• Title/Summary/Keyword: carbon-coating

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A Study of a Changing of Physical and Chemical Intra-structure on Si-DLC Film during Tribological Test (실리콘 함유 DLC 박막의 마찰마모 시험에 의한 물리적 특성 및 화학적 결합 구조 변화 고찰)

  • Kim, Sang-Gweon;Lee, Jae-Hoon;Kim, Sung-Wan
    • Journal of the Korean Society for Heat Treatment
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    • v.24 no.3
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    • pp.127-132
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    • 2011
  • The silicon-containing Diamond-like Carbon (Si-DLC) film as an low friction coefficient coating has especially treated a different silicon content by plasma-enhanced chemical vapor deposition (PECVD) process at $500^{\circ}C$ on nitrided-STD 11 mold steel with (TMS) gas flow rate. The effects of variable silicon content on the Si-DLC films were tested with relative humidity of 5, 30 and 85% using a ball-on-disk tribometer. The wear-tested and original surface of Si-DLC films were analysed for an understanding of physical and chemical characterization, including a changing structure, via Raman spectra and nano hardness test. The results of Raman spectra have inferred a changing intra-structure from dangling bonds. And high silicon containing DLC films have shown increasing carbon peak ratio ($I_D/I_G$) values and G-peak values. In particular, the tribological tested surface of Si-DLC was shown the increasing hardness value in proportional to TMS gas flow rate. Therefore, at same time, the structure of the Si-DLC film was changed to a different intra-structure and increased hardness film with mechanical shear force and chemical reaction.

Simulation of Silicon Carbide Converted Graphite by Chemical Vapor Reaction (Ⅰ) (화학적 기상 반응에 의한 탄화규소 피복 흑연의 시뮬레이션(Ⅰ))

  • Lee, Joon-Sung;Choi, Sung-Churl
    • Journal of the Korean Ceramic Society
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    • v.38 no.9
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    • pp.846-852
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    • 2001
  • A two-dimensional Monte Carlo simulation has been used to investigate the effect of the reaction temperature on the formation of the silicon carbide conversion layer near the surface of graphite substrate The carbothermal reduction of silica is the reaction mechanism of silicon carbide formation on graphite substrate by chemical vapor reaction methods. The chemical composition of silicon carbide conversion layer gradually changes from carbon to silicon carbide because gaseous reactants diffuse through micropores within graphite substrate and react with carbon at the surface of inner pores. The simulation was carried out under the condition of reaction temperature at 1900K, 2000K, 2100K and 2200K for 500MCS. It was found from the results of simulation that the thickness of silicon carbide conversion layer increases with reaction temperature.

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Improved Characteristics of Carbon Nanotube Transparent Electrode Films Using Acid Treatments (산 처리를 이용한 탄소 나노튜브 투명전극 특성 향상)

  • Jeon, Joo-Hee;Choi, Ji-Hyuk;Moon, Kyeong-Ju;Lee, Tae-Il;Moon, Ho-Jun;Kim, Hyung-Yeol;Myoung, Jae-Min
    • Korean Journal of Materials Research
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    • v.20 no.2
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    • pp.51-54
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    • 2010
  • Transparent conductive films of single wall carbon nanotube (SWCNT) were prepared by spray coating method. The effect of acid treatment on the SWCNT films was investigated. The field emission scanning electron microscope (FESEM) shows that acid treatment can remove dispersing agent. The electrical and optical properties of acid-treated films were enhanced compared with those of as deposited SWCNT films. Nitric acid ($HNO_3$), sulfuric acid ($H_2SO_4$), nitric acid:sulfuric acid (3:1) were used for post treatment. Although all solutions reduced sheet resistance of CNT films, nitric acid can improve electrical characteristics efficiently. During acid treatment, transmittance was increased continuously with time. But the sheet resistance was decreased for the first 20 minutes and then increased again. Post-treated SWCNT films were transparent (85%) in the visible range with sheet resistance of about $162{\Omega}/sq$. In this paper we discuss simple fabrication, which is suitable for different types of large-scale substrates and simple processes to improve properties of SWCNT films.

