• 한국표면공학회지
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• 제37권1호
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• pp.5-12
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• 2004

The enhancement of adhesion for Cu film on polycarbonate (PC) surface with the $Ar/O_2$ gas plasma treatment and dc-bias sputtering was studied. The plasma treatment with this reactive mixture changes the chemical property of PC surface into hydrophllic one, which is shown by the variation of contact angle with surface modification. The micro surface roughness that also gives the high adhesive environment is increased by the $Ar/O_2$ gas plasma treatment. These results were observed distinctly from the atomic force microscopy (AFM). The negative substrate dc-bias effect for the Cu adhesion on PC was also investifated. Accelerated $Ar^{+}$ lons in sheath area of anode bombard the bare surface of PC during initial stage of dc bias sputtering. PC substrate. therefore, has severe roughen and hydrophilic surface due to the physical etching process with more activated functional group. As dc-bias sputtering process proceeds, morphology of Cu film shows better step coverage and dense layer. The results of peel test show the evidence of superiority of bias sputtering for the adhesion between metal Cu and PC.C.

• 한국전기전자재료학회논문지
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• 제27권5호
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• pp.317-321
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• 2014

Hydrothermal synthesis technique could be carried out for growth of ZnO nanowires at relatively low process temperature, and it could be freely utilized with various substrates for fabrication process of functional electronic devices. However, it has also a demerit of relatively slow growth characteristics of the resulting ZnO nanowires. In this paper, an external DC bias of positive and negative 0.5 [V] was applied in the hydrothermal synthesis process for 2~8 [h] to prepare ZnO nanowires on a seed layer of AZO with high electrical conductivity. Growth characteristics of the synthesized ZnO nanowires were analyzed by FE-SEM. Material property of the grown ZnO nanowires was examined by PL analysis. The ZnO nanowires grown with positive bias revealed distinctively enhanced growth characteristics, and they showed a typical material property of ZnO.

• 한국전기전자재료학회논문지
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• 제15권8호
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• pp.713-719
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• 2002

In this study, the vertically well-aligned CNTs were synthesized by DC bias-assisted inductively coupled plasma hot-filament chemical vapor deposition (ICPHFCVD) using radio-frequence plasma of high density and that CNTs were vertically grown on Ni(300 )/Cr(200 )-deposited glass substrates at 58$0^{\circ}C$. This system(ICPHFCVD) added to tungsten filament in order to get thermal decompound and DC bias in order to vertically grow to general Inductively Coupled Plasma CVD. The grown CNTs by ICPHFCVD were developed to higher graphitization and fewer field emission properties than those by general ICPCVD. In this system, DC bias was effect of vortical alignment to growing CNTs. The measured turn-on fields of field emission property by general ICPCVD and DC bias-assisted ICPHFCVD were 5 V/${\mu}{\textrm}{m}$ and 3 V/${\mu}{\textrm}{m}$, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.195-198
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• 1999

A technique is investigated for achieving broadband properties by controlling the operation frequency of microstrip antennas. The control is achieved by applying DC bias to the microstrip antenna. Air gap antenna with PZT post is fabricated. by using in C-band. In the case of Air gap antenna, the variation of center frequency was about 16Mhz and the bandwidth was increased up to 123.3% at 15dB, 160.7% at 20dB than before applying DC bias respectively. The change property of frequency in air gap antenna is nearly the same the C-V property in PZT.

• 한국군사과학기술학회지
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• 제6권3호
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• pp.44-53
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• 2003

Cu/C films were prepared at room temperature under $Cu(hfac)_2-Ar-H_2$ atmosphere in order to obtain metallized polymer by using ECR-MOCVD(Electron Cyclotron Resonance Metal Organic Chemical Vapor Deposition) coupled with a DC bias system. The room temperature MOCVD on polymer substrate could be possible by collaboration of ECR and a DC bias. Structural analysis of the films by ECR was found that fine copper grains embedded in an amorphous polymer matrix with indistinctive interfacial layer. The increase in $H_2$ contents brought on copper-rich film formation with low electric resistance. On the other hand carbon-rich films with low sheet electric resistance were prepared in argon atmosphere. The electric sheet resistance of Cu/C films with good interfacial property were controlled at $10^8$~$10^0$ Ohm/sq. ranges by the $H_2$/Ar mole ratio and the shielding effectiveness of the film showed maximum up to 45dB in the our experimental range.

