• 제목/요약/키워드: capacitance density

검색결과 395건 처리시간 0.023초

X-ray Absorption Spectroscopy of a Poly Sodium 4-Styrensulfonate Intercalated Graphite Oxide Electrode

  • 정혜경;박병규;김재영;노한진
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.393-393
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    • 2011
  • We investigated the electronic structures of a poly sodium 4-styrensulfonate intercalated graphite oxide (PSSGO) electrode and a precursor graphite oxide (GO) electrode using X-ray absorption spectroscopy (XAS). Both electrodes were obtained from electrochemical cells. We found that in the C K-edge XAS spectra the ${\pi}^*$ state intensity originating from the sp2 hybridization of graphite decreases predominantly in the graphite oxide and PSSGO electrodes. This indicates that the negatively charged electrolyte ion (BF4-) is absorbed onto the electrodes and is transferred to the ${\pi}^*$ state of the both electrodes. The analysis of their F K-edge spectra reveals that more BF4- ions were found in the PSSGO electrode than in the graphite oxide electrode. This indicates that more electrolyte ions are absorbed in the PSSGO than in the graphite oxide electrode. We argue that this is the main reason why PSSGO cells have higher capacitance, higher energy density, and higher power density when compared to the graphite oxide cells. We also found that BF4- is the primary working ion that can be inserted into the interlayers of the PSSGO electrode.

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Sr(Mg1/3Nb1/3)O3-Ba(Mg1/3Nb2/3)O3-Ba(Mg1/3Ta2/3)O3고용체의 유전성 (복합 Perovskite구조를 갖는 세라믹스의 유전성) (Dielectric Properties of Sr(Mg1/3Nb1/3)O3-Ba(Mg1/3Nb2/3)O3-Ba(Mg1/3Ta2/3)O3 Solid Solution)

  • 윤기현;정범준;김응수;강동헌
    • 한국세라믹학회지
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    • 제25권6호
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    • pp.639-644
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    • 1988
  • The physical and dielectric properties of complex perovskite compound Sr(Mg1/3Nb1/3)O3-Ba(Mg1/3Nb2/3)O3-Ba(Mg1/3Ta2/3)O3(BMT) system were investigated as a function of composition. As the mole ratio of BMN was increased, lattice parameter ratio c/a was slightly increased, and density was increased in SMN-BMN system. However, in BMN-BMT system, lattice parameter ratio c/a and density were decreased with increasing the mole ratio of BMN. Dielectric constant, dielectric loss at $25^{\circ}C$ and 100kHz, and temperature coefficient of resonant frequency, the dependence of temperature in capacitance were increased with increasing the mole ratio of BMN in SMN-BMN-BMT system. These result can be explained according to the degree of order=disorder and dielectric constant.

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$ZnO-Bi_2O_3$ 계 바리스터에서 후열처리가 DC 열화 특성에 미치는 영향 (Influence of post-annealing on DC degradation characteristics in $ZnO-Bi_2O_3$ Varistor)

  • 소순진;김영진;소병문;박춘배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.333-336
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    • 1999
  • The relationship between the DC degradation characteristics of the $ZnO-Bi_2O_3$ varistor and post-annealing is investigated in this study. $ZnO-Bi_2O_3$ varistors containing $SiO_2$ range 0.3 mol% were fabricated by standard ceramic techniques. The post- annealing is performed at $550^{\circ}C$ for 0, 1.5 and 5h. A little phase transition is found according to the analysis of X-ray diffraction. DC degradation tests were conducted at $115\pm3^{\circ}C$ for periods up to 22h. Current-voltage analysis was used to determine nonlinear coefficients($\alpha$). Capacitance-voltage analysis enable the donor density($N_d$) and the barrier height($E_B$) to be determined. From above analysis, it is found that the past-annealing for 5h improved degradation characteristics in $ZnO-Bi_2O_3$ with Si additive.

