• Journal of Acupuncture Research
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• 제15권2호
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• pp.393-406
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• 1998

Twenty five cases of the patient admission-treatment from chiefly complained of neck pain observed clinically from first January 1997 to thirty first December 1997 in the Dept. of Acupuncture and Moxibustion, Oriental Hospital, Taejon University, Taejon, Korea. And the results were obtained as follows; 1. The distribution of sex was male 13(52%) cases, female 12(48%) cases and the male to female ratio was 1.1 : 1. The distribution of age was the most predominant as the fifties 6(24%) cases. 2. The contributing factors were the most predominant as the reason unknown 9(36%) cases, unstable position 5(20%) cases. 3. The distribution of duration was the most predominant of 9(36%) cases in a week. 4. The distribution of before admission-treatments were the most predominant as west-medication 13(32.5%) cases. 5. The distribution of patient's condition of first treatment was the most predominant as Gr.III 13(52%) cases. 6. The distribution of duration for admission was the most predominant as 13(52%) cases in a week. 7. The distribution of radiological studies were the nust predominant as the HIVD 26(63.4%) cases. 8. The distribution of clinical symptoms were the most predominant as neck pain 25(21.0%) cases, radiating pain to the upper extremities 23(19.3%) cases. 9. The distribution of located on clinical syrnptoms were the most predominant as neck-shoulder and back-upper extremities 11(44%) cases. 10. The distribution of clinical diagnosis was the most predominant as HIVD 16(45.7%) cases. 11. The distribution of methods of treatment were the most predominant as Acupuncture -­ Herb Medication - Electro Acupuncture treatment 8(32%) cases. 12. The effect of treatment by discharge was the most predominant of 11(44%) cases as Good result.

• 전기전자학회논문지
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• 제11권1호통권20호
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• pp.54-60
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• 2007

본 연구에서는 고속 I/0 인터페이스용 ESD(Electro-Static Discharge)보호소자로서 SCR(Silicon Controlled Rectifier)구조에 기반한 새로운 구조의 ESD보호소자인 N/P-type Low Voltage Triggered Silicon-Controlled Rectifier(NPLVTSCR)을 제안하였다. 제안된 NPLVTSCR은 기존 SCR이 갖는 높은 트리거 전압($\sim$20V)을 낮추고 ($\sim$5V) 또한 정상상태에서의 보호소자의 래치업 현상을 줄일 수 있다. 본 연구에서 제안된 NPLVTSCR의 전기적 특성 및 ESB감내특성을 확인하기 위하여 TCAD툴을 이용하여 시뮬레이션을 수행하였으며, 또한 TSMC 90nm공정에서 테스트 패턴을 제작하여 측정을 수행하였다. 시뮬레이션 및 측정 결과를 통해, NPLVTSCR은 PMOS 게이트 길이에 따라 3.2V $\sim$ 7.5V의 트리거링 전압과 2.3V $\sim$ 3.2V의 홀딩전압을 갖으며, 약 2kV의 HBM ESD 감내특성을 갖는 것을 확인 할 수 있었다.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2004년도 제5회 압연심포지엄 신 시장 개척을 위한 압연기술
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• pp.285-293
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• 2004

Oxidation behavior of 304 and 430 stainless steel were studied using thin film X-ray analysis and glow discharge spectrum analysis (here-after GDS). The oxidation layer of 304 stainless steel was composed of $Cr_2O_3\;and\;FeCrO_4$ and its thickness was about $1.5{\mu}m$ after $1\~5$ minutes of annealing at $1120^{\circ}C$ open air. However, the oxidation layer of 430 stainless steels was mainly composed of $Cr_2O_3$ and its typical thickness was 0.5um after $1\~5$ minutes of annealing at $1000^{\circ}C$ open air. Electro-chemical analysis revealed that the descaling of oxidation layer could be activated by Fe, Cr dissolution from the matrix behind the oxidation layer at the current density of $5\~10ASD$ and by Fe, Cr-oxide dissolution from the oxidation layer at the current density over than 10ASD. Electrolytic stripping of 430 and 304 revealed the intial incubation period of descaling by oxygen evolving at low current density range such as $5\~10ASD$. However the dissolution of oxide layer was occurred when applying the anodic current of $10\~20ASD$ on 430 and 304 stainless steels. It was suggested that the electrolytic pickling of high Cr bearing stainless steel such as 430 and 304 seemed to be the more effective in the high current density range such as $10\~20ASD$ than the low current density range such as $5\~10ASD$.

