• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1168-1170
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• 2005

Nanoimprint Lithography(NIL) has increasingly been recognized as a key manufacturing technology for nanosized feature. One of the most important task for nanoimprint lithography is to provide the imprinting stamp with low price. The Stamp fabricated with Si based material by e-beam lithography, RIE is extremely expensive and its throughput is very limited and PDMS replica is too soft to hold high imprinting pressure.(>5atm) In this study, we present the imprinting stamp which can be easily replicated from original mold and is based on PVC film. Replication of original Si mold to PVC film was done by Hot embossing technique, ($120^{\circ}C$ of Temperature, 20 atm applied) As small as 100nm patterns were successfully transferred into PVC film. The size of stamp was up to 100mm in diameter.

• Transactions of Materials Processing
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• v.20 no.1
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• pp.23-28
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• 2011

For the fabrication of nano patterned products manufacturing a nano patterned mold is needed in advance. The nano patterned stamper was fabricated by electroforming the AAO master with nickel. The surface of nickel-plated stamper had nano-patterned holes with the diameter of 73 nm and the depth of 83 nm. Hot embossing was used for forming P3HT sheet and the process factors of hot embossing were closer as pressure, temperature and time. In the present paper hot embossing experiments were performed to find the main process conditions to affect the replication ratio of nano patterns on surface of P3HT sheet. As a result, main contributing factors for the replication ratio of hot embossed pattern could be sequentially enumerated as pressure, temperature and time.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.12
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• pp.1106-1110
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• 2005

We fabricated (110) silicon hard master by using anisotropic wet etching for embossing. The etching chemical for the silicon wafer was a TMAH $25\%$ solution. The anisotropic wet etching produces a smooth sidewall surface and the surface roughness of the fabricated master is about 3 nm. After spin coating an organic-inorganic sol-gel hybrid material on a silicon substrate, we employed hot embossing technique operated at a low pressure and temperature to form patterns on the silicon substrate by using the fabricated master. We successfully fabricated the multi-mode planar optical waveguides showing low propagation loss of 0.4 dB/cm. The surface roughness of embossed patterns was uniform for more than 10 times of the embossing processes with a single hydrophobic surface treatment of the silicon hard master.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.14 no.4
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• pp.1-7
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• 2015

In the present study, copper micromolds with a microhole array were precisely manufactured by a synchrotron LIGA process. Like in the traditional LIGA process, a deep X-ray lithography based on a synchrotron radiation was employed as the first manufacturing step. Due to the excellent optical performance of the synchrotron X-ray used, cylindrical micropillar arrays with high aspect ratio could be efficiently obtained. The fabricated microfeatures were then used as a master of the subsequent copper electroforming process, thereby resulting in copper micromolds with a microhole array. Thermoplastic hot embossing experiments with the copper micromolds were carried out for imprinting cylindrical microfeatures onto a polystyrene sheet. Through the hot embossing, the effect of embossing temperature and usefulness of the present manufacturing method could be verified.

• Journal of the Korean Ceramic Society
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• v.42 no.10 s.281
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• pp.645-648
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• 2005

To fabricate a (100) silicon hard master, we used anisotropic wet etching for the embossing. The etching chemical for the sili­con wafer was a TMAH 25$\%$ solution. The anisotropic wet etching produces a smooth sidewall surface inclined at 54.7°, and the surface roughness of the fabricated master is about 1 nm. After spin coating an organic-inorganic sol-gel hybrid resin on a silicon substrate, we used the fabricated master to form patterns on the silicon substrate. Thus, we successfully obtained patterns via the hot embossing technique with the (100) silicon hard master. Moreover, by using a single hydrophobic surface treatment of the master, we succeeded in achieving uniform surface roughness of the embossed patterns for more than ten embossments.

• Fibers and Polymers
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• v.3 no.3
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• pp.113-119
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• 2002

Nanoimprint lithography (NIL) is a nanofabrication method known to be a low cost method of fabricating nanoscale patterns as small as 6 m. This study is focused on understanding physical phenomena in the embossing of nano/micro scale structures with 100 nm minimum feature size. We present the effects of capillary force and width of stamp groove on flow behavior at the embossing stage through numerical experimentation. We also compare our numerical results with previous experimental results and discuss our results.

• Macromolecular Research
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• v.12 no.5
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• pp.474-477
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• 2004

We present simple, low-cost methods for the fabrication of polymeric waveguides that have large core sizes for use as optical interconnects. We have used both hot embossing and micro-contact printing techniques for the fabrication of multimode waveguides using the same materials. Rectangular and large-core (60${\times}$60 $\mu\textrm{m}$$^2$) channels were readily prepared when using these methods. The dimensions of the embossed and printed channels were the same as those of the pattern on the original master. The polymeric waveguides that we fabricated with large core sizes exhibited a low propagation loss of 0.1 dB/cm at 850 nm, which indicates that hot embossing and micro-contact printing are suitable techniques for the fabrication of optical waveguides having large-core.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2009.05a
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• pp.397-400
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• 2009

When the metal sheet is subjected to the housing surface for fitting and insulating from harsh surroundings like fluid ingression or hot steam, both strength and formability have to be equally considered. In this regard, the main aim of this study is to design an apparatus of cost-effectively producing flexible fluted band with increasing the formability of embossed stainless steel sheet, which is utilized as a thermal insulation metal for housing ship engine exhauster. Designed to fabricate a maximum sheet width of 700 mm, this new apparatus consists of upper roll made of hard urethane and the female-etched lower roll made of SKD11, have a producing capacity up to 1-meter homogeneously embossed sheet for just 60 seconds. This machine is devised for the maximum operating efficiency from original sheet handling to machine setting. The embossing properties are characterized by 3-D profiling. After embossing plain metal sheet, both yield strength and elongation properties are improved simultaneously, indicating the effectiveness of the newly designed apparatus.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.11a
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• pp.309-310
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• 2008

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.95-96
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• 2012