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단일 트랜지스터용 강유전체 메모리의 Buffer layer용 $Y_{2}O_3$의 연구 ($Y_{2}O_3$ Films as a Buffer layer for a Single Transistor Type FRAM)

  • 장범식;임동건;최석원;문상일;이준신
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2000년도 하계학술대회 논문집 C
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    • pp.1646-1648
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    • 2000
  • This paper investigated structural and electrical properties of $Y_{2}O_3$ as a buffer layer of sin91r transistor FRAM (ferroelectric RAM). $Y_{2}O_3$ buffer layers were deposited at a low substrate temperature below 400$^{\circ}C$ and then RTA (rapid thermal anneal) treated. Investigated parameters are substrate temperature, $O_2$ partial pressure, post- annealing temperature, and suppression of interfacial $SiO_2$ layer generation. for a well-fabricated sample, we achieved that leakage current density ($J_{leak}$) in the order of $10^{-7}A/cm2$, breakdown electric field ($E_{br}$) about 2 MV/cm for $Y_{2}O_3$ film. Capacitance versus voltage analysis illustrated dielectric constants of 7.47. We successfully achieved an interface state density of $Y_{2}O_3$/Si as low as $8.72{\times}10^{10}cm^{-2}eV^{-1}$. The low interface states were obtained from very low lattice mismatch less than 1.75%.

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${N_2}O$ 플라즈마 전처리와 엑시머 레이저 어닐링을 통한 $150^{\circ}C$ 공정의 실리콘 산화막 게이트 절연막의 막질 개선 효과 (High quality $SiO_2$ gate Insulator with ${N_2}O$ plasma treatment and excimer laser annealing fabricated at $150^{\circ}C$)

  • 김선재;한상면;박중현;한민구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.71-72
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    • 2006
  • 플라스틱 기판 위에 유도 결합 플라즈마 화학적 기상 증착장치 (Inductively Coupled Plasma Chemicai Vapor Deposition, ICP-CVD) 를 사용하여 실리콘 산화막 ($SiO_2$)을 증착하고, 엑시머레이저 어널링 (Excimer Laser Annealing, ELA) 과 $N_{2}O$ 플라즈마 전처리를 통해, 전기용량-전압(Capacitance-Voltage, C-V) 특성과 항복 전압장 (Breakdown Voltage Field) 과 같은 전기적 특성을 개선시켰다. 에너지 밀도 $250\;mJ/cm^2$ 의 엑시머 레이저 어닐링은 실리콘 산화막의 평탄 전압 (Flat Band Voltage) 을 0V에 가까이 이동시키고, 유효 산화 전하밀도 (Effective Oxide Charge Density)를 크게 감소시킨다. $N_{2}O$ 플라즈마 전처리를 통해 항복 전압장은 6MV/cm 에서 9 MV/cm 으로 향상된다. 엑시머 레이저 어닐링과 $N_{2}O$ 플라즈마 전처리를 통해 평탄 전압은 -9V 에서 -1.8V 로 향상되고, 유효 전하 밀도 (Effective Charge Density) 는 $400^{\circ}C$에서 TEOS 실리콘 산화막을 증착하는 경우의 유효 전하 밀도 수준까지 감소한다.

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Reactive RF Magnetron Sputter Deposited $Y_2O_3$ Films as a Buffer Layer for a MFIS Transistor

  • Lim, Dong-Gun;Jang, Bum-Sik;Moon, Sang-Il;Junsin Yi
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.47-50
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    • 2000
  • This paper investigated structural and electrical properties of $Y_2$ $O_3$ as a buffer layer of single transistor FRAM (ferroelectric RAM). $Y_2$ $O_3$ buffer layers were deposited at a low substrate temperature below 40$0^{\circ}C$ and then RTA (rapid thermal anneal) treated. Investigated parameters are substrate temperature, $O_2$ partial pressure, post-annealing temperature, and suppression of interfacial $SiO_2$ layer generation. For a well-fabricated sample, we achieved that leakage current density ( $J_{leak}$) in the order of 10$^{-7}$ A/$\textrm{cm}^2$, breakdown electric field ( $E_{br}$ ) about 2 MV/cm for $Y_2$ $O_3$ film. Capacitance versus voltage analysis illustrated dielectric constants of 7.47. We successfully achieved an interface state density of $Y_2$ $O_3$/Si as low as 8.72x1010 c $m^{-2}$ e $V^{-1}$ . The low interface states were obtained from very low lattice mismatch less than 1.75%.

