• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1295-1298
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• 2006

Influences of anti-reflection surface treatment, radius of curvature and ambient illuminance on legibility of reflective-type displays were studied. The results showed that legibility mainly depended on the surface treatment. Better surface treatment also produced less visual fatigue after the letter-search task

• 한국세라믹학회지
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• 제30권9호
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• pp.775-783
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• 1993

TiO2-SiO2 system anti-reflective(AR) film was prepared to decrease reflectance on the glass surface. The experiments were carried out as fellow, 1) preparation & hydrolysis of TiO2-SiO2 system sols. 2) glass dipping, and 3) drying & heat treatment. We investigated the refractive index and thickness of film with viscosity, zeta-potential of sol, sol concentration, withdrawal speed, drying and heat treatment condition. As a result, we prepared good qualitative Quarter-Half-Quarter type anti-reflective film that had minimum, 0.02% and average reflectance, 0.087% in the visible region.

• Applied Science and Convergence Technology
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• 제23권1호
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• pp.27-33
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• 2014

We have studied photovoltaic characteristics of single-junction GaAs solar cells with/without an $MgF_2/ZnS$ anti-reflective coating (ARC) illuminated by low-density concentration (<10 suns). By the ARC deposition, the short-circuit current density ($J_{SC}$) and the fill factor (FF) are increased by $5mA/cm^2$ and 5% at a standard illumination (1 sun), respectively, and the resulted conversion efficiency is enhanced by 45%. In contrast with the cell with no ARC showing a rapid degradation with increasing concentration power, the efficiency of ARC-deposited cell remains almost constant as ($17.7{\pm}0.3$)% regardless of the concentration. It informs that ARC treatment is very effective in GaAs concentrator solar cells.

• 한국재료학회:학술대회논문집
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• 한국재료학회 1997년도 한국재료학회 추계학술발표회
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• pp.39-39
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• 1997

• 한국세라믹학회지
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• 제45권9호
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• pp.524-530
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• 2008

Anti-Reflective (AR) thin film coatings of $SiO_2$ (n= 1.48) and $TiO_2$ (n=2.17) were deposited by ion-beam assisted deposition (IBAD) with End-Hall ion source and conventional electron beam (e-beam) evaporation to investigate the effect of deposition method on the refractive indicies (n) of the fIlms. Green-light generation using a GaAs laser diode was achieved via excitation of the second harmonic. The latter resulted from the transmission of the fundamental guided-mode wave of 1064 nm through periodically poled $LiNbO_3$. Large differences in the refractive indicies of each of the layers in the multilayer coating may improve AR performance. IBAD of $SiO_2$ reduced its refractive index from 1.45 to 1.34 at 1064 nm. Conversely, e-beam evaporation of $TiO_2$ increased its refractive index from 1.80 to 2.11. In addition, no fluctuations in absorption at the wavelength of 1064 nm were found. The results suggest that films prepared by different deposition methods can increase the effectiveness of multilayer AR coatings.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 춘계학술대회 논문집 전자세라믹스 센서 및 박막재료 반도체재료 일렉트렛트 및 응용기술
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• pp.39-42
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• 2000

As gate dimensions continue to shrink below $0.2{\mu}m$, improving CD (Critical Dimension) control has become a major challenge during CMOS process development. Anti-Reflective Coatings are widely used to overcome high substrate reflectivity at Deep UV wavelengths by canceling out these reflections. In this study, we have investigated Batchtype system for PECVO SiOxNy as Anti-Reflective Coatings. The Singletype system was baseline and Batchtype system was new process. The test structure of Singletype is SiON $250{\AA}$ + Cap Oxide $50{\AA}$ and Batchtype is SiON $250{\AA}$ + Cap Oxide $50{\AA}$ or N2O plasma treatment. Inorganic chemical vapor deposition SiOxNy layer has been qualified for bottom ARC on Poly+WSix layer, But, this test was practiced on the actual device structure of TiN/Al-Cu/TiN/Ti stacks. A former day, in Batchtype chamber thin oxide thickness control was difficult. In this test, Batchtype system is consist of six deposition station, and demanded 6th station plasma treatment kits for N2O treatment or Cap Oxide after SiON $250{\AA}$. Good reflectivity can be obtained by Cap Oxide rather than N2O plasma treatment and both system of PECVD SiOxNy ARC have good electrical properties.

