• Journal of Intelligence and Information Systems
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• v.12 no.3
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• pp.83-93
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• 2006

This paper is wireless location awareness technology using RFID. We investigates the Location of the received Signal strength reported by RF Analyses of the data are performed to understand the underlying features of location fingerprints. The system is performed factors the extreme environmental Emit signal, which consists of a unique 5000 Terminals. The Location Service have become very popular in many service industries, purchasing and distribution logistics, industry, manufacturing companies and a parking place. The Technically optimal Solution would be the storage of Intelligence information in the most common form of electronic data-carrying device in use in everyday life is the smart card based upon a contact field (telephone smart card, bank cards). The method of an indoor positioning experiment system is compared using measured Location data and a charge of service. The result of research showed the following: first, to check out the mechanism between benefit of system installation and operation of Active RFID. Second, it contributed on indoor wireless location intelligence system efficiency.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.49 no.1
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• pp.1-7
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• 2000

The SNOSFET memory devices with ultrathin ONO(tunnel oxide-nitride-blocking oxide) gate dielectric were fabricated using n-well CMOS process and investigated its characteristics. The thicknesses of tunnel oxide, nitride and blocking oxide were $23{\AA},\; 53{\AA}\; and\; 33{\AA}$, respectively. Auger analysis shows that the ONO layer is made up of $SiO_2(upper layer of blocking oxide)/O-rich\; SiO_x\N\_y$. It clearly shows that the converting layer with $SiO_x\N\_y(lower layer of blocking oxide)/N-rich SiO_x\N\_y(nitride)/O-rich SiO_x\N\_y(tunnel oxide)$. It clearly shows that the converting layer with $SiO_x\N\_y$ phase exists near the interface between the blocking oxide and nitride. The programming condition of +8 V, 20 ms, -8 V, 50 ms is determined and data retention over 10 years is obtained. Under the condition of 8 V programming, it was confirmed that the modified Fowler-Nordheim tunneling id dominant charge transport mechanism. The programmed threshold voltage is distributed less than 0.1 V so that the reading error of memory stated can be minimized. An $8\times8$ NAND type flash EEPROM with SONOSFET memory cell was designed and simulated with the extracted SPICE parameters. The sufficient read cell current was obtained and the upper limit of $V_{TH}$ for write state was over 2V.

• 제어로봇시스템학회:학술대회논문집
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• 2005.06a
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• pp.1417-1422
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• 2005

Among the sensors mainly used for displacement measurement, there are a linear CCD(Charge Coupled Device) and a PSD(Position Sensitive Detector) as a non-contact type. Their structures are different very much, which means that the signal processing of both sensors should be applied in the different ways. Most of the displacement measurement systems to get the 3-D shape profile of an object using a linear CCD are a computer-based system. It means that all of algorithms and mathematical operations are performed through a computer program to measure the displacement. However, in this paper, the developed system has microprocessor and other digital components that make the system measure the displacement of an object without a computer. The thing different from the previous system is that AVR microprocessor and FPGA(Field Programmable Gate Array) technology, and a comparator is used to play the role of an A/D(Analog to Digital) converter. Furthermore, an ATC(Automatic Threshold Control) algorithm is applied to find the highest pixel data that has the real displacement information. According to the size of the light circle incident on the surface of the CCD, the threshold value to remove the noise and useless data is changed by the operation of AVR microprocessor. The total system consists of FPGA, AVR microprocessor, and the comparator. The developed system has the improvement and shows the better performance than the system not using the ATC algorithm for displacement measurement.

