• Proceedings of the KIEE Conference
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• 2006.07c
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• pp.1502-1504
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• 2006

본 연구는 $SF_6$와 Dry-air(건조공기)가 혼합된 절연매체의 절연 특성과 부분방전 특성 연구를 위하여 기초실험용 쳄버와 70kV급 GIS mock up 을 이용하여 교류전압을 인가하여 실험이 수행되었다. 전자의 경우, Sphere gap 및 Needle/Plate 전극시스템을 이용하여 순수 $SF_6$가스와 Dry-air의 절연내력을 비교하고, 챔버의 압력을 5기압으로 유지한 상태에서 Dry-air와 $SF_6$가스의 혼합비를 변화시키면서 절연내력이 측정되었다. 후자의 경우, 기초실험에서 도출된 $SF_6$가스와 Dry-air의 최적의 혼합비율을 선택한 후, 방전 개시전압과 부분방전 양상을 순수 $SF_6$가스의 결과와 비교 분석하기 위한 실험을 수행하였다. 이를 위하여 GIS 사고의 주요원인이 되는 결함들, 즉 Protrusion, Floating, Free moving particle 들을 인위적으로 모의하여 Mock up 내부에 설치하고 내부 압력을 5기압으로 유지한 상태에서 수행되었다. 전자의 경우, $0.5{\sim}5$ 기압 범위내 에서 Dry-air 압력을 변화시켰을 때 절연내력은 전극시스템에 무관하게 순수 $SF_6$가스의 결과치의 $40{\sim}50%$정도이다. 또한 챔버 압력이 5기압일 경우, Needle/Plate 전극을 이용했을 경우, Dry-air 가 80% 혼합된 절연매체는 순수 $SF_6$가스 절연내력의 80%정도이다. 후자의 경우, 인가전압을 고정 시켰을 때, 부분방전 패턴과 방전크기는, 순수 $SF_6$가스와 Dry-air 가 80% 혼합된 절연매체는 동일한 패턴과 방전크기를 나타내고 있다. 이러한 결과를 근거로, 가스 압력이 5기압에서 운전되는 전력기기의 절연 매체로서 혼합가스를 사용할 경우, $SF_6$가스와 Dry-air의 혼합비는 2:8정도가 적절한 것으로 제안한다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.12
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• pp.1122-1127
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• 1998

Group II-AF_2$films such as $CaF_2$, $SrF_2$, and $BaF_2$ have been commonly used many practical applications such as silicon on insulatro(SOI), three-dimensional integrated circuits, buffer layers, and gate dielectrics in filed effect transistor. This paper presents electrical and structural properties of fluoride films as a gate dielectric layer. Conventional gate dielectric materials of TFTs like oxide group exhibited problems on high interface trap charge density($D_it$), and interface state incorporation with O-H bond created by mobile hydrogen and oxygen atoms. To overcome such problems in conventional gate insulators, we have investigated $CaF_2$ films on Si substrates. Fluoride films were deposited using a high vacuum evaporation method on the Si and glass substrate. $CaF_2$ films were preferentially grown in (200) plane direction at room temperature. We were able to achieve a minimum lattice mismatch of 0.74% between Si and $CaF_2$ films. Average roughness of $CaF_2$ films was decreased from 54.1 ${\AA}$ to 8.40 ${\AA}$ as temperature increased form RT and $300^{\circ}C$. Well fabricated MIM device showed breakdown electric field of 1.27 MV/cm and low leakage current of $10^{-10}$ A/$cm^2$. Interface trap charge density between $CaF_2$ film and Si substrate was as low as $1.8{\times}10^{11}cm^{-2}eV^{-1}$.

• Korean Journal of Materials Research
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• v.31 no.10
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• pp.539-545
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• 2021

The effect of Sm₂O₃ doping on the microstructure and electrical properties of the ZPCCA-based varistors is comprehensively investigated. The increase of doping content of Sm₂O₃ results in better densification (from 5.70 to 5.82 g/cm³) and smaller mean grain size (from 7.8 to 4.1 ㎛). The breakdown electric field increases significantly from 2568 to 6800 V/cm as the doping content of Sm₂O₃ increases. The doping of Sm₂O₃ remarkably improves the nonlinear properties (increasing from 23.9 to 91 in the nonlinear coefficient and decreasing from 35.2 to 0.2 µA/cm² in the leakage current density). Meanwhile, the doping of Sm₂O₃ reduces the donor concentration (the range of 2.73 × 10¹⁸ to 1.18 × 10¹⁸ cm^-3) of bulk grain and increases the barrier height (the range of 1.10 to 1.49 eV) at the grain boundary. The density of the interface states decreases in the range of of 5.31 × 10¹² to 4.08 × 10¹² cm^-2 with the increase of doping content of Sm₂O₃. The dielectric constant decreases from 1594.8 to 507.5 with the increase of doping content of Sm₂O₃.

