• Title/Summary/Keyword: c-Axis orientation

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Preparation and Pervaporative Alcohol Dehydration of Crystallographically b/c-axis Oriented Mordenite Zeolite Membranes (결정학적으로 b/c-축 방향으로 배향된 모데나이트 제올라이트 분리막의 제조 및 투과증발 알코올 탈수 거동)

  • Kim, Young-Mu;Lee, Du-Hyoung;Kim, Min-Zy;Cho, Churl-Hee
    • Membrane Journal
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    • v.28 no.5
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    • pp.340-350
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    • 2018
  • In the present study, crystallographically b- and c-axis oriented mordenite zeolite membranes were prepared and their pervaporative ethanol dehydration was investigated. The seed layer with a high coverage grew to be c-axis oriented dense layer, while the seed layer with a low coverage grew to be b-axis oriented layer. This phenomenon could be explained by the evolutionary selection growth mechanism. The b-axis grown membrane with 8-membered rings showed a high separation factor of above 1000 and a considerable total flux of around $0.2kg/m^2h$. The c-axis grown, columnar structured membrane with 8- and 12-membered rings showed a low separation factor of less than 200 and a relatively high total flux of around $0.25kg/m^2h$. The high performance of b-axis grown membrane was due to the relatively small opening of 8-membered rings. Water molecules can freely permeate through the openings, but ethanol molecules, difficultly. Therefore, in the present study, we introduced a new method to control crystallographic orientation of mordenite membrane by changing seeding amount of needle-like crystals, and elucidated that b-axis oriented mordenite membrane showed better performance than c-axis grown mordenite membrane.

Characterization of the Crystallized ITO Thin Films Grown at Different Temperatures by Off-axis RF Magnetron Sputtering (유연성 기판 위에 증착된 ITO 박막의 공정 온도에 따른 전기적·광학적 특성 평가)

  • Choi, Hyung-Jin;Yoon, Soon-Gil
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.5
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    • pp.397-400
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    • 2013
  • Off-axis magnetron sputtering was used for the crystallized ITO thin films deposition at various temperatures from 25 to $120^{\circ}C$. The ITO thin films were crystallized at $50^{\circ}C$ for Si (001) substrates and at $75^{\circ}C$ for PET substrate. The ITO thin films grown onto PET substrate at $120^{\circ}C$ were crystallized with a (222) preferred orientation. The 160-nm thick ITO films showed a resistivity of about $7{\times}10^{-4}{\Omega}{\cdot}cm$ and a transmittance of about 84% at a wavelength of 550 nm. Off-axis sputtering can be applied for low temperature crystallization of the ITO films.

A Study on C-axis Preferred Orientation of ZnO Thin Film at Ar/$O_2$gas ratios (Ar/$O_2$에 따른 ZnO 박막의 C-축 배향성에 관한 연구)

  • Lee, Dong-Yoon;Park, Yong-Wook;Nam, Sahn;Lee, Jeon-Kook;Kim, Hyun-Jai;Yoon, Seok-Jin;Whang, Keum-Chan
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.7
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    • pp.617-624
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    • 2000
  • Zinc Oxide(ZnO) thin films on Si(100) substrate were deposited by RF magnetron reactive sputtering. The charcteristics of ZnO thin films on argon/oxygen(Ar/O$_2$)gas ratios RF power and substrate temperature were investigated by XRD, SEM, and AFM analyses. C-axis preferred orientation resistivity and surface roughness highly depended on Ar/O$_2$gas ratios. The resistivity of ZnO thin films rapidly increased with increasing oxygen ratio and the resistivity value of 9$\times$10$^{7}$ $\Omega$cm was obtained at a working pressure of 10 mTorr with Ar/O$_2$=50/50. The surface roughness was also improved with increasing oxygen ratio and the ZnO films deposited with Ar/O$_2$=50/50 showed the excellent roughness value of 28.7$\AA$.

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Constructional Characteristics and Propagation Conditions on ZnO Films by Sputtering (스퍼터링에 의한 산화아연박막의 구조적 특성 및 전파경계조건)

  • Lee, Dong-Yoon
    • Proceedings of the Korea Contents Association Conference
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    • 2009.05a
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    • pp.807-809
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    • 2009
  • Thin film deposition methods have been widely used and intensively investigated because high quality crystalline films enable to fabricate by sputtering. Especially rf magnetron sputtering deposition has advantages of being employ a relatively high deposition rate and also to achieve high crystalline films in low pressure because plasma density around target by magnetic is high. To apply ZnO thin film for SAW filter, it has highly flat surface, excellent c-axis preferred orientation and high resistivity value. As-deposited ZnO films showed the strong c-axis growth and excellent crystallinity. C-axis preferred orientation, resistivity and surface roughness highly depended on oxygen/argon gas ratio.

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Epitaxial Growth of ZnO Thin Films on (100) $LaAlO_3$ Substrate by Pulsed Laser Deposition (PLD를 이용한 (100) $LaAlO_3$ 기판위의 ZnO 에피택셜 박막 성장)

  • Cho, Dae-Hyung;Kim, Ji-Hong;Moon, Byung-Moo;Jo, Yeong-Deuk;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.256-256
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    • 2008
  • We report epitaxial growth of ZnO thin films on (100) single-crystalline $LaAlO_3$ (LAO) substrates using pulsed laser deposition (PLD) at different substrate temperatures (400~$800^{\circ}C$). The structural and electrical properties of the films have been investigated by means of X-ray diffraction (XRD), atomic force microscope (AFM), transmission line method (TLM). The poly-crystalline of $\alpha$- and c-axis oriented ZnO film was formed at lower deposition temperature ($T_s$) of $400^{\circ}C$. At higher $T_s$, however, the films exhibit single-crystalline of $\alpha$-axis orientation represented by ZnO[$\bar{1}11$ || LAO <001>. The electrical properties of ZnO thin films depend upon their crystalline orientation, showing lower electrical resistivity values for $\alpha$-axis oriented ZnO films.

