• Nuclear Engineering and Technology
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• v.53 no.7
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• pp.2371-2376
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• 2021

As the γ-ray energy increases, a reconstructed image becomes noisy and blurred due to the penetration of the γ-ray through the coded mask. Therefore, the thickness of the coded mask was increased for high energy regions, resulting in severely decreased the performance of the detection efficiency due to self-collimation by the mask. In order to overcome the limitation, a modified uniformly redundant array γ-ray imaging system using dual anti-mask method was developed, and its performance was compared and evaluated in high-energy radiation region. In the dual anti-mask method, the two shadow images, including the subtraction of background events, can simultaneously contribute to the reconstructed image. Moreover, the reconstructed images using each shadow image were integrated using a hybrid update maximum likelihood expectation maximization (h-MLEM). Using the quantitative evaluation method, the performance of the dual anti-mask method was compared with the previously developed collimation methods. As the shadow image which was subtracted the background events leads to a higher-quality reconstructed image, the reconstructed image of the dual anti-mask method showed high performance among the three collimation methods. Finally, the quantitative evaluation method proves that the performance of the dual anti-mask method was better than that of the previously reconstruction methods.

• Journal of Korean Neurosurgical Society
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• v.66 no.4
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• pp.476-481
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• 2023

Objective : The latest version of the Leksell Gamma Knife Icon^TM allows for mask- and frame-based fixation. Although mask fixation provides fractionated treatment and immobilization using a noninvasive method, it is not free from collision. The authors investigated the collision problem with a modified mask fixation method. Methods : This study presents a case of two meningiomas in the frontal area, where a collision occurs in the occipital area. A modified mask fixation method was introduced to avoid the collision : first, the edges of the head cushion were cut off and polystyrene beads with a diameter of approximately 5 cm were removed. Next, the head cushion was sealed using a stapler. Finally, the head cushion was flattened in the adapter. We compared the shot coordinates, 3-dimensional (3D) error, clearance distance, and vertical depth of the head cushion between the initial and modified mask fixations. Results : When comparing the initial and modified mask fixations, the difference in the shot coordinates was +10.5 mm along the y-axis, the difference in the 3D error was approximately 18 mm, and the difference in clearance was -10.2 mm. The head cushion was approximately 8 mm deeper in the modified mask fixation. Conclusion : Based on these findings, we recommend a modified mask fixation method for gamma knife radiosurgery using ICON with a collision.

• Journal of the Korea Safety Management & Science
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• v.12 no.4
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• pp.87-92
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• 2010

The mask-face interface design should consider the face shape to improve the half mask respirator's fit ratio. This study tried to design the mask-face interface using recent Korean face data. By using the data of 1536 men's 3D face scanning (Size Korea data), head clay mock-up was made and mask-face interface line was extracted from this head mock-up. Using this interface line, the half-mask prototype was made. According to the quantitative fitting test, the proposed mask was found to be well fitted (average fit-ratio > 100). The proposed method had two advantages. 1) The method could use massive head-related anthropometric data like Size Korea data. 2) The qualitative fit test (observation) could be conducted very quickly by fitting the prototype to the head mock-up. However, this method also had several limitations. 1) The head clay mock-up could be different according to the mock-up maker. 2) The average values of the head-related anthropometric data were used to make the head mock-up. Small and large size head mock-ups should be made and tested.

• Journal of Biomedical Engineering Research
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• v.16 no.2
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• pp.239-248
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• 1995

The method of increasing signal to noise ratio (SNR) in a Hadamard transform spectrometer (HTS) is multiplexing. The multiplexing is executed by a mask. Conventional masks are mechanical or electro-optical. A mechanical mask has disadvantages of jamming and misalignment. A stationary electro-optical mask has a disadvantage of information losses caused by spacers which partition mask elements. In this paper, a mixed-concept electro-optical mask (MCEOM) is developed by expanding the length of a spacer to that of lon-off mask element. An MCEOM is operated by stepping a movable mask. 2N measurements are required for N spectrum estimates. The average mean square error (AMSE) using MCEQM is equal to that using a stationary electro-optical mask without spacers for large N. The cost of manufacturing an MCEOM is lower than that of producing a conventional electro-optical mask because an MCEOM needs only (N + 1)/2 on-off mask elements whereas the con¬ventional electro-optical mask needs N on-off mask elements. There are no information losses in the spectrometers having an MCEOM.