• KIEE International Transactions on Electrophysics and Applications
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• 제4C권5호
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• pp.220-229
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• 2004

We have examined a technique of one-dimensional (1D) fluid modeling for radio-frequency Ar capacitively coupled plasmas (CCP) between unequal-sized powered and grounded electrodes. In order to simulate a practical CCP reactor configuration with a grounded side wall by the 1D model, it has been assumed that the discharge space has a conic frustum shape; the grounded electrode is larger than the powered one and the discharge space expands with the distance from the powered electrode. In this paper, we focus on how much a 1D model can approximate a 2D model and evaluate their comparisons. The plasma density calculated by the 1D model has been compared with that by a two-dimensional (2D) fluid model, and a qualitative agreement between them has been obtained. In addition, 1D and 2D calculation results for another reactor configuration with equal-sized electrodes have also been presented together for comparison. In the discussion, four CCP models, which are 1D and 2D models with symmetric and asymmetric geometries, are compared with each other and the DC self-bias voltage has been focused on as a characteristic property that reflects the unequal electrode surface areas. Reactor configuration and experimental parameters, which the self-bias depends on, have been investigated to develop the ID modeling for reactor geometry with unequal-sized electrodes.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1988년도 전기.전자공학 학술대회 논문집
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• pp.563-566
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• 1988

A current-controlled CMOS operational transconductance amplifier(OTA), whose transconductance is directly proportional to the DC bias current, has been developed for many electronic circuit applications. It features that its transconductance is insensitive to temperature unlike that of the bipolar OTA. This property makes it possible to use the proposed OTA as a basic buliding block in electrically variable circuit design. The SPICE simulation shows that the conversion sensitivity of the circuit is 44.62 mv /${\mu}A$ and the linearity error less than 0.54 % over a bias current range from 2 ${\mu}A$ to 120 ${\mu}A$ when the output is loaded with a 1${\Omega}$ resistor.

• 열처리공학회지
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• 제36권3호
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• pp.115-120
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• 2023

ZnO/Cu/ZnO (ZCZ) thin film deposited on the glass substrate with DC and RF magnetron sputtering was rapid thermal annealed (RTA) and then effect of thermal temperature on the opto-electical and transparent heater properties of the films were considered. The visible transmittance and electrical resistivity are depends on the annealing temperature. The electrical resistivity decreased from 1.68 × 10^-3 Ωcm to 1.18 × 10^-3 Ωcm and the films annealed at 400℃ show a higher transmittance of 78.5%. In a heat radiation test, when a bias voltage of 20 V is applied to the ZCZ film annealed at 400℃, its steady state temperature is about 70.7℃. In a repetition test, the steady state temperature is reached within 15s for all of the bias voltages.

• 한국재료학회지
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• 제33권11호
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• pp.497-501
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• 2023

ZnO/Cu/ZnO (ZCZ) thin films were deposited at room temperature on a glass substrate using direct current (DC) and radio frequency (RF, 13.56 MHz) magnetron sputtering and then the effect of post-deposition electron irradiation on the structural, optical, electrical and transparent heater properties of the films were considered. ZCZ films that were electron beam irradiated at 500 eV showed an increase in the grain sizes of their ZnO(102) and (201) planes to 15.17 nm and 11.51 nm, respectively, from grain sizes of 13.50 nm and 10.60 nm observed in the as deposited films. In addition, the film's optical and electrical properties also depended on the electron irradiation energies. The highest opto-electrical performance was observed in films electron irradiated at 500 eV. In a heat radiation test, when a bias voltage of 18 V was applied to the film that had been electron irradiated at 500 eV, its steady state temperature was about 90.5 ℃. In a repetition test, it reached the steady state temperature within 60 s at all bias voltages.

• 한국자기학회지
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• 제25권3호
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• pp.67-73
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• 2015

본 연구는 철기(Fe based) $Fe_{73.5}Si_{13.5}B_9Nb_3Cu_1$ 나노결정 합금의 분말코어(powder core)의 연자기적 특성 향상을 위한 기초연구로서, 절연 코팅제의 첨가량 및 분말입도에 따른 투자율, 코어손실 및 DC 바이어스 특성을 주로 조사하였다. 우선 합금조성을 PFC 장치를 이용하여 비정질 합금리본을 제조한 후, 열처리, 미분쇄 및 분급하여 얻어진 합금분말에 절연 코팅제(PEI)의 첨가량을 0.5, 1.0, 2.0, 2.5 wt%로 변화시켜 $16ton/cm^2$으로 압축성형 및 결정화 열처리하여 제조한 토로이달 나노결정 분말코어($OD12.7mm{\times}ID7.62mm{\times}H4.75mm$)는 절연 코팅제 함량이 증가할수록 투자율은 감소하였지만, 코어손실 및 DC 바이어스 특성은 향상됨을 확인하였다. 이러한 이유는 합금분말 절연 코팅제 첨가량이 증가할수록 비정질 합금분말 입자가 적어져 분말코어의 성형밀도가 낮아지기 때문으로 추정되었으며, 절연 코팅제의 함량은 1 wt%가 가장 적합한 것으로 판단되었다. 또한 절연 코팅제 함량을 1 wt%로 고정하고, 합금분말의 입도에 따라 제조한 분말코어의 경우, 실효투자율 및 코어손실은 입도가 클수록 우수하였지만, DC 바이어스 특성은 인가자장이 증가함에 따라 더욱 나빠짐을 확인하였다. 그 이유는 합금분말 표면의 코팅층 두께 차이에 의한 절연효과, 잔류기공 혹은 분말코어의 성형밀도 차이 등에 기인하는 것으로 추정되었다.