• Information Display
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• v.4 no.4
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• pp.6-10
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• 2003

우리는 연-X-선 흡수 분광법(soft-X-ray Absorption Spectroscopy ; XAS)을 사용하여 실제 산화물 음극 전자 방출 물질 표면의 화학 구조에 대해 연구하였다. 바륨 3d 흡수단의 고-에너지 분해 스펙트럼은 활성화 과정(온도와 전압 인가) 후에 산화물 음극표면에서 수십 나노미터 깊이 아래까지 바륨 함량이 현저히 증가한다는 것을 보여주었다. 바륨과 산소의 XAS 데이터를 비교해보면 표면에서 과잉 바륨이 형성되는 것을 확실히 입증하고 있다. 게다가 우리는 표면에서의 과잉 바륨의 증가가 활성화 과정에서 열에너지에 의한 것이 아니라 인가된 전압에 의한 것임을 밝혀냈다. 이 결과로 우리는 표면의 과잉 바륨 형성 전체 과정을 규명하고 활성화 동안 표면의 바륨 증가가 분말 입자로부터 니켈 계면으로의 바륨 이온의 전해 이동 속도에 의해 제어된다는 것을 제안한다. 우리는 또한 표면 바륨 증가가 전해 이동에 의한 분말 입자 내의 바륨의 고갈에서 비롯되는 것으로 추정한다.

• Journal of the Mineralogical Society of Korea
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• v.24 no.2
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• pp.73-82
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• 2011

X-ray absorption spectroscopy (XAS) study was conducted using arsenite-sorbed two-line ferrihydrite to investigate the mechanism of surface interactions between two-line ferrihydrite and As(III) (arsenite) which are ubiquitous in nature. The two-line ferrihydrite used was synthesized in the laboratory and the study was undertaken at pHs 4 and 10 to compare the difference in mechanisms of surface interaction between acidic and alkaline environments. The effect of arsenite-adsorbed concentrations on surface complexation was investigated at each pH condition as well. From the results of XAS analyses, the structural parameters of arsenite in the EXAFS revealed that the coordination number and distanceof As-O were 3.1~3.3 and 1.74~1.79 ${\AA}$, respectively, which indicate that the unit structure of arsenite complex formed on the surface of two-line ferrihydrite is $AsO_3$. The dominant structures of As(III)-Fe complex were examined to be bidentate binuclear comer-sharing ($^2C$) and the mixture of bidentate mononuclear edge sharing ($^2E$) and $^2C$ appeared as well. At pH 4, arsenite complex showed different structures on the surface of two-line ferrihydrite, depending on the adsorbed concentrations. At pH 10, on the contrary, the surface structures of arsenite complexes were interpreted to be almost identical, irrespective of the adsorbed concentrations of arsenite. Consequently, this microscopic XAS results support the results of macroscopic adsorption experiments in which the surface interaction between arsenite and two-line ferrihydrite is significantly influenced by pH conditions as well as arsenite concentrations.

• Current Applied Physics
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• v.18 no.11
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• pp.1458-1464
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• 2018

An improved method for the preparation of g-$C_3N_4$ is described. Currently, heating (> $400^{\circ}C$) of urea is the common method used for preparing the g-$C_3N_4$. We have found that sonication of melamine in $HNO_3$ solution, followed by washing with anhydrous ethanol, not only reduce the crystallite size of g-$C_3N_4$ but also facilitate intriguing electronic structure and photoluminescence (PL) properties. Moreover, loading of metal (Pt and Ag) nanoparticles, by applying the borohydride reduction method, has resulted in multicolor-emission from g-$C_3N_4$. With the help of PL spectra and local electronic structure study, at C K-edge, N K-edge, Pt L-edge and Ag K-edge by X-ray absorption spectroscopy (XAS), a precise mechanism of tunable luminescence is established. The PL mechanism ascribes the amendments in the transitions, via defect and/or metal states assimilation, between the ${\pi}^*$ states of tris-triazine ring of g-$C_3N_4$ and lone pair states of nitride. It is evidenced that interaction between the C/N 2p and metal 4d/5d orbitals of Ag/Pt has manifested a net detraction in the ${\delta}^*{\rightarrow}LP$ transitions and enhancement in the ${\pi}^*{\rightarrow}LP$ and ${\pi}^*{\rightarrow}{\pi}$ transitions, leading to broad PL spectra from g-$C_3N_4$ organic semiconductor compound.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.334.2-334.2
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• 2014