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Preparation of AIN piezoelectric thin film for filters (필터용 AIN 압전 박막의 제작)

  • Keum Min-Jong;Kim Yeong-Cheol;Seo Hwa-Il;Kim Kyung-Hwan
    • Journal of the Semiconductor & Display Technology
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    • v.5 no.1 s.14
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    • pp.13-16
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    • 2006
  • AIN thin films were prepared on amorphous glass and $SiO_2(1{\mu}m)/Si(100)$ substrate by the facing targets sputtering (FTS) apparatus, which can provide high density plasma, a high deposition rate at a low working gas pressure. The AIN thin films were deposited at a different nitrogen gas flow rate ($1.0{\sim}0.3$) and other sputtering parameters were fixed such as sputtering power of 200w, working pressures of 1mTorr and AIN thin film thickness of 800 nm, respectively. The thickness and crystallographic characteristics of AIN thin films as a function of $N_2$ gas flow rate $[N_2/(N_2+Ar)]$ were measured by $\alpha$-step and an X-ray diffraction (XRD) instrument. And the c-axis preferred orientations were evaluated by rocking curve. In the results, we could prepared the AIN thin film with c-axis preferred orientation of about $5^{\circ}$ on substrate temperature R.T. at nitrogen gas flow rate 0.7.

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Characterization of Fibroin Biosynthesis in the 5th Instar of Bombyx mori (5령 누에에 있어서 Fibroin 생합성의 특성)

  • 이인전;여주홍
    • Journal of Sericultural and Entomological Science
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    • v.38 no.2
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    • pp.180-185
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    • 1996
  • Biosynthesis tracing of the silk fibroin in Bombyx mori silkworm was examined in vivo with isotopic [1-13C] Gly. labeling by nuclear magnetic resonance method. The [1-13C] Gly. labeled silk fibroin yielded very sharp 13C NMR signal in the posterior silk gland as well as in aqueous solution and the amound of [1-13C] Gly. labeled signal in the silkworm increased gradually and rapidly to 5-th day of fifth instar. However, the decomposition or decrease of the [1-13C] Gly. labeled signal occured from 5-th to 9-th day of fifth instar unexpectedly. These findings suggest that a relative amount of ${\alpha}$-helical portion or amorphous silk II portion was formed without any further signal from 6-th day of fifth instar to pupation. Through peak separation of orientation spectrum, between the fiber axis and the molecular bond direction, N-H bond in Bombyx mori silk fiber as well as the orientation distribution around the silk fibroin axis were determined and two kinds of peaks were also obtained from this orientation spectrum.

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The crystalline characteristics of ZnO deposited on various cooling rates by RF sputter (RF 스퍼터링 법에 의한 ZnO 박막의 결정성과 기판의 냉각속도)

  • Park, Sung-Hyun;Lee, Neung-Hun;Ji, Seung-Han;Jeon, Seok-Hwan;Lee, Sang-Hoon;Chu, Soon-Nam
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.257-258
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    • 2006
  • ZnO thin films were prepared by RF magnetron sputter deposition on p-Si(100) wafer with various cooling rates of substrate temperature such as the substrates were pre-heated to $400^{\circ}C$ before the deposition and then cooled down naturally or slowly to $300^{\circ}C$, $200^{\circ}C$, $100^{\circ}C$, and R.T., by the temperature controller during the deposition. The crystall me and micro-structural characteristics of the films were investigated by XRD and SEM ZnO films which cooled down naturally or slowly by temperature controller during deposition, especially the film were deposited with cooling down from $400^{\circ}C$ to $200^{\circ}C$ slowly, showed the most outstanding c-axis preferred orientation.

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Preparation of Highly Oriented ZnO Thin Films Prepared by Sol-Gel Method

  • Cheol Jeong;Hwang, Kyu-Seog;Moon, Jong-Ha;Kim, Byung-Hoon
    • The Korean Journal of Ceramics
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    • v.3 no.4
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    • pp.249-252
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    • 1997
  • Highly oriented ZnO thin films were fabricated by dip-coating technique using zinc acetate 2-methoxyethanol 2-aminoethanol solution as starting materials, and effects of substrates on the film's orientation were investigated. Product films were obtained by prefiring at 300, 400, 500 and 550℃ for 10 min, followed by final heat-treatment at the same temperatures as prefiring for 1h. c-axis oriented films on glass substrates were prepared by heat treatment of prefiring films at 300-550℃, while films on alumina showed polycrystalline structure. Films with c-axis orientation exhibited lower specific resistivities than those of polycrystalline films with partial crack and pore.

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Properties of CoCrTa Thin Film Introduce Two Step methode and Amorphous Si Under Layer for Perpendicular Magnetic Recording Media (Two Step방식과 아몰퍼스 Si 하지층 도입에 따른 수직자기기록 매체용 CoCrTa 박막의 특성 평가)

  • Park, Won-Hyo;Kim, Kyung-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.550-552
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    • 2003
  • We prepared $Co_{77}Cr_{20}Ta_3$ Magnetic layer for perpendicular magnetic recording media with introduce Two-step methode and Amorphous Si Underlayer on slide glass substrate. The thickness of magnetic layer were 100nm, and Underlayer were varied from 5 to 100 nm. The multi layer Properties of crystal structure were examined with XRD. Prepared thin films showed improvement of dispersion angle of c-axis orientation ${\Delta}{\theta}_{50}$ caused by inserting Buffer-layer and amorphous Si underlayer.

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