• Title/Summary/Keyword: impurity control

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The Metal Detection using Primary Current in Contact-less Power Supply (무접점 전원공급 시 1차측 전류를 이용한 금속 물질 검출에 관한 연구)

  • Kim, Yu-Seok;Yu, Joo-Hee;Kim, Choon-Sam;Sung, Won-Ki
    • The Transactions of the Korean Institute of Power Electronics
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    • v.17 no.5
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    • pp.445-452
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    • 2012
  • The impurity detection method applied to existing discriminated the normality(R, L, C) and impurity(Metal) load using mutual RFID/ID method in the contactless power supply in which the primary side and the secondary side are completely separation by using the contactless transformer. However, this kind of system is caused the high cost of the system and complexity of control. Therefore, in this paper was proposed the contact-less power transfer using the primary current that determine normality or impurity load by compare the primary current Amplitude to reference quantity value and design the 3[W] contact-less power transfer and conduct an experiment for demonstrate the validity.

Preparation and Impurity Control of the BaTiO3 Coatings by Micro Arc Oxidation Method

  • Ok, Myeong-Ryul;Kim, Ji Hye;Oh, Young-Joo;Hong, Kyung Tae
    • Corrosion Science and Technology
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    • v.5 no.4
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    • pp.149-152
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    • 2006
  • $BaTiO_3$ coatings were prepared by micro arc oxidation (MAO) method. Only $Ba(OH)_2$ was dissolved in the electrolyte and process time was less than 30 min. Commercial purity $Ba(OH)_2$ (97%) containing $BaCO_3$ as impurity was used in preparing the electrolyte. XRD showed that the coating was composed of largely $BaTiO_3$, and in some process conditions, small quantity of impurity, $BaCO_3$, was characterized in the coating layer. The quantity of $BaCO_3$ could be controlled to negligible quantity by regulating the applied voltage and duration time of the MAO process.

A Study on the Contamination of D.I. Water and its Effect on Semiconductor Device Manufacturing (초순수의 오염과 반도체 제조에 미치는 영향에 대한 연구)

  • Kim, Heung-Sik;Yoo, Hyung-Won;Youn Chul;Kim, Tae-Gak;Choi, Min-Sung
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.30A no.11
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    • pp.99-104
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    • 1993
  • We analyzed the D.I. water used in wet cleaning process of semiconductor device manufacturing both at the D.I. water plant and at the wafer cleaning bath to detect the impurity source of D.I. water contamination. This shows that the quantity of impurity is related to the resistivity of D.I. water, and we found that the cleanliness of the wafer surface processed in D.I. water bath was affected by the degree of the ionic impurity contamination. So we evaluated the cleaning effect as different method for Fe ion, having the best adsoptivity on wafer surface. Moreover the temperature effect of the D.I. water is investigated in case of anion in order to remove the chemical residue after wet process. In addition to the control of D.I. water resistivity, chemical analysis of impurity control in D.I. water should be included and a suitable cleaning an drinsing method needs to be investigated for a high yielding semiconductor device.

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Optical dielectric function of impurity doped Quantum dots in presence of noise

  • Ghosh, Anuja;Bera, Aindrila;Ghosh, Manas
    • Advances in nano research
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    • v.5 no.1
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    • pp.13-25
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    • 2017
  • We examine the total optical dielectric function (TODF) of impurity doped GaAs quantum dot (QD) from the viewpoint of anisotropy, position-dependent effective mass (PDEM) and position dependent dielectric screening function (PDDSF), both in presence and absence of noise. The dopant impurity potential is Gaussian in nature and noise employed is Gaussian white noise that has been applied to the doped system via two different modes; additive and multiplicative. A change from fixed effective mass and fixed dielectric constant to those which depend on the dopant coordinate manifestly affects TODF. Presence of noise and also its mode of application bring about more rich subtlety in the observed TODF profiles. The findings indicate promising scope of harnessing the TODF of doped QD systems through expedient control of site of dopant incorporation and application of noise in desired mode.