Mechanical and electrical properties of ta-C coating Using the Filtered Vacuum Arc System (FVAS 시스템을 이용한 기계적 및 전기적 특성이 우수한 ta-C 코팅막 형성 연구)

  • Gang, Yong-Jin;Jang, Yeong-Jun;Kim, Jong-Guk
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.155-155
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    • 2016
  • DLC (Diamond like Carbon)는 Diamond와 유사한 물리화학적 특성을 보유한 막으로 고경도 및 우수한 내마모성, 화학적 안정성의 특성을 가지고 있다. DLC는 크게 카본의 막 형성 공정에서 카본 소스에 따라 수소가 포함된 DLC와 무수소 DLC 로 구분된다. Tetrahedral amorphous carbon (ta-C) 박막은 DLC 박막 중에서 가장 다이아몬드와 유사한 특성을 가지는 박막으로, a:C-H에 비해 고온안정성, 높은 경도 (30~80 GPa) 및 내마모 특성이 우수하여, 현재 다양한 응용분야에 적용되고 있으며, 최근에는 고내구성을 보유하면서 전기적 특성을 가지는 기능성 DLC막의 요구가 증대하고 있다. 본 연구에서는 무수소 DLC 형성을 위해 자장필터가 장착된 Filtered Vacuum Arc Source (FVAS)를 자체적으로 개발하여 연구를 수행하였다. FVAS 장비는 카본 이온 발생부와 Plasma Duct 부위, 전자석부위 구성되어 있으며, 본 연구에서는 Plasma Duct 부위의 Bias 제어를 통한 음극에서 기판으로 이동하는 카본이온의 에너지 및 flux 변화를 통해 ta-C 막의 전기적, 기계적 물성 연구를 진행하였다. Plasma Duct Bias 변화는 각 0 ~ 20 V 조건으로 진행하였으며, 물성 평가는 경도 (Hardness), 마찰계수, 전기적 특성에 대한 분석을 진행하였다. 박막의 증착 거동에서는 Plasma Duct bias 변화에 따라 10 V에서 가장 높은 증착 거동을 가지다 감소하는 경향을 확인 하였으며, 박막의 물성 특성 평가 시에도 이와 유사하게 특성의 차이를 관찰하였다. 이는 음극부위에서 형성된 카본이온이 기판에 도달 시에 Plasma Duct Bias 변화에 따라 이온의 Flux 및 에너지 변화로 인한 박막의 밀도 및 ta-C 막의 물성 변화로 예상되며, 이를 분석하기 위해 라만 분석법을 통해 증명하였다.

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Nanocrystalline Diamond Coating on Steel with SiC Interlayer (철강 위에 SiC 중간층을 사용한 나노결정질 다이아몬드 코팅)

  • Myung, Jae-Woo;Kang, Chan Hyoung
    • Journal of Surface Science and Engineering
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    • v.47 no.2
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    • pp.75-80
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    • 2014
  • Nanocrystalline diamond(NCD) films on steel(SKH51) has been investigated using SiC interlayer film. SiC was deposited on SKH51 or Si wafer by RF magnetron sputter. NCD was deposited on SiC at $600^{\circ}C$ for 0.5~4 h employing microwave plasma CVD. Film morphology was observed by FESEM and FIB. Film adherence was examined by Rockwell C adhesion test. The growth rate of NCD on SiC/Si substrate was much higher than that on SiC/SKH51. During particle coalescence, NCD growth rate was slow since overall rate was determined by the diffusion of carbon on SiC surface. After completion of particle coalescence, NCD growth became faster with the reaction of carbon on NCD film controlling the whole process. In the case of SiC/SKH51 substrate, a complete NCD film was not formed even after 4 h of deposition. The adhesion test of NCD/SiC/SKH51 samples revealed a delamination of film whereas that of SiC/SKH51 showed a good adhesion. Many voids of less than 0.1 ${\mu}m$ were detected on NCD/SiC interface. These voids were believed as the reason for the poor adhesion between NCD and SiC films. The origin of voids was due to the insufficient coalescence of diamond particles on SiC surface in the early stage of deposition.

