• 제목/요약/키워드: film properties

검색결과 7,362건 처리시간 0.041초

벌지 실험을 통한 Ti 박막의 크기 효과 관찰 및 기계적 물성 측정 (Observation of Size Effect and Measurement of Mechanical Properties of Ti Thin Film by Bulge Test)

  • 정봉부;이헌기;황경호;박현철
    • 대한기계학회논문집B
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    • 제37권1호
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    • pp.19-25
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    • 2013
  • 본 연구에서는 벌지 실험을 이용하여 티타늄 박막의 기계적 물성을 측정하였다. 벌지 실험은 외적 지지구조를 가지지 않는 박막 시편의 한 면에 일정한 압력을 가하여 박막의 변위를 측정, 압력과 변위의 관계를 이용하여 박막의 기계적 물성을 측정하는 실험이다. 스퍼터링을 이용해 증착된 티타늄 박막의 두께는 1.0, 1.5, $2.0{\mu}m$ 이고, 물성의 열처리 시간에 대한 영향을 알아보기 위해 증착된 시편은 $600^{\circ}C$에서 각각 150, 300, 600 초 동안 열처리 되었다. 박막의 탄성 계수, 잔류 응력, 항복 응력이 벌지 실험을 통해 측정되었고, 실험 결과 항복 응력은 열처리 시간에 의존하는 특성을 확인하였다. 또한 시편 두께가 감소할수록 강도가 증가하는 크기효과를 관찰하였다.

FVA 증착법에 의해 합성된 ta-C 박막의 구조 및 물성 제어 (The control of the structure and properties of tetrahedral amorphous carbon films prepared by Filtered Vacuum Arc)

  • 이철승;신진국;김종국;이광렬;윤기현
    • 한국진공학회지
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    • 제11권1호
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    • pp.8-15
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    • 2002
  • 진공 여과 음극 아크(Filtered Vacuum cathodic Arc, FVA) 증착법을 이용하여 초경질 다이아몬드상 카본 박막(tetrahedral amorphous carbon, ta-C)을 합성하였다. FVA 증착법은 이온화율이 높고, 치밀한 다이아몬드상 카본 박막 증착에 적당한 이온 에너지를 갖는 등의 장점을 갖고 있다. 하지만, 이때의 카본 이온 에너지는 아크 소스의 조작만으로는 쉽게 조절되지 못한다는 단점을 갖고 있다. 다양한 물성 조절을 위해, 본 연구에서는 기판에 바이어스 전압을 인가하여 ta-C박막의 기계적 물성을 제어하였다. 기판의 바이어스 전압이 증가함에 따라, 기계적 물성 및 밀도는 바이어스 전압이 -100 V인 경우에 최대값을 보였다. 최대 경도값 및 밀도는 각각 55$\pm$3 GPa, 3.6$\pm$0.4 g/㎤로 이는 RF PACVD나 이온빔으로 증착되는 DLC의 3~5배에 이르는 값이다. 조성 및 구조 분석은 Raman spectroscopy와 NEXAFS spectroscopy를 이용하여 조사하였다. 각 바이어스 전압에 따른 박막의 물성 변화는 박막내의 $sp^2$$sp^3$ 혼성결합 분율의 변화의 관점으로 이해할 수 있었다.

Passivation Properties of Hydrogenated Silicon Nitrides deposited by PECVD

  • Kim, Jae Eun;Lee, Kyung Dong;Kang, Yoonmook;Lee, Hae-Seok;kim, Donghwan
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.334.2-334.2
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    • 2016
  • Silicon nitride (SiNx:H) films are generally used as passivation layer on solar cell and they are usually made by plasma enhanced chemical vapor deposition (PECVD). In this study, we investigated the properties of silicon nitride (SiNx:H) films made by PECVD. Effects of mixture ratio of process gases with silane (SiH4) and ammonia (NH3) on the passivation qualities of silicon nitride film are evaluated. Passivation properties of SiNx:H are focused by making antireflection properties identical with thickness and refractive index controlled. The absorption coefficient of each film was evaluated by spectrometric ellipsometery and the minority carrier lifetimes were evaluated by quasi-steady-state photo-conductance (QSSPC) measurement. The optical properties were obtained by UV-visible spectrophotometer. The interface properties were measured by capacitance-voltage (C-V) measurement and the film components were identified by Fourier transform infrared spectroscopy (FT-IR) and Rutherford backscattering spectroscopy detection (RBS) - elastic recoil detection (ERD).

