• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2001년도 The 6th International Symposium of East Asian Resources Recycling Technology
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• pp.393-397
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• 2001

The innovatory process, that is the direct separation and recovery of the iron and zinc metals contained in the high temperature exhaust gas generated from the electric arc furnace fer the inn scrap melting and/or the dust treatment, has been proposed. This proposed process consists of the moving coke bed filter that is directly connected to the electric furnace, and the following heavy metal condenser. The exhaust gas passes through the filter and the condenser right after exhausting from the electric furnace. The moving coke bed filter is being controlled at about 1000℃ and collects iron and slag components contained in the high temperature exhaust gas. Heavy metals such as zinc and lead pass through the filter as vapor. Based on the thermodynamic considerations, the iron oxide and the zinc oxide are reduced in the filter. The solution loss reaction rate is comparatively low at about 1000℃ in the coke bed filter by the analysis using the mathematical simulation model. The heavy metal condenser is installed in the position after the coke bed filter, and rapidly cools the gas from about 1000℃ to 450℃ by a full of the cooling medium like the solid ceramic ball in addition to the cooling from the wall. The zinc and lead vapor condense and separate f개m the gas in a liquid state. The investigation of the characteristics of the exhaust gas of the commercial electric arc furnace, the fundamental experiments of the laboratory scale and the bench scale ensured the formation of this proposed process. A small-scale pilot plant examination is carrying out at present to confirm the formation of the process. It is certain that the dust generation of the electric arc furnace is extremely decreased, and it can save the energy consumption of usual dust treatment processes by the realization of this process.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1998년도 추계종합학술대회 논문집
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• pp.621-624
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• 1998

This paper presents a new configuration of dielectric bandpass filter using the comb-line filter design theory. This filter is composed of a homogeneous dielectric monoblock $(\varepsilonr=35.5)$ with two metal post and a dielectric sheet $(\varepsilonr=9.8).$ In this structure, the RF leakage is suppressed without other shield housing. For the fabricated filter, insertion loss value in the passband region was 0.9dB(Max.) and return loss value was 19dB(Min). Also, this filter has a attenuation pole in the stopband.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 춘계학술대회 논문집 반도체재료
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• pp.34-37
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• 2001

As the integrated circuit device shrinks to smaller dimensions, chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric (IMD) layer with free-defect. However, as the inter-metal dielectrics (IMD) layer gets thinner, micro-scratches are becoming as major defects. Micro-scratches are generated by agglomerated slurry, solidified and attached slurry in pipe line of slurry supply system. To prevent agglomerated slurry particle from inflow, we installed 0.5${\mu}m$ POU (point of use) filter, which is depth-type filter and has 80% filtering efficiency for the $1.0{\mu}m$ size particle. In this paper, we studied the relationship between defect generation and pad count to understand the exact efficiency of the slurry filtration, and to find out the appropriate pad usage. Our preliminary results showed that it is impossible to prevent defect-causing particles perfectly through the depth-type filter. Thus, we suggest that it is necessary to optimize the flow rate of slurry to overcome depth type filters weak-point, and to install the high spray of de-ionized Water (DIW) with high pressure.

• 한국전자파학회논문지
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• 제9권1호
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• pp.108-114
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• 1998

본 논문에서는 도파관 E 면 금속삽입 방볍에 의한 밀리미터파 대역통과 여파기의 설계를 위해 모드매칭법에 의해 산란행렬올 계산하여 설계한 여파기의 전달특성을 분석하고, 설계 방법의 타당성 여부 검증을 위해 WR-34 구형 도파관을 사용하여 30.085-30.885 GHz 대역의 대역통과 여파기를 설계, 제작하였다. 설계, 제작된 대역통과 여파기의 전달특성은 모드매칭법에 의한 해석파 거의 일치하게 측정되었으며, 통과대역내 삽입손실은 최대 0 0.8 dB, 반사손실 -15 dB의 우수한 여파특성을 나타냉으로써 도파관 E-면 금속삽입 형태에 의한 밀리미터파용 대역통과 여파기로서의 적합성을 입증하였다.

• Radiation Oncology Journal
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• 제7권2호
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• pp.293-297
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• 1989

Electron contamination due to the interaction between radiation beam and material was analyzed for the factors such as source-skin distance (SSD), field size, tray characteristics and position of filter, which can affect the surface dose in Cobalt teletherapy. Surface dose in open beam was more influenced by SSD with increasing field size. Relative surface charge (RSC) increased with the use of tray (solid, circular hole, slotted), compared with open beam, which is thought to be due to increased electron contamination of the tray. To reduce the surface dose, 0.4mm thick Lipowitz metal filter was used. Compared with open beam, RSC decreased by 8.8%, 11.3%, 13.3%, 16.6%, 19.3% and 21.7% for the field size of $5{\times}5$, $10{\times}10$, $15{\times}15$, $20{\times}20$, $25{\times}25$ and $30{\times}30cm^2$, respectively. On the contrary, use of Lipowitz metal filter increased RSC at 60cm or less SSD. Surface dose was effectively reduced with Lpowitz metal filter placed right below solid tray in Cobalt teletherapy.