• 한국분말재료학회지
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• 제22권4호
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• pp.229-233
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• 2015

Porous metallic glass compact (PMGC) are developed by electro-discharge sintering (EDS) process of gas atomized $Zr_{41.2}Ti_{13.8}Cu_{12.5}Ni_{10}Be_{22.5}$ metallic glass powder under of 0.2 kJ generated by a $450{\mu}F$ capacitor being charged to 0.94 kV. Functional iron-oxides are formed and growth on the surface of PMGCs via hydrothermal synthesis. It is carried out at $150^{\circ}C$ for 48hr with distilled water of 100 mL containing Fe ions of 0.18 g/L. Consequently, two types of iron oxides with different morphology which are disc-shaped $Fe_2O_3$ and needle-shaped $Fe_3O_4$ are successfully formed on the surface of the PMGCs. This finding suggests that PMGC witih hydrothermal technique can be attractive for the practical technology as a new area of structural and functional materials. And they provide a promising road map for using the metallic glasses as a potential functional application.

• 비파괴검사학회지
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• 제19권6호
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• pp.426-432
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• 1999

발전설비를 구성하는 주요 기기중 펌프, 발브, 배관 등의 용접부에 발생할 수 있는 균열 등의 결함을 검출하기 위한 plus-point 와전류검사탐촉자를 설계하여 결함을 검출하고 그 크기를 측정할 수 있는 검사기법을 연구하였다. 차동형 모드로 운전되는 plus-point 와전류탐촉자는 2개의 "I"자형 코일 이 십자형태로 교차되어 있으며, 탐촉자와 시험체 표면사이의 lift-off 변화에 의한 영향이 재래식 표면 탐촉자에 비해서 작게 발생하는 특징이 있다. 결함에 대한 탐촉자 반응을 평가하기 위해서 304 스텐 인레스강 용접부에 인공결함인 균열성 노치를 방전가공하여 시험편을 제작하였으며, 이를 활용하여 plus-point 와전류탐촉자의 결함 검출, 종류 판별 및 크기를 측정 할 수 있는 기법을 연구하였다.

• 한국전자파학회논문지
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• 제24권10호
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• pp.979-986
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• 2013

본 논문에서는 이동통신 기기에서 ESD(ElectroStatic Discharge) 보호소자로 흔히 사용되는 TVS(Transient Voltage Suppressor) diode로 야기되는 잡음 신호가 안테나 무선감도 저하에 미치는 영향에 대해 분석하였다. 다양한 기능을 가진 스마트폰의 경우, 좁은 실장 공간으로 인해 스피커가 안테나 영역 근처에 존재할 수 있고, 스피커로 유입되는 ESD로부터 오디오 증폭기를 보호하기 위한 TVS가 안테나 GND로 사용되어지는 영역에 위치할 수 있다. 스피커를 구동시키는 class-D 증폭기에서 발생하는 디지털 오디오 신호와 안테나에서 커플링되어 스피커로 전달되어진 CDMA(Code Division Multiple Access) RF(Radio Frequency) 통신 신호가 TVS에 의해 믹싱되고, 안테나의 GND로 누설되어 안테나 무선감도를 저하시키는 현상에 대해 실험적 분석후 시뮬레이션을 통해 검증하였다. 이를 통해 비선형적인 ESD 보호소자가 신호의 원치 않는 결합통로가 되는 문제를 사전에 차단할 수 있을 것으로 보인다.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2002년도 춘계종합학술대회
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• pp.529-534
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• 2002