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ITiO박막의 전기적 특성 향상을 위한 공정변수의 최적화 (Optimization of process parameters for improvement of electrical properties of ITiO film)

  • 최우진;성열문;곽동주
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2011년도 제42회 하계학술대회
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    • pp.1430-1431
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    • 2011
  • To develope the transparent conducting oxide(TCO) films is one of the essential technologies to improve various properties of electro-optical devices such as dye-sensitized solar cells(DSCs). ITiO thin film is considered one of the candidates as TCO electrodes of DSCs because it shows many advantages such as the high transparency in long wavelength range above 700nm and excellent properties of electrical necking between nanoporous TiO2 and ITiO transparent electrode. This paper presents the effect of sputtering processes on the structural, electrical and optical properties of ITiO thin film deposited by r.f. magnetron sputtering. The effect of doping concentration of Ti on the chemical compounds and C axis-orientation properties of were mainly studied experimentally. The morphology and electrical properties were greatly influenced by deposition processes, especially by the doping concentration of Ti. The $3.8{\times}10^{-4}{\Omega}{\cdot}cm$ of minimum volume resistivity were obtained under the experimental conditions of gas pressure 7mTorr, substrate temperature $300^{\circ}C$, and 2.5% of Ti doping concentration.

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Molecular Aligning Properties of a Dielectric Layer of Polymer-Ceramic Nanocomposite for Organic Thin-Film Transistors

  • Kim, Chi-Hwan;Kim, Sung-Jin;Yu, Chang-Jae;Lee, Sin-Doo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.1200-1203
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    • 2004
  • We investigated the molecular aligning capability of a polymer layer containing ceramic nanoparticles which can be used as a gate insulator of organic thin-film transistors (OTFTs). Because of the enhanced dielectric properties arising from the nanoparticles and molecular aligning properties of the polymer, the composite layer provides excellent mobility characteristics of the OTFTs.

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Bi4Ti3O12 박막의 구조적 특성과 유전 특성에 미치는 산소 열처리 효과 (Effects of Oxygen Annealing on the Structural Properties and Dielectric Properties Of Bi4Ti3O12 Thin Films)

  • 차유정;성태근;남산;정영훈;이영진;백종후
    • 한국전기전자재료학회논문지
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    • 제22권4호
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    • pp.290-296
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    • 2009
  • $Bi_{4}Ti_{3}O_{12}$ (BiT) thin films were grown on the Pt/Ti/$SiO_2$/si substrate using a metal organic decomposition (MOD) method. Effects of oxygen annealing on the structural properties and dielectric properties of the BiT thin films were investigated. The BiT films were well developed when rapid thermal annealed at $>500^{\circ}C$ in oxygen ambient. For the film annealed at $700^{\circ}C$, no crystalline phase was observed under oxygen free annealing atmosphere while its crystallinity was significantly enhanced as the oxygen pressure increased. The BiT film also exhibited a smooth surface with defect free grains. A high dielectric constant and a low dielectric loss were achieved satisfactory in the frequency range from 75 kHz to 1 MHz. Especially, the BiT film, annealed at $700^{\circ}C$ and 10 torr oxygen pressure, showed good dielectric properties: dielectric constant of 51 and dielectric loss of 0.2 % at 100 kHz. Its leakage current was also considerably improved, being as $0.62\;nA/cm^2$ at 1 V. Therefore, it is considered that the oxygen annealing has effects on an enhancement of crystallinity and dielectric properties of the BiT films.

