• 제목/요약/키워드: angle of bias

검색결과 167건 처리시간 0.023초

RF 바이어스 조건하에서 증착된 a-C:H 박막을 이용한 네마틱 액정의 배향 효과 (Alignment Effects for Nematic Liquid Crystal using a-C:H Thin Films Deposited at Rf Bias Condition)

  • 황정연;박창준;서대식;안한진;백홍구
    • 한국전기전자재료학회논문지
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    • 제17권5호
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    • pp.526-529
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    • 2004
  • The nematic liquid crysta](NLC) aligning capabilities using a-C:H thin film deposited at the three kinds of rf bias condition were investigated. A high pretilt angle of NLC on low substrate rf bias applied a-C:H thin films was observed and the low pretilt angle of the NLC on high substrate rf bias applied a-C:H thin films was observed. Consequently, the high NLC pretilt angle and the good aligning capabilities of LC alignment by the IB alignment method on the a-C:H thin film deposited at 1 W rf bias condition can be achieved. It is considered that pretilt angle of the NLC may be attributed to substrate rf bias condition and IB energy time. Therefore, LC alignment is affected by topographical structure forming strong IB energy.

Sensitivity of an Anisotropic Magnetoresistance Device with Different Bias Conditions

  • Kim, T.S.;Kim, K.C.;Kim, Kibo;K. Koh;Y.J. Song;Song, Y.S.;Suh, S.J.;Kim, Y.S.
    • Journal of Magnetics
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    • 제6권1호
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    • pp.36-41
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    • 2001
  • A micromagnetic model and a single-domain model simulation programs were used to analyze the sensitivity of a $20\mu m\times 60\mu m \times 1000{\AA}$ permalloy strip as a magnetoresistance sensor with bias fields of various directions and magnitudes. The micromagnetic model agrees with the measured sensitivity data better than the single-domain model. The data show the highest peak sensitivity with the bias field at 90$^{\circ}$to the current. The peak sensitivity decreases and the peak broadens as the bias angle decreases. The simulation using the micromagnetic model shows that a bias angle smaller than 90$^{\circ}$eads to magnetization patterns which are free from closure domains or vertices over a wider range of bias fields.

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개더 조건에 따른 개더 효과에 관한 연구 (A Study on the Effect of Gathering made by Gathering Conditions)

  • 이명희;정희경
    • 한국의류학회지
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    • 제28권6호
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    • pp.776-783
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    • 2004
  • The purpose of this study was to identify the reasonable gathering conditions as consider of effect of gathering and variation of silhouette made by gathering conditions. The experimental design consists of four factorial design: (1) three kinds of different weight and different thickness fabrics (2) three kinds of different stitch densities (3) five kinds of different ratio of gathers (4) three kinds of different angles. Therefore one hundred thirty five (135) samples were made. Data analysis utilize SPSS WIN 10.0 Package. The results of this study were as follows: 1. In the aspect of fabrics, it is shown the visual propriety that it is as thin as the small stitch, and as thick as the big stitch. 2. As stitch densities, it shows the different stabilized nodes. 3. In the aspect of ratio of gathers, it is shown the visual propriety that a few was small stitches, which help formations of nodes, and a lot were big stitches, which help increased the effect of gather. 4. In the aspect of angle of bias, the drape appearance was excellent as a sample of cutting by 0 angle(0$^{\circ}$) of bias. The big stitches that help formations of stabilized nodes, and a case of cutting by 45 angle(45$^{\circ}$) of bias was small stitch.

PECVD 장치를 사용하여 증착된 a-C:H 박막을 이용한 네마틱 액정의 틸트 발생 (Generation of Tilt in the nematic liquid crystal using a-C:H Thin Films Deposited Using PECVD Method)

  • 박창준;황정연;서대식;안한진;김경찬;백홍구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.469-472
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    • 2003
  • The nematic liquid crystal (NLC) aligning capabilities using a-C:H thin film deposited at the three kinds of rf bias condition were investigated. A high pretilt angle of about $11^{\circ}$ by the ion beam alignment method was observed on the a-C:H thin film (polymer-like carbon) deposited at 1W rf bias condition, and the low pretilt angle of the NLC was observed on the a-C:H thin film(diamond-like carbon) deposited at rf 30W and 60W bias condition. Consequently, the high NLC pretilt angle and the good aligning capabilities of LC alignment by the IB alignment method on the a-C:H thin film deposited at 1W rf bisa condition can be achieved.

