• 제목/요약/키워드: bias voltage

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마이크로웨이브 화학 기상 증착법을 이용한 다이아몬드 박막의 증착 (Deposition of diamond thin film by MPECVD method)

  • Sung Hoon Kim;Young Soo Park;Jo-Won Lee
    • 한국결정성장학회지
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    • 제4권1호
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    • pp.92-99
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    • 1994
  • 마이크로웨이브 화학 기상 중착법을 이용하여 n 형 Si(100) 기팡위에 다이아몬드 박막을 증착하였다. 다이아몬드의 핵생성 밀도를 향상시키기 위하여 Si 기판을 다이아몬드 분말로 전처리 하거나 negative bias를 인가하여 다이아몬드 박막을 증착하였다. 전처리한 기판에서는 다이아몬드의 순수도가 전체압력이 증가함에 따라 (20~150 Torr)향상되었으며 bias 인가시에는$CH_4$ 농도와 전체압력에 따라 다이아몬드의 생성유무가 결정되었다.플라즈마의 이온에 의해 가판위에 생성되는 전류를 $CH_4$ 농도, bias 전압, 그리고 전체압력에 따라 측정하였으며 그 결과를 다이아몬드 박막의 생성 조건과 관련시켜 검토 하였다.

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Effect of Bias Magnetic Field on Magnetoelectric Characteristics in Magnetostrictive/Piezoelectric Laminate Composites

  • Chen, Lei;Luo, Yulin
    • Journal of Magnetics
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    • 제20권4호
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    • pp.347-352
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    • 2015
  • The magnetoelectric (ME) characteristics for Terfenol-D/PZT laminate composite dependence on bias magnetic field is investigated. At low frequency, ME response is determined by the piezomagnetic coefficient $d_{33,m}$ and the elastic compliance $s_{33}^H$ of magnetostrictive material, $d_{33,m}$ and $s_{33}^H$ for Terfenol-D are inherently nonlinear and dependent on $H_{dc}$, leading to the influence of $H_{dc}$ on low-frequency ME voltage coefficient. At resonance, the mechanical quality factor $Q_m$ dependences on $H_{dc}$ results in the differences between the low-frequency and resonant ME voltage coefficient with $H_{dc}$. In terms of ${\Delta}E$ effect, the resonant frequency shift is derived with respect to the bias magnetic field. Considering the nonlinear effect of magnetostrictive material and $Q_m$ dependence on $H_{dc}$c, it predicts the low-frequency and resonant ME voltage coefficients as a function of the dc bias magnetic field. A good agreement between the theoretical results and experimental data is obtained and it is found that ME characteristics dependence on $H_{dc}$ are mainly influenced by the nonlinear effect of magnetostrictive material.

Frriction and Wear of Siamond-Like Carbon Films Produced by Plasma-Assisted CVD Technique

  • AkihiroTanaka;KazunoriUmeda;KazuyukiMizuhara;Ko, Myoung-Wan;Kim, Seong-Young;Shin, Seung-Yong;Lee, Sang-Hyun
    • The Korean Journal of Ceramics
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    • 제3권3호
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    • pp.182-186
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    • 1997
  • Diamond-like carbon(DLC) films were deposited on silicon substreates by using an RF plasmaassisted CVD apparatus; the effects of deposition conditions such as CH4 gas pressure and substrate bias voltage on DLC film friction and wear were examined in both friction and scratch tests. In friction tests critical loads at which the friction coefficient increases abruptly depend on substrate bias voltages: critical loads deposited at a bias voltage of -100 V exceed those deposited at other bias voltages. Critical loads are correlated with DLC film hydrogen content. Critical DLC film loads in scratch tests depended considerably less than in friction tests. The friction coefficient of DLC films depends on neither substrate bias voltage nor CH4 gas pressure.

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Fabrication and Electrical Transport Characteristics of All-Perovskite Oxide DyMnO3/Nb-1.0 wt% Doped SrTiO3 Heterostructures

  • Wang, Wei Tian
    • 한국재료학회지
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    • 제30권7호
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    • pp.333-337
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    • 2020
  • Orthorhombic DyMnO3 films are fabricated epitaxially on Nb-1.0 wt%-doped SrTiO3 single crystal substrates using pulsed laser deposition technique. The structure of the deposited DyMnO3 films is studied by X-ray diffraction, and the epitaxial relationship between the film and the substrate is determined. The electrical transport properties reveal the diodelike rectifying behaviors in the all-perovskite oxide junctions over a wide temperature range (100 ~ 340 K). The forward current is exponentially related to the forward bias voltage, and the extracted ideality factors show distinct transport mechanisms in high and low positive regions. The leakage current increases with increasing reverse bias voltage, and the breakdown voltage decreases with decrease temperature, a consequence of tunneling effects because the leakage current at low temperature is larger than that at high temperature. The determined built-in potentials are 0.37 V in the low bias region, and 0.11 V in the high bias region, respectively. The results show the importance of temperature and applied bias in determining the electrical transport characteristics of all-perovskite oxide heterostructures.

화학증착법에 의한 티타늄 피복된 고속도강에의 다이아몬드 박막 형성 (The formation of diamond films on high speed steel with a titanium inter- layer by electron-assisted CVD process)

  • 정연진;이건영;이호진;최진일
    • 한국결정성장학회지
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    • 제14권1호
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    • pp.6-11
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    • 2004
  • Bias 인가된 hot filament CVD 방법을 이용해 티타늄을 RF sputtering 법으로 고속도강에 피복하여 중간 층으로 한 후 다이아몬드 박막을 피복할 때 bias 전압의 영향과 계면 층의 특성을 조사하였다. 다이아몬드 증착 시 bias가 인가될 경우 필라멘트에서 전자 방출이 촉진되어 다이아몬드 핵생성과 성장을 촉진시켰으며 본 실험에서의 최적 증착 조건은 증착 압력 20 torr, bias 인가전압 200V, 기판온도 $700^{\circ}C$로 나타났다. 강에의 다이아몬드 박막 형성 시 중간 층으로서의 티타늄은 Fe 및 C에 대한 확산도가 높고 탄화물 형성 원소이므로 다이아몬드 핵생성 및 성장에 적합한 원소로 나타났다.

