• 제목/요약/키워드: electronic charge distribution

검색결과 117건 처리시간 0.021초

Single Junction Charge Pumping 방법을 이용한 전하 트랩형 SONOSFET NVSM 셀의 기억 트랩분포 결정 (Determination of Memory Trap Distribution in Charge Trap Type SONOSFET NVSM Cells Using Single Junction Charge Pumping Method)

  • 양전우;홍순혁;서광열
    • 한국전기전자재료학회논문지
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    • 제13권10호
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    • pp.822-827
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    • 2000
  • The Si-SiO$_2$interface trap and nitride bulk trap distribution of SONOSFET(polysilicon-oxide-nitride-oxide-semiconductor field effect transistor) NVSM (nonvolatile semiconductor memory) cell is investigated by single junction charge pumping method. The device was fabricated by 0.35㎛ standard logic fabrication process including the ONO stack dielectrics. The thickness of ONO dielectricis are 24$\AA$ for tunnel oxide, 74 $\AA$ for nitride and 25 $\AA$ for blocking oxide, respectively. By the use of single junction charge pumping method, the lateral profiles of both interface and memory traps can be calculated directly from experimental charge pumping results without complex numerical simulation. The interface traps were almost uniformly distributed over the whole channel region and its maximum value was 7.97$\times$10$\^$10/㎠. The memory traps were uniformly distributed in the nitride layer and its maximum value was 1.04$\times$10$\^$19/㎤. The degradation characteristics of SONOSFET with write/erase cycling also were investigated.

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재활용을 고려한 HDPE/EVA필름의 전계분포 및 체적저항특성 해석 (Analysis of Electric Field Distribution and Characteristics of Volume Resistivity in HDPE/EVA Film for Recycling)

  • 이홍규;임기조;김용주
    • 한국전기전자재료학회논문지
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    • 제21권9호
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    • pp.801-807
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    • 2008
  • Recently, CV, CN-CV and CNCV-W cable are used for HVDC transmission and distribution cable. However, XLPE which is used as insulation layer of power cable has thermosetting properties. It is very difficult to recycling. In this paper, we prepared HDPE/EVA film, which the blending ratio are 80:20, 70:30, 60:40, 50;50 respectively for the purpose of recycling. Main factor such as electric field distribution and its resistivity in insulation system affected on insulation performance and reliability for HVDC applications. Therefore, electric field distribution formed by space charge and characteristics of volume resistivity was currently investigated. We suggest the possibility of utilization for HVDC insulation layer from the results.

3차원 경계적분방정식법을 이용한 정전장 해석 (Electric Field Analysis Using Three Dimensional Boundary Integral Equation Method)

  • 김재홍;김동훈;박일한
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2000년도 하계학술대회 논문집 B
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    • pp.828-830
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    • 2000
  • This paper describes BIEM(Boundary Integral Equation Method) for computation of three dimensional electric field distribution and numerical method that an equivalent charge density is unknown variable. After computing numerically the surface charge distribution. the distribution of both potential and electric field are obtained. Finally, this numerical method is applied to the concentric sphere and the coaxial cylindrical model and numerical result is compared to the analytic solution.

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수명시간에 따른 NPT-IGBT의 N-drift 영역에서의 과잉소수 캐리어와 전하량 분석 (Analysis of excess minority carrier and charge wish lifetimes in N-dirft region of NPT-IGBT)

  • 류세환;이용국;안형근;한득영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.844-847
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    • 2001
  • In this work, transient characteristics of the Non-Punch Through(NPT) Insulated Gate Bipolar Transistor(IGBT) has been studied. we has analyzed with lifetimes excess minority carrier injected into N-dirft, base region of IGBT's BJT part and accumulated charge of on-state which affected swiching characteristic. In this paper, excess minority carrier and charge distribution in active base region is expressed analytically. This analysis proposed optical trade-off between lifetimes and accumulated charge for decreasing switching losses because charge result in switching loss when device was tuned off.

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An Investigation of Locally Trapped Charge Distribution using the Charge Pumping Method in the Two-bit SONOS Cell

  • An, Ho-Myoung;Lee, Myung-Shik;Seo, Kwang-Yell;Kim, Byung-Cheul;Kim, Joo-Yeon
    • Transactions on Electrical and Electronic Materials
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    • 제5권4호
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    • pp.148-152
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    • 2004
  • The direct lateral profile and retention characteristics of locally trapped-charges in the nitride layer of the two-bit polysilicon-oxide-nitride-oxide-silicon (SONOS) memory are investigated by using the charge pumping method. After charges injection at the drain junction region, the lateral diffusion of trapped charges as a function of retention time is directly shown by the results of the local threshold voltage and the trapped-charges quantities.

