• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 2017.05a
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• pp.820-823
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• 2017

This study experimentally investigate how the Reynolds number affect cavitation performance in a turbopump inducer using water. Cavitation performance has been determined by the static pressure measured at the inlet of the inducer. Reynolds number has been varied by varying water temperature and inducer rotational speed to maintain constant non-dimensional thermal parameter. At low non-dimensional thermal parameter, the critical cavitation number is insensitive to Reynolds number. However, at high non-dimensional thermal parameter, the critical cavitation number increased as Reynolds number increases. Thus, cavitation performance is deteriorated as Reynolds number increases when thermal effect exists.

• Transactions on Electrical and Electronic Materials
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• v.3 no.1
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• pp.4-8
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• 2002

The typical mold method for FED (field emission display) fabrication is used to form a gate electrode, a gate oxide layer, and emitter tip after fabrication of a mold shape using wet-etching of Si substrate. However, in this study, new mold method using a side wall space structure was developed to make sharp emitter tips with the gate electrode. In new method, gate oxide layer and gate electrode layer were deposited on a Si wafer by LPCVD (low pressure chemical vapor deposition), and then BPSG (Boro phosphor silicate glass) thin film was deposited. After then, the BPSG thin film was flowed into the mold at high temperature in order to form a sharp mold structure. TiN was deposited as an emitter tip on it. The unfinished device was bonded to a glass substrate by anodic bonding techniques. The Si wafer was etched from backside by KOH-deionized water solution. Finally, the sharp field emitter array with gate electrode on the glass substrate was formed.

• Journal of the Korean Ceramic Society
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• v.20 no.1
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• pp.43-48
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• 1983

The formation of strontium titanate from several molar $SrCO_3$ and $TiO_2$ mixtures was studied in air and $CO_2$ gas Mixtures of $SrCO_3$ and $TiO_2$ were heated in air at 400-$600^{\circ}C$ DTA-TG was used to obtain thermal histories of simples heated in air and $CO_2$ gas. X-ray diffraction analysis was used to determine both the phase composition and the amounts of each phase present. The phase relationship of various compounds $SrTiO_3$, $Sr_2TiO_4$, $Sr_2Ti_3O_7$ and $Sr_4Ti_3O_{10}$ formed by the sintering in each composition was shown by the calibration curves. High temperature X-ray analysis was used to determine both the formation process and deformation process of each products. Small amount of SrTiO3 is formed first at the surface af contact SrTiO3 reacts with $SrCO_3$ to form Sr2TiO4 this is affected on the $CO_2$ pressure.

• Journal of the Korean Ceramic Society
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• v.49 no.6
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• pp.642-647
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• 2012

$TiO_2$ thin films for a pulse power capacitor were deposited by RF magnetron sputtering. The effects of the deposition gas ratio and thickness on the crystallization and electrical properties of the $TiO_2$ films were investigated. The crystal structure of $TiO_2$ films deposited on Si substrates at room temperature changed to the anatase from the rutile phase with an increase in the oxygen partial pressure. Also, the crystallinity of the $TiO_2$ films was enhanced with an increase in the thickness of the films. However, $TiO_2$ films deposited on a PET substrate showed an amorphous structure, unlike those deposited on a Si substrate. An X-ray photoelectron spectroscopy(XPS) analysis revealed the formation of chemically stable $TiO_2$ films. The dielectric constant of the $TiO_2$ films as a function of the frequency was significantly changed with the thickness of the films. The films showed a dielectric constant of 100~110 at 1 kHz. However, the dissipation factors of the films were relatively high. Films with a thickness of about 1000nm showed a breakdown strength that exceeded 1000 kV/cm.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.17 no.3
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• pp.49-55
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• 2003

This paper studied characteristics of surface discharge and tracking phenomena on the surface of solid insulators in Liquid Nitrogen(LN2) noticed as a cooling medium of high temperature superconductor. In order to investigate the bubble effect which have much influence on electric surface discharge in Liquid Nitrogen, knife type electrode and plane electrode were formed oppositely with A-mode, B-mode and C-mode configuration. It is considered that these result are fundamental data for electric insulation design of superconductor and cryogenic application machinery which will be studied and developed in the future.

