• 제목/요약/키워드: ZnO Grain

검색결과 444건 처리시간 0.028초

$SiO_2$와 CaO 첨가가 Mn-Zn Ferrites의 전자기적 물성에 미치는 영향 (Effect of CaO and $SiO_2$ Addition on the Electromagnetic Properties of Mn-Zn Ferrites)

  • 서정주;신명승;한영호
    • 한국세라믹학회지
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    • 제32권9호
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    • pp.1033-1039
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    • 1995
  • The current experiment has quantitatively investigated the effect of the content of CaO and SiO2 on the microstructure, density, electrical resistivity, power loss and initial permeability of manganese zinc ferrites. The density increased initially with CaO and SiO2 content and the further addition showed an adverse effect. The excess addition of CaO and SiO2 developed a discontinuous grain growth with numerous pores inside grains and lowered the electrical resistivity. The initial permeability decreased with increasing the content of SiO2. The samples with relatively low power loss showed that half of the total loss at 10$0^{\circ}C$, 100 kHz and 2000 Gauss was due to the eddy current loss.

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박막 태양전지용 투명 전극을 위한 Ga 도핑된 ZnO의 증착 온도에 따른 구조 및 전기 특성 변화 (Effect of Deposition Temperature on Structural and Electrical Properties of Ga-Doped ZnO for Transparent Electrode of Thin Film Solar Cells)

  • 손창식
    • 한국재료학회지
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    • 제21권3호
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    • pp.144-148
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    • 2011
  • We have investigated the structural and optical properties of Ga-doped ZnO (GZO) thin films deposited by RF magnetron sputtering at various deposition temperatures from 100 to $500^{\circ}C$. All the GZO thin films are grown as a hexagonal wurtzite phase with highly c-axis preferred parameter. The structural and electrical properties are strongly related to deposition temperature. The grain size increases with the increasing deposition temperature up to $400^{\circ}C$ and then decreases at $500^{\circ}C$. The dependence of grain size on the deposition temperature results from the variation of thermal activation energy. The resistivity of GZO thin film decreases with the increasing deposition temperature up to $300^{\circ}C$ and then decreases up to $500^{\circ}C$. GZO thin film shows the lowest resistivity of $4.3{\times}10^{-4}\;{\Omega}cm$ and highest electron concentration of $1.0{\times}10^{21}\;cm^{-3}$ at $300^{\circ}C$. The mobility of GZO thin films increases with the increasing deposition temperature up to $400^{\circ}C$ and then decreases at $500^{\circ}C$. GZO thin film shows the highest resistivity of 14.1 $cm^2/Vs$. The transmittance of GZO thin films in the visible range is above 87% at all the deposition temperatures. GZO is a feasible transparent electrode for the application to the transparent electrode of thin film solar cells.

박막 태양전지용 투명 전극을 위한 Ga 도핑된 ZnO의 RF 전력에 따른 구조 및 전기 특성 변화 (Effect of RF Power on Structural and Electrical Properties of Ga-Doped ZnO for Transparent Electrode of Thin Film Solar Cells)

  • 손창식
    • 한국재료학회지
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    • 제21권4호
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    • pp.202-206
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    • 2011
  • We have investigated the structural and electrical properties of Ga-doped ZnO (GZO) thin films deposited by an RF magnetron sputtering at various RF powers from 50 to 90W. All the GZO thin films are grown as a hexagonal wurtzite phase with highly c-axis preferred parameters. The structural and electrical properties are strongly related to the RF power. The grain size increases as the RF power increases since the columnar growth of GZO thin film is enhanced at an elevated RF power. This result means that the crystallinity of GZO is improved as the RF power increases. The resistivity of GZO rapidly decreases as the RF power increases up to 70 W and saturates to 90W. In contrast, the electron concentration of GZO increases as the RF power increases up to 70 W and saturates to 90W. GZO thin film shows the lowest resistivity of $2.2{\times}10^{-4}{\Omega}cm$ and the highest electron concentration of $1.7{\times}10^{21}cm^{-3}$ at 90W. The mobility of GZO increases as the RF power increases since the grain boundary scattering decreases due to the reduced density of the grain boundary at a high RF power. The transmittance of GZO thin films in the visible range is above 90%. GZO is a feasible transparent electrode for application as a transparent electrode for thin film solar cells.