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직조구조차이와 적층각의 변화에 따른 섬유강화복합재료의 압축특성 (Compressive Characteristics of Composites According to the Micro-structure and Stacking angle)

  • 유성환;박석원;장승환
    • Composites Research
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    • 제22권1호
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    • pp.15-21
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    • 2009
  • 본 논문에서는 편향각을 갖는 직물 복합재료 시편을 제작하여 정적 압축실험과 피로실험을 수행하고 그 결과를 비교하였다. 직물구조의 차이에 따른 압축거동을 평가하기 위해 동일한 섬유와 기지로 구성된 일방향 복합재료와 평직 복합재료의 적층순서를 동일하게 조절한 시편을 준비하였다. 정적 압축실험을 통해 편향각을 갖는 시편의 강성과 강도를 측정하였고, 측정된 강도를 바탕으로 압축강도 예측식을 제안하였다. 피로실험을 통해 복합재료의 직물 구조의 차이에 의한 피로수명의 변화를 관찰하였으며, 편향각의 변화와 하중조건에 따른 피로수명의 차이를 비교하였다.

의복패턴상에서 직물의 각도 변화에 따른 봉합강도 (Seam-Strength as a Function of Angle of Bias on the Patterns)

  • 이명희;최석철
    • 한국의류학회지
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    • 제21권4호
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    • pp.710-717
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    • 1997
  • An investigation made of fabric strength & elongation and the lock stitch seam strength & elongation by stitch density (N1.5; 26 stitches/3 cm, N2.0; 19 stitches/3 cm, N2.5; 14 stitches/3cm) depending on methods of. sample prepariation (angle variations of unseamed sample and overlapping way of seamed sample) It found maximum stitch density that results of the seam strength test was highist in each angle of bias. The results obstained were as follows: 1. As the results of fabric strength and elongation tests as a function of angle of bias, breaking strength were that warp and weft angles (0$^{\circ}$, 90$^{\circ}$) were much higher than bias angles (20$^{\circ}$, 30$^{\circ}$, 45$^{\circ}$, 60$^{\circ}$) . And otherwise breaking elongation were that 45$^{\circ}$ angle of bias were highest and were that the warp & weft way were lower. 2. As the results of the seam strength tests by the stitch density under samples of same angles, the maximum stitch density were those; under 0$^{\circ}$/0$^{\circ}$, 60$^{\circ}$/60$^{\circ}$:F1, F2-N2.0, F3-N1.5, under 20$^{\circ}$/20$^{\circ}$, 30$^{\circ}$/30$^{\circ}$, 45$^{\circ}$/45$^{\circ}$: F1-N2.5, F2-N2.0, F3-N1.5, under 90$^{\circ}$/90$^{\circ}$: F1, F2, F3-N1.5. 3. As the results of the seam strength tests by the stitch density under samples of symmetry angles, the maximum stitch density were those; under 20$^{\circ}$/-20$^{\circ}$, 30$^{\circ}$/-30$^{\circ}$, 60$^{\circ}$/-60$^{\circ}$: F1, F3-N1.5, F2-N2.0, under 45$^{\circ}$/-45$^{\circ}$: F1, F2-N2.0, F3-N1.5.

