• Title/Summary/Keyword: ftsH

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Characterization and Expression in Escherichi coli of Streptococcus pneumoniae FtsH

  • Kim, Hee-Soo;Lee, Jae-Jung
    • The Journal of the Korean Society for Microbiology
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    • v.35 no.2
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    • pp.109-115
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    • 2000
  • FtsH is a membrane-bound, ATP-dependent metalloprotease that is involved in a variety of cellular functions including the regulation of responses to heat and stress shock. Previously, we had cloned and sequenced pneumococcal ftsH gene whose deduced amino acid sequence was very similar to those of several gram-positive bacteria and Escherichia coli, except for the N-terminal domain that was responsible for membrane anchoring. In order to better understand the role of Streptococcus pneumoniae FtsH, we expressed pneumococcal ftsH gene in Escherichia coli. When it was expressed from a strong promoter, $P_{tac}$, a considerable amount of the recombinant FtsH was produced, although the prolonged induction resulted in not only accumulation of breakdown products but also ceasing of the further growth of E. coli host. This indicated that the expression of the exogenous ftsH gene was tightly regulated since the excessive FtsH appeared detrimental to bacterial cells. In Western blotting, the pneumococcal FtsH protein, whether native or recombinant, was reactive to anti-E. coli FtsH serum. The observation that FtsH proteins were well conserved throughout the bacterial kingdom and its expression level was fine-tuned suggests an important role for this protein in the stress adaptation which may be related to infecting process by pneumococci.

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Membrane-Bound Protease FtsH Protects PhoP from the Proteolysis by Cytoplasmic ClpAP Protease in Salmonella Typhimurium

  • Hyungkeun Song;Eunna Choi ;Eun-Jin Lee
    • Journal of Microbiology and Biotechnology
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    • v.33 no.9
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    • pp.1130-1140
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    • 2023
  • Among the AAA+ proteases in bacteria, FtsH is a membrane-bound ATP-dependent metalloprotease, which is known to degrade many membrane proteins as well as some cytoplasmic proteins. In the intracellular pathogen Salmonella enterica serovar Typhimurium, FtsH is responsible for the proteolysis of several proteins including MgtC virulence factor and MgtA/MgtB Mg2+ transporters, the transcription of which is controlled by the PhoP/PhoQ two-component regulatory system. Given that PhoP response regulator itself is a cytoplasmic protein and also degraded by the cytoplasmic ClpAP protease, it seems unlikely that FtsH affects PhoP protein levels. Here we report an unexpected role of the FtsH protease protecting PhoP proteolysis from cytoplasmic ClpAP protease. In FtsH-depleted condition, PhoP protein levels decrease by ClpAP proteolysis, lowering protein levels of PhoP-controlled genes. This suggests that FtsH is required for normal activation of PhoP transcription factor. FtsH does not degrade PhoP protein but directly binds to PhoP, thus sequestering PhoP from ClpAP-mediated proteolysis. FtsH's protective effect on PhoP can be overcome by providing excess ClpP. Because PhoP is required for Salmonella's survival inside macrophages and mouse virulence, these data implicate that FtsH's sequestration of PhoP from ClpAP-mediated proteolysis is a mechanism ensuring the amount of PhoP protein during Salmonella infection.

Preparation of ITO thin films by FTS(Facing Targets Sputtering) method (FTS법을 이용한 ITO박막의 제작)

  • Kim, G.H.;Keum, M.J.;Kim, H.K.;Son, S.H.;Jang, K.W.;Lee, W.J.;Kim, K.H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.203-206
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    • 2004
  • In this study the ITO thin films were prepared by using FTS(Facing Targets Sputtering) system. The electric characteristics, transmittance, surface roughness of ITO thin films were investigated as a function of varying input current and working gas pressure at room temperature. As a result, the ITO thin film was fabricated with resistivity $6{\times}10^{-4}[\Omega{\cdot}cm]$, carrier mobility $52.11[cm^2/V{\cdot}sec]$, carrier concentration $1.72{\times}10^{20}[cm^{-3}]$ of ITO thin film at working pressure 1mTorr and input current 0.6A.

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Preparation AZO(ZnO:Al) thin film for FBAR by FTS method (대향타겟스퍼터링법에 의한 FBAR용 AZO(ZnO:Al) 전극의 제작)

  • Keum, M.J.;Shin, S.K.;Ga, C.H.;Chu, S.N.;Kim, K.H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.172-175
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    • 2003
  • ZnO:Al thin film for application to FBAR's bottom electrode using ZnO piezoelectric thin film were prepared by FTS, in order to improve the crystallographic properties of ZnO thin films because the ZnO:Al thin film and ZnO thin films structure is equal each other. So we prepared the ZnO:Al thin film with oxygen gas flow rate. Thickness and c-axis preferred orientation and electric properties of ZnO:Al bottom electrode were evaluated by $\alpha$-step, XRD and 4-point probe..