• IE interfaces
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• v.11 no.2
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• pp.107-117
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• 1998

This paper presents a useful method of registration in manufacturing of shadow color mask for cathode ray tubes of the FTM (Flat Tension Mask) type, wherein the shadow mask and front panel are interchangeable when mask-panels are assembled, which is called ICM system. Theoretical analysis and alignment process are presented. The pattern of mask aperture is registered with a screen pattern of corresponding geometry of the panel in flat tension mask tube. Registration accuracy of panel and mask affects the purity of color cathode ray tube concerned with mislanding. It tries to minimize the misregistration caused by variances, which are mechanical error, mask stretching position error, restrictive number of fiducial point, etc.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.11 no.4
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• pp.280-286
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• 1986

A newmethod of fast mask operators for edge detection is proposed, which is based on the matrix factorization. The output of each component in the multi-directional mask operator is obtained adding every image pixels in the mask area weighting by corresponding mask element. Therefore, it is same as the result of matrix-vector multiplication like one dimensional transform, i, e, , trasnform of an image vector surrounded by mask with a transform matrix consisted of all the elements of eack mask row by row. In this paper, for the Sobel and Prewitt operators, we find the transform matrices, add up the number of operations factoring these matrices and compare the performances of the proposed method and the standard method. As a result, the number of operations with the proposed method, for Sobel and prewitt operators, without any extra storage element, are reduced by 42.85% and 50% of the standard operations, respectively and in case of an image having 100x100 pixels, the proposed Sobel operator with 301 extra storage locations can be computed by 35.93% of the standard method.

• IEMEK Journal of Embedded Systems and Applications
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• v.17 no.6
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• pp.337-346
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• 2022

This paper addresses the problem of vision-based ear loops ansd attachment inspection in mask production lines. This paper focuses on connections with ear loops and mask filter by an efficient combined approach. The proposed method used a template matching, shape detection and summation of histogram with preprocessing. We had a parameter for detecting defects heuristically. If the shape vertices are lower than the parameters our proposed method will find defective mask automatically. After finding normal masks in mask ear loops attachment status inspection algorithm our proposed method conducts attachment amount inspection. Our experimental results showed that the precision is 1 and the recall is 0.99 in the mask attachment status inspection and attachment amount inspection.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.30 no.10 s.253
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• pp.1314-1319
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• 2006

This paper describes the novel fabrication method of the high-aspect-ratio nano structure which is impossible by conventional method using a shadow mask and a Deep X-ray Lithography (DXRL). The shadow mask with $1{\mu}m-sized$ apertures is fabricated on the silicon membrane using a conventional UV-lithography. The size of aperture is reduced to 200nm by accumulated low stress silicon nitride using a LPCVD (low pressure chemical vapor deposition) process. The X-ray mask is fabricated by depositing absorber layer (Au, $3{\mu}m$) on the back side of nano shadow mask. The thickness of an absorber layer must deposit dozens micrometers to obtain contrast more than 100 for a conventional DXRL process. The thickness of $3{\mu}m-absorber$ layer can get sufficient contrast using a central beam stop method, blocking high energy X-rays. The nano circle and nano line, 200nm in diameter in width, respectively, were demonstrated 700nm in height with a negative photoresist of SU-8.

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.8
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• pp.1247-1256
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• 1989

In this paper, we propose the dynamic scene segmentation algorithm using a cross mask and edge information. This method, a combination of the conventioanl feature-based and pixel-based approaches, uses edges as features and determines moving pixels, with a cross mask centered on each edge pixel, by computing similarity measure between two consecutive image frames. With simple calcualtion the proposed method works well for image consisting of complex background or several moving objects. Also this method works satisfactorily in case of rotaitional motion.

• Journal of Multimedia Information System
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• v.4 no.2
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• pp.65-73
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• 2017

This paper proposes a method to improve the image quality by designing Unsharp Mask Filter (UMF) based on Retinex theory which controls the frequency pass characteristics adaptively. Conventional unsharp masking technique uses blurring image to emphasize sharpness of image. Unsharp Masking(UM) adjusts the original image and sigma to obtain a high frequency component to be emphasized by the difference between the blurred image and the high frequency component to the original image, thereby improving the contrast ratio of the image. In this paper, we design a Unsharp Mask Filter(UMF) that can process the contrast ratio improvement method of Unsharp Masking(UM) technique with one filtering. We adaptively process the contrast ratio improvement using Unsharp Mask Filter(UMF). We propose a method based on Retinex theory for adaptive processing. For adaptive filtering, we control the weights of Unsharp Mask Filter(UMF) based on the human visual system and output more effective results.