• The Transactions of the Korean Institute of Power Electronics
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• v.20 no.3
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• pp.214-222
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• 2015

The superiority of gallium nitride FET (GaN FET) over silicon MOSFET is examined in this paper. One of the outstanding features of GaN FET is low reverse-recovery charge, which enables continuous conduction mode operation of totem-pole bridgeless boost power factor correction (PFC) circuit. Among many bridgeless topologies, totem-pole bridgeless shows high efficiency and low conducted electromagnetic interference performance, with low cost and simple control scheme. The operation principle, control scheme, and circuit implementation of the proposed topology are provided. The converter is driven in two-module interleaved topology to operate at a power level of 5.5 kW, whereas phase-shedding control is adopted for light load efficiency improvement. Negative bias circuit is used in gate drivers to avoid the shoot-through induced by high speed switching. The superiority of GaN FET is verified by constructing a 5.5 kW prototype of two-module interleaved totem-pole bridgeless boost PFC converter. The experiment results show the highest efficiency of 98.7% at 1.6 kW load and an efficiency of 97.7% at the rated load.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.196-196
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• 2012

Graphene, two-dimensional one-atom-thick planar sheet of carbon atoms densely packed in a honeycomb crystal lattice, has grabbled appreciable attention due to its extraordinary mechanical, thermal, electrical, and optical properties. Based on the graphene's high carrier mobility, high frequency graphene field effect transistors have been developed. Graphene is useful for photonic components as well as for the applications in electronic devices. Graphene's unique optical properties allowed us to develop ultra wide-bandwidth optical modulator, photo-detector, and broadband polarizer. Graphene can support SPP-like surface wave because it is considered as a two-dimensional metal-like systems. The SPPs are associated with the coupling between collective oscillation of free electrons in the metal and electromagnetic waves. The charged free carriers in the graphene contribute to support the surface waves at the graphene-dielectric interface by coupling to the electromagnetic wave. In addition, graphene can control the surface waves because its charge carrier density is tunable by means of a chemical doping method, varying the Fermi level by applying gate bias voltage, and/or applying magnetic field. As an extended application of graphene in photonics, we investigated the characteristics of the graphene-based plasmonic waveguide for optical signal transmission. The graphene strips embedded in a dielectric are served as a high-frequency optical signal guiding medium. The TM polarization wave is transmitted 6 mm-long graphene waveguide with the averaged extinction ratio of 19 dB at the telecom wavelength of $1.31{\mu}m$. 2.5 Gbps data transmission was successfully accomplished with the graphene waveguide. Based on these experimental results, we concluded that the graphene-based plasmonic waveguide can be exploited further for development of next-generation integrated photonic circuits on a chip.

• Transactions of the Society of Information Storage Systems
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• v.1 no.2
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• pp.155-160
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• 2005

In this paper, the channel decoder promising reliable data retrieving in noisy holographic channel has been developed for holographic WORM(write once read many) system. It covers various DSP(digital signal processing) blocks, such as align mark detector, adaptive channel equalizer, modulation decoder and ECC(error correction code) decoder. The specific schemes of DSP are designed to reduce the effect of noises in holographic WORM(H-WORM) system, particularly in prototype of DAEWOO electronics(DEPROTO). For real time data retrieving, the channel decoder is redesigned for FPGA(field programmable gate array) based hardware, where DSP blocks calculate in parallel sense with memory buffers between blocks and controllers for driving peripherals of FPGA. As an input source of the experiments, MPEG2 TS(transport stream) data was used and recorded to DEPROTO system. During retrieving, the CCD(charge coupled device), capturing device of DEPROTO, detects retrieved images and transmits signals of them to the FPGA of hardware channel decoder. Finally, the output data stream of the channel decoder was transferred to the MPEG decoding board for monitoring video signals. The experimental results showed the error corrected BER(bit error rate) of less than $10^{-9}$, from the raw BER of DEPROTO, about $10^{-3}$. With the developed hardware channel decoder, the real-time video demonstration was possible during the experiments. The operating clock of the FPGA was 60 MHz, of which speed was capable of decoding up to 120 mega channel bits per sec.

