• Current Photovoltaic Research
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• v.4 no.3
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• pp.119-123
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• 2016

We discussed various cover glass substrates available for photovoltaic (PV) modules, and investigated the fabrication methods of light trapping structures for the efficiency enhancement of PV modules: wet and dry etching or laser and direct patternings. We also introduced the analysis of haze at etched glass surfaces as a function of wavelength and also presented a anti-reflection coating technology for PV module.

• Transactions on Electrical and Electronic Materials
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• v.4 no.3
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• pp.29-33
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• 2003

Tri-crystalline silicon wafers have three different orientations and three-grain boundaries. In this paper, tri-crystalline silicon (tri-Si) wafers have been used for the fabrication of buried contact solar cells. The optical and micro-structural properties of these cells after texturing in KOH solution have been investigated and compared with those of cast mult- crystalline silicon (multi-Si) wafers. We employed a cost effective fabrication process and achieved buried contact solar cell (BCSC) energy conversion efficiencies up to $15\%$ whereas the cast multi-Si wafer has efficiency around $14\%$.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.405-405
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• 2011

실리콘 질화막(SiNx : H)는 결정질 실리콘 태양전지 제작 공정에서 ARC (Anti Reflection Coating)과 표면 패시베이션의 역할로써 많이 사용되었지만, layer 자체의 quality가 좋지 않기 때문에 최근에는 SiNx/SiO2 이중 layer로 passivation layer를 형성하고 있다. SiO2 layer는 Si substrate를 소스로 하여 성장시키기 때문에 막의 질이 우수하기는 하지만, 막 성장을 위해서 Furnace를 이용해야 하기 때문에, 공정 시간과 공정 비용을 증가시키는 단점이 있다. 본 연구에서는 SiO2 layer를 Furnace가 아닌, 질산(HNO3)을 이용하여SiNx/Thin SiO2 passivation layer 제작하였다. 실험에서는 SiO2 성장을 위해서 질산 용액에 p-type wafer를 dipping하여 시간대 별, SiO2 막의 두께를 관찰하였고, passivation의 효과를 확인하기 위해 lifetime을 측정하였다. 그 결과 SiNx/SiO2 이중 passivation layer는 SiNx 단일 막으로 passivation을 하였을 때보다, lifetime이 10 us 상승했고, 셀 제작시 효율은 약 1.1%, Fill Factor는 약 4% 정도 증가한 것을 확인할 수 있었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.301-301
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• 2012

지구 온난화와 화석 연료의 고갈이 심각해지면서 청정 에너지원으로서 신재생에너지에 대한 관심이 더욱 고조되고 있다. 신재생에너지 분야의 핵심기술의 하나인 태양전지의 여러 응용분야 중에서 건물 일체형 태양전지의 발전 가능성이 특히 높게 평가되고 있다. Si 계 박막 태양전지 내에 금속 산화물 계 선택적 투과막을 적용하면 선택적으로 적외선영역을 광흡수층으로 반사시키므로 건물 일체형 태양전지에 적용이 가능한 높은 변환효율의 투명 태양전지를 제조할 수 있다. 최근 연구 결과에 의하면 AlTiO 선택적 투과막의 투과율은 표면 평탄도에 의존하며, 타겟에 인가되는 전력을 감소시킴으로써 reactive co-sputtering 시 발생하는 아크 방전을 억제하면 AlTiO 박막의 평탄도가 개선된다는 사실이 알려져 있다. 본 연구에서는 AlTi single 타겟을 이용하여 AlTiO 박막을 형성함으로써 박막 표면을 더욱 개선시켜 가시광선 영역의 투과율을 향상시킨 결과를 보고한다.

• Journal of the Semiconductor & Display Technology
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• v.11 no.4
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• pp.1-6
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• 2012

Keeping the polarization direction of the projection light unchanged is of crucial importance for high quality of images on a double-screen 3D projection display system. It has been found that the deposition of oxide layers on the surfaces of scattering polarizer film results in an improvement of polarization maintenance property of the film. The secondary image formed on the front screen by the light scattered from the rear screen decreases by 30% through the application of oxide layers on both surfaces of the screen. Since the oxide layer can also be used as an anti-reflection (AR) coating of the film, this method is very effective for the projection display applications.

