• 제목/요약/키워드: bias voltage

검색결과 1,266건 처리시간 0.043초

Effect of Bias Voltage on the Micro Discharge Characteristics of MgO Film prepared by Unbalanced Magnetron Sputtering

  • Kim, Young-Kee;Park, Jung-Tea;Park, Cha-Soo;Cho, Jung-Soo;Park, Chung-Hoo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.101-102
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    • 2000
  • The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the de bias voltage of -10V showed lower discharge voltage, lower erosion rate by ion bombardment, higher optic transparency and higher crack resistance in annealing process than those samples prepared by conventional magnetron sputtering or E-beam evaporation.

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EACVD법에 의한 고속도강에의 c-BN박막형성 및 특성에 관하여 (The Characteristics of c-BN Thin Films on High Speed Steel by Electron Assisted Hot Filament C.V.D Systems)

  • 이건영;최진일
    • 한국표면공학회지
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    • 제39권3호
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    • pp.87-92
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    • 2006
  • The characteristic of interface layer and the effect of bias voltage on the microstructure of c-BN films were studied in the microwave plasma hot filament C.V.D process. c-BN films were deposited on a high speed steel(SKH-51) substrate by hot filament CVD technique assisted with a microwave plasma to develop a high performance of resistance coating tool. c-BN films were obtained at a gas pressure of 20 Torr, vias voltage of 300 V and substrate temperature of $800^{\circ}C$ in $B_2H_6-NH_3-H_2$ gas system. It was found that a thin layer of hexagonal boron nitride(h-BN) phase exists at the interface between c-BN layer and substrate.

고속 입자 충격을 도입한 AC PDP의 MgO 보호층 형성에 관한 연구 (Preparation of MgO Protective layer for AC PDP by High Energy Particle Bombardment)

  • 김영기;박정태;고광식;김규섭;조정수;박정후
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제49권9호
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    • pp.527-532
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    • 2000
  • The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with dc bias voltage of -10V showed lower discharge voltage and lower erosion rate byion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardement during deposition process.

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Macro Modeling and Parameter Extraction of Lateral Double Diffused Metal Oxide Semiconductor Transistor

  • Kim, Sang-Yong;Kim, Il-Soo
    • Transactions on Electrical and Electronic Materials
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    • 제12권1호
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    • pp.7-10
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    • 2011
  • High voltage (HV) integrated circuits are viable alternatives to discrete circuits in a wide variety of applications. A HV device generally used in these circuits is a lateral double diffused metal oxide semiconductor (LDMOS) transistor. Attempts to model LDMOS devices are complicated by the existence of the lightly doped drain and by the extension of the poly-silicon and the gate oxide. Several physically based investigations of the bias-dependent drift resistance of HV devices have been conducted, but a complete physical model has not been reported. We propose a new technique to model HV devices using both the BSIM3 SPICE model and a bias dependent resistor model (sub-circuit macro model).

접합 부분의 농도 변화를 갖는 PtSi-nSi 소자에서 신뢰성 분석 (Reliability Analysis in PtSi-nSi Devices with Concentration Variations of Junction Parts)

  • 이용재
    • 한국정보통신학회논문지
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    • 제3권1호
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    • pp.229-234
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    • 1999
  • 측정 온도 변화와 n-형 실리콘 기판 농도의 변화를 갖는 백금 쇼트키 다이오드에서 신뢰성 특성을 분석하였다. 신뢰성 측정분석의 파라미터는 순방향 바이어스에서 포화전류, 임계전압과 이상인자이고, 소자의 모양에 따라서 역방향 바이어스에서 항복전압이다. 소자의 모양은 가장자리 효과를 위한 긴직사각형과 정사각형이다. 결과로써, 백금과 엔-실리콘 접합 부분에서 증가된 농도에 의해 순방향 임계전압, 장벽높이와 역방향 항복전압은 감소되었지만 이상인자와 포화전류는 증가되었다. 순방향과 역방향 바이어스 하에서 신뢰성 특성의 추출된 전기적 파라미터 값들은 측정온도(실온,$50^{\circ}C$, $75^{\circ}C$)에서 더 높은 온도에서 증가되었다. 긴직사각형 소자가 가장자리 부분의 터널링 효과에 의해 역방향 항복 특성에서 정사각형 소자보다 감소되었다.

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전극 변화에 따른 유기 발광 소자의 내장 전압 (Built-in voltage depending on electrode in organic light-emitting diodes)

  • 윤희명;이은혜;이원재;정동회;오용철;김태완
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 춘계학술대회 논문집
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    • pp.14-16
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    • 2008
  • Built-in voltage in organic light-emitting diodes was studied using modulated photocurrent technique ambient conditions. From the bias voltage-dependent photocurrent, built-in voltage of the device is determined. The applied bias voltage when the magnitude of modulated photocurrent is zero corresponds to a built-in voltage. Built-in voltage in the device is generated due to a difference of work function of the anode and cathode. A device was made with a structure of anode/$Alq_3$/cathode to study a built-in voltage. ITO was used as an anode, and Al and LiAl were used as a cathode. A layer thickness of Al and LiAl were 100nm. Obtained built-in voltage is about 1.0V in the Al layer was used as a cathode. The obatined built-in voltage is about 1.6V in the LiAl layer was used as a cathode. The result of built-in voltage is dependent of cathode. We can see that the built-in voltage increase up to 0.4V when the LiAl layer was used as the cathode. These results correspond to the work function of LiAl which is lower than that of Al. As a result, the barrier height for an electron injection from the cathode to the organic layer could be lowered when the LiAl was used as a cathode.