Improvement of Rate Capability and Low-temperature Performances of Graphite Negative Electrode by Surface Treatment with Copper Phthalocyanine (구리 프탈로시아닌으로 표면처리된 흑연 음극의 속도특성 및 저온성능 개선)

  • Jurng, Sunhyung;Park, Sangjin;Ryu, Ji Heon;Oh, Seung M.
    • Journal of the Korean Electrochemical Society
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    • v.18 no.3
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    • pp.130-135
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    • 2015
  • The rate capability and low-temperature characteristics of graphite electrode are investigated after surface treatment with copper phthalocyanine (CuPc) or phthalocyanine (Pc). Uniform coating layers comprising amorphous carbon or copper are generated after the treatment. The rate performance of graphite electrodes is enhanced by the surface treatment, which is more prominent with CuPc. The resistance of the graphite electrode estimated from electrochemical impedance spectroscopy and pulse resistance measurement is the smallest for the CuPc-treated graphite. It is likely that the amorphous carbon layer formed by the decomposition of Pc facilitates $Li^+$ diffusion and the metallic copper derived from CuPc improves the electrical conductivity of the graphite electrode.

The Effect of Boron Content and Deposition Temperature on the Microstructure and Mechanical Property of Ti-B-C Coating Prepared by Plasma-enhanced Chemical Vapor Deposition (PECVD법에 의해 증착된 Ti-B-C코팅막 내의 보론함량과 증착온도에 따른 미세구조 및 기계적 물성의 변화)

  • Ok, Jung-Tae;Song, Pung-Keun;Kim, Kwang-Ho
    • Journal of Surface Science and Engineering
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    • v.38 no.3
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    • pp.106-111
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    • 2005
  • Ternary Ti-B-C coatings were synthesized on WC-Co and Si wafers substrates by a PECVD technique using a gaseous mixture of $TiCl_4,\;BCl_3,\;CH_4,\;Ar,\;and\; H_2$. The effects of deposition variables such as substrate temperature, gas ratio, $R_x=[BCl_3/(CH_4+BCl_3)]$ on the microstructure and mechanical properties of Ti-B-C coatings were investigated. From our instrumental analyses, the synthesized Ti-B-C coatings was confirmed to be composites consisting of nanocrystallites TiC, quasi-amorphous TiB2, and amorphous carbon at low boron content, on the contrary, nanocrystallites $TiB_2$, quasi-amorphous TiC, and amorphous carbon at relatively high boron content. The microhardness of the Ti-B-C coatings increased from $\~23 GPa$ of TiC to $\~38 GPa$ of $Ti_{0.33}B_{0.55}C_{0.11}$ coatings with increasing the boron content. The $Ti_{0.33}B_{0.55}C_{0.11}$ coatings showed lower average friction coefficient of 0.45, in addition, it showed relatively better wear behavior compared to other binary coatings of $TiB_2$ and TiC. The microstruture and microhardness value of Ti-B-C coatings were largely depend on the deposition temperature.

Effect of plasma etching on DLC films prepared by RF-PECVD method (RF-PECVD법에 의해 합성된 DLC 박막에 대한 plasma etching의 영향에 대한 연구)

