• 제목/요약/키워드: electroless copper

검색결과 132건 처리시간 0.027초

Si-sealant를 이용하여 제조한 금속수소화물 전극의 특성 (The Properties of the Metal Hydride electrodes prepared by Silicon Sealant)

  • 최전;박충년
    • 한국수소및신에너지학회논문집
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    • 제4권2호
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    • pp.23-28
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    • 1993
  • The $(LM)Ni_{4.5}Co_{0.1}Mn_{0.2}Al_{0.2}$ hydrogen storage alloy powders were conducted 25wt% electroless copper plating in an acidic bath. For the preparation of a hydride electrodes, the copper coated alloy powder was mixed with Si-sealant(organosilicon) and compacted with $6t/cm^2$ at room temperature. The electrode characteristics were examined through electrochemical measurements in a half cell. As a sealant contents increased, the initial discharge capacity of si-sealant bounded electrode was lower and the activation rate in high current density was slower. For extended cycles, however, the electrodes with the Si-sealant were superior in a high rate discharge and useful range of temperature over the sealant-free electrode. In addition, the cycle life increased with increasing the amount of Si-sealant added. It can be suggested from the results that the Si-sealant as a binder could be applied to the preparation of the metal hydride electrode.

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환원제로 차아인산나트륨을 사용한 무전해 동도금속도에 미치는 도금액 조성과 도금조건의 영향 (Effects of Bath Compositions and Plating Conditions on Electroless Copper Plating Rate with Sodium Hypophosphite as Reducing Agent)

  • 오이식;박정덕;배영한
    • 동력기계공학회지
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    • 제5권2호
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    • pp.71-78
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    • 2001
  • Using sodium hypophosphite as reducing agent, bath composition and plating condition of electroless copper plating on plating rate have been studied. The followings were determined as optimum, bath composition; $CuSO_4\;0.025M,\;NiSO_4\;0.002M,\;NaH_2PO_2\;0.4M$, sodium citrate 0.06M, $H_3BO_3$ 0.6M, thiourea or 2-MBT $0.2mg/{\ell}$, and operation conditions; pH $9{\sim}10$ at bath temperature rage of $60{\sim}70^{\circ}C$. A small amount of nickel ion($Ni^{2+}/Cu^{2+}$=0.002/0.025) to the hypophosphite reduced solution promotes autocatalysis and continuous plating. An additive such as thiourea or 2-MBT of a small amount($0.2mg/{\ell}$) can be used to stabilize the solution without changing plating rate much. The attivation energy between $20^{\circ}C\;and\;70^{\circ}C$ were calculated to be 11.3kcal/mol for deposition weight. Plating reaction had been ceased by the adjustment of pH above 13, temperature higher than $90^{\circ}C\;and\;under\;20^{\circ}C$. Deposited surface became worse in the case of increment of bath temperature above $80^{\circ}C$.

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Electrochemical Deposition of Copper on Polymer Fibers

  • Lim, Seung-Lin;Kim, Jaecheon;Park, Jongdeok;Kim, Sohee;Lee, Jae-Joon
    • Journal of Electrochemical Science and Technology
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    • 제7권2호
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    • pp.132-138
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    • 2016
  • In this study, we report the fabrication of functional complex fibers, which have been studied widely globally for numerous applications. Here, we fabricated conductive complex fibers with antibacterial properties by coating metal ions on the surface of plastic (polypropylene) fibers using the electroless and electrochemical deposition. First, we polished the polypropylene melt-blown fiber surface and obtained an absorbing Pd seed layer on its surface. Subsequently, we substituted the Pd with Cu. Bis-3-sulfopropyl-disulfide disodium salt (SPS), polyethylene glycol (PEG), and ethylene thiourea (ETU) were used as the brightener, carrier, and leveler, respectively for the electroplating. We focused on most achieving the stable plating condition to remove dendrites, which are normally during electroplating metals so that smooth layer is formed on the fiber surface. The higher the amount of SPS, the higher was the extent of irregular plate-like growth. Many irregularities in the form of round spheres were observed with increase in the amount of PEG and ETU. Hence, when the additives were used separately, a uniform coating could not be obtained. A stable coating was obtained when the three additives were combined and a uniform 5-9 μm thick copper layer with a stable morphology could be obtained around the fiber. We believe that our results can be applied widely to obtain conductive fibers with antibacterial properties and are useful in aiding research on conductive lightweight composite fibers for application in information technology and robotics.

