• 제목/요약/키워드: mask method

검색결과 922건 처리시간 0.028초

High performance γ-ray imager using dual anti-mask method for the investigation of high-energy nuclear materials

  • Lee, Taewoong;Lee, Wonho
    • Nuclear Engineering and Technology
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    • 제53권7호
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    • pp.2371-2376
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    • 2021
  • As the γ-ray energy increases, a reconstructed image becomes noisy and blurred due to the penetration of the γ-ray through the coded mask. Therefore, the thickness of the coded mask was increased for high energy regions, resulting in severely decreased the performance of the detection efficiency due to self-collimation by the mask. In order to overcome the limitation, a modified uniformly redundant array γ-ray imaging system using dual anti-mask method was developed, and its performance was compared and evaluated in high-energy radiation region. In the dual anti-mask method, the two shadow images, including the subtraction of background events, can simultaneously contribute to the reconstructed image. Moreover, the reconstructed images using each shadow image were integrated using a hybrid update maximum likelihood expectation maximization (h-MLEM). Using the quantitative evaluation method, the performance of the dual anti-mask method was compared with the previously developed collimation methods. As the shadow image which was subtracted the background events leads to a higher-quality reconstructed image, the reconstructed image of the dual anti-mask method showed high performance among the three collimation methods. Finally, the quantitative evaluation method proves that the performance of the dual anti-mask method was better than that of the previously reconstruction methods.

Avoiding a Collision in Gamma Knife Radiosurgery : A Modified Mask Fixation Method

  • Hyeong Cheol Moon;Doheui Lee;Byung Jun Min;Young Gyu Kim;Yun-Sik Dho
    • Journal of Korean Neurosurgical Society
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    • 제66권4호
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    • pp.476-481
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    • 2023
  • Objective : The latest version of the Leksell Gamma Knife IconTM allows for mask- and frame-based fixation. Although mask fixation provides fractionated treatment and immobilization using a noninvasive method, it is not free from collision. The authors investigated the collision problem with a modified mask fixation method. Methods : This study presents a case of two meningiomas in the frontal area, where a collision occurs in the occipital area. A modified mask fixation method was introduced to avoid the collision : first, the edges of the head cushion were cut off and polystyrene beads with a diameter of approximately 5 cm were removed. Next, the head cushion was sealed using a stapler. Finally, the head cushion was flattened in the adapter. We compared the shot coordinates, 3-dimensional (3D) error, clearance distance, and vertical depth of the head cushion between the initial and modified mask fixations. Results : When comparing the initial and modified mask fixations, the difference in the shot coordinates was +10.5 mm along the y-axis, the difference in the 3D error was approximately 18 mm, and the difference in clearance was -10.2 mm. The head cushion was approximately 8 mm deeper in the modified mask fixation. Conclusion : Based on these findings, we recommend a modified mask fixation method for gamma knife radiosurgery using ICON with a collision.

한국인 안면부 인체 데이터를 이용한 마스크 계면 프로토타입 설계 (Half-Mask Interface Prototype Design using Korean Face Anthropometric Data)

  • 송영웅;양원호
    • 대한안전경영과학회지
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    • 제12권4호
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    • pp.87-92
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    • 2010
  • The mask-face interface design should consider the face shape to improve the half mask respirator's fit ratio. This study tried to design the mask-face interface using recent Korean face data. By using the data of 1536 men's 3D face scanning (Size Korea data), head clay mock-up was made and mask-face interface line was extracted from this head mock-up. Using this interface line, the half-mask prototype was made. According to the quantitative fitting test, the proposed mask was found to be well fitted (average fit-ratio > 100). The proposed method had two advantages. 1) The method could use massive head-related anthropometric data like Size Korea data. 2) The qualitative fit test (observation) could be conducted very quickly by fitting the prototype to the head mock-up. However, this method also had several limitations. 1) The head clay mock-up could be different according to the mock-up maker. 2) The average values of the head-related anthropometric data were used to make the head mock-up. Small and large size head mock-ups should be made and tested.

하다마드 분광계측기의 마스크 설계 (A Design of Optimal Masks in Hadamard Transform Spectrometers)

  • 박진배
    • 대한의용생체공학회:의공학회지
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    • 제16권2호
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    • pp.239-248
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    • 1995
  • The method of increasing signal to noise ratio (SNR) in a Hadamard transform spectrometer (HTS) is multiplexing. The multiplexing is executed by a mask. Conventional masks are mechanical or electro-optical. A mechanical mask has disadvantages of jamming and misalignment. A stationary electro-optical mask has a disadvantage of information losses caused by spacers which partition mask elements. In this paper, a mixed-concept electro-optical mask (MCEOM) is developed by expanding the length of a spacer to that of lon-off mask element. An MCEOM is operated by stepping a movable mask. 2N measurements are required for N spectrum estimates. The average mean square error (AMSE) using MCEQM is equal to that using a stationary electro-optical mask without spacers for large N. The cost of manufacturing an MCEOM is lower than that of producing a conventional electro-optical mask because an MCEOM needs only (N + 1)/2 on-off mask elements whereas the con¬ventional electro-optical mask needs N on-off mask elements. There are no information losses in the spectrometers having an MCEOM.

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FTM 튜브의 판넬과 마스크의 일치방법 개발 (Development of Registration Method of Panel and Mask for FTM Tube)

  • 윤종순;정종윤
    • 산업공학
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    • 제11권2호
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    • pp.107-117
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    • 1998
  • This paper presents a useful method of registration in manufacturing of shadow color mask for cathode ray tubes of the FTM (Flat Tension Mask) type, wherein the shadow mask and front panel are interchangeable when mask-panels are assembled, which is called ICM system. Theoretical analysis and alignment process are presented. The pattern of mask aperture is registered with a screen pattern of corresponding geometry of the panel in flat tension mask tube. Registration accuracy of panel and mask affects the purity of color cathode ray tube concerned with mislanding. It tries to minimize the misregistration caused by variances, which are mechanical error, mask stretching position error, restrictive number of fiducial point, etc.

