• 제목/요약/키워드: doping material

검색결과 792건 처리시간 0.023초

결정입계 선택적 식각 기법을 적용한 다결정 규소 태양전지의 효율 향상에 관한 연구 (A study on efficiency improvement of poly-Si solar cell using a selective etching along the grain boundaries)

  • 임동건;이수은;박성현;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.597-600
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    • 1999
  • A solar cell conversion efficiency was degraded by grain boundary effect in polycrystalline silicon To reduce grain boundary effect, we performed a preferential grain boundary etching, POC$_3$ n-type emitter doping, and then ITO film growth on poly- Si. Among the various preferential etchants, Schimmel etch solution exhibited the best result having grain boundary etch depth higher than 10 ${\mu}{\textrm}{m}$. RF magnetron sputter grown ITO films showed a low resistivity of 10$^{-4}$ $\Omega$ -cm and high transmittance of 85 %. With well fabricated poly-Si solar cells, we were able to achieve as high as 15 % conversion efficiency at the input power of 20 mW/$\textrm{cm}^2$.

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n-MOSFET 정전기 방전 분석 (Electrostatic Discharge Analysis of n-MOSFET)

  • 차영호;권태하;최혁환
    • 한국전기전자재료학회논문지
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    • 제11권8호
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    • pp.587-595
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    • 1998
  • Transient thermal analysis simulations are carried out using a modeling program to understand the human body model HBM ESD. The devices were simulated a one-dimensional device subjected to ESD stress by solving Poison's equation, the continuity equation, and heat flow equation. A ramp rise with peak ESD voltage during rise time is applied to the device under test and then discharged exponentially through the device. LDD and NMOS structures were studied to evaluate ESD performance, snap back voltages, device heating. Junction heating results in the necessity for increased electron concentration in the space charge region to carry the current by the ESD HBM circuit. The doping profile adihacent to junction determines the amount of charge density and magnitude of the electric field, potential drop, and device heating. Shallow slopes of LDD tend to collect the negative charge and higher potential drops and device heating.

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단일벽 탄소나노튜브의 플러렌 캡슐화 및 라만분광 분석 (Encapsulation of Fullerenes in Single-walled Carbon Nanotubes and their Characteristic Analysis by Raman Spectroscopy)

  • 곽정춘;이내성
    • 한국전기전자재료학회논문지
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    • 제21권2호
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    • pp.118-125
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    • 2008
  • Single walled carbon nanotubes (SWCNTs) can be modified to produce a new concept of hybrid materials by introducing atoms or molecules inside their cylindrical empty space. Such an endohedral doping of the SWCNTs is expected to decisively alter their electronic transport and mechanical properties, In this study, we purified SWCNTs by three-step purification processes and formed the peapod structure by introducing $C_{60}$ fullerenes inside the SWCNTs. $C_{60}$ molecules were observed to be regularly arranged by transmission electron microscopy. In Raman spectra, the radial breathing mode (RBM) rather than the other modes was significantly affected by the endohedral injection of $C_{60}$. The RBM intensity was more greatly reduced in the large-diameter SWCNTs than the small-diameter ones, Raman spectroscopy is expected to be a key technique for analyzing $C_{60}$-encapsulated SWCNTs.

Single Junction Charge Pumping 방법을 이용한 전하 트랩 형 SONOSFET NVSM 셀의 기억 트랩 분포 결정 (Determination of Memory Trap Distribution in Charge Trap Type SONOSFET NVSM Cells Using Single Junction Charge Pumping Method)

  • 양전우;흥순혁;박희정;김선주;서광열
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 추계학술대회 논문집
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    • pp.453-456
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    • 1999
  • The Si-SiO$_2$interface trap and nitride bulk trap distribution of SONOSFET(polysilicon-oxide-nitride-oxide-semiconductor)NVSM(nonvolatile semiconductor memory) cell were investigated by single charge pumping method. The used device was fabricated by 0.35 7m standard logic fabrication including the ONO cell process. This ONO dielectric thickness is tunnel oxide 24 $\AA$, nitride 74 $\AA$, blocking oxide 25 $\AA$, respectively. Keeping the pulse base level in accumulation and pulsing the surface into inversion with increasing amplitudes, the charge pumping current flow from the single junction. Using the obtained I$_{cp}$-V$_{h}$ curve, the local V$_{t}$ distribution, doping concentration, lateral interface trap distribution and lateral memory trap distribution were extracted. The maximum N$_{it}$($\chi$) of 1.62$\times$10$^{19}$ /cm$^2$were determined.mined.d.

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Electrical Characteristics of Green Emitting Phosphor $Ir(PPY)_3$ Doped OLEDs

  • Kim, Jun-Ho;Kim, Yun-Myung;Ha, Yun-Kyung;Kim, Young-Kwan;Kim, Jung-Soo
    • KIEE International Transactions on Electrophysics and Applications
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    • 제11C권3호
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    • pp.53-57
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    • 2001
  • The organic light-emitting devices (OLEDs) based on fluorescence have low efficiency due to the requirement of spin-symmetry conservation. By using the phosphorescent material, internal quantum efficiency can reach 100%, compared with 25% in the case of the fluorescent material. Thus, phosphorescent OLEDs have recently been extensively studied and shown higher internal quantum efficiency than the conventional OLEDs. In this study, we investigated the characteristics of the phosphorescent OLEDs with the green emitting phosphor, $Ir(ppy)_3$ (tris(2-phenylpyridine)iridium). The device with a structure of ITO/TPD$Ir(ppy)_3$ doped in BCP/BCP/$Alq_3$/Li:Al/Al was fabricated, and its electrical and optical characteristics were studied. By changing the doping concentration of $Ir(ppy)_3$, we fabricated several devices and investigated their characteristics.