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바이어스 각도에 따른 견직물의 역학적 특성 변화 (Mechanical Properties of Silk Fabrics according to Bias Angles)

  • 강윤희;유효선;노의경
    • 한국의류학회지
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    • 제42권4호
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    • pp.561-570
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    • 2018
  • This study defined the changes of mechanical properties of silk fabric according to bias angles and investigated the influence of bias angles and fabric characteristics on hand value. For the experiments, 4 types of commercial silk plain weave fabrics were chosen. All fabrics had the same density, but different yarn characteristics. Fabric samples were cut into 12 different bias angles between $0^{\circ}$ and $165^{\circ}$ with $15^{\circ}$ gap and measured for tensile, shear, bending, surface properties by the KES-FB system. As a result, most mechanical parameters showed an asymmetry shape with $90^{\circ}$. The most flexible and easiest angles are $45^{\circ}$, $135^{\circ}$. Furthermore, the bias angles of silk fabrics were classified into three clusters with mechanical properties such as WT, 2HG, 2HG5, B, and SMD. The parameters according to fabric samples showed significant differences at WT, RT, B, 2HB, and MIU. It showed bigger effects as yarn fineness; in addition, twists were higher except RT. The results of hand value indicated that Koshi and Hari were highest with a bias angle of $75^{\circ}$; however, Shinayakasa was highest at bias angle of $45^{\circ}$. Finally, Shari was lowest at $45^{\circ}$.

소매산 높이에 따른 소매달림선 하부곡선상의 봉제조건에 관한 연구 (A study on the Sewing Condition of the Lower part of the Armhole Seam by Cap Heights)

  • 이명희
    • 한국의류산업학회지
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    • 제4권3호
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    • pp.229-234
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    • 2002
  • An investigation was made of the angle of bias on the lower part of the armhole line of the back bodice and that on the lower part of the sleeve cap curve line by cap heights, and then it was made of the lock stitch seam strength and elongation on the matching angles, the stitch density (26 stitches/3cm, 19 stitches/3cm, 14 stitches/3cm, and the samples (a cotton fabric and two kinds of cotton mixed polyester fabric). The matching angles of the machine-sewed samples are $30^{\circ}/-30^{\circ}$, $30^{\circ}/-45^{\circ}$, $45^{\circ}/-45^{\circ}$ and $60^{\circ}/-60^{\circ}$ by the analysis of the angles of bias on the lower part of the armhole seam. In view of the results of the seam strength and elongation, the reasonable sewing condition of the lower part of the armhole seam was 19 stitches/3cm.

Exchange Bias Coupling Depending on Uniaxial Deposition Field of Antiferromagnetic FeMn Layer

  • Lee, Sang-Suk;Hwang, Do-Guwn
    • Journal of Magnetics
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    • 제15권1호
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    • pp.17-20
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    • 2010
  • The relationship between ferromagnet anisotropic magnetization and the antiferromagnet atomic spin configuration was investigated for various angles of the uniaxial deposition magnetic field of the FeMn layer in the Corning glass/Ta(5nm)/NiFe(7nm)/FeMn(25nm)/Ta(5nm) multilayer that was prepared by the ion beam sputter deposition. The exchange bias field ($H_{ex}$) obtained from the measurement of the easy-axis MR loop decreased to 40 Oe at the deposition field angle of $45^{\circ}$, and to 0 Oe at the angle of $90^{\circ}$. When the difference between the uniaxial axis between the ferromagnet NiFe and the antiferromagnet FeMn was $90^{\circ}$, the strong antiferromagnetic dipole moment of FeMn caused the weak ferromagnetic dipole moment of NiFe to rotate in the interface.

바이어스 조건하에서 증착한 a-C:H 박막을 이용한 액정배향 효과 (LC Alignment Effects using a-C:H Thin Film as Working Gas at Bias Condition)

  • 황정연;조용민;서대식;노순준;백홍구
    • 한국전기전자재료학회논문지
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    • 제16권11호
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    • pp.1019-1022
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    • 2003
  • We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a-C:H thin film as working gas at 30W rf bias condition. A high pretilt angle of about 5$^{\circ}$ by ion beam(IB) exposure on the a-C:H thin film surface was measured. A good LC alignment by the IB alignment method on the a-C:H thin film surface was observed at annealing temperature of 250$^{\circ}C$, and the alignment defect of the NLC was observed above annealing temperature of 300$^{\circ}C$. Consequently, the high LC pretilt angle and the good thermal stability of LC alignment by the IB alignment method on the a-C:H thin film surface as working gas at 30W rf bias condition can be achieved.