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저 유전 재료의 에칭 공정을 위한 $H_2/N_2$ 가스를 이용한 Capacitively Coupled Plasma 시뮬레이션 (Capacitively Coupled Plasma Simulation for Low-k Materials Etching Process Using $H_2/N_2$ gas)

  • 손채화
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권12호
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    • pp.601-605
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    • 2006
  • The resistance-capacitance (RC) delay of signals through interconnection materials becomes a big hurdle for high speed operation of semiconductors which contain multi-layer interconnections in smaller scales with higher integration density. Low-k materials are applied to the inter-metal dielectric (IMD) materials in order to overcome the RC delay. Relaxation continuum (RCT) model that includes neutral-species transport model have developed to model the etching process in a capacitively coupled plasma (CCP) device. We present the parametric study of the modeling results of a two-frequency capacitively coupled plasma (2f-CCP) with $N_2/H_2$ gas mixture that is known as promising one for organic low-k materials etching. For the etching of low-k materials by $N_2/H_2$ plasma, N and H atoms have a big influence on the materials. Moreover the distributions of excited neutral species influence the plasma density and profile. We include the neutral transport model as well as plasma one in the calculation. The plasma and neutrals are calculated self-consistently by iterating the simulation of both species till a spatio-temporal steady state profile could be obtained.

다공질 실리콘 알코올 가스 센서의 C-V 응답 특성 (C-V Response Properties of Alcohol Vapor Sensors Based on Porous Silicon)

  • 김성진;이상훈;최복길;성만영
    • 한국전기전자재료학회논문지
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    • 제17권6호
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    • pp.592-597
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    • 2004
  • Porous silicon(PS) has received much attention as a sensitive material of chemical sensors because of its large internal surface area. In this work, we fabricated gas-sensing devices based on the porous silicon layer which could be applicable to the measurement of blood alcohol content(BAC), and estimated their electrical properties. The structure of the sensor is similar to an MIS (metal-insulator-semiconductor) diode and consists of thin Au/oxidized PS/PS/p-Si/Al, where the p-Si substrate is etched anisotropically to reduce the thickness. We measured C-V curves from two types of the samples with the PS layer treated by the different anodization current density of 60 or 100 mA/cm$^2$, in order to compare the sensitivity. As a result, the magnitude and variation of capacitances from the devices with the PS formed under the current density of 100 mA/cm$^2$ were found to be more detectable due to the larger internal surface.

정극 활물질 LiMnO2 충.방전과 임피던스 특성 (The Impeditive Properties and Charge/Discharge of Positive Active Material $LiMnO_2$)

  • 위성동;김종옥;구할본
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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    • pp.299-305
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    • 2003
  • The battery industries have been developed to the implementation of lithium ion secondary cell from the cell of Ni/Cd and Ni/MH in the past to be asked of an age of high technology from low technology. Also in resent the polymeric cell to get a good high function with an age of new advanced information system is changed from the 21 century to the secondary batteries society. The properties of lithium secondary batteries have the high energy density, the long cycle time, the low self discharge area and the high active voltage. The wanted properties of secondary batteries for the motion of an apparatuses of industries of an high skill age have a small type trend of the energy density and it is become with a strong asking of the industrial society market about the storable medium of the convenience and new power energy. The electrochemical properties is researched for the cell to be synthesised and crystallized the positive active material LiMnO2 of the secondary cell at 9250C to get a new improved data of the electric discharge for that the capacitance of the LiMnO2 thin film that is improving and researching with the properties and a merit and demerit in the this kind of asking.

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태양광 시스템에 적용한 배터리 커패시터의 전기적 특성에 관한 연구 (A Study on the Electrical Characteristics of Battery Capacitor Applied to Photovoltaic Power System)

  • 맹주철;윤중락
    • 전기학회논문지
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    • 제66권12호
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    • pp.1740-1744
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    • 2017
  • This paper describes the preparation and characteristics of a battery capacitor and module for solar power system. A cylindrical 30,000F battery capacitor ($60{\times}138mm$) was assembled by using the $LTO(Li_4Ti_5O_{12})$ electrode as an anode and $NMC(LiNiMnCoO_2)-LCO(LiCoO_2)$ as a cathode. The battery capacitor has reduced energy density and power density under high CC(constant current) and CP(constant power) conditions. Battery capacitor module (16V, 11Ah) was fabricated using an asymmetric hybrid capacitor with a capacitance of 30,000F. In order to determine the characteristics of the battery capacitor Module for solar power system, battery capacitor cells were connected in series with active balancing circuit. As a result of measuring the 100w LED lamp, it was discharged at the voltage of 15V~10V, and the compensation time at discharge was measured to be about 4979s. Experimental results show that it can be applied to applications related to solar power system by applying battery capacitor module.