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포도당 산화효소를 고정화한 Polypyrrole 효소전극의 배위자 변화에 따른 전기화학적 특성 (Electrochemical Properties of Polypyrrole Enzyme Electrode Immobilized Glucose Oxidase with Different Ligand)

  • 김현철;구할본
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.529-532
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    • 2001
  • We synthesized polypyrrole (PPy) by electrolysis of the pyrrole monomer solution containing support electrolyte KCl and/or p-toluene sulfonic acid sodium salt (p-TS). The electrochemical behavior was investigated using cyclic voltammetry and AC impedance. In the case of using electrolyte p-75, the redox potential was about -0.3 V vs. Ag/AgCl reference electrode, while the potential was about 0 V for using electrolyte KCl. It is considered as the backbone forms a queue effectively by doping p-TS Therefore, it is possible to be arranged regularly. That leads to improvement in the electron hopping. The AC impedance plot gave a tent of betterment of mass transport. PPy doped with p-TS has improved in mass transport, or diffusion. That is because the PPy doped with p-TS has a good orientation, and is more porous than PPy with KCl.

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진공증착법으로 제조한 CdS:In 박막의 전기 및 광학적 특성 (Electrical and Optical Properties of In-doped CdS Films Prepared by Vacuum Evaporation)

  • 김시열;임호빈
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1992년도 춘계학술대회 논문집
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    • pp.101-104
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    • 1992
  • In-doped CdS thin films have been deposited at 150$^{\circ}C$ by simultaneous thermal evaporation of CdS and In. Deposition rate and film thickness were 8A/sec and about 1um, respectively. Indium doping concentration of films varied as Indium source temperature from 500$^{\circ}C$ to 700˚. Properties of In-CdS films have been investigatied by measurements of electrical resistivity, Hall effect, X-ray diffraction and optical trasmission spectra. The conductivity of these films was always n-type. The resistivity, carrier concentration, mobility and optical band gap dependence on Indium source temperature are reported. Carrier concentration and mobility of In-CdS films increased with increasing Indium source temperature: then they decreased. The variation of the optical band gap of In-CdS thin films are related to carrier concentration.

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칼코게나이드 As-Ge-Se-S 박막에서 Ag와 Cu 광도핑에 의한 광유기 이방성 (Photoinduced anisotropy in the Ag and Cu photodoped chalcogenide As-Ge-Se-S thin films)

  • 박종화;장선주;박정일;이영종;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.535-538
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    • 2000
  • We have investigated the photoinduced anisotropy in chalcogenide $As_{40}Ge_{10}Se_{15}S_{35}$ thin films, non-doped and photodoped by Ag and Cu. The films were exposed by the linearly polarized He-Ne laser light( $\lambda$=632.8nm). The Ag and Cu photodoping resulted in reducing the time of saturation photoinduced linearly dichroism. Also photoinduced linearly dichroism was increased up to maximum 184% by Ag photodoping and 138% by Cu photodoping, respectively. As the result of this study, the linearly dichroism can be interesting for different applications of photoinduced anisotropy. In addition, it will offer lots of information for the photodoping mechanism and analysis of chalcogenide thin film.

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Eu 첨가에 따른 PZT 박막의 강유전 특성 (Ferroelectirc Properties of Eu-doped PZT Thin Films)

  • 김창일;손영훈;김경태;김동표;이병기
    • 한국전기전자재료학회논문지
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    • 제16권7호
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    • pp.611-615
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    • 2003
  • Eu-doped lead zirconate titanate(Pb$\sub$1.1/(Zr$\sub$0.6/Ti$\sub$0.4/)O$_3$; PZT) thin films on the Pt/Ti/SiO$_2$/Si substrates prepared by a sol-gel method. The effect on structural and electrical properties of PZT thin films measured according to the Eu content. Eu-doping altered significantly dielectric and ferroelectric properties. The remanent polarization and the coercive field decreased with the increasing Eu content. The dielectric constant and the dielectric loss of PZT thin films decreased with the increasing Eu content. The 0.5 mol% of Eu-doped PZT thin film showed improved fatigue characteristic comparing to the undoped PZT thin film.

감압화학증착의 이단계 성장으로 실리콘 기판 위에 증착한 in-situ 인 도핑 다결정 실리콘 박막의 미세구조 조절 (Manipulation of Microstructures of in-situ Phosphorus-Doped Poly Silicon Films deposited on Silicon Substrate Using Two Step Growth of Reduced Pressure Chemical Vapor Deposition)

  • 김홍승;심규환;이승윤;이정용;강진영
    • 한국전기전자재료학회논문지
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    • 제13권2호
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    • pp.95-100
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    • 2000
  • For the well-controlled growing in-situ heavily phosphorus doped polycrystalline Si films directly on Si wafer by reduced pressure chemical vapor deposition, a study is made of the two step growth. When in-situ heavily phosphorus doped Si films were deposited directly on Si (100) wafer, crystal structure in the film is not unique, that is, the single crystal to polycrystalline phase transition occurs at a certain thickness. However, the well-controlled polycrtstalline Si films deposited by two step growth grew directly on Si wafers. Moreover, the two step growth, which employs crystallization of grew directly on Si wafers. Moreover, the two step growth which employs crystallization of amorphous silicon layer grown at low temperature, reveals crucial advantages in manipulating polycrystal structures of in-situ phosphorous doped silicon.

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