• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.35 no.4
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• pp.407-411
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• 2022

Bulk-sized PbTiO₃ (PT), which is widely known as a high-performance ferroelectric oxide but cannot be fabricated into a monolithic ceramic due to its high c/a ratio, was successfully prepared with a high tetragonality by partially substituting Ni ions for Pb ions using a solid-state reaction method. We found that Ni-doped PT was well-fabricated as a bulk monolith with a significant c/a ratio of ~1.06. X-ray diffraction on as-sintered and crushed samples revealed that NiTiO₃ secondary phase was present at the doping level of more than 2 at.%. Scanning electron microscopic study showed that NiTiO₃ secondary phase grew on the surface of PT specimens regardless of the doping level possibly due to the evaporation of Pb during sintering. We demonstrated that an unconventional introduction of Ni ions into A-site plays a key role on the fabrication of bulk PT, though how Ni ion functions should be studied further. We expect that this study contributes to a further development of displacive ferroelectric oxides with a high c/a ratio.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1997.11a
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• pp.116-119
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• 1997

In this paper A double-layer organic electroluminescent(EL) device was fabricated using a TPD(N,N'-dipheny] -N,N'-bis(3-methylphenyl)-[1,1'-biphenyl]-4.4'-diamine: aromatic diamine), as a hole-transport material and tris (8-hydroxy quinolinate) aluminum(Alq$_3$) as a an emiting material and its performance characteristics were investigated. structure of devices is ITO/TPD/Alq$_3$/Al. we have fabricated hole transport layer of two types. Doping material of Hole Transport material is Poly(methyl methacrylate)(PMMA) and PEI(Poly-Ether-Imide). Carrier injection from the electrodes to the doped PMMA and PEI layer through the dopants and concomitant electroluminescence from Alq$_3$were observed. Green emission with luminance of 40cd/m$^2$was achieved at a drive voltage of 30V

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.12
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• pp.984-989
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• 2012

We have investigated the structural, electrical and optical properties of Ga-doped ZnO (GZO) thin films prepared by RF magnetron sputtering with laboratory-made ZnO targets containing 1, 3, 5, 7 wt% of $Ga_2O_3$ powder as a doping source. The GZO thin films show the typical crystallographic orientation with c-axis regardless of $Ga_2O_3$ content in the targets. The $3,000{\AA}$ thick GZO thin films with the lowest resistivity of $7{\times}10^{-4}{\Omega}{\cdot}cm$ are obtained by using the GZO ($Ga_2O_3$= 5 wt%) target. Optical transmittance of all films shows higher than 80% at the visible region. The optical energy band gap for GZO films increases as the carrier concentration ($n_e$) in the film increases.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.11a
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• pp.133-133
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• 2009

Phospho-olivine $LiFePO_4$ and $LiTi_{0.1}Fe_{0.9}PO_4$ cathode materials were prepared by the solid-state reaction. To improve conductivity we carried out electrochemical performance of $Ti^{2+}$ doped $LiFePO_4$. The $Ti^{2+}$ doped $LiFePO_4$ started 3.36 V of flat voltage on discharge curve and showed a gentle decline in the curve compared to undoped $LiFePO_4$ without great changes of capacity. And so, we could achieve to improve electrochemical performance as reversible, cycle life. Similarly, $LiFePO_4$ doping with $Ti^{2+}$ was showed the effect of dopant which was obtained the improved discharge capacity as 140 mAh/g and good cycling performance.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.28 no.11
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• pp.683-689
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• 2015

For the formation of $N^+$ doping, the antimony ions are mainly used for the fabrication of a BJT (bipolar junction transistor), CMOS (complementary metal oxide semiconductor), FET (field effect transistor) and BiCMOS (bipolar and complementary metal oxide semiconductor) process integration. Antimony is a heavy element and has relatively a low diffusion coefficient in silicon. Therefore, antimony is preferred as a candidate of ultra shallow junction for n type doping instead of arsenic implantation. Three-dimensional (3D) profiles of antimony are also compared one another from different tilt angles and incident energies under same dimensional conditions. The diffusion effect of antimony showed ORD (oxygen retarded diffusion) after thermal oxidation process. The interfacial effect of a $SiO_2/Si$ is influenced antimony diffusion and showed segregation effects during the oxidation process. The surface sputtering effect of antimony must be considered due to its heavy mass in the case of low energy and high dose conditions. The range of antimony implanted in amorphous and crystalline silicon are compared each other and its data and profiles also showed and explained after thermal annealing under inert $N_2$ gas and dry oxidation.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.454-455
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• 2009

