicon wafer and changes of characteristics by subsequent annealing process and firing process after phosphorus doped amorphous silicon (a-Si:H) deposition. The tunneling of carrier through oxide layer is checked through I-V measurement when the voltage is from -1 V to 1 V and interface state density also be calculated about $1{\times}1012cm-2eV-1$ using MIS (Metal-Insulator-Semiconductor) structure . Tunnel oxide produced by 68 wt% HNO3 for 5 min on $100^{\circ}C$, H2SO4:H2O2 for 5 min on $100^{\circ}C$ and DI-water for 60 min on $95^{\circ}C$. The oxide layer is measured thickness about 1.4~2.2 nm by spectral ellipsometry (SE) and properties as passivation layer by QSSPC (Quasi-Steady-state Photo Conductance). Tunnel oxide layer is capped with phosphorus doped amorphous silicon on both sides and additional annealing process improve lifetime from $3.25{\mu}s$ to $397{\mu}s$ and implied Voc from 544 mV to 690 mV after P-doped a-Si deposition, respectively. It will be expected that amorphous silicon is changed to poly silicon phase. Furthermore, lifetime and implied Voc were recovered by forming gas annealing (FGA) after firing process from $192{\mu}s$ to $786{\mu}s$. It is shown that the tunnel oxide layer is thermally stable.

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