전기화학적 전착에 의한 태양전지용 저가 유연 금속 메쉬 제작 (Preparation of Low-cost and Flexible Metal Mesh Electrode Used in the Hybrid Solar Cell by Simple Electrochemical Depositon)

  • 이주열;이상열;이주영;김만
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2017년도 춘계학술대회 논문집
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    • pp.123.1-123.1
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    • 2017
  • Hybrid solar cells have intensively studied in recent years due to their advantages such as cost effectiveness and possibility of applications in flexible and transparent devices. It is critical to fabricate individual layer composed of organic and inorganic materials in the hybrid solar cell at low cost. Therefore, it is required to manufacture cheaply and enhance the photon-to-electricity conversion efficiency of each layer in the flexible solar cell industry. In this research, we fabricated pure Cu metal mesh electrode prepared by using electroplating and/or electroless plating on the Ni mold which was manufacture through photolithography, electroforming, and polishing process. Copper mesh was formed on the surface of nickel metal working master when pulsed electrolytic copper deposition were performed at various plating parameters such as plating time, current density, and so on. After electrodeposition at 2ASD for 5~30seconds, the line/pitch/thickness of copper mesh sheet was $1.8{\sim}2.0/298/0.5{\mu}m$.

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ISG법에 의한 금속과 세라믹기판과의 밀착력 향상 (Adhesion improvement between metal and ceramic substrate by using ISG process)

  • 김동규;이홍로;추현식
    • 한국표면공학회지
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    • 제32권6호
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    • pp.709-716
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    • 1999
  • Ceramic is select for an alternative substrate material for high-speed circuits due to its low-thermal expansion. As, in this study, ceramic was prepared by ISG (interlayer sol-gel) process using metal salts and a metal alkoxide as the starting materials. Generally ceramic substrate is used electroless copper plating for the metallization. But it has been indicate weakely the adhesion strength between the substrate and copper layer. Therefore, this research, using the ISG process on the preparation of homogeneous and possible preparation at law temperature fabricated sol solution. Using of the dip coating method was coated for the purpose of giving the anchoring effect on the coating layer and enhancing the adhesion strength between the $Al_2$O$_3$ substrate and copper layer. This study examined primary the characteristic of the sol making condition and differential thermal analysis (DTA) X-ray diffraction (XRD) were mearsured to identify the crystal phase of heat treatment specimens. The morphology of the coated films were studied by scanning electron microscopy(SEM). As a resurt, XRD analysis was obtained patterns of $\alpha$-cordierite after heat-treatment about 2 hours at $1000^{\circ}C$. SEM analysis could have seen a large number of voids on coated film. The more contants of$ Al_2$$O_3$ Wt% was increased the more voids was advanced. Peel adhesion strength has a maximum in the contants of the TEOS:ANE of 1:0.7 mole%. In this case, adhesion strength has been measured 1150gf, peel adhesion strength were about 10 times more than uncoated of the ceramics film.

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Ni/MH 전지에서 Cu 도금에 의한 음극활물질의 전극 특성 향상 (An Improvement in the Properties of MH Electrode of Ni/MH Battery by the Copper Coating)

  • 조진훈;김인중;이윤성;남기석;김기주;이홍기
    • 공업화학
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    • 제8권4호
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    • pp.568-574
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    • 1997
  • Ni/MH전지에서 Cu 도금이 MH(metal hydride)음극의 전극 특성에 미치는 영향을 실험적으로 조사하였다. $LaNi_5$와 Cu도금된 $LaNi_5$를 활물질로 사용하여 냉간압착법과 페이스트법의 혼용법으로 전극을 제조하였다. 그 결과 소량의 CMC(carboxymethylcellulose sodium salt)를 첨가하고 열처리를 행하지 않은 전극이 높은 방전용량을 보였다. $LaNi_5$보다는 Cu 도금된 $LaNi_5$를 활물질로 사용하여 제조한 전극의 방전용량이 증가하였으며, 이는 $LaNi_5$표면에 도금된 구리에 의해 전극의 전자 전도도가 증가되었기 때문이며 도금된 구리의 양이 증가할 수록 그 효과는 현저하였다. 또한 전극의 방전용량은 산성 무전해도금의 경우가 알칼리성 무전해도금을 행한 전극보다 우수한 용량을 나타내었다. Al이 첨가된 $LaNi_{4.5}Al_{0.5}$ 전극이 $LaNi_5$전극보다 우수한 방전용량을 보였다. 구리 도금이 $LaNi_5$의 피독특성에 미치는 영향을 CO기체의 피독실험으로 조사하였다.