Selective emitter structure have an important research subject for crystalline silicon solar cells because it is used in production for high efficiency solar cells. A selective emitter structure with highly doped regions underneath the metal contacts is widely known to be one of the most promising high-efficiency solution in solar cell processing. Since most of the selective emitter processes require expensive extra masking and double steps process. Formation of selective emitters is not cost effective. One method that satisfies these requirements is the method of screen-printing with a phosphorus doping paste. In this paper we researched two groups of selective emitter structure process. One was using dopant paste, and the other was using solid source, in order to compare their uniformity, sheet resistance and performance condition time.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.155-155
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• 2009

AC-PDP의 유전체 보호막 물질로 사용 종인 다결정 MgO의 전기적 특성을 개선하기 위하여 본 연구에서는 MgO에 doping 물질과 첨가량에 따른 전기적 특성을 고찰하였다. 박막을 증착시키기 위해 MgO pellet target을 만드는데 이때 pellet의 밀도, XRD, 비커스경도, 파괴인성, 표면 grain size와 이차전자방출계수와의 관계 및 박막의 표면거칠기, 표면의 형태, 투과율과 이차전자방출계수와의 관계를 고찰하였다. 이에 여러 dopant를 첨가하여 특성 평가한 실험데이터를 정리하여 이차전자방출계수와의 연계성을 조사 하였다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.374-374
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• 2009

We have fabricated pure YBCO films and $BaZrO_3$ doped ones on $CeO_2$ buffered YSZ single crystal substrates using rf-sputtering method. In this work, pure YBCO and 2 vol% BZO doped YBCO target were used to investigate the flux pinning properties of BZO doped YBCO films compared to undoped ones. BZO nanodots within the superconducting materials was known to comprise the self-assembled columnar defects along the c-axis from the bottom of YBCO films up to the top surface, thus can be a very strong pinning sites in the applied magnetic field parallel to them. We will discuss the possibility of growing self-assembled columnar defects in the rf-sputtering method. It is speculated that BZO and YBCO phases can separate and BZO form nanodots surrounded by YBCO epitaxial layers and continuous phase separation and ordering between these two materials, which was well studied in Pulsed Laser Deposition method. For this purpose, some severe experimental conditions such as on-axis sputtering, shorter target-substrate distance, high rf-power, etc was adopted and their results will be presented.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.4
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• pp.284-288
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• 2013

Power MOSFETs(Metal Oxide Semiconductor Field Effect Transistor) operate as energy control semiconductor switches. In order to reduce energy loss of the device during switch-on state, it is essential to increase its conductance. We have experimental results and explanations on the doping profile dependence of the electrical behavior of the vertical MOSFET. The device is fabricated as $8.25{\mu}m$ cell pitch and $4.25{\mu}m$ gate width. The performances of device with various p base doping concentration are compared at Vth from 1.77 V to 4.13 V. Also the effect of the cell structure on the on-resistance and breakdown voltage of the device are analyzed. The simulation results suggest that the device optimized for various applications can be further optimized at power device.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.972-975
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• 2001

The effect of Cr$_2$O$_3$(0 to 0.5 wt%) doping on the microstructure and electrical properties of ternary Pb(Zr,Ti)O$_3$-Pb(Ni,Nb)O$_3$piezoelectric ceramic has been investigated. Abnormal grain growth (grain size 3.3 to 11.2 $\mu$m) and densification are found. Minor additives of $\leq$0.1 wt% improve the mechanical coupling factor, but with more additives of $\geq$0.2 wt% electrical properties deteriorate. Thus, these phenomna can be ascribed mainly to anomalous developed microstructure. The large grains were composed of a core region that is free of Cr and a surrounding shell region rich in Cr. The interfaces between the core and the shell were composed of misfit dislocations. The mechanical properties of the specimens were strongly influenced by this microstructural change. The microstrutural and compositonal evolution of the specimens containing different amounts of Cr$_2$O$_3$were monitored. Electrical properties were measured and related to the variations in the microstructure.