Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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Comparison of Passivation Property on Hydrogenated Silicon Nitrides whose Antireflection Properties are Identical

반사방지 특성을 통일시킨 실리콘 질화막 간의 패시베이션 특성 비교

  • Kim, Jae Eun (Department of Materials Science and Engineering, Korea University) ;
  • Lee, Kyung Dong (Department of Materials Science and Engineering, Korea University) ;
  • Kang, Yoonmook (KU-KIST Green School, Graduate School of Energy and Environment, Korea University) ;
  • Lee, Hae-Seok (Department of Materials Science and Engineering, Korea University) ;
  • Kim, Donghwan (Department of Materials Science and Engineering, Korea University)
  • 김재은 (고려대학교 신소재공학과) ;
  • 이경동 (고려대학교 신소재공학과) ;
  • 강윤묵 (고려대학교 KU-KIST 그린스쿨) ;
  • 이해석 (고려대학교 신소재공학과) ;
  • 김동환 (고려대학교 신소재공학과)
  • Received : 2015.11.05
  • Accepted : 2015.12.22
  • Published : 2016.01.27
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Abstract

Silicon nitride ($SiN_x:H$) films made by plasma enhanced chemical vapor deposition (PECVD) are generally used as antireflection layers and passivation layers on solar cells. In this study, we investigated the properties of silicon nitride ($SiN_x:H$) films made by PECVD. The passivation properties of $SiN_x:H$ are focused on by making the antireflection properties identical. To make equivalent optical properties of silicon nitride films, the refractive index and thickness of the films are fixed at 2.0 and 90 nm, respectively. This limit makes it easier to evaluate silicon nitride film as a passivation layer in realistic application situations. Next, the effects of the mixture ratio of the process gases with silane ($SiH_4$) and ammonia ($NH_3$) on the passivation qualities of silicon nitride film are evaluated. The absorption coefficient of each film was evaluated by spectrometric ellipsometry, the minority carrier lifetimes were evaluated by quasi-steady-state photo-conductance (QSSPC) measurement. The optical properties were obtained using a UV-visible spectrophotometer. The interface properties were determined by capacitance-voltage (C-V) measurement and the film components were identified by Fourier transform infrared spectroscopy (FT-IR) and Rutherford backscattering spectroscopy detection (RBS) - elastic recoil detection (ERD). In hydrogen passivation, gas ratios of 1:1 and 1:3 show the best surface passivation property among the samples.

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