• JSTS:Journal of Semiconductor Technology and Science
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• v.11 no.4
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• pp.262-271
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• 2011

In this work, we present a unified analytical surface potential model, valid for both PD and FD SOI MOSFETs. Our model is based on a simplified one dimensional and purely analytical approach, and builds upon an existing model, proposed by Yu et al. [4], which is one of the most recent compact analytical surface potential models for SOI MOSFETs available in the literature, to improve its accuracy and remove its inconsistencies, thereby adding to its robustness. The model given by Yu et al. [4] fails entirely in modeling the variation of the front surface potential with respect to the changes in the substrate voltage, which has been corrected in our modified model. Also, [4] produces self-inconsistent results due to misinterpretation of the operating mode of an SOI device. The source of this error has been traced in our work and a criterion has been postulated so as to avoid any such error in future. Additionally, a completely new expression relating the front and back surface potentials of an FD SOI film has been proposed in our model, which unlike other models in the literature, takes into account for the first time in analytical one dimensional modeling of SOI MOSFETs, the contribution of the increasing inversion charge concentration in the silicon film, with increasing gate voltage, in the strong inversion region. With this refinement, the maximum percent error of our model in the prediction of the back surface potential of the SOI film amounts to only 3.8% as compared to an error of about 10% produced by the model of Yu et al. [4], both with respect to MEDICI simulation results.

• Journal of IKEEE
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• v.19 no.4
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• pp.506-513
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• 2015

In this paper, an output-capacitorless, low-dropout (LDO) regulator is designed, which consumes $4.5{\mu}A$ quiescent current. Proposed LDO regulator is realized using two amplifier for good load regulation and fast response time, which provide high gain, high bandwidth, and high slew rate. In addition, a one-shot current boosting circuit is added for current control to charge and discharge the parasitic capacitance at the pass transistor gate. As a result, response time is improved during load-current transition. The designed circuit is implemented through a $0.11-{\mu}m$ CMOS process. We experimentally verify output voltage fluctuation of 260mV and recovery time of $0.8{\mu}s$ at maximum load current 200mA.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.11
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• pp.914-920
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• 2000

When the charge-trap type SONOS(polysilicon-oxide-nitride-oxide-semiconductor) cells are used to flash memory, the tunneling program/erase condition to minimize the generation of interface traps was investigated. SONOSFET NVSM(Nonvolatile Semiconductor Memory) cells were fabricated using 0.35 ㎛ standard memory cell embedded logic process including the ONO cell process, based on retrograde twin-well, single-poly, single metal CMOS(Complementary Metal Oxide Semiconductor) process. The thickness of ONO triple-dielectric for the memory cell is tunnel oxide of 24 $\AA$, nitride of 74 $\AA$, blocking oxide of 25 $\AA$, respectively. The program mode(V$\_$g/=7, 8, 9 V, V$\_$s/=V$\_$d/=-3 V, V$\_$b/=floating) and the erase mode(V$\_$g/=-4, -5, -6 V, V$\_$s/=V$\_$d/=floating, V$\_$b/=3 V) by MFN(Modified Fowler-Nordheim) tunneling were used. The proposed programming condition for the flash memory of SONOSFET NVSM cells showed less degradation(ΔV$\_$th/, S, G$\_$m/) characteristics than channel MFN tunneling operation. Also, the program inhibit conditins of unselected cell for separated source lines NOR-type flash memory application were investigated. we demonstrated that the phenomenon of the program disturb did not occur at source/drain voltage of 1 V∼12 V and gate voltage of -8 V∼4 V.

• Journal of the Korean Vacuum Society
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• v.9 no.3
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• pp.249-253
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• 2000

We have analyzed electrical characteristics of the amorphous $MgTiO_3$thin films deposited by pulsed laser deposition (PLD) technique with the temperature of 400~$500^{\circ}C$. The electrical characteristics of $MgTiO_3$films heavily depend on the deposition temperature. We speculate that the density of anomalous positive charge (APC) substantially increases as the deposition temperature lowers, causing the HF C-V curves shift to the direction of the negative gate voltage. We further observed that both the degree of C-V shift as a function of the deposition temperature and the density of APC were minimized by the use of $SiO_2$with thickness of approximately 100 $\AA$ between $MgTiO_3$films and the Si substrate.