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시각시스템의 Edge 검출용 고속 마스크 Operator (Fast Mask Operators for the edge Detection in Vision System)

  • 최태영
    • 한국통신학회논문지
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    • 제11권4호
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    • pp.280-286
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    • 1986
  • 행렬분해에 의하여 edge검출용 mask operator의 고속계산법을 제시하였다. 다방향성 mask operator의 각방향에 대한 계산결과는 mask원소와 화상간의 곱한 것을 합산한 것이다. 이것은 각 mask의 원소를 행으로 하는 행렬과 mask에 포함되는 화소를 원소로하는 벡터와의 곱과 마찬가지여서 1차원 신호변환으로도 취급할 수 있다. 본 논문에서는 Sobel 및 Prewitt operator의 경우에 대한 변환행렬을 구한 다음 분해하여 계산량을 산출하여 직접 계산할 때의 방법과 비교하였다. 이 결과 여분의 기억점을 사용치 않고서도 이 방법에 의한 계산량은 Soble 및 Prweitt operator의 경우에 각각 직접 계산량의 42.86%, 50%밖에 되지 않았다. 그리고 100x100화소의 화상인 경우에 301개의 여분의 기억점을 사용할때에 Sobel opreator는 직접 계산량의 35.93%로 줄어 들었다.

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마스크 생산 라인에서 다중 영상 기반 마스크 이어링 검사 방법 (Multi-Vision-based Inspection of Mask Ear Loops Attachment in Mask Production Lines)

  • 우지명;이상현;이헌철
    • 대한임베디드공학회논문지
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    • 제17권6호
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    • pp.337-346
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    • 2022
  • This paper addresses the problem of vision-based ear loops ansd attachment inspection in mask production lines. This paper focuses on connections with ear loops and mask filter by an efficient combined approach. The proposed method used a template matching, shape detection and summation of histogram with preprocessing. We had a parameter for detecting defects heuristically. If the shape vertices are lower than the parameters our proposed method will find defective mask automatically. After finding normal masks in mask ear loops attachment status inspection algorithm our proposed method conducts attachment amount inspection. Our experimental results showed that the precision is 1 and the recall is 0.99 in the mask attachment status inspection and attachment amount inspection.

나노 X-선 쉐도우 마스크를 이용한 고폭비의 나노 구조물 제작 (A Novel Fabrication Method of the High-Aspect-Ratio Nano Structure (HAR-Nano Structure) Using a Nano X-Ray Shadow Mask)

  • 김종현;이승섭;김용철
    • 대한기계학회논문집A
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    • 제30권10호
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    • pp.1314-1319
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    • 2006
  • This paper describes the novel fabrication method of the high-aspect-ratio nano structure which is impossible by conventional method using a shadow mask and a Deep X-ray Lithography (DXRL). The shadow mask with $1{\mu}m-sized$ apertures is fabricated on the silicon membrane using a conventional UV-lithography. The size of aperture is reduced to 200nm by accumulated low stress silicon nitride using a LPCVD (low pressure chemical vapor deposition) process. The X-ray mask is fabricated by depositing absorber layer (Au, $3{\mu}m$) on the back side of nano shadow mask. The thickness of an absorber layer must deposit dozens micrometers to obtain contrast more than 100 for a conventional DXRL process. The thickness of $3{\mu}m-absorber$ layer can get sufficient contrast using a central beam stop method, blocking high energy X-rays. The nano circle and nano line, 200nm in diameter in width, respectively, were demonstrated 700nm in height with a negative photoresist of SU-8.

Cross Mask와 에지 정보를 사용한 동영상 분할 (Dynamic Scene Segmentation Algorithm Using a Cross Mask and Edge Information)

  • 강정숙;박래홍;이상욱
    • 대한전자공학회논문지
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    • 제26권8호
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    • pp.1247-1256
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    • 1989
  • In this paper, we propose the dynamic scene segmentation algorithm using a cross mask and edge information. This method, a combination of the conventioanl feature-based and pixel-based approaches, uses edges as features and determines moving pixels, with a cross mask centered on each edge pixel, by computing similarity measure between two consecutive image frames. With simple calcualtion the proposed method works well for image consisting of complex background or several moving objects. Also this method works satisfactorily in case of rotaitional motion.

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Design of Unsharp Mask Filter based on Retinex Theory for Image Enhancement

  • Kim, Ju-young;Kim, Jin-heon
    • Journal of Multimedia Information System
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    • 제4권2호
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    • pp.65-73
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    • 2017
  • This paper proposes a method to improve the image quality by designing Unsharp Mask Filter (UMF) based on Retinex theory which controls the frequency pass characteristics adaptively. Conventional unsharp masking technique uses blurring image to emphasize sharpness of image. Unsharp Masking(UM) adjusts the original image and sigma to obtain a high frequency component to be emphasized by the difference between the blurred image and the high frequency component to the original image, thereby improving the contrast ratio of the image. In this paper, we design a Unsharp Mask Filter(UMF) that can process the contrast ratio improvement method of Unsharp Masking(UM) technique with one filtering. We adaptively process the contrast ratio improvement using Unsharp Mask Filter(UMF). We propose a method based on Retinex theory for adaptive processing. For adaptive filtering, we control the weights of Unsharp Mask Filter(UMF) based on the human visual system and output more effective results.