• 한국진공학회지
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• 제17권2호
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• pp.138-147
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• 2008

RF 스퍼터링 시스템을 이용하여 $SiO_2/TiO_2/ZrO_2$ 광대역 반사방지막을 단계별로 제작하였고, 분광타원계와 $UV-V_{is}$ 분광광도계를 이용하여 박막의 두께, 굴절률 및 투과율 스펙트럼을 300$\sim$900nm의 파장 영역에 걸쳐 측정 및 분석하였다. 측정 및 분석된 박막의 두께, 굴절률 및 투과율 스펙트럼을 설계값과 비교 평가한 결과 각층의 두께, 굴절률의 차이에 따른 투과율의 변화를 분석할 수 있었고, 박막의 두께보다는 굴절률과 굴절률의 분산형태가 투과율의 변화에 더 크게 기여함을 알 수 있었다.

• 한국표면공학회지
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• 제52권2호
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• pp.84-89
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• 2019

We fabricated durable anti-reflective(AR) layer with silica globular coating on polymer by two steps. Firstly, nano-protrusions of polymer were formed by plasma etching known as R.I.E(reactive ion etching) process. Secondly, silica globular coating was deposited on polymer nano-protrusions for mechanically protective and optically enhancing AR layers by RF magnetron sputter. And then durable antireflective polymers were synthesized adjusting plasma power and time, working pressures of RIE and RF sputtering processes. Consequently, we acquired the average transmission (94.10%) in the visible spectral range 400-800 nm and the durability of AR layer was verified to sustain its transmission until 5,000 numbers by rubber test at a load of 500 gf.

• 공업화학
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• 제26권4호
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• pp.400-405
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• 2015

Tetraethylorthosilicate (TEOS)를 전구체로서 이용하여 제조된 기존의 반사방지(AR; anti-reflective) 코팅막은 대부분 수분을 쉽게 흡수할 뿐만 아니라 낮은 내마모성을 갖는다. 본 연구에서는 AR 코팅막의 투과율, 소수성 및 내마모성을 향상할 목적으로 전구체로서 methyltrimethoxysilane (MTMS)를 사용하고 불소 실란, 산 촉매, 염기 촉매 및 산-염기 2단계 촉매를 첨가하여 다양한 AR 코팅막을 제조하였다. 제조된 AR 코팅막은 UV-Vis, 접촉각 측정기, AFM, 연필경도 및 부착성 시험을 통해 특성을 분석하였다. 그 결과, 경화온도가 $300^{\circ}C$일 때 코팅되지 않은 유리 기판의 투과율은 90.5%인 반면, AR 코팅된 유리 기판의 투과율은 94.8%로 증가하였다. 불소 실란을 첨가한 경우, 소수성이 크게 향상되었음을 나타내듯이 AR 코팅막 표면에서의 접촉각은 $96.3^{\circ}$에서 $108^{\circ}$까지 증가하였다. AR 코팅막의 내마모성은 산 촉매에 의해 향상되었으며, 그것의 투과율은 염기 촉매에 의해 증가하였다. 산-염기 2단계 촉매 반응에 의해 제조한 AR 코팅막의 경우, 상승 효과에 의해 촉매의 도입 없이 제조된 AR 코팅막과 비교하여 투과율 및 내마모성이 향상되었다.

• 공업화학
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• 제30권3호
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• pp.358-364
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• 2019

반사 방지(anti-reflective; AR) 코팅막의 광학 특성 및 내오염성을 향상하기 위하여 tetraethylorthosilicate (TEOS)/염기 및 methyltrimethoxysilane (MTMS)/산 혼성 용액의 혼합비를 변화시키며 다양한 AR 코팅막을 제조하였다. 제조된 AR 코팅막은 UV-Vis, 접촉각 측정기, AFM, FT-IR 및 연필 경도 시험을 통해 특성을 분석하였다. MTMS/산 용액의 함량이 10 wt%인 혼성 용액으로 제조한 AR 코팅막에서 유리 기판은 매우 우수한 광학 특성(97.2%의 투과율), 우수한 내오염성($121^{\circ}$의 물 접촉각 및 $90^{\circ}$의 $CH_2I_2$ 접촉각), 중간 정도의 기계적 강도(4 H의 연필 경도)를 나타내었다. 특히 우수한 내오염성은 기판의 표면 위에서 혼성 용액 내 소량의 MTMS/산 용액으로부터 유래된 메틸기($-CH_3$)의 고른 분산에 기인한 것으로 고려되었다. 연필 경도 시험 결과로부터, AR 코팅막의 기계적 강도는 MTMS/산 용액의 함량이 증가할수록 향상되는 것으로 나타났다.