• Proceedings of the Korean Institute of Navigation and Port Research Conference
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• v.2
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• pp.53-56
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• 2006

KOMPSAT (KOrea Multi-Purpose SATellite)-5 for the earth observation and scientific research is scheduled to launch in 2009. The second payload, AOPOD (Atmosphere Occultation and Precision Orbit Determination) system, consists of a space-borne dual frequency GPS receiver and a laser retro reflector. GPS radio occultations from AOPOD system can be used to generate profiles of refractivity, temperature, pressure and water vapor in the neutral atmosphere with a high vertical resolution. Also the radio occultation in the ionosphere provides an inexpensive tool of vertical electron density profile. Currently, many LEO missions with GPS radio occultation receivers are on orbit and more GPS occultation missions are planed to launch in the near future. In this paper, we simulated radio occultation measurements from KOMPSAT-5 and retrieved atmospheric profiles using the simulated data.

• Proceedings of the KIEE Conference
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• 2002.06a
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• pp.49-51
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• 2002

In this thesis, Josephson junction using high-Tc superconducting multi-layer thin film has been fabricated by on-axis RF magnetron sputtering method. And, the characterizations were performed by X-ray diffraction, SEM and the measuring system of critical current density. The physical properties of multi-layer superconducting thin films were also analyzed with the measured results. To fabricate the multi-layer superconducting thin films, the optimum partial pressure of Argon and Oxgen and the temperature of substrate were measured. Also, YBaCuO thin film was grown on MgO and $SrTiO_3$ substrates by rf-sputtering and LGO thin film of 30 A was epitaxially grown on the YBaCuO thin film as a josephson junction with the same condition. The schottky barrier at the contact surface between YBaCuO/LGO and YBaCuO/Au and the energy gap of 0.5 ${\sim}$ 0.6 mV in Nb were observed from the dI/dV-V of YBaCuO/LGO/Au/Nb and YBaCuO/Au/Nb.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11a
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• pp.213-216
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• 2001

Etching behaviors of ferroelectric YMn $O_3$ thin films were studied by an inductively coupled plasma (ICP). Etch characteristic on ferroelectric YMn $O_3$ thin film have been investigated in terms of etch rate, selectivity and etch profile. The maximum etch rate of YMn $O_3$ thin film is 300 $\AA$/min at Ar/C $l_2$ of 2/8, RF power of 800W, dc bias voltage of 200V, chamber pressure of 15mTorr and substrate temperature of 3$0^{\circ}C$. Addition of C $F_4$ gas decrease the etch rate of YMn $O_3$ thin film. From the results of XPS analysis, Y $F_{X}$ compunds were found on the surface of YMn $O_3$ thin film which is etched in Ar/C1/C $F_4$ plasma. The etch profile of YMn $O_3$ film is improved by addition of C $F_4$ gas into the Ar/C $l_2$ plasma. These results suggest that fluoride yttrium acts as a sidewall passivants which reduce the sticking coefficient of chlorine on YMn $O_3$.>.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.6
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• pp.580-585
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• 2004

Silicon dioxide (SiO$_2$) is widely used as a gate dielectric material for thin film transistors (TFT) and semiconductor devices. In this paper, SiO$_2$ films were grown by APCVD(Atmospheric Pressure chemical vapor deposition) at the high temperature. Experimental investigations were carried out as a function of $O_2$ gas flow ratios from 0 to 200 1pm. This article presents the SiO$_2$ gate dielectric studies in terms of deposition rate, refrative index, FT-IR, C-V for the gate dielectric layer of thin film transistor applications. We also study defect passivation technique for improvement interface or surface properties in thin films. Our passivation technique is Forming Gas Annealing treatment. FGA acts passivation of interface and surface impurity or defects in SiO$_2$ film. We used RTP system for FGA and gained results that reduced surface fixed charge and trap density of midgap value.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.7
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• pp.564-568
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• 2003

The etching of Au thin films have been performed in an inductively coupled CF$_4$/Cl$_2$/Ar plasma. The etch rates were measured as CF$_4$ contents added from 0 to 30 % to Cl$_2$/Ar plasma, of which gas mixing ratio was fixed at 20%. Other parameters were fixed at an rf power of 700 W, a dc bias voltage of 150 V, a chamber pressure of 15 mTorr, and a substrate temperature of 3$0^{\circ}C$. The highest etch rate of the Au thin film was 3700 $\AA$m/min at a 10% additive CF$_4$ into Cl$_2$/Ar plasma. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. XPS analysis indicated that Au reacted with Cl and formed Au-Cl, which is hard to remove on the surface because of its high melting point. The etching products could be sputtered by Ar ion bombardment.