Surface Oxidation of High Strength Automotive Steels during Continuous Annealing, and the Influence of Trace Elements of P,B, and Sb

  • Sohn, Il-Ryoung;Park, Joong-Chul;Kim, Jong-Sang
    • Corrosion Science and Technology
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    • 제9권6호
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    • pp.259-264
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    • 2010
  • In continuous hot dip galvanizing process, oxide formation on steel surface has an influence on Zn wetting. High strength automotive steel contains high amount of Si and Mn, where Si-Mn composite oxides such as $Mn_2SiO_4$ or $MnSiO_3$ covers the surface after annealing. Zn wetting depends on how the aluminothermia reaction can reduce the Mn-Si composite oxides and then form inhibition layer such as $Fe_2Al_5$ on the steel surface. The outward diffusion of metallic ions such as $Mn^{2+}$, $Si^{2+}$ in the steel matrix is very important factor for the formation of the surface oxides on the steel surface. The surface state and grain boundaries provide an important role for the diffusion and the surface oxide reactions. Some elements such as P, Sb, and B have a strong affinity for the interface precipitation, and it influence the diffusivity of metallic ions on grain boundaries. B oxide forms very rapildly on the steel surface during the annealing, and this promote complex oxides with $SiO_2$ or MnO. P has inter-reacted with other elements on the grain boundaries and influence the diffusion through on them. Small addition of Sb could suppress the decarburization from steel surface and retards the formation of internal and external selective oxides on the steel surface. Interface control by the trace elements such as Sb could be available to improve the Zn wettability during the hot dip galvanizing.

Co-sputtering법으로 제작된 MgxZn1-xO 박막의 인가 파워에 따른 구조적 특성 (The Structural Characteristics of MgxZn1-xO Thin Films with Sputtering Power by Co-sputtering Method)

  • 김상현;손지훈;장낙원;김홍승;윤영
    • 한국전기전자재료학회논문지
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    • 제26권2호
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    • pp.164-169
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    • 2013
  • The effect of co-sputtering condition on the structural properties of $Mg_xZn_{1-x}O$ thin films grown by RF magnetron co-sputtering system was investigated for manufacturing UV LED. $Mg_xZn_{1-x}O$ thin films were grown with ZnO and MgO target varying RF power. Structural properties were investigated by X-ray diffraction (XRD) and Energy dispersive spectroscopy (EDS). The $Mg_xZn_{1-x}O$ thin films have sufficient crystallinity on the high ZnO power. The EDS analyzed showed that the Mg content in the $Mg_xZn_{1-x}O$ films decreased from 3.99 to 24.27 at.% as the RF power of ZnO target increased. The Mg content in the $Mg_xZn_{1-x}O$ films could be controlled by co-sputtering power.

ZnO Nanorods Grown on CdxZn1-xO Seed Layers with Various Cd Mole Fractions

  • Kim, Min-Su;Kim, Do-Yeob;Yim, Kwang-Gug;Kim, Soaram;Nam, Gi-Woong;Kim, Sung-O;Lee, Dong-Yul;Leem, Jae-Young
    • Bulletin of the Korean Chemical Society
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    • 제33권1호
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    • pp.189-193
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    • 2012
  • ZnO nanorods were grown on the $Cd_xZn_{1-x}O$ seed layers with various Cd mole fractions by hydrothermal method. The effects of the Cd mole fraction for $Cd_xZn_{1-x}O$ seed layers on the structural and optical properties of the ZnO nanorods were investigated by scanning electron microscopy, X-ray diffraction, and photoluminescence. The narrowest full-width at half-maximum and largest grain size of the $Cd_xZn_{1-x}O$ seed layers, indicating improvement in crystal quality, were observed at the Cd mole fraction of 0.5. At the Cd mole fraction of 0.5, the largest enhancement in the density, the crystal quality, and the growth rate of the ZnO nanorods was observed while their appearance was not affected significantly by the incorporation of the Cd in the $Cd_xZn_{1-x}O$ seed layers. Consequently, the luminescent properties of the ZnO nanorods were enhanced. The largest improvement in the structural and optical properties of the ZnO nanorods was observed at the Cd mole fraction of 0.5.

어닐링 조건이 RF Magnetron sputtering을 이용하여 증착된 undoped ZnO 박막의 결정 및 광학특성에 미치는 영향 (The effect of annealing conditions on the structural and optical properties of undoped ZnO thin films prepared by RF Magnetron sputtering)

