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Via Formation in Dielectric Layers Made of Photosensitive BCB (감광성 BCB를 이용한 절연막층에서의 비아형성)

  • 주철원;임성훈;한병성
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.5
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    • pp.351-355
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    • 2001
  • Via for achieving reliable fabrication of MCM(Multichip Module) substrate was formed on photosensitive BCB layer. The MCM substrate consists of photosensitive BCB(Benzocyclobutene) interlayer dielectric and copper conductors. In order to form the vias in the photosensitive BCB layer, the process of forming the BCB layer and its via forming plasma etch using C$_2$F$\_$6//O$_2$ gas were evaluated. The thickness of the BCB layer after hard bake was shrunk down to 40% of the original. The resolution of vias formed on the BCB was 15㎛ and the slope after develop was 85 degree. AES analysis was done on two vias, one is etched in C$_2$F$\_$6/O$_2$ gas and the other isnot etched. On the via etched in C$_2$F$\_$6//O$_2$, native C was detected and the amount of native C was reduced after Ar sputter. On the via not etched in C$_2$F$\_$6//O$_2$, organic C was detected. As a result of AES, BCB residue was not removed by Ar sputter, so plasma etch is necessary for achieving reliable vias.

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Dissociative adsorption and self-assembly of $CaF_2$ on the Si(001)-$4^{\circ}$ off surface

  • Kim, Hui-Dong;Dugerjav, Otgonbayar;Arvishataar, Amarmunkh;Motlak, Moaaed;Seo, Jae-Myeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.132-132
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    • 2012
  • Depositing $CaF_2$[0.6% lattice-mismatch] on the Si(001)-$4^{\circ}$ off surface [composed of a single (001) domain with regularly-arrayed double-layer DB steps and located between (1 1 19) and (1 1 21)] held at $700^{\circ}C$, $CaF_2$ molecules are preferentially adsorbed on the dimers and dissociated to Ca and F atoms. Dissociated Ca atoms form a silicide layer of a $2{\times}3$ structure on the (001) terrace, while F atoms are desorbed from the surface. Once the terrace is covered with a calcium silicide layer, CaF starts to be adsorbed selectively on the steps, as shown in Fig. (a). With $CaF_2$ deposition exceeding 1 ML, the (1 1 17) surface having 1-D $CaF_2$ nanodots are formed as shown in Fig. (b). By the present STM study, it has been clearly disclosed that the calcium silicide interfacial layer is preformed prior to adsorption of $CaF_2$ on vicinal Si(001) surface.

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Improved Energy Conversion Efficiency of Dye-sensitized Solar Cells Fabricated using Open-ended TiO2 Nanotube Arrays with Scattering Layer

  • Rho, Won-Yeop;Chun, Myeoung-Hwan;Kim, Ho-Sub;Hahn, Yoon-Bong;Suh, Jung Sang;Jun, Bong-Hyun
    • Bulletin of the Korean Chemical Society
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    • v.35 no.4
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    • pp.1165-1168
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    • 2014
  • We prepared dye-sensitized solar cells (DSSCs) with enhanced energy conversion efficiency using open-ended $TiO_2$ nanotube arrays with a $TiO_2$ scattering layer. As compared to closed-ended $TiO_2$ nanotube arrays, the energy conversion efficiency of the open-ended $TiO_2$ nanotube arrays was increased from 5.63% to 5.92%, which is an enhancement of 5.15%. With the $TiO_2$ scattering layer, the energy conversion efficiency was increased from 5.92% to 6.53%, which is an enhancement of 10.30%. After treating the open-ended $TiO_2$ nanotube arrays with $TiCl_4$, the energy conversion efficiency was increased from 6.53% to 6.89%, a 5.51% enhancement, which is attributed to improved light harvesting and increased dye adsorption.

Fabrication of YBCO superconducting film with $CeO_{2}/BaTiO_{3}$double buffer layer ($CeO_{2}/BaTiO_{3}$ 이중완충막을 이용한 YBCO 박막 제작)

  • 김성민;이상렬
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.790-793
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    • 2000
  • We have fabricated good quality superconducting YBa$_2$Cu$_3$$O_{7-x}$(YBCO) thin films on Hastelloy(Ni-Cr-Mo alloys) metallic substrates with CeO$_2$and BaTiO$_3$buffer layers in-situ by pulsed laser deposition in a multi-target processing chamber. YBCO film with CeO$_2$ single buffer layer shows T$_{c}$ of 71.64 K and the grain size less than 0.1 ${\mu}{\textrm}{m}$. When BaTiO$_3$is used as a single buffer layer, the grain size of YBCO is observed to be larger than that of YBCO/CeO$_2$by 200 times and the transition temperature of the film is enhanced to be about 84 K. CeO$_2$/BaTiO$_3$double buffer layer has been adopted to enhance the superconducting properties, which results in the enhancement of the critical temperature and the critical current density to be about 85 K and 8.4 $\times$ 10$^4$ A/cm$^2$ at 77 K, respectively mainly due to the enlargement of the grain size of YBCO film.ilm.