• Journal of the Korean Solar Energy Society
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• v.28 no.5
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• pp.8-13
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• 2008

In this study, we analyze the electrical optical characteristics of transparent glass for photovoltaic and glass-glass module application. The elemental facts from raw glass to laminated glass with solar cells are analyzed using UV spectrophotometer and spectroradiometer. From the data of transmittance and reflectance, the optimum PV module processing condition and selection of material for fabrication should be considered deeply for obtaining high module efficiency. Also we introduce two glasses which has 2%$\sim$4% higher transmittance using coating technology with anti-reflection material. From this experiment, we try to give some basic information for PV module manufacturing industry. The detail description is specified as the following paper.

• Journal of Magnetics
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• v.12 no.2
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• pp.77-80
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• 2007

Recently there was a proposal for a spin filter by using the spin superlattice structure. In a certain energy range, the proposed structure exhibits a high spin filtering efficiency close to 100%. Unfortunately such energy range turns out to be narrow. In this paper, we report a method to widen the energy range by using an analogy to optical anti-reflection coating. In optics, it is well known that a stack of alternating layers of two dielectric materials can function as a highly transmissive or reflective filter for wide range of wavelength. Since electrons also have wave character as light, it would be possible to make an electronic analog of an optical filter. We demonstrate that alternating layers of two materials with different g-factors can function as a spin filter that allows electrons to be transmitted only when their spins point towards a certain particular direction. This spin-superlattice-based spin filter operates in wide energy ranges, curing the problem in the previous proposal.

• Journal of the Semiconductor & Display Technology
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• v.17 no.2
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• pp.12-15
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• 2018

InSb (III-V compound semiconductor) is used for photodiode to detect the mid-wavelength infrared radiation. Generally the quantum efficiency of InSb IR FPAs(Focal Plane Arrays) is known to be determined by thickness of InSb and transmittance of anti-reflection coating layer. In this study, we confirmed that the C-V characteristics of detector array affects the quantum efficiency of the InSb IR FPAs. We fabricated the IR FPAs with various $V_{fb}$(flat band voltage) values and confirmed the tendency between the $V_{fb}$ value and quantum efficiency of the IR FPAs.

• Korean Journal of Materials Research
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• v.31 no.7
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• pp.403-408
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• 2021

Various surface colors are predicted and implemented using the interference color generated by controlling the thickness of nano-level diamond like carbon (DLC) thin film. Samples having thicknesses of up to 385 nm and various interference colors are prepared using a single crystal silicon (100) substrate with changing processing times at low temperature by plasma-enhanced chemical vapor deposition. The thickness, surface roughness, color, phases, and anti-scratch performance under each condition are analyzed using a scanning electron microscope, colorimeter, micro-Raman device, and scratch tester. Coating with the same uniformity as the surface roughness of the substrate is possible over the entire experimental thickness range, and more than five different colors are implemented at this time. The color matched with the color predicted by the model, assuming only the reflection mode of the thin film. All the DLC thin films show constant D/G peak fraction without significant change, and have anti-scratch values of about 19 N. The results indicate the possibility that nano-level DLC thin films with various interference colors can be applied to exterior materials of actual mobile devices.

• 한국신재생에너지학회:학술대회논문집
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• 2010.11a
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• pp.47.2-47.2
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• 2010

For reducing outer reflection in mono-crystalline silicon solar cell, wet texturing process has been adapted for long period of time. Nowadays mixed solution with potassium hydroxide and isopropyl alcohol is used in silicon surface texturing by most manufacturers. In the process of silicon texturing, etch rate is very critical for effective texturing. Several parameters influence the result of texturing. Most of all, temperature, process time and concentration of potassium hydroxide can be classified as important factors. In this paper, temperature, process time and concentration of potassium hydroxide were set as major parameters and 3-level test matrix was created by using robust design for the optimized condition. The process optimization in terms of lowest reflection and stable etch rate can be traced by using robust design method.