• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.234.2-234.2
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• 2014

Organic light emitting diode (OLED) is considered as the next generation flat panel displays due to its advantages of low power consumption, fast response time, broad viewing angle and flexibility. For the flexible application, it is essential to develop thin film encapsulation (TFE) to protect oxidation of organic materials from oxidative species such as oxygen and water vapor [1]. In many TFE research, the inorganic film by atomic layer deposition (ALD) process demonstrated a good barrier property. However, extremely low throughput of ALD process is considered as a major weakness for industrial application. Recently, there has been developed a high throughput ALD, called 'spatial ALD' [2]. In spatial ALD, the precursors and reactant gases are supplied continuously in same chamber, but they are separated physically using a purge gas streams to prevent mixing of the precursors and reactant gases. In this study, the $Al_2O_3$ thin film was deposited by spatial ALD process. We characterized various process variables in the spatial ALD such as temperature, scanning speed, and chemical compositions. Water vapor transmission rate (WVTR) was determined by calcium resistance test and less than $10-^3g/m^2{\cdot}day$ was achieved. The samples were analyzed by x-ray photoelectron spectroscopy (XPS) and field emission scanning electron microscope (FE-SEM).

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.431-431
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• 2013

Flexible Organic Light Emitting Diode (OLED) displays are required for future devices. It is possible that plastic substrates are instead of glass substrates. But the plastic substrates are permeable to moisture and oxygen. This weak point can cause the degradation of fabricated flexible devices; therefore, encapsulation process for flexible substrate is needed to protect organic devices from moisture and oxygen. Y.G. Lee et al.(2009) [1] reported organic and inorganic multilayer structure as an encapsulation barrier for enhanced reliability and life-time.Flowable Oxide process is a low-temperature process which shows the excellent gap-fill characteristics and high deposition rate. Besides, planarization is expected by covering dust smoothly on the substrate surface. So, in this research, Bi-layer structured is used for encapsulation: Flowable Oxide Thin film by PECVD process and Al2O3 thin film by ALD process. The samples were analyzed by water vapor transmission rate (WVTR) using the Calcium test and film cross section images were obtained by FE-SEM.

• Structural Engineering and Mechanics
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• 제10권3호
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• pp.245-262
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• 2000

The objective of this study is to analyze the deformational characteristics of a high-vacuum insulation panel that is evacuated to eliminate significant gas-phase conductance through its thickness. The panel is composed of a metal envelope and low thermal conductance spacers. The problem is very challenging because several nonlinearities are involved concurrently. Not only are various finite element models such as triangular, rectangular, beam and circular plate models used to simulate the panel, but also several finite element programs are used to solve the problem based on the characteristics of the finite element model. The numerical results indicate that the effect of the diameter of the spacer on the vertical deformation of the plate panel is negligibly small. The parameter that mainly influences the maximum sag is the spacing between the spacers. The maximum vertical deformation of the panel can be predicted for a practical range of the spacing between the spacers and the thickness of the plate. Compared with the numerical results obtained by the finite element models and the experimental tests, they have a good agreement. The results are represented in both tabular and graphical forms. In order to make the results useful, a curve fitting technique has been applied to predict the maximum deformation of the panel with various parameters. Moreover, the panel was suggested to be a "smart" structure based on thermal effect.

• Applied Microscopy
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• 제43권2호
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• pp.88-97
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• 2013

Technical investigation to figure out the problems arising during in-situ heating electron backscatter diffraction (EBSD) analysis inside scanning electron microscopy (SEM) was carried out. EBSD patterns were successfully acquired up to $830^{\circ}C$ without degradation of EBSD pattern quality in steels. Several technical problems such as image drift and surface microstructure pinning were taking place during in-situ experiments. Image drift problem was successfully prevented in constant current supplying mode. It was revealed that the surface pinning problem was resulted from the $TiO_2$ oxide particle formation during heating inside SEM chamber. Surface pinning phenomenon was fairly reduced by additional platinum and carbon multi-layer coating before in-situ heating experiment, furthermore was perfectly prevented by improvement of vacuum level of SEM chamber via leakage control. Plane view in-situ observation provides better understanding on the overall feature of recrystallization phenomena and cross sectional in-situ observation provides clearer understanding on the recrystallization mechanism.