  • 박형식;유정열;윤의중
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.423-423
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    • 2007
  • In this study, the effects of annealing conditions on the structural and optical properties of ZnO films were investigated. ZnO oxide (ZnO) films were deposited onto $SiO_2$/Si substrates by RF magnetron sputtering from a ZnO target. The substrate was not heated during deposition. ZnO films were annealed in temperature ranges of $500{\sim}650^{\circ}C$ in the $O_2$ flow for 5 ~ 20 min. The film average thicknesses were in the range of 291 nm. The surface morphologies and structures of the samples were characterized by SEM and XRD, respectively. The optical properties were evaluated by PL measurement at room temperature using a He-Cd 325 nm laser. According to the results, the optimal annealing conditions for the best photoluminescence (PL) characteristics were found to be oxygen fraction, ($O_2/O_2+Ar$) of 20%, RF power of 240W, substrate temperature of RT (room temperature), annealing condition of $600^{\circ}C$ for 20 min, and sputtering pressure of 20 mTorr. The obtained wavelength of light emission was found at 379 nm (ultraviolet-UV region). However, the optimal parameters for the best PL characteristics of ZnO thin films were not consistent with those obtained from the (002) intensities of XRD analyses. As a result, XRD pattern was not considered as the key issue concerning the intensity of PL of ZnO thin film. The intensity of the emitted UV light will correspond to the grain size of ZnO film.

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이온빔 스퍼터링에 의해 증착된 Mn-Zn 페라이트 박막의 자기 및 전기적 특성 (Magnetic and Electrical Properties of Mn-Zn Ferrite Thin Films Deposited by Ion Beam Sputtering)

  • 조해석;하상기;이대형;주한용;김형준;김경용;제해준;유병두
    • 한국세라믹학회지
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    • 제32권3호
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    • pp.313-320
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    • 1995
  • We investigated the preferred orientation, electrical and magnetic properties of the Mn-Zn ferrite thin films deposited on SiO2/Si(100) by ion beam sputtering. The Cu-added Mn-Zn ferrite thin films had a preferred orientation of (111) with a weak orientation, (311). While the Zn-added one had a strong (111) preferred orientation. The saturation magnetization of the Cu- or Zn-doped Mn-Zn ferrite films increased with increasing substrate temperature (Ts) due to the increase of grain size and the enhancement of crystallinity. For the same reason the coercivity of Cu- or Zn-doped Mn-Zn ferrite films deposited at low Ts increased with increasing Ts, but those of the films deposited at high Ts slightly decreased not only because the defect density of the films decreases but because more grains have multi-domains with increasing Ts. The resistivity of Cu- or Zn-added Mn-Zn ferrite thin fims measured by complex impedance method decreased with increasing Ts due to the ehhancement of crystallinity as well as due to the increase of grain size.

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ZnO/Cu/ZnO 박막의 차량용 저방사 및 전기광학적 특성 연구 (The emissivity and opto-electrical properties of ZnO/Cu/ZnO thin films for the vehicle applications)

  • 이연학;김선경;엄태용;정용하;소상우;손영길;손동일;김대일
    • 한국표면공학회지
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    • 제56권6호
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    • pp.451-456
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    • 2023
  • Transparent conducting films having a three layered structure of ZnO/Cu/ZnO (ZCZ) were deposited onto the glass substrates by using RF and DC magnetron sputtering at room temperature. The emissivity and opto-electrical properties of the films were investigated with a varying thickness(5, 10, 15 nm) of the Cu interlayer. With increasing the Cu thickness to 15 nm, the films showed a enhanced electrical properties. Although ZnO 30/Cu 15/ZnO 30 nm film shows a lower resistivity of 5.2×10-5 Ωcm, it's visible transmittance is deteriorated by increased optical absorbtion of the films. In addition, X-ray diffraction patterns indicated that the insertion of Cu interlayer improve the grain size of ZnO films, which is favor for the electrical and optical properties of transparent conducting films. From the observed low emissivity of the films, it is concluded that the ZCZ thin films with optimal thickness of Cu interlayer can be applied effectively for the car's window coating materials.

$Al_2O_3$가 미량 첨가된 비선형성 ZnO 바리스터의 미세구조와 전도기구 (The microstructure and conduction mechanism of the nonlinear ZnO varistor with $Al_2O_3$ additions)

  • 한세원;강형부;김형식
    • E2M - 전기 전자와 첨단 소재
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    • 제9권7호
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    • pp.708-718
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    • 1996
  • The microstructure and electrical properties of the nonlinear ZnO varistor with A1$_{2}$ $O_{3}$ additions is investigated. The variation of nonlinear behavior with A1$_{2}$ $O_{3}$ additions is indicated from J-E and C-V measurement to be a result of the change of the interface defects density $N_{t}$ at the grain boundaries and the donor concentration $N_{d}$ in the ZnO grains. The optimum composition which has the nonlinear coefficients of -57 was observed in the sample with 0.005wt% A1$_{2}$ $O_{3}$ additions. The conduction mechanism at the pre-breakdown region is consistent with a Schottky thermal emission process obeying a relation given by $J^{\var}$exp[-(.psi.-.betha. $E^{1}$2/)kT] and the conduction process at the breakdown region follows a Fowler-Nordheim tunneling mechanism of the form $J^{\var}$exp(-.gamma./E).

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