• Title/Summary/Keyword: Xe

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Design of I-123 Nuclide production system (I-123 핵종생산장치 시스템 설계)

  • Jung, Hyun-Woo;You, Jae-Jun;Kim, Byung Il;Chun, KwonSoo;Lee, Ji-Seub;Park, Hyun;Choi, JunYong;Oh, Se-Young;Bang, Sang-Kwon;Lee, Dong Hoon
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2014.05a
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    • pp.496-499
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    • 2014
  • Xe Gas is moved to Target from GPM. It is Used to feasible nuclear reaction from proton of 30MeV Cyclotron being investigated by the Xe-124 Gas target System. This system is divided into four parts. Hardware was constructed by solidworks and Helium Supply is to cool the Havor Foil. Water has the job of cooling down the temperature when Xe Gas is being investigated in the target. Temperature and pressure gauges are attached to be checked easily. GPM(Gas Process Manifold) has the part that prepares to transport Xe Gas. There are Storage Vessel that stores Xe Gas, the cold trap that filters humidity and impurity and lastly storage vessel that temporarily stores Xe Gas. HCS(Helium Circulation System) using the Helium to cleaning and cooling. these parts are used to SIEMENS PLC and Pcvue Program. Because It is more comfortable and easy maintenance.

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A Study on discharge gas of Fluorescent Induction Lamp (무전극 램프의 방전가스 연구)

  • Kim, Keun;Jeon, Byung-Hoon
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1481_1482
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    • 2009
  • Pure Xe, Kr and Ne atoms and Mixures of Xe-Ne used in fluorescent induction lamps(FILs). However standard regulation of FILs is not made up until now. Therefore, the electron transport coefficients, the electron drift velocity W, the longitudinal diffusion coefficient NDL and the ionization coefficient $\alpha$/N in pure Xe, Kr, Ne gases and Xe-Ne mixtures(1:9, 5:5, 7:3) were calculated over the wide E/N range from 0.01 to 500 Td at 1 Torr by two-term approximation of the Boltzman equation.

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Vacuum ultraviolet emission characteristics of binary and ternary gas mixtures with xenon concentration and gas pressure in AC-PDPs (AC-PDP에서 Ne-Xe의 2원 혼합기체와 He-Ne-Xe의 3원 혼합기체의 Xe 혼합비와 가스 압력에 따른 VUV 발광 특성)

  • Yoo, N.L.;Jung, K.B.;Lee, J.H.;Lee, S.B.;Han, Y.K.;Jeong, S.H.;Lee, H.J.;Son, C.G.;Lim, J.E.;Oh, P.Y.;Moon, M.W.;Jeoung, J.M.;Ko, B.D.;Cho, G.S.;Uhm, H.S.;Choi, E.H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.05a
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    • pp.142-145
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    • 2005
  • AC-PDP에서 발광 휘도와 발광 효율의 개선은 매우 중요한 과제중의 하나이다. 높은 발광 휘도와 발광 효율을 위해선 VUV의 높은 발광 효율이 요구되어진다. 이 실험에서는 AC-PDP에서 Ne-Xe의 2원 혼합기체와 He-Ne-Xe의 3원 혼합기체의 VUV 발광 세기를 측정하였다. 기체 압력은 200 Torr, 300 Torr, 400 Torr, 500 Torr로 유지하였고, Xe 혼합비는 1%, 2%, 4%, 7%, 10%, 15%를 사용하였다. 진공자외선 발광 세기는 He-Ne-Xe의 3원 혼합기체가 Ne-Xe의 2원 혼합기체보다 발광 세기가 훨씬 높다는 것을 알 수 있었다. 그리고 Xe 함량이 증가함에 따라 공명선인 147 nm의 발광 세기는 Xe 혼합비가 약 10%까지는 증가하다가 10% 이후에는 포화되고, 반면 분자선인 173 nm은 Xe 함량과 가스 압력이 증가함에 따라 발광 세기가 증가하였다.

