• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.155-156
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• 2006

Single crystalline ZnO fims were successfully grown on r-plane sapphire substrate by plasma-assisted molecular beam epitaxy. Epitaxial relationship between the ZnO film and the-r-plane sapphire was determined to be [-1101]$Al_2O_3\;{\parallel}$ [0001]ZnO, [11-20]$Al_2O_3\;{\parallel}$ [-1100]ZnO based on the in-situ RHEED analysis and confirmed again by HRXRD measurements. Grown (11-20) ZnO films showed faceted structure along the <0001> direction and the RMS roughness was about 4 nm.

• Proceedings of the IEEK Conference
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• 1998.06a
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• pp.391-394
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• 1998

The effect of the heat treatment of the AZO transparent conductive film prepared by rf magnetron sputtering was investigated. The variations of the electrical and optical properties with heat treatment ambient and temperature were studied. After the heat treatment in air above 300.deg. C, the resistivity of AZO films increased by 1 to 8 orders of magnitude. However, no significant change in the AZO films after th eheat treatment in vacuum was not observed.

• 한국신재생에너지학회:학술대회논문집
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• 2010.06a
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• pp.74.2-74.2
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• 2010

유리를 기판으로 하는 실리콘 박막태양전지의 경우 PIN 비정질 태양전지 뒤에 후면반사막으로 주로 Ga 또는 Al이 Doping된 후면반사막을 사용한다. 이 후면반사막의 경우 PIN층을 통과한 빛을 반사함으로써 빛의 효용성을 높이는 데 그 목적이 있다. 본 논문에서는 후면박사막으로 ZnO:Al을 사용하고 산소 부여량에 따른 투과도, 비저항 변화를 살펴보고 실제로 a-Si:H 박막태양전지를 제작하여 그 효과를 파악하였다. 이 때 산소 부여량이 많아질 경우 투과도는 높아지지만 비저항이 급격히 높아지는 문제가 있었으나 이 조건으로 a-Si:H 박막태양전지를 제작시에도 효율이 상승하였다.

• Journal of information and communication convergence engineering
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• v.5 no.3
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• pp.219-222
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• 2007

Highly conductive and transparent aluminum doped ZnO thin films (AZO) films have been prepared by r.f. magnetron sputtering processes on poly carbonate (PC) and onto glass as reference. In addition, the electrical, optical properties of the films prepared at various sputtering powers were investigated. The XRD measurements revealed that all of the obtained films were polycrystalline with the hexagonal structure and had a preferred orientation with the c-axis perpendicular to the substrate. The ZnO:Al films were increasingly dark gray colored as the sputter power increased, resulting in the loss of transmittance. High quality films with the resistivity as low as $9.7{\times}10^{-4}\;{\Omega}-cm$ and transmittance over 90% have been obtained by suitably controlling the r.f. power.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.05a
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• pp.144-145
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• 2006

In this study, the Al doped ZnO thin films were prepared by the facing targets sputtering(FTS) apparatus. The electrical characteristics, transmittance of ITO thin films were investigated as a function of varying input current and oxygen gas flow rate. As a result, the ITO thin film was prepared with a resistivity $6{\times}10-4[{\Omega}-cm]$ and transmittance 80% at visible range.

• Proceedings of the Korean Vacuum Society Conference
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• 2001.07a
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• pp.67-67
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• 2001

• Korean Journal of Materials Research
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• v.11 no.10
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• pp.889-894
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• 2001

2wt% $Al_2O_3-doped$ ZnO (AZO) thin films were deposited on sapphire (0001) single crystal substrate by parellel type rf magnetron sputtering at 55$0^{\circ}C$. The as-grown AZO thin films was polycrystalline and showed only broad deep defect-level photoluminescence (PL). In order to examine the change of PL property, AZO thin films were annealed in $N_2$ (N-AZO) and $H_2$ (H-AZO) at the temperature of $600^{\circ}C$~$1000^{\circ}C$ through rapid thermal annealing. After annealed at $800^{\circ}C$, N-AZO shows near band edge emission (NBE) with very small deep-level emission, and then N-AZO annealed at $900^{\circ}C$ shows only sharp NBE with 219 meV FWHM. In Comparison with N-AZO, H-AZO exhibits very interesting PL features. After $600^{\circ}C$ annealing, deep defect-level emission was quire quenched and NBE around 382 nm (3.2 eV) was observed, which can be explained by the $H_2$passivation effect. At elevated temperature, two interesting peaks corresponding to violet (406 nm, 3.05 eV) and blue (436 nm, 2.84 eV) emission was firstly observed in AZO thin films. Moreover, peculiar PL peak around 694 nm (1.78 eV) is also firstly observed in all the H-AZO thin films and this is believed good evidence of hydrogenation of AZO. Based on defect-level scheme calculated by using the full potential linear muffin-tin orbital (FP-LMTO), the emission 3.2 eV, 3.05 eV, 3.84 eV and 1.78 eV of H-AZO are substantially deginated as exciton emission, transition from conduction band maximum to $V_{ Zn},$ from $Zn_i$, to valence band maximum $(V_{BM})$ and from $V_{o} to V_BM}$, respectively.

• 한국신재생에너지학회:학술대회논문집
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• 2005.06a
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• pp.154-159
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• 2005

Low RF power density was used for preparing transparent conducting AI-doped ZnO (AZO) thin films by RF Magnetron Sputtering on Corning 1737 glass. The dependence of films' structural, optical and electrical properties on sputtering gas, film's thickness and substrate temperature were investigated. Low percent of incorporated H2 in Ar sputtering gas has proven to reduce film's resistivity and sheet resistance as low as $4.1\times10^{-3}{\Omega}.cm$. It also formed new preferred peaks orientation of (101) and (100) which indicated that the c-axis of AZO films was parallel to the substrate. From UN-VIS-NIR Spectrophotometer analysis, it further showed high optical transmittance at about $\~ 90\%$ at visible light spectra (400-700nm).

• Proceedings of the Korean Vacuum Society Conference
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• 2009.02a
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• pp.141-141
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• 2009

• Proceedings of the Korean Vacuum Society Conference
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• 2008.08a
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• pp.106-106
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• 2008