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저전압 DRAM 회로 설계 검토 및 제안 (Reviews and Proposals of Low-Voltage DRAM Circuit Design)

  • 김영희;김광현;박홍준;위재경;최진혁
    • 대한전자공학회논문지SD
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    • 제38권4호
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    • pp.251-265
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    • 2001
  • 반도체 소자가 소형화 되면서 소자의 신뢰성을 유지하고 전력 소모를 줄이기 위해 기가-비트 DRAM의 동작 전압은 1.5V 이하로 줄어들 것으로 기대된다. 따라서 기가-비트 DRAM을 구현하기 위해 저전압 회로 설계 기술이 요구된다. 이 연구에서는 지금까지 발표된 저전압 DRAM 회로 설계 기술에 대한 조사결과를 기술하였고, 기가-비트 DRAM을 위해 4가지 종류의 저전압 회로 설계 기술을 새로이 제안하였다. 이 4가지 저전압 회로 설계 기술은 subthreshold 누설 전류를 줄이는 계층적 negative-voltage word-line 구동기, two-phase VBB(Back-Bias Voltage) 발생기, two-phase VPP(Boosted Voltage) 발생기와 밴드갭 기준전압 발생기에 대한 것인데, 이에 대한 테스트 칩의 측정 결과와 SPICE 시뮬레이션 결과를 제시하였다.

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A Study of the Relationship Analysis of Power Conversion and Changed Capacitance in the Depletion Region of Silicon Solar Cell

  • Kim, Do-Kyeong;Oh, Yeong-Jun;Kim, Sang-Hyun;Hong, Kyeong-Jin;Jung, Haeng-Yeon;Kim, Hoy-Jin;Jeon, Myeong-Seok
    • Transactions on Electrical and Electronic Materials
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    • 제14권4호
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    • pp.177-181
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    • 2013
  • In this paper, silicon solar cells are analyzed regarding power conversion efficiency by changed capacitance in the depletion region. For the capacitance control in the depletion region of silicon solar cell was applied for 10, 20, 40, 80, 160 and 320 Hz frequency band character and alternating current(AC) voltage with square wave of 0.2~1.4 V. Academically, symmetry formation of positive and negative change of the p-n junction is similar to the physical effect of capacitance. According to the experiment result, because input of square wave with alternating current(AC) voltage could be observed to changed capacitance effect by indirectly method through non-linear power conversion (Voltage-Current) output. In addition, when input alternating current(AC) voltage in the silicon solar cell, changed capacitance of depletion region with the forward bias condition and reverse bias condition gave a direct effect to the charge mobility.

레이저 빔을 이용한 비정질실리콘 전기적 특성의 비파괴 측정 (Nondestructive Measurement on Electrical Characteristics of Amorphous Silicon by Using the Laser Beam)

  • 박남천
    • 한국항해항만학회:학술대회논문집
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    • 한국항해항만학회 2000년도 추계학술대회논문집
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    • pp.36-39
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    • 2000
  • A small electrical potential difference which appears on any solid body when subjected to illumination by a modulated light beam generated by laser is called photocharge voltage(PCV)[1,2]. This voltage is proportional to the induced change in the surface electrical charge and is capacitatively measured on various materials such as conductors, semiconductors, ceramics, dielectrics and biological objects. The amplitude of the detected signal depends on the type of material under investigation, and on the surface properties of the sample. In photocharge voltage spectroscopy measurements[3], the sample is illuminated by both a steady state monochromatic bias light and the pulsed laser. The monochromatic light is used to created a variation in the steady state population of trap levels in the surface and space charge region of semiconductor samples which does result in a change in the measured voltage. Using this technique the spatial variation of PCV can be utilized to evalulate the surface conditions of the sample and the variation of the PCV due to the monochromatic bias light are utilized to charactrize the surface states. A qualitative analysis of the proposed measuremen is present along with experimental results performed on amorphous silicon samples. The deposition temperature was varied in order to obtain samples with different structural, optical and electronic properties and measurements are related to the defect density in amorphous thin film.

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ISL 게이트에서 측정과 시뮬레이션의 결과 비교 (The Results Comparison of Measurement and Simulations in ISL(Integrated Schottky Logic) Gate)

  • 이용재
    • 한국정보통신학회논문지
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    • 제5권1호
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    • pp.157-165
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    • 2001
  • 집적 쇼트키 논리 게이트에서 전압 스윙을 크게 하기 위해서 백금 실리사이드 쇼트키 접합의 전기직 특성을 분석하였고, 이 접합에서 프로그램으로 특성을 시뮬레이션 하였다. 분석특성 특성을 위한 시뮬레이션 프로그램은 제조 공정용 SUPREM V와 모델링용 Matlab, 소자 구조용의 Medichi 툴이다. 시뮬레이션 특성을 위한 입력 파라미터는 소자 제작 공정의 공정 단계와 동일한 조건으로 하였다. 분석적인 전기적인 특성들은 순방향 바이어스에서 턴-온 전압, 포화 전류, 이상인자이고, 역방향 바이어스에서 항복 전압을 실제 특성과 시뮬레이션 특성 사이의 결과를 보였다. 결과로써 순방향 턴-온 전압, 역방향 항복전압, 장벽 높이는 기판의 증가된 농도의 변화에 따라 감소되었지만, 포화전류와 이상인자는 증가되었다.

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