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A study on the discharge characteristics by gas pressure and discharge gap in Xe absolute partial pressure of AC PDP (Xe 절대분압에서 가스 압력과 전극 간격에 따른 AC PDP의 방전 특성 고찰)

  • Kim, Dong-Hwan;Cho, Hyun-Min;Ha, Chang-Seung;Ok, Jung-Woo;Cho, Sung-Yong;Kim, Dong-Hyun;Lee, Hea-June;Lee, Ho-Jun;Park, Chung-Hoo
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1360_1361
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    • 2009
  • 일반적으로 AC PDP는 Xe+Ne이 동작가스로 사용된다. 본 연구에서는 Xe 분압을 50, 60, 80, 100 Torr로 고정한 상태에서 전체 가스압력을 변화시키고 Short 방전 갭으로 $80{\mu}m$를, Long 방전 갭으로 $180{\mu}m$ 적용함으로써 나타나는 AC-PDP의 방전특성을 분석하였다. 여기에 Xe 분압을 Short 방전 갭에서는 80, 100 Torr로, Long 방전 갭에서는 50, 60, 80 Torr로 각각 고정하고, Ne 압력을 변화시킴에 따라 나타나는 방전개시전압, 소비전력, 휘도, 발광효율을 측정하여 높은 휘도와 효율을 가지면서 방전개시전압을 최대한 낮출 수 있는 적정 조합을 연구하였다. 실험결과, Short 방전 갭 패널은 소비전력이 26% 낮았고, Long 방전 갭 패널은 휘도가 45% 높았다. 휘도, 소비전력 등 여러 가지 측면을 고려하였을 때, 방전개시전압이 가장 낮은 Short 방전 갭, Xe 절대분압 80 Torr, Xe 35%(Xe+Ne=286 Torr)에서의 방전 특성이 가장 우수하였다.

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The Influence of Xe Content on Wall Voltage Transfer Behavior

  • Baik, Bong-Joo;Choi, Kwang-Yeol;Min, Wong-Kee;Hong, Mun-Heon;Lee, Dong-Woo;Min, Byung-Kuk;Kim, Weo-Dong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.1555-1558
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    • 2008
  • Various approaches were undertaken by major PDP makers in order to improve the luminous efficacy of the plasma discharge cells. There have been many reports that state that using a high Xe content PDP is one of the most promising key technologies available to improve the luminous efficacy. In the case of the higher Xe content panel, the higher address and sustain voltage were needed to drive the panel under the same reset condition. In this study, a variety of Xe content panels were investigated in order to examine wall voltage transfer behaviors. The transferred wall voltage status after addressing discharge at the same driving condition was analyzed by comparing Vt close curve of high and low Xe content panels. Through this analysis of Vt close curve difference, the driving waveform of a high Xe panel was quantitatively adjusted Under the same address voltage condition, results showed that the amount of the transferred wall voltage and Vt close curve after addressing discharge was matched for the first sustain discharge. Taking these results into consideration, we conclude that the driving waveform for different Xe content panels could be designed for the desired addressing discharge condition and the wall voltage state of the cell could be quantitatively controlled and measured through these approaches.

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Output Ccharacteristics of XeCl Excimer Laser Excited by Transeverse-Electron-Beam (횡방향 전자빔여기 XeCl 엑시머 레이저의 출력특성)

  • 류한용;이주희;김용평
    • Korean Journal of Optics and Photonics
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    • v.5 no.3
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    • pp.386-393
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    • 1994
  • We have investigated output characteristics of XeCI excimer laser excited by transeverse electronbeam. We used e-beam output of 880 kV, 21 kA (70 ns, FWHM) and controlled current density of e-beam by pulsed magnetic coil (4.7 kG) which was fabricated around an e-beam diode (A-K gap is 21 mm) and laser chamber. We have obtained 35 J (4 atm) of e-beam deposition energy injected into laser media. The deposition energy was converted from an exposure area of Radcolor film and rising pressure of gas media which is measured by pressure jump method. The excited volume of $320cm^{3}$ was calculated. The maximum efficiency of 1.7% was obtained with the mixing ratio of HCllXe/Ar==0.2/ 6.3/93.5% and total pressure of 3 atm. Also laser output energy and specific energy were obtained 0.52 J and 1.7 J/I, respectively. For the analysis of experimental results we have developed computer simulation code. From the good agreements with the results of experiment and simulation we could theoretically explain the XeCI* formation channel. relaxation channel, and absorption channel of 308 nm.308 nm.