본 연구에서는 a-InGaZnO (IGZO) 활성층에 대기분위기에서 열처리 온도를 각각 $150^{\circ}C$, $250^{\circ}C$, $350^{\circ}C$ 실시하여 전자구조와 광학적 특성분석 및 화학적 결합 상태의 변화를 알아보고, 이러한 물성 변화에 따른 소자의 특성을 알아 보았다. 박막 트랜지스터 소자의 전기적 특성은, IGZO 박막에 후 열처리 공정온도 후 제작한 박막 트랜지스터는 $150^{\circ}C$에서 3.1 cm2/Vs의 전계 효과 이동도와 0.38 V/decade의 문턱전압 이하 기울기를 보였으나, $350^{\circ}C$에서는 8.8 cm2/Vs의 전계 효과 이동도와 0.20 V/decade의 문턱전압 이하 기울기로 더 향상된 박막 트랜지스터의 전기적 특성 결과를 관측하였다. 전기적 소자 특성의 변화와 활성층 IGZO 박막 특성 변화와의 상관관계를 조사하기 위하여 X-ray Absorption Spectroscopy (XAS)과 Spectroscopy Ellipsometry (SE)로 측정된 흡수 스펙트럼을 통하여 3 eV 이상의 광학적 밴드 갭은 기존에 보고 되었던 a-IGZO와 유사한 특성을 보이고 있음을 확인하였고, 이러한 측정, 분석법들을 통해 후 열처리 공정 온도에 따른 밴드 갭 부근의 결함준위의 양 변화와 가전자대의 전자구조의 변화에 따라 전기적 특성이 달라짐을 확인 할 수 있었다. 또한, X-ray Photoemission Spectroscopy (XPS)를 통해 측정한 O-1s를 통해 Oxygen deficient state와 밴드 갭 부근의 결함준위와의 상관관계를 도출해낼 수 있었다. 이는 a-IGZO 활성층에 후 열처리 공정 온도 변화에 따라서 전자구조의 혼성변화와 밴드 갭 부근의 결함준위의 양의 변화, 에너지 준위의 변화 및 이와 연관된 화학적 상태 변화가 박막 트랜지스터의 특성 변화를 예상할 수 있다는 결과를 도출하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.397-397
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• 2013

The electrical, electronic, optical properties and the local structure of Nickel Oxide (NiO) thin film have been investigated by X-ray photoelectron spectroscopy (XPS), Reflection Electron Energy Loss Spectroscopy (REELS), UV-spectrometer,Hall Effect measurement and X-ray absorption spectroscopy (XAS). The XPS results show that the Ni 2p spectra for all films consist of $Ni2p_{3/2}$ at around 854.5 eV which indicate the presence of Ni-O bond from NiO phase and for the annealed film at temperature above $200^{\circ}C$ shows the coexist Ni oxide and Ni metal phase. The REELS spectra showed that the band gaps of the NiO thin films were abruptly decreased with increasing temperature. The values of the band gaps are consistent with the optical band gaps estimated by UV-Spectrometer. The optical transmittance spectra shows that the transparency of NiO thin films in the visible light region was deteriorated with higher temperature due to existence of $Ni^0$. Hall Effect measurement suggest that the NiO thin films prepared at relatively low temperatures (RT and $100^{\circ}C$) are suitable for fabricating p-type semiconductor which showed that the best properties was achieved at $100^{\circ}C$, such as a low resistivity of $7.49{\Omega}.cm$. It can be concluded that the annealing process plays a crucial role in converting from p type to n type semiconductor which leads to reducing electrical resistivity of NiO thin films. Furthermore, the extended X-ray absorption fine structure (EXAFS) spectrum at the Ni K-edge was used to address the local structure of NiO thin films. It was found that the thermal treatments increase the order in the vicinity of Ni atom and lead the NiO thin films to bunsenite crystal structure. Moreover, EXAFS spectra show in increasing of coordination number for the first Ni-O shell and the bond distance of Ni-O with the increase of substrate temperature.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.299-299
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• 2016