반사방지 특성을 통일시킨 실리콘 질화막 간의 패시베이션 특성 비교 (Comparison of Passivation Property on Hydrogenated Silicon Nitrides whose Antireflection Properties are Identical)

  • 김재은;이경동;강윤묵;이해석;김동환
    • 한국재료학회지
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    • 제26권1호
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    • pp.47-53
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    • 2016
  • Silicon nitride ($SiN_x:H$) films made by plasma enhanced chemical vapor deposition (PECVD) are generally used as antireflection layers and passivation layers on solar cells. In this study, we investigated the properties of silicon nitride ($SiN_x:H$) films made by PECVD. The passivation properties of $SiN_x:H$ are focused on by making the antireflection properties identical. To make equivalent optical properties of silicon nitride films, the refractive index and thickness of the films are fixed at 2.0 and 90 nm, respectively. This limit makes it easier to evaluate silicon nitride film as a passivation layer in realistic application situations. Next, the effects of the mixture ratio of the process gases with silane ($SiH_4$) and ammonia ($NH_3$) on the passivation qualities of silicon nitride film are evaluated. The absorption coefficient of each film was evaluated by spectrometric ellipsometry, the minority carrier lifetimes were evaluated by quasi-steady-state photo-conductance (QSSPC) measurement. The optical properties were obtained using a UV-visible spectrophotometer. The interface properties were determined by capacitance-voltage (C-V) measurement and the film components were identified by Fourier transform infrared spectroscopy (FT-IR) and Rutherford backscattering spectroscopy detection (RBS) - elastic recoil detection (ERD). In hydrogen passivation, gas ratios of 1:1 and 1:3 show the best surface passivation property among the samples.

스퍼터링 방법으로 성장한 코발트크롬철망간니켈 고엔트로피 질산화물 박막의 구조특성 (Structural Characterization of CoCrFeMnNi High Entropy Alloy Oxynitride Thin Film Grown by Sputtering)

  • 이정국;홍순구
    • 한국재료학회지
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    • 제28권10호
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    • pp.595-600
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    • 2018
  • This study investigates the microstructural properties of CoCrFeMnNi high entropy alloy (HEA) oxynitride thin film. The HEA oxynitride thin film is grown by the magnetron sputtering method using nitrogen and oxygen gases. The grown CoCrFeMnNi HEA film shows a microstructure with nanocrystalline regions of 5~20 nm in the amorphous region, which is confirmed by high-resolution transmission electron microscopy (HR-TEM). From the TEM electron diffraction pattern analysis crystal structure is determined to be a face centered cubic (FCC) structure with a lattice constant of 0.491 nm, which is larger than that of CoCrFeMnNi HEA. The HEA oxynitride film shows a single phase in which constituting elements are distributed homogeneously as confirmed by element mapping using a Cs-corrected scanning TEM (STEM). Mechanical properties of the CoCrFeMnNi HEA oxynitride thin film are addressed by a nano indentation method, and a hardness of 8.13 GPa and a Young's modulus of 157.3 GPa are obtained. The observed high hardness value is thought to be the result of hardening due to the nanocrystalline microstructure.

셀룰로오스/키토산 및 세리신/키토산 복합화필름의 역학특성 (Mechanical Properties of Cellulose/Chitosan and Sericin/Chitosan Blend Films)

  • 윤흥수;이의소;김승일;윤호규;고교청구
    • 한국염색가공학회지
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    • 제17권1호
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    • pp.30-37
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    • 2005
  • The tensile properties, acetic acid solubility and degree of swelling in distilled water of cellulose/chitosan and sericin/chitosan film blended by mixing chitosan acetic acid solution with cellulose solution or sericin solution were investigated and the effect of crosslinking agent on solubility and degree of swelling were also considered. From the experimental results, the model of intermolecular bond is proposed. Tensile modulus of 100% cellulose film is high but the tensile strength and elongation are low. The elongation of 100% chitosan film is high but tensile modulus and strength is low. But it is possible to make film having same or higher tensile strength and modulus compared to that of 100% cellulose film by mixing cellulose and chitosan or by mixing sericin and chitosan. Chitosan is solved in 5vol % acetic acid solution but cellulose and sericin are not solved. Degree of swelling of chitosan in distilled water is higher than that of cellulose and sericin. Lower than 40wt% chitosan content, the solubility of cellulose/chitosan film in 5vol % acetic acid solution shows lower expected value but higher in case of sericin/chitosan film.