• 전력전자학회논문지
• /
• 제17권5호
• /
• pp.445-452
• /
• 2012

The impurity detection method applied to existing discriminated the normality(R, L, C) and impurity(Metal) load using mutual RFID/ID method in the contactless power supply in which the primary side and the secondary side are completely separation by using the contactless transformer. However, this kind of system is caused the high cost of the system and complexity of control. Therefore, in this paper was proposed the contact-less power transfer using the primary current that determine normality or impurity load by compare the primary current Amplitude to reference quantity value and design the 3[W] contact-less power transfer and conduct an experiment for demonstrate the validity.

• Corrosion Science and Technology
• /
• 제5권4호
• /
• pp.149-152
• /
• 2006

$BaTiO_3$ coatings were prepared by micro arc oxidation (MAO) method. Only $Ba(OH)_2$ was dissolved in the electrolyte and process time was less than 30 min. Commercial purity $Ba(OH)_2$ (97%) containing $BaCO_3$ as impurity was used in preparing the electrolyte. XRD showed that the coating was composed of largely $BaTiO_3$, and in some process conditions, small quantity of impurity, $BaCO_3$, was characterized in the coating layer. The quantity of $BaCO_3$ could be controlled to negligible quantity by regulating the applied voltage and duration time of the MAO process.

• 전자공학회논문지A
• /
• 제30A권11호
• /
• pp.99-104
• /
• 1993

We analyzed the D.I. water used in wet cleaning process of semiconductor device manufacturing both at the D.I. water plant and at the wafer cleaning bath to detect the impurity source of D.I. water contamination. This shows that the quantity of impurity is related to the resistivity of D.I. water, and we found that the cleanliness of the wafer surface processed in D.I. water bath was affected by the degree of the ionic impurity contamination. So we evaluated the cleaning effect as different method for Fe ion, having the best adsoptivity on wafer surface. Moreover the temperature effect of the D.I. water is investigated in case of anion in order to remove the chemical residue after wet process. In addition to the control of D.I. water resistivity, chemical analysis of impurity control in D.I. water should be included and a suitable cleaning an drinsing method needs to be investigated for a high yielding semiconductor device.

• Advances in nano research
• /
• 제5권1호
• /
• pp.13-25
• /
• 2017

We examine the total optical dielectric function (TODF) of impurity doped GaAs quantum dot (QD) from the viewpoint of anisotropy, position-dependent effective mass (PDEM) and position dependent dielectric screening function (PDDSF), both in presence and absence of noise. The dopant impurity potential is Gaussian in nature and noise employed is Gaussian white noise that has been applied to the doped system via two different modes; additive and multiplicative. A change from fixed effective mass and fixed dielectric constant to those which depend on the dopant coordinate manifestly affects TODF. Presence of noise and also its mode of application bring about more rich subtlety in the observed TODF profiles. The findings indicate promising scope of harnessing the TODF of doped QD systems through expedient control of site of dopant incorporation and application of noise in desired mode.

• 대한약학회:학술대회논문집
• /
• 대한약학회 2004년도 Proceedings of the Convention of the Pharmaceutical Society of Korea Vol.2
• /
• pp.115-116
• /
• 2004

• 자원리싸이클링
• /
• 제25권4호
• /
• pp.49-53
• /
• 2016

주석 폐자원으로부터 회수된 주석 조금속을 메탄술폰산 전해액에서 전해정련을 수행하여 고순도 주석을 회수하고자 하였다. 전해정련층 표면형상을 관찰한 결과 주석 전해정련 시 glycol계 유기첨가제를 통해 균일하게 주석이 전착되었고, 수지상 형상 및 박리현상은 발생하지 않았다. 주석 조금속 및 전해정련층의 순도를 ICP-OES로 분석한 결과 주석 조금속은 은, 구리, 납, 니켈 등의 불순물이 함유되어 97.280 wt.%의 주석순도를 나타내었고, 전해정련을 수행 후 순도 분석결과 주석의 순도는 99.956 wt.%으로 증가하였다. 순환 전압전류 시험결과 유기첨가제는 주석 전해정련 시 불순물의 환원반응을 억제 또는 가속시키는 역할을 하는 것으로 판단된다.