• Korean Journal of Materials Research
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• v.34 no.2
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• pp.111-115
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• 2024

Silicon carbide (SiC) has emerged as a promising material for next-generation power semiconductor materials, due to its high thermal conductivity and high critical electric field (~3 MV/cm) with a wide bandgap of 3.3 eV. This permits SiC devices to operate at lower on-resistance and higher breakdown voltage. However, to improve device performance, advanced research is still needed to reduce point defects in the SiC epitaxial layer. This work investigated the electrical characteristics and defect properties using DLTS analysis. Four deep level defects generated by the implantation process and during epitaxial layer growth were detected. Trap parameters such as energy level, capture-cross section, trap density were obtained from an Arrhenius plot. To investigate the impact of defects on the device, a 2D TCAD simulation was conducted using the same device structure, and the extracted defect parameters were added to confirm electrical characteristics. The degradation of device performance such as an increase in on-resistance by adding trap parameters was confirmed.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.11a
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• pp.55-55
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• 2009

Silicon Carbide (SiC) is a material with a wide bandgap (3.26eV), a high critical electric field (~2.3MV/cm), a and a high bulk electron mobility (${\sim}900cm^2/Vs$). These electronic properties allow high breakdown voltage, high frequency, and high temperature operation compared to Silicon devices. Although various SiC DMOSFET structures have been reported so far for optimizing performances. the effect of channel dimension on the switching performance of SiC DMOSFETs has not been extensively examined. In this paper, we report the effect of the interface states ($Q_s$) on the transient characteristics of SiC DMOSFETs. The key design parameters for SiC DMOSFETs have been optimized and a physics-based two-dimensional (2-D) mixed device and circuit simulator by Silvaco Inc. has been used to understand the relationship with the switching characteristics. To investigate transient characteristic of the device, mixed-mode simulation has been performed, where the solution of the basic transport equations for the 2-D device structures is directly embedded into the solution procedure for the circuit equations. The result is a low-loss transient characteristic at low $Q_s$. Based on the simulation results, the DMOSFETs exhibit the turn-on time of 10ns at short channel and 9ns at without the interface charges. By reducing $SiO_2/SiC$ interface charge, power losses and switching time also decreases, primarily due to the lowered channel mobilities. As high density interface states can result in increased carrier trapping, or recombination centers or scattering sites. Therefore, the quality of $SiO_2/SiC$ interfaces is important for both static and transient properties of SiC MOSFET devices.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.9
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• pp.535-540
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• 2017

The changes in the electrical characteristics of CMOS ICs due to coupling with a narrow-band electromagnetic wave were analyzed in this study. A magnetron (3 kW, 2.45 GHz) was used as the narrow-band electromagnetic source. The DUT was a CMOS logic IC and the gate output was in the ON state. The malfunction of the ICs was confirmed by monitoring the variation of the gate output voltage. It was observed that malfunction (self-reset) and destruction of the ICs occurred as the electric field increased. To confirm the variation of electrical characteristics of the ICs due to the narrow-band electromagnetic wave, the pin-to-pin resistances (Vcc-GND, Vcc-Input1, Input1-GND) and input capacitance of the ICs were measured. The pin-to-pin resistances and input capacitance of the ICs before exposure to the narrow-band electromagnetic waves were $8.57M{\Omega}$ (Vcc-GND), $14.14M{\Omega}$ (Vcc-Input1), $18.24M{\Omega}$ (Input1-GND), and 5 pF (input capacitance). The ICs exposed to narrow-band electromagnetic waves showed mostly similar values, but some error values were observed, such as $2.5{\Omega}$, $50M{\Omega}$, or 71 pF. This is attributed to the breakdown of the pn junction when latch-up in CMOS occurred. In order to confirm surface damage of the ICs, the epoxy molding compound was removed and then studied with an optical microscope. In general, there was severe deterioration in the PCB trace. It is considered that the current density of the trace increased due to the electromagnetic wave, resulting in the deterioration of the trace. The results of this study can be applied as basic data for the analysis of the effect of narrow-band high-power electromagnetic waves on ICs.

