• Journal of the Korean institute of surface engineering
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• v.32 no.3
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• pp.257-264
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• 1999

Thin reflective films are synthesized by using PVD methods with a bright metal of Al or Ag. For purposes of improving the reflectance and adhesion of such films particularly, substrate bias was applied during sputtering (namely, ion-plating) to enhance the deposition process with higher energy. And we succeeded in fabricating a quality silver film which possesses an adhesion of $85{\;}Kg/\textrm{cm}^2$ and a high reflectivity of more than 96%. Both of reflectivity and adhesion are better in case of bias sputtering as controlled than nonbias sputtering, particularly the bias of 50-100 V showed most effective. The microstructures of sample films were examined by using various equipments and the XRD spectrum in particular showed that <111> direction is the preferred growth orientation.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.04a
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• pp.136-138
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• 2007

최근 기계가공기술의 발달에 따라 내마모용 TiN 박막의 수요가 증가하였고, TiN박막은 내마모용으로 높은 경도 및 밀착력을 필요로 한다. TiN박막을 증착시키는 방법은 PVD, CVD 등 여러 가지가 있으나 본 연구에서 공구강 SKD 61기판 표면과 Radical Nitriding(RN) 처리된 SKD 61 기판에 arc ion plating(AIP)를 이용하여 TiN 박막을 증착시켜 표면경도를 향상시키고, 이 코팅층의 미세구조가 기계적 특성에 미치는 영향을 연구하였다. 그 결과 RN처리된 SKD61에서 코팅 두께가 많이 나왔고, 스크래치테스트 결과 접착력이 향상되었음을 알 수 있었다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2018.06a
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• pp.33.1-33.1
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• 2018

pH is expressed mathematically as $pH=-{\log}[H^+]$, is a measure of the hydrogen ion concentration, [$H^+$] to specify the acidity or basicity of an aqueous solution. The pH scale usually ranges from 0 to 14. Every aqueous solution can be measured to determine its pH value. The pH values below 7.0 express the acidity, above 7.0 are alkalinity and pH 7.0 is a neutral solution. The solution pH can be determined by indicator or by measurement using pH sensor, which measuring the voltage generated between a glass electrode and a reference electrode according to the Nernst Equation. The pH value of solutions depends on the temperature and the activity of contained ions. In nickel electroless plating process, the controlled pH value in some limited ranges are extremely important to achieve optimal deposition rate, phosphorus content as well as solution stability. Basically, nickel electroless plating solution contains of $Ni^{2+}ions$, reducing agent, buffer and complexing agents. The plating processes are normally carried out at $82-92^{\circ}C$. However, the change of its pH values with temperatures does not follow any rule. Thus, the purpose of study is to understand the relationship between pH and temperature of some based solutions and electroless nickel plating solutions. The change of pH with changing temperatures is explained by view of the thermal dynamic and the practical measurements.

• Journal of the Korean Professional Engineers Association
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• v.16 no.3
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• pp.68-73
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• 1983

The metal deposition behavior in the barrel tin plating has been studied for the electronic DIP products, and tried to find out some modified factors in order to explain partial ,current flow behavior of this load. The deposition distribution characteristics for DTP products should be classified with the normal barrel plating as partially conductive load. Deposit distribution curves obtained from one-dimensional model have shown strong dependence n the applied current density, rotating speed of barrel and metal ion concentration of the solution. Theoretical formula J=$\delta$'/${\beta}$-{-c$^3$/${\gamma}$-exp-(1-${\alpha}$)n${\Phi}$} derived from one-dimensional porous model has been proposed for the barrel plating behavior where higher overpotential and concentration changes take place during barrel plating.

• Journal of Korean Society of Occupational and Environmental Hygiene
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• v.34 no.1
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• pp.98-105
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• 2024

Objectives: The purpose of this study was to identify the exposure level of airborne hexavalent chromium in the plating industry and the exposure level compared to domestic and international occupational exposure limits. Methods: A total 92 samples were collected from ten industrial plating sites. Hexavalent chromium samples were collected using a three-stage cassette equipped with a 37 mm, 5 ㎛ pore size PVC filter. The analysis was performed by ion chromatography. Results: The geometric mean of hexavalent chromium concentration in the plating industry was 0.052 ㎍/m², and it was found that the average exposure level was 0.8 times the South Korean exposure limit. When applying the US ACGIH TLV, however, the average concentration was more than twice as high. Conclusions: The South Korean exposure limit for hexavalent chromium needs to be strengthened due to significant differences in exposure levels according to domestic and international occupational exposure limits. Furthermore, respiratory and dermal sensitization should be labeled.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2000.05a
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• pp.38-38
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• 2000

• Proceedings of the Materials Research Society of Korea Conference
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• 2005.05a
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• pp.284-284
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• 2005

• Proceedings of the Materials Research Society of Korea Conference
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• 1996.11a
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• pp.75-75
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• 1996

• Proceedings of the Korean Vacuum Society Conference
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• 2008.02a
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• pp.332-332
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• 2008

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.301-301
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• 2014