SiC는 넓은 에너지갭 (Eg=~3.4 eV)을 갖는 반도체로써, 고전압, 고온에서 동작이 가능하여 기존의 Si기반의 파워디바이스를 대체하기 위한 물질로 많은 연구가 이루어지고 있다. 파워 디바이스의 성능 향상을 위해서는 기판과 절연체 사이의 계면에 생성되는 계면 결함을 감소시켜야 한다. 따라서 본 연구에서는 SiC 기판에 high-k 물질인 HfO2를 증착하여 HfO2/SiC 계면에 유도된 결함을 분석하고 이를 감소시킬 수 있는 방법에 대한 연구를 수행하였다. HfO2 박막은 atomic-layer-deposition (ALD) 방법을 이용하여 SiC 기판 위에 $200^{\circ}C$에서 증착하였다. HfO2 박막 증착 후 NH3 분위기에서 rapid thermal annealing 방법을 이용하여 $600^{\circ}C$에서 1분 동안 열처리 진행하였다. Current-voltage (I-V) 측정을 통해 열처리 전 HfO2/SiC의 절연파괴 전압이 약 8.3 V 임을 확인하였다. NH3 열처리 후 HfO2/SiC의 절연파괴 전압이 10 V로 증가하였으며 누설 전류가 크게 감소하는 것을 확인하였다. 또한 capacitance-voltage (C-V) 측정을 통해 열처리 후 flat band voltage가 negative 방향에서 positive 방향으로 이동함을 확인하였고, 이를 통해 NH3 열처리 방법이 HfO2/SiC 계면에 존재하는 결함을 감소시킬 수 있음을 확인하였다. 전자 구조상의 conduction band edge에 존재하는 결함 준위를 분석하기 위해 x-ray absorption spectroscopy (XAS) 분석을 실시하였고, 열처리 전 HfO2/SiC 계면에 많은 결함 준위가 존재함을 확인하였으며, x-ray photoelectron spectroscopy (XPS) 분석을 통해 이 결함 준위가 oxygen deficiency state과 관련됨을 알 수 있었다. NH3 열처리 후 결과와 비교해보면, oxygen deficiency state가 감소함을 확인하였으며 이로 인해 conduction band edge에 존재하는 결함 준위가 감소함을 알 수 있었다. 따라서, NH3 열처리 방법을 이용하여 HfO2/SiC 계면에 존재하는 결함을 감소시킬 수 있으며, HfO2/SiC의 물리적, 전기적 특성을 향상시킬 수 있다는 결과를 도출하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.193.2-193.2
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• 2016

We evaluate the change in defects in the oxidized SiO2 grown on 4H-SiC (0001) by plasma assisted oxidation, by comparing with that of conventional thermal oxide. In order to investigate the changes in the electronic structure and electrical characteristics of the interfacial reaction between the thin SiO2 and SiC, x-ray photoelectron spectroscopy (XPS), X-ray absorption spectroscopy (XAS), DFT calculation and electrical measurements were carried out. We observed that the direct plasma oxide grown at the room temperature and rapid processing time (300 s) has enhanced electrical characteristics (frequency dispersion, hysteresis and interface trap density) than conventional thermal oxide and suppressed interfacial defect state. The decrease in defect state in conduction band edge and stress-induced leakage current (SILC) clearly indicate that plasma oxidation process improves SiO2 quality due to the reduced transition layer and energetically most stable interfacial state between SiO2/SiC controlled by the interstitial C.

• Journal of the Mineralogical Society of Korea
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• v.22 no.1
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• pp.23-34
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• 2009

The adsorption of iodide on untreated bentonite and bentonites modified with organic cation (i.e., hexadecylpyridinium chloride monohydrate ($HDP^+$)) was investigated, and the organobentonites were characterized using uptake measurements, ${\mu}$-XRD, and electrophoretic mobilities measurement. Uptake measurements indicate that bentonite has a high affinity for $HDP^+$. Our ${\mu}$-XRD study indicates that organobentonites significantly expanded in basal spacing and organic cations were substantially intercalated into the interlayer spaces of bentonite. The electrophoretic mobility indicates that organobentonite tht is modified with organic cations in excess of the CEC of bentonite is completely different from untreated bentonite in the surface charge distribution. We found significant differences in adsorption capacities of iodide depending on the bentonite properties as follows: iodide adsorption capacities were 439 mmol/kg for the bentonite modified with $HDP^+$ at an equivalent amount corresponding to 200% of the CEC of bentonite whereas no adsorption of iodide was observed for the untreated bentonite. The molecular environments of iodine adsorbed on organobentonites were further studied using I K-edge and $L_{III}$-edge x-ray absorption spectroscopy (XAS). The X-ray absorption near-edge structure (XANES) of iodine spectra from organobentonites was similar to that of KI reference solution. Linear combination fitting of EXAFS data suggests the fraction of iodine reacted with the organic compound increased with increasing loading of the organic compound on organobentonites. In this study, we observed significant differences in the adsorption environments of iodide depending on the modified property of bentonite and suggest that an organobentonite has potential as reactive barrier material around a nuclear waste repository containing anionic radioactive iodide.