Study on the Surface Morphology and Control of Impurity by Organic Additive for Tin electro-refining (주석 전해정련에서 유기첨가제에 따른 표면형상 및 전해불순물 제어에 관한 연구)

  • Park, Sung Cheol;Son, Seong Ho;Kim, Yong Hwan;Han, Chul Woong;Lee, Ki-Woong
    • Resources Recycling
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    • v.25 no.4
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    • pp.49-53
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    • 2016
  • The electro-refining process was performed to purify the casted tin crude metal from waste tin in methanesulfonic acid. The surface morphologies of electrodeposited tin on cathode were observed, the dendrite and delamination were inhibited by glycol group of organic additive. The impurity concentrations of tin crude metal and deposited metal were analyzed using ICP-OES. Quantitative analysis on casted tin crude metal showed that it consists of tin with 97.280 wt.% and several impurity metals of Ag, Cu, Pb, Ni, and etc. After tin electro-refining, the purity of tin increased up to 99.956 wt.%. Reduction current by cyclic voltammetry seems to be closely related to behavior of impurity in tin electro-refining.

A Patent Analysis on Impurity Removal and Catalysts for Crude Oil Purification (원유 불순물 제거 및 정제 관련 촉매 기술에 대한 특허 분석)

  • Jo, Hee-Jin;Moun, Seong-Guen;Jo, Young-Min;Chung, Yon-Soo
    • Clean Technology
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    • v.16 no.1
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    • pp.1-11
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    • 2010
  • As crude oil with heavier and/or highly oxidized components prevails, purification technologies such as desulfurization, denitrilization and demetalization have become important issues to control contents of sulfur and other impurities affecting the quality of petroleum. Also, the importance of catalyst technologies related with crude oil purification has been emphasized to control the production and yield of products. In this paper, technology trends of impurity removal such as sulfur, nitrogen and metal components from crude oil and catalysts related with purification of crude oil were studied through patent analysis. The patents published or registered in Korea, U. S. A., Japan, and Europe from mid 1970's to 2009 had been analyzed based on the application tendency, the distribution of major applicants, and their active indices, etc. The technology flow was figured out to see the technology trends.

Purification and Characterization of Paclitaxel from Plant Cell Cultures of Taxus chinensis in Large-Scale Process (식물세포 Taxus chinensis 배양으로부터의 Paclitaxel 대량 정제 및 특성)

  • 김진현;기은숙;민범찬;최형균;홍승서;이현수
    • KSBB Journal
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    • v.15 no.5
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    • pp.537-540
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    • 2000
  • In developing a HPLC purification process, it was hoped that a single chromatographic system would be sufficient to abtain pure paclitaxel in high yield. However, no such system was found, due in part to the complex taxoid profile of crude paclitaxel and to the rigorous nature of the product specification. A two step HPLC purification was adopted using reverse-phase separation on C(sub)18 as a first step, and normal-phase separation on silica as the final polishing step. Impurity profiles were established and maintained for paclitaxel, which identified and quantified each impurity observed in purified paclitaxel from these two steps, all impurities at or above 0.1% were identified. Results provide information for improving the quality control of paclitaxel production.

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Development of a Monitoring and Control System in Gas Purification Process (가스 정제공정의 감시 제어시스템 연구)

  • 조택선;양종화
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1996.11a
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    • pp.313-317
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    • 1996
  • This work deals with description of gas purifing system to product high pure helium gas using low temperature absorption. The system controls temperature of heaters, open/close of solenoid valves and levels of liquid nitrogen to purify a raw gas and continuously products purified gas with perfoming alternatively purification and regeneration. We develop the monitoring and control program to monitor the gas purification process on real-time and control the process time with checking the impurities in purified gas. From the result of system operation, the developed monitoring and control system continuously products high pure helium gas with reducing impurities in raw gas to permitted limits(less than 0.01 ~ 0.05 ppm)

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Characterization and Microstructure of an Extruded Flat-Tubular-Type Alumina Filter (압출공정에 의한 수 처리용 평관형알루미나 필터의 미세구조와 특성평가)

  • Bae, Byung-Seo;Ha, Jang-Hoon;Song, In-Hyuck
    • Journal of the Korean Ceramic Society
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    • v.51 no.5
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    • pp.406-412
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    • 2014
  • In this study, flat-tubular-type alumina filters were manufactured using alumina powder of two sizes ($2.4{\mu}m$ ALM-44 and $0.4{\mu}m$ AP 400) by an extrusion process. The manufactured alumina filter was sintered at $1200-1600^{\circ}C$ for 1 h. As particle size increased, the largest pore size, average pore size and porosity increased; but density and linear shrinkage decreased. The alumina filter fabricated using ALM-44 powder sintered at $1500^{\circ}C$ was confirmed as the best water treatment filter after investigation of the bending strength, water permeability and impurity-removal efficiency of the experimental filters. This flat-tubular-type alumina filter is expected to be useful not only for direct water treatment, but also for use as a support filter during coating processes, to control pore size.