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Detection of Change in Water System Due to Collapse of Laos Xe pian-Xe namnoy Dam Using KOMPSAT-5 Satellites (KOMPSAT-5 위성 영상을 활용한 라오스 세피안-세남노이 댐 붕괴에 따른 수계변화 탐지)

  • Kim, Yunjee;Lee, Moungjin;Lee, Sunmin
    • Korean Journal of Remote Sensing
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    • v.35 no.6_4
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    • pp.1417-1424
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    • 2019
  • Recently, disaster accidents have occurred frequently over the world, and disaster have been continuously studied using remote sensing due to large scale and hard-to-reach features. The collapse of Laos Xe pian-Xe namnoy dam in 2018 also caused a lot of human and economic damage. This study's purpose is to change detect water system due to the collapse of Xe pian-Xe namnoy dam in Laos and to derive areas where future flooding is expected. The water system is extracted from each image of KOMPSAT-5 before and after the dam collapse in order to quantitatively change detect in the water system. The result of the water system area increased more than 10 times after the dam collapse. In addition, it is confirmed that the newly created water system is thickly created in areas of low altitude area. This study result can be used in the future to systematize the pre-response to abnormalities and issues in existing operating dams. And then, if combined with other remote sensing data, more diverse and specific results could be obtained.

Pulse Stretching Effect in XeCl Excimer Laser (XeCl 엑시머 레이저에서의 Pulse Stretching 효과)

  • Chu, Hong;Kim, Dong-Hwan;Lee, Soo-Man;John, Young-Min;Choi, Sang-Sam;Park, Dae-Yoon
    • Korean Journal of Optics and Photonics
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    • v.4 no.4
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    • pp.447-451
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    • 1993
  • Long pulse XeCl excimer laser with 150 ns (FWHM) pulse duration is developed using a simple capacitor-charge transfer circuit. We measured the laser pulse width varying the gas mixture ratio and capacitance ratio, which dominantly affect the pulse width. In this way we can easily stretch the pulse width from short pulse to long pulse. The pulse width was stretched by 120 ns as the partial pressure of HC1 and Xe gas was reduced under constant gas mixture ratio ([Xe]/[HCl]= 15), and by varying the capacitance ratio (Cm/Cp) under fixed pressure, the pulse width was stretched by 60 ns.

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Characterizations of Surface Textured Silicon Substrated by XeF2 Etching System (이불화제논 기상 식각에 의한 실리콘 기판의 표면 텍스쳐링 특성)

  • Kim, Seon-Hoon;Ki, Hyun-Chul;Kim, Doo-Gun;Na, Yong-Beom;Kim, Nam-Ho;Kim, Hwe-Jong
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.59 no.4
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    • pp.749-753
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    • 2010
  • We investigated the haze and the surface roughness of textured Si substrates etched by $XeF_2$ etching system with the etching parameters of $XeF_2$ pressure, etching time, and etching cycle. Here the haze was obtained as a function of wavelength from the measured reflectance. The haze of textured Si substrates was strongly affected by the etching parameter of etching cycle. The surface roughness of textured Si substrates was calculated with the haze and the scalar scattering theory at the wavelength of 800 nm. Then, the surface roughness was compared with that measured by atomic force microscope. The surce roughness obtained by two methods was changed with the similar tendency n terms of $XeF_2$ etching conditions.

A Study on the Relationships Between the Electrooptical Characteristics and Working Gas Xe+Ne+He (AC PDP의 전기광학적 특성과 동작 Gas $Xe_x+Ne_y+He_{1-y)$의 상관관계에 관한 연구)

  • Park, Chung-Hoo;Yoo, Su-Bok;Lee, Hae-June;Lee, Ho-Jun;Kim, Jae-Sung;Lee, Don-Kyu
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.9
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    • pp.1619-1625
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    • 2007
  • The gas mixture ratio of PDP discharges plays a very important role in the discharge characteristics of a plasma display panel. The increase of Xe contents results in the increases of luminance and luminous efficiency while it also results in the increase of the breakdown voltage. The addition of He gas increases the brightness and the luminous efficiency. Especially, the luminance and the luminous efficiency have a maximum value when the partial pressure of He is about 10% of the total pressure for a standard plasma display panel with Xe fraction of $10\sim30%$.