• 한국재료학회지
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• 제31권8호
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• pp.445-449
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• 2021

Zintl compound Mg₃Sb₂ is a promising candidate for efficient thermoelectric material due to its small band gap energy and characteristic electron-crystal phonon-glass behavior. Furthermore, this compound enables fine tuning of carrier concentration via chemical doping for optimizing thermoelectric performance. In this study, nominal compositions of Mg_3.8Sb_2-xTe_x (0 ≤ x ≤ 0.03) are synthesized through controlled melting and subsequent vacuum hot pressing method. X-ray diffraction (XRD) and scanning electron microscopy (SEM) are carried out to investigate phase development and surface morphology during the process. It should be noted that 16 at. % of excessive Mg must be added to the system to compensate for the loss of Mg during melting process. Herein, thermoelectric properties such as Seebeck coefficient, electrical conductivity, and thermal conductivity are evaluated from low to high temperature regimes. The results show that Te substitution at Sb sites effectively tunes the majority carriers from holes to electrons, resulting in a transition from p to n-type. At 873 K, a peak ZT value of 0.27 is found for the specimen Mg_3.8Sb_1.99Te_0.01, indicating an improved ZT value over the intrinsic value.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.389-390
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• 2012

In this study, we fabricate a superhydrophobic surface made of hierarchical nanostructures that combine wax crystalline structure with moth-eye structure using vacuum cluster system and measure their hydrophobicity and durability. Since the lotus effect was found, much work has been done on studying self-cleaning surface for decades. The surface of lotus leaf consists of multi-level layers of micro scale papillose epidermal cells and epicuticular wax crystalloids [1]. This hierarchical structure has superhydrophobic property because the sufficiently rough surface allows air pockets to form easily below the liquid, the so-called Cassie state, so that the relatively small area of water/solid interface makes the energetic cost associated with corresponding water/air interfaces smaller than the energy gained [2]. Various nanostructures have been reported for fabricating the self-cleaning surface but in general, they have the problem of low durability. More than two nanostructures on a surface can be integrated together to increase hydrophobicity and durability of the surface as in the lotus leaf [3,5]. As one of the bio-inspired nanostructures, we introduce a hierarchical nanostructure fabricated with a high vacuum cluster system. A hierarchical nanostructure is a combination of moth-eye structure with an average pitch of 300 nm and height of 700 nm, and the wax crystalline structure with an average width and height of 200 nm. The moth-eye structure is fabricated with deep reactive ion etching (DRIE) process. $SiO_2$ layer is initially deposited on a glass substrate using PECVD in the cluster system. Then, Au seed layer is deposited for a few second using DC sputtering process to provide stochastic mask for etching the underlying $SiO_2$ layer with ICP-RIE so that moth-eye structure can be fabricated. Additionally, n-hexatriacontane paraffin wax ($C_{36}H_{74}$) is deposited on the moth-eye structure in a thermal evaporator and self-recrystallized at $40^{\circ}C$ for 4h [4]. All of steps are conducted utilizing vacuum cluster system to minimize the contamination. The water contact angles are measured by tensiometer. The morphology of the surface is characterized using SEM and AFM and the reflectance is measured by spectrophotometer.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.472-472
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• 2011

The capacitive coupled plasma (CCP) has been extensively used in the semiconductor industry because it has not only good uniformity, but also low electron temperature. But CCP source has some problems, such as difficulty in varying the ion bombardment energy separately, low plasma density, and high processing pressure, etc. In this reason, dual frequency CCP has been investigated with a separate substrate biasing to control the plasma parameters and to obtain high etch rate with high etch selectivity. Especially, in this study, we studied on the etching of $SiO_2$ by using the pulse-time modulation in the dual-frequency CCP source composed of 60 MHz/ 2 MHz rf power. By using the combination of high /low rf powers, the differences in the gas dissociation, plasma density, and etch characteristics were investigated. Also, as the size of the semiconductor device is decreased to nano-scale, the etching of contact hole which has nano-scale higher aspect ratio is required. For the nano-scale contact hole etching by using continuous plasma, several etch problems such as bowing, sidewall taper, twist, mask faceting, erosion, distortions etc. occurs. To resolve these problems, etching in low process pressure, more sidewall passivation by using fluorocarbon-based plasma with high carbon ratio, low temperature processing, charge effect breaking, power modulation are needed. Therefore, in this study, to resolve these problems, we used the pulse-time modulated dual-frequency CCP system. Pulse plasma is generated by periodical turning the RF power On and Off state. We measured the etch rate, etch selectivity and etch profile by using a step profilometer and SEM. Also the X-ray photoelectron spectroscopic analysis on the surfaces etched by different duty ratio conditions correlate with the results above.