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The Effects of the Amount of $\textrm{SiO}_2$ Dopant on the Melt Oxidation Behavior of the Al-Alloy (Al-합금의 용융산화거동에 미치는 $\textrm{SiO}_2$도판트 량의 영향)

  • Gang, Jeong-Yun;Kim, Il-Su
    • Korean Journal of Materials Research
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    • v.9 no.6
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    • pp.609-614
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    • 1999
  • The effect of the amount of $SiO_2$dopant on the behavior of $AlO_2$$O_3$-composite formation by melt oxdation of Al-alloy was examined in this paper. The $SiO_2$powder was spread on the top surface of the Al-1Mg-3-Si-5Zn-1Cu alloy in th alumina crucible. The selected amount of each powder was 0.03, 0.10, 0.16g/$\textrm{cm}^2$. The oxidation behavior was determined by observing the weight gain after the heat treatment for 10 hours at 1373K. The macroscopic structure of formed oxide layer was examined by an optical microscope. The top surface and the cross-section of the grown oxide layer were investigated by SEM and analysed by EDX. The $SiO_2$ powder was determined to enhance oxidation by thermit reaction with Al which reduced the growth incubation period of the oxidation layer. As the amount of the $SiO_2$dopant increased, the growth rate decreased due to the precipitated Si which blocked the Al-alloy channel in the composite materials. However, more uniform layer was obtained due to the occurrance of the enhanced oxidation reaction in the whole alloy surface compared to the case of addition of less amount of dopant.

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Development of Selective GaN etching Process for p-GaN/AlGaN/GaN E-mode FET Fabrication (p-GaN/AlGaN/GaN E-mode FET 제작을 위한 선택적 GaN 식각 공정 개발)

  • Jang, Won-Ho;Cha, Ho-Young
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.24 no.2
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    • pp.321-324
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    • 2020
  • In this work, we developed a selective etching process for GaN that is a key process in p-GaN/AlGaN/GaN enhancement-mode (E-mode) power switching field-effect transistor (FET) fabrication. In order to achieve a high current density of p-GaN/AlGaN/GaN E-mode FET, the p-GaN layer beside the gate region must be selectively etched whereas the underneath AlGaN layer should be maintained. A selective etching process was implemented by oxidizing the surface of the AlGaN layer and the GaN layer by adding O2 gas to Cl2/N2 gas which is generally used for GaN etching. A selective etching process was optimized using Cl2/N2/O2 gas mixture and a high selectivity of 53:1 (= GaN/AlGaN) was achieved.

지연에 민감한 대화형 서비스를 위한 동영상 전송율 평활화 연구

  • 장승기;서덕영
    • Proceedings of the Korean Society of Broadcast Engineers Conference
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    • 1996.06a
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    • pp.147-151
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    • 1996
  • This paper describes two traffic shaping methods for VBR(variable bit rate) video bit streams encoded in the MPEG-2 syntax. Difficulties in control of VBR video traffic are lessened by traffic shaping. Burstness of single layer MPEG-2 video can be reduced by performing intra-refresh in more than one consecutive frames. In two layer encoding of spatial scalability, burstness can be reduced by setting the temporal locations of GOP starting frame of a layer, differently from the other. Queueing analysis shows that these two methods outperform conventional encoding schemes in terms of temporal and semantic QoS requirements.

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Growth and Characteristics of TiN Thin Films by Atomic Layer Epitaxy (Atomic Layer Epitaxy 법에 의한 TiN 박막의 성장과 그 특성)

  • 이종화;김동진
    • Proceedings of the IEEK Conference
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    • 1998.10a
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    • pp.581-584
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    • 1998
  • TiN thin films were grown on (100) Si substrate by atomic layer epitaxy at 130 - $240^{\circ}C$ using TEMAT and NH3 as precursors. Reactants were injected into the reactor in sequence of TEMAT precursor vapor pulse, N2 purging gas pulse, NH3 gas pulse and N2 purging gas pulse so that gas-phase reactions could be removed. The films were characterized by means of x-ray diffraction(XRD), 4-point probe, atomic force microscopy(AFM) and auger electron spectroscopy(AES).

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Development of DVS167 OOB Processor in POD Module for OpenCable (OpenCable 용 POD 모듈의 DVS167 OOB Processor 개발)

  • 박부식;위정욱;임기택
    • Proceedings of the IEEK Conference
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    • 2003.07b
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    • pp.843-846
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    • 2003
  • In this paper, we have analyzed algorithm of physical layer, data link layer and MAC layer of Out-Of-Band (OOB) specified in the OpenCabl $e^{TM}$SCTE-55-2 2002$^{[3]}$ and designed architecture of the OOB processor. The OOB processor performs fundamental multiple access control for the OOB channel and extracts session key information from a EMM packet for descrambling MPEG-2 streams. In this paper, we have implemented a prototype board for the DVS167 OOB processor and verified it.t.

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Bulk Heterojunction Organic Photovoltaics- Nano Morphology Control and Interfacial Layers

  • Kim, Gyeong-Gon
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.59.2-59.2
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    • 2012
  • Polymer solar cells utilize bulk heterojunction (BHJ) type photo-active layer in which the electron donating polymer and electron accepting $C_{60}$ derivatives are blended. We found there is significant charge recombination at the interface between the BHJ active layer and electrode. The charge recombination at the interface was effectively reduced by inserting wide band gap inorganic interfacial layer, which resulted in efficiency and stability enhancement of BHJ polymer solar cell.

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