범세계 해상 조난·안전 시스템(Global Maritime Distress ＆ Safety System： GMDSS)에 따라 DSC(Digital Selective Calling) 전용 수신기, DSC 장치, VHF 송수신기 등이 국제항해에 종사하는 300GT 이상의 모든 선박에 의무적으로 탑재하도록 규정되었다. 또한, 최근에 국제해사기구(International Maritime Organization： IMO)는 GMDSS를 포함한 항해·통신 장비에 EMC 규정을 적용하도록 권고함에 따라 현재 선박에서 사용되는 대부분의 전자가 새로운 규정에 대응해야 하는 문제점에 직면하게 되었다. 본 연구에서는 채널 70 DSC 전용 수신기, DSC 장치, VHF 송수신장치가 집적된 장치에 대하여 예상되는 EMC 규정을 미리 적용 및 분석하여 보고 대처방안을 모색하였다. 시험은 도선 및 방사를 통한 불요파의 측정과 같은 전자파 간섭을 비롯하여 전압, 주파수 변위에 대한 내성과 정전기 방전에 대한 내성을 포함한 다양한 전자파 감응성 시험 등이 적용되었고 이에 따른 국내외 제품의 전원 및 접지에 대한 문제점을 파악할 수 있게 되었다.

• International Journal of Precision Engineering and Manufacturing
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• 제8권2호
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• pp.38-43
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• 2007

This paper describes ultrasonically assisted grinding used to obtain a glossy surface quickly and precisely. High-quality surfaces are required for plastic injection molding dies used in the production of plastic parts such as dials for cellular phones. Traditionally, in order to finish the dies, manual polishing by a skilled worker has been required after the machining processes, such as electro discharge machining (EDM), which leaves an affected layer, and milling, which leaves tooling marks. However, manual polishing causes detrimental geometrical deviations of the die and consumes several days to finish a die surface. Therefore, a machining process for finishing dies without manual polishing to improve the surface roughness and form accuracy would be extremely valuable. In this study, a 3D positioning machine equipped with an ultrasonic spindle was used to conduct grinding experiments. An electroplated diamond tool was used for these experiments. Generally, diamond tools cannot grind steel because of excessive wear as a result of carbon atoms diffusing into bulk steel and chips. However, ultrasonically assisted grinding can achieve a fine surface (roughness Rz of $0.4{\mu}m$) on die steel without severe tool wear. The final aim of this study is to realize mirror surface grinding for injection molding dies without manual polishing. To do this, it is necessary to fabricate an electroplated diamond tool with high form accuracy and low run-out. This paper describes a tool-making method for high precision grinding and the grinding performance of a self-electroplated tool. The ground surface textures, tool performance and tool life were investigated A ground surface roughness Rz of 0.14 um was achieved Our results show that the spindle speed, feed rate and cross feed affected the surface texture. One tool could finish $5000mm^2$ of die steel surface without any deterioration of the ground surface roughness.

• 대한전자공학회논문지SD
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• 제46권12호
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• pp.105-112
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• 2009