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Precision Position Control of a Fast Tool Servo Using Piezoelectric Actuators (압전 구동기를 이용한 미소절삭 공구대의 정밀위치제어)

  • Song, J.W.;Kim, S.H.;Kim, H.S.
    • Journal of the Korean Society for Precision Engineering
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    • v.14 no.10
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    • pp.50-57
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    • 1997
  • A fast tool servo (FTS) for diamond turning improves machining accuracy by quickly compensating relative position errors between the cutter and the workpiece. Therefore, the FTS needs to have large band-width with good tracking performance. Serious hysteresis nonlinearity of PZT actuators used in the FTS, however, deteriorates fast tracking performance. Several types of feedforward hysteresis compensators and feedback controllers are tested to improve tracking performance. Through simulations and experiments, control structure which yields the smallest tracking error is selected. The maximum peak to peak error in tracking a sinusoidal waveform is reduced by one fifth compared to that of a regular PID controller.

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KIER Liquefaction R & D's status (KIER 액화 기술 개발 현황)

  • Yang, Jung-Il;Yang, Jung Hoon;Lee, Ho-Tae;Chun, Dong Hyun;Kim, Hak-Joo;Jung, Heon
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.110.1-110.1
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    • 2010
  • A bench scale slurry bubble column reactor (SBCR) with active-Fe based catalyst was developed for the Fischer-Tropsch synthesis (FTS) reaction. Considering the highly exothermic reaction heat generated in the bench scale SBCR, an effective cooling system was devised consisting of a U-type dip tube submerged in the reactor. Also, the physical and chemical properties of the catalyst were controlled so as to achieve high activity for the CO conversion and liquid oil ($C_{5+}$) production. Firstly, the FTS performance of the FeCuK/$SiO_2$ catalyst in the SBCR under reaction conditions of $265^{\circ}C$, 2.5 MPa, and $H_2/CO=1$ was investigated. The CO conversion and liquid oil ($C_{5+}$) productivity in the reaction were 88.6% and 0.226 $g/g_{cat}-h$, respectively, corresponding to a liquid oil ($C_{5+}$) production rate of 0.03 bbl/day. To investigate the FTS reaction behavior in the bench scale SBCR, the effects of the space velocity and superficial velocity of the synthesis gas and reaction temperature were also studied. The liquid oil production rate increased upto 0.057 bbl/day with increasing space velocity from 2.61 to 3.92 $SL/h-g_{Fe}$ and it was confirmed that the SBCR bench system developed in this research precisely simulated the FTS reaction behavior reported in the small scale slurry reactor.

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Transparent Conductive Oxide(TCO) thin film(AZO) prepared for display application (디스플레이용 투명전도막(AZO)의 제작)

  • Kim, H.W.;Keum, M.J.;Son, I.H.;Sin, S.K.;Ka, C.H.;Kim, K.H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.165-168
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    • 2004
  • In this study, AZO(ZnO:Al) thin film were prepared by FTS(Facing Target Sputtering) system. The electrical, optical and crystallographic properties of AZO thin film with $O_2$ gas flow ratio have been investigated. The thickness, transmittance, crystal structure and resistivity of AZO thin film were measured by a-step, UV-VIS spectrometer, XRD and four-point probe, respectively. As a result AZO thin film deposited with the transmittance over 80% and the resistivity about $10^{-1}\Omega-cm$.

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Viriditoxin Induces G2/M Cell Cycle Arrest and Apoptosis in A549 Human Lung Cancer Cells

  • Park, Ju Hee;Noh, Tae Hwan;Wang, Haibo;Kim, Nam Deuk;Jung, Jee H.
    • Natural Product Sciences
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    • v.21 no.4
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    • pp.282-288
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    • 2015
  • Viriditoxin is a fungal metabolite isolated from Paecilomyces variotii, which was derived from the giant jellyfish Nemopilema nomurai. Viriditoxin was reported to inhibit polymerization of FtsZ, which is a key protein for bacterial cell division and a structural homologue of eukaryotic tubulin. Both tubulin and FtsZ contain a GTP-binding domain, have GTPase activity, assemble into protofilaments, two-dimensional sheets, and protofilament rings, and share substantial structural identities. Accordingly, we hypothesized that viriditoxin may inhibit eukaryotic cell division by inhibiting tubulin polymerization as in the case of bacterial FtsZ inhibition. Docking simulation of viriditoxin to ${\beta}-tubulin$ indicated that it binds to the paclitaxel-binding domain and makes hydrogen bonds with Thr276 and Gly370 in the same manner as paclitaxel. Viriditoxin suppressed growth of A549 human lung cancer cells, and inhibited cell division with G2/M cell cycle arrest, leading to apoptotic cell death.

Detailed Comparison of Discharge Characteristics of both FTS and CPMS Systems (FTS와 CPMS 시스템의 방전특성비교)

  • Kwak, D.J.;Sung, Y.M.;Park, C.H.;Ha, P.K.
    • Proceedings of the KIEE Conference
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    • 1994.07b
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    • pp.1619-1621
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    • 1994
  • Both Facing Target Sputtering(FTS) and Cylindrical Post-Magnetron Sputtering(CPMS) systems have been degigned in order to form high density plasma and to obtain high deposition rate. However, these two systems have some different applications, and discharge characteristics of these two systems are not well known. In this paper, the discharge characteristics and plasma parameters of both FTS and CPMS systems are studied experimentally. It is found that these two system show some different discharge characteristics under magnetic fields. The plasma density and electron temperature of these two systems are in the range of $10^{10}{\sim}10^{11}[cm^{-3}]$ and $3.5{\sim}5.5[eV]$, respectively.

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