The characteristic of Er$^+$ :SiO$_2$ thin film preparation by rf sputtering method
(고주파 스펴터링에 의한 Ef$^+$ :SiO$_2$ 박막 제작 특성)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 1997.11a
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- pp.90-93
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- 1997