본 논문에서는 $0.35{\mu}m$ Bipolar-CMOS-DMOS(BCD)공정으로 설계한 스마트 파워 IC 내의 가드링 코너 영역에서 발생하는 비정상적인 정전기 불량을 관측하고 이를 분석하였다. 칩내에서 래치업(Latch-up)방지를 위한 고전압 소자의 가드링에 연결되어 있는 Vcc단과 Vss 사이에 존재하는 기생 다이오드에서 발생한 과도한 전류 과밀 현상으로 정전기 내성 평가에서 Machine Model(MM)에서는 200V를 만족하지 못하는 불량이 발생하였다. Optical Beam Induced Resistance Charge(OBIRCH)와 Scanning Electronic Microscope(SEM)을 사용하여 불량이 발생한 지점을 확인하였고, 3D T-CAD 시뮬레이션으로 원인을 검증하였다. 시뮬레이션 결과를 통해 Local Oxidation(LOCOS)형태의 Isolation구조에서 과도한 정전기 전류가 흘렀을 때 코너영역의 형태에 따라 문제가 발생하는 것을 검증하였다. 이를 통해 정전기 내성이 개선된 가드링 코너 디자인 방법을 제안하였고 제품에 적용한 결과, MM 정전기 내성 평가에서 200V이상의 결과를 얻었다. 통계적으로 Test chip을 분석한 결과 기존의 결과 대비 20%이상 정전기 내성이 향상된 것을 확인 할 수 있었다. 이 결과를 바탕으로 BCD공정을 사용하는 칩 설계 시, 가드링 구조의 정전기 취약 지점을 Design Rule Check(DRC) 툴을 사용하여 자동으로 찾을 수 있는 설계 방법도 제안하였다. 본 연구에서 제안된 자동 검증방법을 사용하여, 동종 제품에 적용한 결과 24개의 에러를 검출하였으며, 수정 완료 제품은 동일한 정전기 불량은 발생하지 않았고 일반적인 정전기 내성 요구수준인 HBM 2000V / MM 200V를 만족하는 결과를 얻었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.146-147
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• 2011

Processing a large area substrate for liquid crystal display (LCD) or solar panel applications in a capacitively coupled plasma (CCP) reactor is becoming increasingly challenging because of the size of the substrate size is no longer negligible compared to the wavelength of the applied radio frequency (RF) power. The situation is even worse when the driving frequency is increased to the Very High Frequency (VHF) range. When the substrate size is still smaller than 1/8 of the wavelength, one can obtain reasonably uniform process results by utilizing with methods such as tailoring the precursor gas distribution by adjustingthrough shower head hole distribution or hole size modification, locally adjusting the distance between the substrate and the electrode, and shaping shower head holes to modulate the hollow cathode effect modifying theand plasma density distribution by shaping shower head holes to adjust the follow cathode effect. At higher frequencies, such as 40 MHz for Gen 8.5 (2.2 m${\times}$2.6 m substrate), these methods are not effective, because the substrate is large enough that first node of the standing wave appears within the substrate. In such a case, the plasma discharge cannot be sustained at the node and results in an extremely non-uniform process. At Applied Materials, we have studied several methods of modifying the standing wave pattern to adjusting improve process non-uniformity for a Gen 8.5 size CCP reactor operating in the VHF range. First, we used magnetic materials (ferrite) to modify wave propagation. We placed ferrite blocks along two opposing edges of the powered electrode. This changes the boundary condition for electro-magnetic waves, and as a result, the standing wave pattern is significantly stretched towards the ferrite lined edges. In conjunction with a phase modulation technique, we have seen improvement in process uniformity. Another method involves feeding 40 MHz from four feed points near the four corners of the electrode. The phase between each feed points are dynamically adjusted to modify the resulting interference pattern, which in turn modulate the plasma distribution in time and affect the process uniformity. We achieved process uniformity of <20% with this method. A third method involves using two frequencies. In this case 40 MHz is used in a supplementary manner to improve the performance of 13 MHz process. Even at 13 MHz, the RF electric field falls off around the corners and edges on a Gen 8.5 substrate. Although, the conventional methods mentioned above improve the uniformity, they have limitations, and they cannot compensate especially as the applied power is increased, which causes the wavelength becomes shorter. 40 MHz is used to overcome such limitations. 13 MHz is applied at the center, and 40 MHz at the four corners. By modulating the interference between the signals from the four feed points, we found that 40 MHz power is preferentially channeled towards the edges and corners. We will discuss an innovative method of controlling 40 MHz to achieve this effect.