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무전해 Ni-B 도금을 이용한 플라즈마 디스플레이 버스 전극용 확산방지막의 열처리 영향 (Effect of Heat Treatment of the Diffusion Barrier for Bus Electrode of Plasma Display by Electroless Ni-B Deposition)

  • 최재웅;황길호;홍석준;강성군
    • 한국재료학회지
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    • 제14권8호
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    • pp.552-557
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    • 2004
  • Thin Ni-B films, 1 ${\mu}m$ thick, were electrolessly deposited on Cu bus electrode fabricated by electro deposition. The purpose of these films is to encapsulate Cu electrodes for preventing Cu oxidation and to serve as a diffusion barrier against copper contamination of dielectric layer in AC-plasma display panel. The layers were heat treated at $580^{\circ}C$(baking temperature of dielectric layer) with and without pre-annealing at $300^{\circ}C$($Ni_{3}B$ formation temperature) for 30 minutes. In the layer with pre-annealing, amount of Cu diffusion was lower about 5 times than that in the layer without pre-annealing. The difference of Cu concentration could be attributed to Cu diffusion before $Ni_{3}B$ formation at grain boundaries. However, the diffusion behavior of the layer with pre-annealing was similar to that of the layer without pre-annealing after $Ni_{3}B$ formation. With increasing annealing time, Cu concentration of both layers increased due to grain growth.

Plasma 처리 및 MmSH 사출방법으로 인한 PC/ABS와 PC상의 은도금 밀착성에 관한 연구 (Electroless Silver Plating of PC/ABS and PC by Plasma Treatment and MmSH Injection Process)

  • 박기용;이혜원;이종권
    • 한국표면공학회지
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    • 제41권1호
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    • pp.33-37
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    • 2008
  • Polycarbonate has a high transmittance to light, low specific gravity, flexibility and cost-effectiveness that extends the application field of the polymer to bio-engineering, optics, electronic parts, etc. Moreover, electro plating of metallic film on PC could endow the parts the electromagnetic interference shielding capability. However, poor adhesion of copper on PC limited the wide usage in the industry. In this work, a composite(PC/ABS) and MmSH(Momentary mold Surface Heating) injection process were used to improve the plating characteristics; plating thickness, gloss and adhesion. Also plasma treatment and chemical treatment were employed for improving adhesion. Plating characteristics on PC/ABS were better than those on PC due to the anchoring effect of butadiene. MmSH injection process could ameliorate the gloss and coating adhesion. Also plating thickness and adhesion of PC and PC/ABS were increased by plasma treatment.

PAS법을 이용한 Ni기 비정질 분말의 소결 (Sintering of Ni-Based Amorphous Alloy Powders by Plasma Activated Sintering Process)

  • 구자민;신기삼;김윤배;배종수;허성강
    • 한국재료학회지
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    • 제15권12호
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    • pp.765-772
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    • 2005
  • PAS(Plasma Activated Sintering) process was tried to apply for the fabrication of BMG(Bulk Metallic Glasses) of $Ni_{57}Zr_{20}Ti_{18}Si_5}\;and\;Ni_{57}Zr_{20}Ti_{18}Si_3Sn_2$ from the as-atomized amorphous powder. Compressive strength for the BMG(bulk Metallic Glasses) of $Ni_{57}Zr_{20}Ti_{18}Si_5$ were lower than those of BMG rods produced by warm extrusion ,or copper mold casting method. Microstructural examination by optical microcope, SEM ana EDS showed that oxidation had occurred during PASintering. In order to prevent the powder from the oxidation during PASintering, Ni coating for $Ni_{57}Zr_{20}Ti_{18}Si_5$ amorphous powder by electroless-plating method was performed. Microstructural examination for Ni coated layers after PASintering indicated that the Ni coating had been so effective to prevent powder from oxidation during PASintering. Sintering behaviors of $Ni_{57}Zr_{20}Ti_{18}Si_3Sn_2$ represent the same as those of $Ni_{57}Zr_{20}Ti_{18}Si_5$.

탄소 단섬유가 첨가된 Cu기지 복합재료의 섬유 분율 및 배열에 따른 열적 특성 (Thermal Properties according to Content and Alignment of Carbon Fiber in Cu Matrix Composite Reinforced with Chopped Carbon Fiber)

  • 김민경;한준현
    • 한국재료학회지
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    • 제31권11호
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    • pp.626-634
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    • 2021
  • Cu matrix composites reinforced with chopped carbon fiber (CF), which is cost effective and can be well dispersed, are fabricated using electroless plating and hot pressing, and the effects of content and alignment of CF on the thermal properties of CF/Cu composites are studied. Thermal conductivity of CF/Cu composite increases with CF content in the in-plane direction, but it decreases above 10% CF; this is due to reduction of thermal diffusivity related with phonon scattering by agglomeration of CF. The coefficient of thermal expansion decreases in the in-plane direction and increases in the through-plane direction as the CF content increases. This is because the coefficient of thermal expansion of the long axis of CF is smaller than that of the Cu matrix, and the coefficient of thermal expansion of its short axis is larger than that of the Cu matrix. The thermal conductivity is greatly influenced by the agglomeration of CF in the CF/Cu composite, whereas the coefficient of thermal expansion is more influenced by the alignment of CF than the aggregation of CF.