• 청정기술
• /
• 제16권1호
• /
• pp.1-11
• /
• 2010

우리가 사용하는 원유는 점점 중질화 되고 산도가 높아지고 있다. 석유의 품질에 영향을 미치는 유황의 함량을 조절하고, 오염금속을 제거하기 위하여 탈황, 탈질, 탈금속 등 불순물 제거기술의 중요성이 커지고 있으며 제품의 생산량과 수율을 조절하기 위한 정제 관련 촉매기술의 중요성 역시 증대하고 있다. 본 논문에서는 원유에서 황, 질소, 금속성분 등을 제거하는 기술과 원유의 정제와 관련된 촉매 기술에 대하여 한국, 미국, 일본, 유럽 등을 중심으로 1970년대 중반부터 2009년까지의 특허를 조사하고, 각국의 출원현황, 점유율, 주요출원인, 특허활동지수 등을 분석하였다. 또한, 주요 기술 분야에 대한 기술흐름도를 작성하여 기술 동향을 살펴보았다.

• KSBB Journal
• /
• 제15권5호
• /
• pp.537-540
• /
• 2000

일반적으로 paclitaxel과 유사한 구조를 가진 복잡한 유도체의 분리나 최종 제품에서의 엄격한 규정 등으로 인하여 한 단계의 HPLC system으로 정 제하는 것은 상당히 어렵다. 이러한 이유로 두 단계 HPLC system으로 식물세포 배양액으로 부터 paclitaxel의 대량 정제를 수행하였다. 즉, 첫번째 단계에 서 reverse-phase HPLC column, 두번째 단계에서 normal­p phase HPLC column을 사용하여 최종 제품을 얻었다. 또한 최종 정 제 된 paclitaxel 내 에 포함되어 있는 불순물 profile 확 언, 함량 분석, 그리고 이들 물질들에 대한 분리, 정제 및 동 정을 실시하였다 이들 불순물들 중에서 0.1% 이상되는 것은 모두 6종 (side chain derivative, baccatin III, 10-deacetyltaxol, cephalomannine, taxane derivative, 7-epitaxol)이며 NMR과 MS를 사용하여 화학구조를 분석한 결과 이미 알려진 pacli­t taxel 유도체 또는 전구체와 동일한 물칠로 밝혀 졌다. 본 연구 결과는 결국 paclitaxel 생산을 위한 품질관리 (quality con­t tr이)와 허가를 위한 자료로 유용하게 사용되어 진다.

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 1996년도 추계학술대회 논문집
• /
• pp.313-317
• /
• 1996

This work deals with description of gas purifing system to product high pure helium gas using low temperature absorption. The system controls temperature of heaters, open/close of solenoid valves and levels of liquid nitrogen to purify a raw gas and continuously products purified gas with perfoming alternatively purification and regeneration. We develop the monitoring and control program to monitor the gas purification process on real-time and control the process time with checking the impurities in purified gas. From the result of system operation, the developed monitoring and control system continuously products high pure helium gas with reducing impurities in raw gas to permitted limits(less than 0.01 ~ 0.05 ppm)

• 한국세라믹학회지
• /
• 제51권5호
• /
• pp.406-412
• /
• 2014

In this study, flat-tubular-type alumina filters were manufactured using alumina powder of two sizes ($2.4{\mu}m$ ALM-44 and $0.4{\mu}m$ AP 400) by an extrusion process. The manufactured alumina filter was sintered at $1200-1600^{\circ}C$ for 1 h. As particle size increased, the largest pore size, average pore size and porosity increased; but density and linear shrinkage decreased. The alumina filter fabricated using ALM-44 powder sintered at $1500^{\circ}C$ was confirmed as the best water treatment filter after investigation of the bending strength, water permeability and impurity-removal efficiency of the experimental filters. This flat-tubular-type alumina filter is expected to be useful not only for direct water treatment, but also for use as a support filter during coating processes, to control pore size.