용융 탄산염 연료전지의 분리판 내 연료 분배 해석 (A study for gas distribution in separators of molten carbonate fuel cell)

  • 박준호;차석원
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2011년도 추계학술대회 초록집
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    • pp.82.2-82.2
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    • 2011
  • A channel design which is closely related with the mass transport overpotential is one of the most important procedures to optimize the whole fuel cell performance. In this study, three dimensional results of a numerical study for gas distribution in channels of a molten carbonate fuel cell (MCFC) unit cell for a 1kW class stack was presented. The relationship between the fuel and air distribution in the anode and cathode channels of the unit cell and the electric performance was observed. A charge balance model in the electrodes and the electrolyte coupled with a heat transfer model and a fluid flow model in the porous electrodes and the channels was solved for the mass, momentum, energy, species and charge conservation. The electronic and ionic charge balance in the anode and cathode current feeders, the electrolyte and GDEs were solved for using Ohm's law, while Butler-Volmer charge transfer kinetics described the charge transfer current density. The material transport was described by the diffusion and convection equations and Navier-Stokes equations govern the flow in the open channel. It was assumed that heat is produced by the electrochemical reactions and joule heating due to the electrical currents.

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E-빔 조사하에서 유리의 전하축퇴 특성 (Characteristics of Charge Accumulation in Glass Materials under E-Beam Irradiation)

  • 최용성;이경섭
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.377-378
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    • 2008
  • Space charge formation in various glass materials under electron beam irradiation was investigated. Charging of spacecraft occurs in plasma and radiation environment. Especially, we focused on an accident caused by internal charging in a glass material that was used as the cover plate of solar panel array, and tried to measure the charge distribution in glass materials under electron beam irradiation by using a PEA (Pulsed Electro-Acoustic method) system. In the case of a quartz glass (pure $SiO_2$), no charge accumulation was observed either during or after the electron beam irradiation. On the contrary, positive charge accumulation was observed in glass samples containing metal-oxide components. It is found that the polarity of the observed charges depends on the contents of the impurities. To identify which impurity dominates the polarity of the accumulated charge, we measured charge distributions in several glass materials containing various metal-oxide components and calculated the trap energy depths from the charge decay characteristics of all glass samples. Furthermore, the dependence of the polarity of accumulated charges on the component of glass materials is discussed by using the models of energy bands.

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E-beam 조사하에서 유리의 전하 측정 (Charge Accumulation in Glass under E-beam irradiation)

  • 김대열;최용성;황종선;이경섭
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.268-269
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    • 2008
  • Charging of spacecraft occurs in plasma and radiation environment. Especially, we focused on an accident caused by internal charging in a glass material that was used as the cover plate of solar panel array, and tried to measure the charge distribution in glass materials under electron beam irradiation by using a PEA (Pulsed Electro-Acoustic method) system. In the case of a quartz glass (pure $SiO_2$), no charge accumulation was observed either during or after the electron beam irradiation. On the contrary, positive charge accumulation was observed in glass samples containing metal-oxide components. It is found that the polarity of the observed charges depends on the contents of the impurities. To identify which impurity dominates the polarity of the accumulated charge, we measured charge distributions in several glass materials containing various metal-oxide components and calculated the trap energy depths from the charge decay characteristics of all glass samples.

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XLPE에서 공간전하가 PD 패턴에 미치는 영향 (Effect of Space Charge on the PD Pattern in XLPE)

  • 황보승;심재위;이진종;이동영;박대희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 연구회
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    • pp.96-100
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    • 2001
  • We have measured the space charge distribution and PD patterns simultaneously in XLPE under AC voltages by modified PEA method in order to investigate the effect of space charge on PD patterns in XLPE with air-gap. From the experimental results, we found that the dynamic space charge accumulated on the surface of XLPE due to the PD dominantly affects the PD pattern in the dielectric-barrier structure and governs the voltage across the air-gap. Moreover, the space charge formed by applying DC voltage still remained after applying AC voltage, which means that the space charge formed during DC strength test is likely to be fatal to the long-time AC insulating characteristics of HV equipments. On the other hand, the PD patterns was much influenced by the pre-formed space charge by DC application. Therefore, it is possible to detect the effects of space charge by monitoring the infinitesimal change of PD patterns before and after DC strength.

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Spatial Distribution of Localized Charge Carriers in SONOS Memory Cells

  • Kim Byung-Cheul
    • Journal of information and communication convergence engineering
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    • 제4권2호
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    • pp.84-87
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    • 2006
  • Lateral distributions of locally injected electrons and holes in an oxide-nitride-oxide (ONO) dielectric stack of two different silicon-oxide-nitride-oxide-silicon (SONOS) memory cells are evaluated by single-junction charge pumping technique. Spatial distribution of electrons injected by channel hot electron (CHE) for programming is limited to length of the ONO region in a locally ONO stacked cell, while is spread widely along with channel in a fully ONO stacked cell. Hot-holes generated by band-to-band tunneling for erasing are trapped into the oxide as well as the ONO stack in the locally ONO stacked cell.