2 단계 펄스 주입을 이용한 프로그램 방법에서 백바이어스 효과 (Back bias effects in the programming using two-step pulse injection)

  • 안호명;장영걸;김희동;서유정;김태근
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.258-258
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    • 2010
  • In this work, back bias effects in the program of the silicon-oxide-nitride-oxide-silicon (SONOS) cell using two-step pulse sequence, are investigated. Two-step pulse sequence is composed of the forward biases for collecting the electrons at the substrate terminal and back bias for injecting the hot electrons into the nitride layer. With an aid of the back bias for electron injection, we obtain a program time as short as 600 ns and an ultra low-voltage operation with a substrate voltage of -3 V.

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바이어스 동작점을 이용한 쇼트키 다이오드 선형화기 설계 (Design of the Shottky Diode Linearizer using a Bias Point)

  • 도대주;이원희;허정;이종악
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2001년도 하계종합학술대회 논문집(1)
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    • pp.393-396
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    • 2001
  • In this paper, a new type of linearizer using a parallel diode with a bias feed resistance has been studied. It has positive gain and negative phase deviations because of a nonlinearity of the diode and movement of bias point cause by a voltage drop at the bias feed resistance. This predistortion linearizer consists of the little component and miniaturizes circuit design. The characteristics of this linearizer can be easily tuned using input bias voltage. In fabricated linearizer, maximum gain and Phase deviation of the linearizer is 1dB, 21$^{\circ}$ respectively. By applying its characteristics to the power amplifier, it will be linearized power amplifier.

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An OTA with Positive Feedback Bias Control for Power Adaptation Proportional to Analog Workloads

  • Kim, Byungsub;Sim, Jae-Yoon;Park, Hong-June
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제15권3호
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    • pp.326-333
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    • 2015
  • This paper reports an adaptive positive feedback bias control technique for operational transconductance amplifiers to adjust the bias current based on the output current monitored by a current replica circuit. This technique enables operational transconductance amplifiers to quickly adapt their power consumption to various analog workloads when they are configured with negative feedback. To prove the concept, a test voltage follower is fabricated in $0.5-{\mu}m$ CMOS technology. Measurement result shows that the power consumption of the test voltage follower is approximately linearly proportional to the load capacitance, the signal frequency, and the signal amplitude for sinusoidal inputs as well as square pulses.

수열 합성된 나노구조를 갖는 ZnO 에 대한 표면 및 계면 결함의 상대적인 영향 (Relative Influence of Surface and Interfacial Defects in Hydrothermally Grown Nanostructured ZnO)

  • 박철민;이지혜;소혜미;장원석
    • 대한기계학회논문집B
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    • 제38권10호
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    • pp.831-835
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    • 2014
  • 온도를 달리하여 수열합성 시킨 두 ZnO nanostructure 의 자외선 검출 소자에 대해 표면 결함과 기판과의 계면 결함의 상대적인 영향을 분석했다. 실험은 laser 가 인가된 상태에서 bias voltage sweep rate을 조절하여, 그에 따른 전류-전압 곡선을 통해 이루어졌다. 수열 성장이 적게 된 ZnO nanostructure의 경우 405, 355 nm laser 인가시, bias voltage sweep rate 을 느리게 할 수록, 전류-전압 기울기가 낮아졌으며, 대조적으로 성장이 크게 된 시료의 경우 기울기가 높아졌다. 이에 대한 이유는 계면과 표면 결함 영향의 차이로 발생됨이 고려됐다. 이와 같이 laser 가 인가된 상태에서 bias voltage sweep rate 에 따른 전류-전압 곡선 분석 실험은 M-S-M (Metal-Semiconductor-Metal) 구조를 갖는 수열 성장된 ZnO 의 표면 및 계면 결함을 관찰하는데 도움을 줄 것으로 생각된다.

Experimental investigation on the degradation of SiGe LNAs under different bias conditions induced by 3 MeV proton irradiation

  • Li, Zhuoqi;Liu, Shuhuan;Ren, Xiaotang;Adekoya, Mathew Adefusika;Zhang, Jun;Liu, Shuangying
    • Nuclear Engineering and Technology
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    • 제54권2호
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    • pp.661-665
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    • 2022
  • The 3 MeV proton irradiation effects on SiGe low noise amplifier (LNA) (NXP BGU7005) performance under different voltage supply VCC (0 V, 2.5 V) conditions were firstly experimental studied in this present work. The S parameters including S11, S22, S21, 1 dB compression point and noise figure (NF) of the test samples under different bias voltage supply were measured and compared before and after 3 MeV proton irradiation. The total proton irradiation fluence was 1 × 1015 protons/cm2. The maximum degradation quantities of the gain S21 and NF of the test samples under zero bias are measured respectively 1.6 dB and 1.2 dB. Compared with the samples under 2.5 V bias supply, the maximum degradation of S21 and NF are respectively 1.1 dB and 0.8 dB in the whole frequency band. It is noteworthy that the gain and NF of SiGe LNAs under zero-bias mode suffer enhanced degradation compared with those under normal bias supply. The key influence factors are discussed based on the correlation of the SiGe device and the LNA circuit. Different process of the ionization damage and displacement damage under zero-bias and 2.5 V bias voltage supply contributed to the degradation difference. The underlying physical mechanisms are analyzed and investigated.