• Journal of Korean Society for Geospatial Information Science
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• v.23 no.3
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• pp.69-75
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• 2015

Road facilities for safe driving were designed for drivers to distinguish them during day and night, but they cannot play their role when the weather becomes worse. Recently, the road facilities have been designed by using electric and electronic technology so that they can be displayed well at a long distance, but they should be replaced very often due to their frequent breakdown. So, there are many problems in traffic calming and maintenance. In this study, to solve the above problems, semi-permanent LED beacon light was installed in the area where traffic accident are frequent, and monitoring system was developed so that the LED beacon light can be maintenanced by connecting with system. For the above installation and development, system was based on window operating system and it was developed for worker to operate it by using P.C. through connecting with wireless local area network. The result of this study led to analyzing state information on the battery of field-installed LED beacon light in real time, and manegement to effectively by predicting their life cycle.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.51 no.8
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• pp.340-346
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• 2002

Capacitor material utilized in the downsizing passive devices and integration of passive devices requires the physical and electrical properties at given area such as capacitor thickness reduction, relative dielectric constant increase, low leakage current and thermal stability. common capacitor materials, $Al_2O_3$, $SiO_2$, $Si_3N_4$, $SiO_2$/$Si_3N_4$, TaN and et al., used until recently have reached their physical limits in their application to integration of passive devices. $Ta_2O_{5}$ is known to be a good alternative to the existing materials for the capacitor application because of its high dielectric constant (25~35), low leakage current and high breakdown strength. Despite the numerous investigations of $Ta_2O_{5}$ material, there have little been established the clear understanding of the annealing effect on capacitance characteristic and conduction mechanism. This study presents the dielectric properties $Ta_2O_{5}$ MIM capacitor structure Processed by $O_2$ RTA oxidation. X-ray diffraction patterns showed the existence of amorphous phase in $600^{\circ}C$ annealing under the $O_2$ RTA and the formation of preferentially oriented-$Ta_2O_{5}$ in 650, $700^{\circ}C$ annealing and the AES depth profile showed $O_2$ RTA oxidation effect gives rise to the $O_2$ deficientd into the new layer. The leakage current density respectively, at 3~1l$\times$$10_{-2}$(kV/cm) were $10_{-3}$~$10_{-6}$(A/$\textrm{cm}^2$). In addition, behavior is stable irrespective of applied electric field. the frequency vs capacitance characteristic enhanced stability more then $Ta_2O_{5}$ thin films obtained by $O_2$ reactive sputtering. The capacitance vs voltage measurement that, Vfb(flat-band voltage) was increase dependance on the $O_2$ RTA oxidation temperature.

• Journal of the Optical Society of Korea
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• v.13 no.1
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• pp.8-14
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• 2009

In a laser-plasma wakefield accelerator, the ponderomotive force of an ultrashort high intensity laser pulse excites a longitudinal wave or plasma bubble in a way similar to the excitation of a wake wave behind a boat as it propagates on the water surface. Electric fields inside the plasma bubble can be several orders of magnitude higher than those available in conventional RF-based particle accelerator facilities which are limited by material breakdown. Therefore, if an electron bunch is properly phase-locked with the bubble's acceleration field, it can gain relativistic energies within an extremely short distance. Here, in the bubble regime we show the generation of stable and reproducible sub GeV, and GeV-class electron beams. Supported by three-dimensional particle-in-cell simulations, our experimental results show the highest acceleration gradients produced so far. Simulations suggested that the plasma bubble elongation should be minimized in order to achieve higher electron beam energies.

• The Journal of the Institute of Internet, Broadcasting and Communication
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• v.21 no.6
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• pp.25-32
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• 2021

In this study, it proposes a mode converter that is relatively easy to implement and can shorten the transmission line length of the final combining port and it was fabricated and tested by applying it to an 8-way spatial combiner. The proposed mode converter converts the signal converted from the doorknob-shaped circular disk connected to the ground into the TM₀₁ mode by opening it in the circular waveguide. The 8-way waveguide spatial combiner is designed and implemented so that 8 signals input from the H-plane are combined in a circular waveguide at the center, and the final combining mode is TM₀₁. The test results confirmed excellent performance with an insertion loss of less than 0.4dB and a combining efficiency of 95% or more. In addition, it was confirmed that it is suitable for high output by calculating the breakdown voltage and discharge threshold power of the new mode conversion structure through electric field analysis. The results confirmed through this study are expected to be applicable to high-power, high-efficiency SSPA in various fields in the future.