  • Oh, Chang-Hyun;Yun, Deok-Yong;Park, Yong-Seob;Cho, Hyung-Jun;Choi, Won-Seok;Hong, Byung-You
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.315-315
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    • 2007
  • 본 논문에서는 DLC (Diamond-like carbon)박막이 가지는 높은 경도, 낮은 마찰계수, 전기적 절연성, 화학적 안정성 등의 특성을 이용하여, 리소그래피를 위한 resist나 hard coating물질로써 응용하기 위해, DLC 박막의 에칭에 관한 연구를 진행하였다. DLC 박막의 합성 과 에칭은 13.56 MHz RF plasma enhanced vapor deposition technique를 통해 이루어졌으며, DLC 박막은 150 W의 RF Power에서 메탄 $(CH_4)$과 수소$(H_2)$ 가스를 이용하여 약 300 nm의 두께로 제작되었으며, DLC박막의 에칭은 RF power의 변화 (50~250 W)와 산소 $(O_2)$가스의 유량변화 (5~25 sccm)에 따라 실시하였다. 에칭 되어진 DLC 박막의 표면 특성들은 AFM (atomic force microscopy)과 contact angle 장치를 사용하여 측정되었고, 측정된 결과로써 DLC 박막은 RF power와 산소 가스의 유량이 높을수록 etching rate는 증가하였고, 박막의 표면은 거칠어졌으며, 결국 DLC 표면에서는 산소에 의한 결합의 증가로 인해 친수성을 나타내었다.

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Influence of Plasma Corrosion Resistance of Y2O3 Coated Parts by Cleaning Process (세정공정에 따른 Y2O3 코팅부품의 내플라즈마성 영향)

  • Kim, Minjoong;Shin, Jae-Soo;Yun, Ju-Young
    • Journal of Surface Science and Engineering
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    • v.54 no.6
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    • pp.365-370
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    • 2021
  • In this research, we proceeded with research on plasma resistance of the cleaning process of APS(Atmospheric Plasma Spray)-Y2O3 coated parts used for semiconductor and display plasma process equipment. CF4, O2, and Ar mixed gas were used for the plasma environment, and respective alconox, surfactant, and piranha solution was used for the cleaning process. After APS-Y2O3 was exposed to CF4 plasma, the surface changed from Y2O3 to YF3 and a large amount of carbon was deposited. For this reason, the plasma corrosion resistance was lowered and contamination particles were generated. We performed a cleaning process to remove the defect-inducing surface YF3 layer and carbon layer. Among three cleaning solutions, the piranha cleaning process had the highest detergency and the alconox cleaning process had the lowest detergency. Such results could be confirmed through the etching amount, morphology, composition, and accumulated contamination particle analysis results. Piranha cleaning process showed the highest detergency, but due to the very large thickness reduction, the base metal was exposed and a large number of contaminated particles were generated. In contrast, the surfactant cleaning process exhibit excellent properties in terms of surface detergency, etching amount, and accumulated contamination particle analysis.

Characteristics of Sr2Ni1.8Mo0.2O6-δ Anode for Utilization in Methane Fuel Conditions in Solid Oxide Fuel Cells

  • Kim, Jun Ho;Yun, Jeong Woo
    • Journal of Electrochemical Science and Technology
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    • v.10 no.3
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    • pp.335-343
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    • 2019
  • In this study, $Sr_2Ni_{1.8}Mo_{0.2}O_{6-{\delta}}$ (SNM) with a double perovskite structure was investigated as an alternative anode for use in the $CH_4$ fuel in solid oxide fuel cells. SNM demonstrates a double perovskite phase over $600^{\circ}C$ and marginal crystallization at higher temperatures. The Ni nanoparticles were exsolved from the SNM anode during the fabrication process. As the SNM anode demonstrates poor electrochemical and electro-catalytic properties in the $H_2$ and $CH_4$ fuels, it was modified by applying a samarium-doped ceria (SDC) coating on its surface to improve the cell performance. As a result of this SDC modification, the cell performance improved from $39.4mW/cm^2$ to $117.7mW/cm^2$ in $H_2$ and from $15.9mW/cm^2$ to $66.6mW/cm^2$ in $CH_4$ at $850^{\circ}C$. The mixed ionic and electronic conductive property of the SDC provided electrochemical oxidation sites that are beyond the triple boundary phase sites in the SNM anode. In addition, the carbon deposition on the SDC thin layer was minimized due to the SDC's excellent oxygen ion conductivity.