• 한국추진공학회지
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• 제3권1호
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• pp.95-103
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• 1999

혼합형 고체추진제의 저압하에서의 연소특성을 연소속도측정, 점화 및 정상 연소현상 관찰, 그리고, 소화표면의 구조 관찰의 측면에서 연구하였다. 이를 위하여 OVSB 장치를 제작하였으며, 저압 연소속도 측정기법을 정립하여 혼합형 고체추진제의 저압 연소속도를 측정하였고, OVSB의 연소실에 장착된 창을 통하여 추진제의 점화 및 연소현상을 비디오 카메라를 사용하여 초당 30 장의 속도로 촬영하여 분석하였다. 또한, 급속감압법을 이용하여 얻은 추진제의 소화표면의 구조를 주사전자현미경으로 분석하였다. 시험 대상 추진제들은 대기압 이하(2.0∼15psia)의 저압하에서 압력 지수가 0.6∼0.88로 높은 압력의존성을 보였으며, 추진제에 포함된 금속입자(Al) 함량이 연소속도와 압력 지수에 크게 영향을 주는 것으로 나타났다. 금속함량이 클수록 연소속도가 빨랐으며, 압력 지수는 작았다. 시험대상 추진제들은 2.0psia 부근에서 자체 소화되는 특성을 보였다. 그리고, 연소표면에서의 AP 입자의 분해속도가 바인더의 분해속도 보다 느렸으며, 낮은 압력으로 인해 바인더가 쉽게 기체상태로 승화하는 것으로 판단되었다. Al이 다량 함유된(17.5%) 추진제가 점화성이 우수하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.124-124
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• 2011

This study investigated the interaction of varied plasma power with ultralow-k toluene-tetraethoxysilane (TEOS) hybrid plasma polymer thin films, as well as changing electrical and mechanical properties. The hybrid thin films were deposited on silicon(100) substrates by plasma enhanced chemical vapor deposition (PECVD) system. Toluene and tetraethoxysilane were utilized as organic and inorganic precursors. In order to compare the electrical and the mechanical properties, we grew the hybrid thin films under various conditions such as rf power of plasma, bubbling ratio of TEOS to toluene, and post annealing temperature. The hybrid plasma polymer thin films were characterized by Fourier transform infrared (FT-IR) spectroscopy, atomic force microscopy (AFM), nanoindenter, I-V curves, and capacitance. Also, the hybrid thin films were analyzed by using ellipsometry. The refractive indices varied with the RF power, the bubbling ratio of TEOS to toluene, and the annealing temperature. To analyze their trends of electrical and mechanical properties, the thin films were grown under conditions of various rf powers. The IR spectra showed them to have completely different chemical functionalities from the liquid toluene and TEOS precursors. Also, The SiO peak intensity increased with increasing TEOS bubbling ratio, and the -OH and the CO peak intensities decreased with increasing annealing temperature. The AFM images showed changing of surface roughness that depended on different deposition rf powers. An nanoindenter was used to measure the hardness and Young' modulus and showed that both these values increased as the deposition RF power increased; these values also changed with the bubbling ratio of TEOS to toluene and with the annealing temperature. From the field emission scanning electron microscopy (FE-SEM) results, the thickness of the thin films was determined before and after the annealing, with the thickness shrinkage (%) being measured by using SEM cross-sectional images.

• Composites Research
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• 제33권4호
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• pp.205-212
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• 2020

본 연구에서는 기상화학반응공정을 이용하여 실리콘카바이드가 코팅된 2종형상의 탄소/탄소복합재 위에 진공플라즈마용사를이용하여 하프늄카바이드를 코팅하였다. 코팅 전/후 시편을 5.06 MW/㎡의 열유속에서 120초 동안 산화 및 삭마 실험을 진행하였다. 시험 전/후의 질량 변화량을 통해 질량삭마율을 계산하였고 캘리퍼스와 고속카메라를 이용하여 길이변화를 측정하여 길이삭마량을 계산하였다. 시편 단면의 FE-SEM 및 EDS 분석을 통해 산화 및 삭마거동을 관찰하였다. 플라즈마 풍동 시험결과 코팅된 시편이 무게감소 및 길이변화가 적어 내산화 및 내삭마성이 높은 것으로 판단되었다. 그러나 동일조건에서 시험한 반구형과 원통형의 산화 및 삭마정도는 상이하였고 원통형에서 더 높은 내산화 및 내삭마성을 가지는 것으로 평가되었다.