• 환경위생공학
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• 제12권2호
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• pp.65-74
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• 1997

The purpose of this study was to investigate the removal effect and variation of contaminated water by various water treatment processes using sediment filter, activated carbon, photocatalysis, reverse osmosis, ultra violet sterilizer and ultra filtration. The removal effect of chloride and trace metal was low by activated carbon and ultra filter but high in reverse osmosis. The removal effect of bacteria and E. coli was low by activated carbon and membrane filter system using activated carbon but high in impregnated activated carbon. The removal effect of TCE was low in sand and ultra filter system as compared with activated carbon. Ultra filtration process was effective for purify agricultural water without E.coli. Reverse osmosis was effective to remove heavy metal and activated carbon was effective to remove halogenated organic chemical compound. The flux and the removal effect of COD in spiral wound ultrafilter were higher than the hollow fiber ultrafilter.

• 한국대기환경학회:학술대회논문집
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• 한국대기환경학회 2006년도 춘계학술대회 논문집
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• pp.483-485
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• 2006

• 방사성폐기물학회지
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• 제6권3호
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• pp.171-178
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• 2008

중 저준위 방사성폐기물 유리화 실증시설의 고온필터(HTF)시스템에 금속필터를 도입하여 일련의 성능시험을 수행하였다. 고온필터시스템의 여과재는 총 19개의 필터 element로 구성되는데 필터로서 금속 재질별 특성을 알기 위해 316L, 904L, Inconel 600 등 3종의 element를 혼합하여 필터set를 구성하였다. 매 시험을 종료한 후에는 필터하우징에서 종류별로 필터 element를 꺼내어 육안으로 변화를 관찰하였다. 그 결과 일부 element 표면에서 어두운 색깔의 반점들이 관찰되었으며, 특히 AISI 316L 재질의 element에서 많은 반점들이 발견되었다. 이 반점들이 부식을 의미하는 것인지 확인하기 위해 두 가지 분석을 수행하였다. 첫째 재질별로 1개씩의 element를 절단하여 정상적인 곳과 반점이 있는 곳의 표면 및 단면을 SEM/EDS로 분석하였다. 그 결과 반점은 Na, S, Si 등 무기계 산화물이 집중적으로 침적되어 필터의 미세기공을 막고 있는 현상으로 밝혀졌으며, 이 침적물들은 폐기물 및 유리용탕으로 부터 휘발된 물질로 판단된다. 둘째, 재질별로 필터 element에 대해 ring tensile시험을 수행하였다. 그 결과 반점을 포함한 시험 필터 element의 인장강도 값이 규정값 이상으로 나타나서 필터에 부식이 없는 것으로 확인되었다. 앞서 두 가지 분석결과로 볼 때 시험한 금속필터 표면에 생성된 반점은 부식생성물이라기 보다는 필터 전단으로부터 유입된 무기산화물 필터기공을 막고 있는 현상으로 판단되며, 이 반점이 반점형태로 국부적 지점에만 나타나는 것은 시험 중단시기 필터에 응축된 수분과 관련이 있는 것으로 판단된다. 반점의 생성은 필터의 유효 여과면적이 줄어 결과적으로 필터에 걸리는 압력손실이 커지기 때문에 필터하우징의 상시보온을 통한 응축 방지가 필요할 것으로 판단된다. 아울러, 보다 장시간의 시험을 통해 필터 부식현상에 대한 검증 필요하다고 판단된다.

• 한국통신학회:학술대회논문집
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• 한국통신학회 1987년도 춘계학술발표회 논문집
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• pp.219-222
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• 1987

A Semi-cusion VLSI Digital Filter Design for TDM/FDM tran-smultiplexer is decribed. Using the polyphase network approach a filter bank composed of only all-pasdigital filter sections was designed. The use of all-pass filters as basic building blocks is shown to provide a Transmultiplexer structure that has low computational requirements low quanization noise and hign modularity. A design of 1st order 2nd All pass filter is done using COMS 2um double metal.

• 한국전기전자재료학회논문지
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• 제14권7호
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• pp.557-561
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• 2001

Chemical mechanical polishing (CMP) process has been widely used to planarize dielectric layers, which can be applied to the integraded circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of in the defect-free inter-level dielectrics (ILD). Especially, defects such as micro-scratch lead to severe circuit failure which affect yield. CMP slurries can contain particles exceeding 1㎛ in size, which could cause micro-scratch on the wafer surface. The large particles in these slurries may be caused by particles agglomeration in slurry supply line. To reduce these defects, slurry filtration method has been recommended in oxide CMP. In this work, we have studied the effects of filtration and the defect trend as a function of polished wafer count using various filters in inter-metal dielectrics(IMD)-CMP process. The filter installation in CMP polisher could reduce defects after IMD-CMP process. As a result of micro-scratch formation, it is shown that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. We have concluded that slurry filter lifetime is fixed by the degree of generating defects.